The document discusses several crystal growth techniques used in semiconductor manufacturing including liquid phase epitaxy (LPE), metal-organic chemical vapor deposition (MOCVD), organometallic vapor phase epitaxy (OMVPE), and molecular beam epitaxy (MBE). It provides an example of blue laser diodes grown using MBE with transmission electron microscope (TEM) and scanning electron microscope (SEM) images showing the epitaxial layers and fabricated laser device.
Original Description:
crystal growth techniques. useful file for starters.
The document discusses several crystal growth techniques used in semiconductor manufacturing including liquid phase epitaxy (LPE), metal-organic chemical vapor deposition (MOCVD), organometallic vapor phase epitaxy (OMVPE), and molecular beam epitaxy (MBE). It provides an example of blue laser diodes grown using MBE with transmission electron microscope (TEM) and scanning electron microscope (SEM) images showing the epitaxial layers and fabricated laser device.
The document discusses several crystal growth techniques used in semiconductor manufacturing including liquid phase epitaxy (LPE), metal-organic chemical vapor deposition (MOCVD), organometallic vapor phase epitaxy (OMVPE), and molecular beam epitaxy (MBE). It provides an example of blue laser diodes grown using MBE with transmission electron microscope (TEM) and scanning electron microscope (SEM) images showing the epitaxial layers and fabricated laser device.