Professional Documents
Culture Documents
PP Phun Xa Magnetron
PP Phun Xa Magnetron
Phn x (Sputtering):
L k thut ch to mng mng da trn nguyn l truyn ng
nng bng cch dng cc ion kh him c tng tc di in
trng bn ph b mt vt liu t bia vt liu, truyn ng nng
cho cc nguyn t ny bay v pha v lng ng trn .
Cc giai on c bn
One
Two
Three
Four
Phn x.
Kim loi/
Hp kim
Bia
Gm
(dn in/
in mi)
Inox
S, gch men
Polymer
X l th
-Dng kim: NaOH, nc ra sunplay,
X l tinh
Lm sch b mt bng phng
in trong chn khng trc
khi cho ph mng.
Bm th cp
bt u t p sut kh quyn.
Bm Booster (Roots),
cp hot ng.
atmtphe
(atm)
torr
(Torr)
pao (p sut)
trn mt ins
vung
(psi)
pascal
(Pa)
bar
(bar)
1 Pa
1
N/m2
105
1 bar
100000
106 dyn/cm2
1,0197
0,98692
750,06
14,504
1 at
98.066,5
0,980665
1 kgf/cm2
0,96784
735,56
14,223
1 atm
101.325
1,01325
1,0332
1 atm
760
14,696
1 torr
133,322
1 Torr;
1 mmHg
19,337103
1 psi
51,715
1 lbf/in2
Bm chan khong
Vung lam viec cua cac bm chan khong
Qu trnh phn x
Pha hi
Pha rn
(Mng - Film)
Pha hi
Pha rn
(Bia-Target)
11
S phn x Magnetron
Cng t trng c iu
chnh (500 2000G) sao cho cc in
t b tc ng mnh cn cc ion th
khng.
Cc in t thc hin cc chuyn ng
cycloid trong in trng v t trng
vung gc h s ion ha rt cao.
Phng in magnetron c th duy tr p
sut rt thp (< 10-2 Pa) v mt dng in
cao hn rt nhiu so vi phng in khng c
t trng.
14
H magnetron cn bng
B (hng v)
in trng
S
N
S
N
T trng
khp kn
Cc e chu tc dng
ca t trng ngang
T trng
khng khp kn
Cc e t chu tc dng
ca t trng ngang
t b e
va p
e ch yu chuyn
ng gn bia
b nhiu e
va p mnh
e theo in trng
n vi v ln
t b
t nng
b
t nng
Thch hp to cc
mng yu cu T0 cao
15
P = 1- 10 mtorr
N = 1012 1015 cm-3
ne = 1010 1012 cm-3
Te = 2 5 eV
DC
16
Bia
(a)
Bia
(b)
- Mt plasma trn
cao hn so vi
trng hp DC.