RF System

Overview
The single purpose of the RF system is to impart enough energy to the argon gas
passing through the torch to create an Argon Plasma. This energy is in the form of a
high frequency electromagnetic field (nominally 40.68 MHz) which is transmitted
from a gold coated copper coil known as the Work Coil. The excitation of the argon
atoms by this field creates extremely high temperatures and a significant proportion
of the atoms exist in an ionised state.
The Plasma is generated and sustained by the RF Field around the work coil through
which the argon gas passes. The RF power to the work coil is generated by a free
running oscillator circuit known as the Source. This circuit begins to oscillate
automatically when high voltage is applied to it and the output power to the work coil
is controlled by varying the magnitude of the high voltage applied to the oscillator.
All of the hardware components of the Source circuit are of fixed values and the
circuit responds to changes in Plasma Impedance (which come about when gas flows
and sample types are changed) by changing oscillating frequency. This is termed a
free running type RF generator, that is, the frequency of oscillation of the generator
changes to match different plasma conditions. The power output of the Generator is
related to the Plate voltage applied to the oscillator circuit and therefore output Power
is controlled by controlling the Plate voltage.
The actual power to the plasma cannot be easily measured, so it is calculated as the
product of DC Plate Voltage (Vp), DC Plate Current (Ip), and the Generator
Efficiency Factor (determined as 0.65), where:
Power = Vp x Ip x 0.65.
Control of the RF power supply is achieved via the CPU Module, ICP Interface PCB
and the Plate Supply Control PCB.
Chapter 4 Integra XL Plasma Generator
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