Professional Documents
Culture Documents
Prof. Chandra PDF
Prof. Chandra PDF
RFDT (2013-2014)
S. No. 1 Broad Project Title / Area Supervisor (s) Short description This will be in continuation of the previous project, which was started but not completed yet.
Prof. The FBAR based on piezoelectric Sudhir zinc oxide and MEMS technology Chandra using dry etching process. The and Prof. S work involves design, simulation, K Koul mask design and mask fabrication, device fabrication and testing in Microwave frequency range. Prof. Sudhir Chandra and Prof. S K Koul Prof. Sudhir Chandra The scope of the project is to design and fabricate test structures in IC chips to extract parameters related to material, devices and processing. The examples are (but not limited to): life time, mobility, carrier concentration, contact resistance of metallization, sheet resistance, surface recombination velocity etc.
Design and fabrication of piezoresistive pressure sensor using dry etching process A self aligned MOSFET using sputter deposited dielectric and polysilicon film