ELECTRO DEPOSITION PROCESS Standard Parameters considered, 0.01M of La(NO3)3 0.01M of EDTA 0.02M of Na3PO4 0.

0.1 M of KCl Ph adjusted to 6.0 by adding 0.1 M of HNO3 Electrodes - indium tin oxide (ITO), Platinum sheet Reference electrode Saturated Calomel Electrode. Working time 15 minutes Potential current 1.4 V to 1.8 V Bath temp 30 to 800 C

TO BE PREPARED To vary the molarity concentration of La(NO3)3 ranges from 0.005 0.03M [0.005, 0.0075, 0.01, 0.015, 0.020, 0.025,0.030] To vary the solution PH [2, 2.5, 3, 3.5 .,13] To vary the bath temperature ranges from 30-900C [30, 45 60, 75. 90] To vary the potential current range from 1 2 V [1.0, 1.2, 1.4, 1.6, 1.8, 2.0] To vary the deposition time. [5, 10, 15, 20, 25, 30, 35,40] in minutes To vary the dispersant Generally NaCl, NH3Cl, Sacharin can also be used instead of EDTA [0.005, 0.0075, 0.01, 0.015, 0.020, 0.025,0.030] Na3PO4 ratio can be varied [0.075, 0.01, 0.02, 0.03, 0.04, 0.05] KCl ratio ranges from 0.005 0.03M [0.005, 0.0075, 0.01, 0.015, 0.020, 0.025,0.030] Thin film coated on different substrate Cupper, tin, SS, ITO, SNO2 Different Annealing Temperature [3000C, 4000C, 5000C, , 16000C]

Altogether 10 different parameters are there, each parameter has to be varied with the standard reference data available such that 1st parameter is varied where the remaining 9 parameters are to be kept constant (reference data) predict the standard valve from the observations. Now fix the 2nd parameter is varied where the remaining 8 parameters are to be kept constant (reference data) and new obtained result is taken into consideration. Then predict the standard valve from the observations. Repeat the above procedure to obtain the standard valve for the remaining seven parameters. For each observation XRD with EDAX SEM AFM UV-SPECTROSCOPY FILM THICKNESS