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반도체 제조용 배관 전해연마
반도체 제조용 배관 전해연마
(electropolishing)
.
.
.
.
.
1) (Rmax) 2. 0m
(Rmax) 0.7m
HIGH POWER
Na .
2)LOW POWER
.
3)() PIT() .
4) () .
.
PIT
.
POWDER
.
Rmax, Ra .
,
.
GAS
.
- (Scanning Electron Microscopy, SEM)
.
- .
- AES(Auger Electron
Chemical Analysis) .
- .
- .
, , , ,
, .
< 1> , FITTING .
(STS316L) ,
,
(AFM, Abrasive Flow
Machining) . ,
,
.
(PITTING) .
4 CLEAN ROOM(CLASS
100) , .
< 5>
CLEAN
< 4> 4
< 5> ,
GAS
GAS GAS
GAS
. (ULTRA CLEAN)
GAS WAFER .
FITTING, TUBE
, GAS
, GAS (ULTRA
CLEAN) .
.
- GAS ,
.
1) , , ,
2)
3)
4) Cr
.
GAS GAS ,
(ULTRA CLEAN) GAS .
2) PARTICLE
PARTICLE 10% 0.013 PATTERN
. PATTERN PARTICLE
,
(PURGE) PARTICLE .
(PURGE) .
3) DEAD SPACE
DEAD SPACE , (:
/BELLOWS SEAL ), PURGE GAS
, PURGE , PARTICLE , DEAD SPACE
GAS .
DEAD SPACE COMPONENT , DEAD SPACE
< 7>
DEAD SPACE
DEAD
1.3cc 0.01cc
4) OUTGAS
< 8> .
< 9>
OUT GAS .
,
, .
.
, OUT GAS
.
OUT GAS
, < 11>
.
< 8>
< 9> ( )
GAS
1.
SUPER CLEAN STAINLESS STEEL
2.
PROCESS GAS / /
3.
PARTICLE / / PITTING
4.
/
5. GAS
/
6. - VCR
/
. (Si) FERRITE .
TOUGHNESS , .
(Mn) S, Se RED-SHORTNESS
. AUSTENITE Ni 50% N STAINLESS
STEEL N .
(P) (),
AUSTENITE . (S)
, Mn, Te, Mo . (Cu) AUSTENITE
ION ,
(Mo) (NORMALIZING) ,
, CREEP , ION .
(Al) FERRITE Ni
, ,
, AF(EF), (AOD), (VOD),
(VIM)
, Electro Slag (ESR), ARC (VAR), (VCR)
< 1> .
,
(VCR)- ARC (VAR) (VIM)- ARC
(VAR) . < 12> .
VCR-VAR ,
, AF , 20015torr
O2+Ar (VCR)
. LF(Ladle Furnace) (S) ,
Casting , ARC (VAR) (C), (O),
(H) .
VIM-VAR
(VIM) . (C),
< 2>
.
VCR-VAR , VCR-VAR (STS316L) ,
(STS316L) . (Mn)
(MnS), Mn FUME ,
, VCR-VAR 0.28 VIM-VAR 0.02
.
(Ni),
(Cr), (Mo) .
<
13> .
JIS-G3214
100
, VCR/VAR
,
AOD , VCR/VAR
, AOD
, VCR/VAR
.
< 15> VIM-VAR VCR-VAR VIM-VAR
, VCR-VAR
25% .
Rmax 0.7
. SEP(Super Electropolishing) EP
, ,
< 2>
< 3> /
< 4>
Level
Spec.
Rmax
Ra
B A
Ra ave. 10inch
E P
Ra ave. 5inch
SEP
Ra ave. 3inch
< 5>
(+)
(ppb)
(-)
(ppb)
NH4+
N/D
Cl-
N/D
Na+
N/D
NO3-
N/D
K+
N/D
SO42-
N/D
Ca2+
N/D
PO43-
N/D
Mg2+
N/D
, ,
,
, CHEMICAL , CHEMICAL .
LAMP
/ , ,
200ml 1
. LOT 10PCS
(SEM)
PARTICLE, PITTING, .
CHEMICAL AUGER CHEMICAL ,
(Cr RICH) . CHEMICAL
(SEM)
< 16> .
. SEM
, ,
PIT
ION
CAP
1Hr ,
50ml .
AES
DEPTH PROFILE
( ) <
18>
10
, , Cr OXIDE 40
) ppm
SAMPLE 100ml
:ELBOW
Fe
Cr
Ni
Si
29
61
sputter 1
20
25
50
sputter 2
60
25
15
sputter 3
63
26
11
< 7>
SAMPLE
HC (ppm)
3/8TEE (3EA)
< 0.1
(SMOOTHNESS)
, ,
, ,
,
, , , , , ,
,
, . < 20>< 24>
< 16> SEM
< 19>