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Degradation Mechanism of PU Mdi Based
Degradation Mechanism of PU Mdi Based
ADVANCES
IN PHOTODEGRADATION
AND
STABILIZATION
OF POLYURETHANES
B. P. THAPLIYALand R. CI~NDRA*
735
735
740
743
748
748
I. I N T R O D U C T I O N
OF PHOTODEGRADATION
736
2.....
..... O a C ~ N ~ : : : ~ C H ~ N H ~ C O 2
.....
..... O 2 C ~ N @ C @ N ~ C O
2.....
737
;H3
NH
NH
hv
it_
I
o
C~------------O
O
..... O ~ ~ N H
O
C~O
O
H3
~ O
.....
o
C~-O
Yamagata and coworkers '6 carried out studies on the influence of UV light on
urethane compounds and noted the behavior of thermoplastic polyurethanes
in the presence of UV light. Fluorescence, UV, IR spectroscopy and ESR data
indicated that in the initial stages of UV irradiation the urethane linkage was
broken via an electrophilic mechanism, therefore decreasing density in the initial
stages. Crosslinking occured in the later stages by a radical mechanism and was
accompanied by the formation of colored material. Noack and Schwetlick ~7
suggested that the yellowing of urethane polymers under UV irradiation was
due to oxidation of free-NH2 groups formed by the photolysis of the urethane
groups. UV spectral and ESR studies indicated t8 that photodegradation was
dependent on the kind of polyol used to prepare the polyurethane.
By taking into account the effect of excitation wavelength, Gardette and
Lemaire '9 postulated that the photolysis of MDI-based polyurethanes proceeds
by two entirely unrelated processs. From Gardette and Lemaire's work 2 it can
be concluded that the degradation of aromatic polyurethanes by irradiation
may be acounted for by two mechanisms based on the formation of different
738
B. P. T H A P L I Y A L and R. C H A N D R A
products. The first is observed at short wavelengths ( < 340 nm) and proceeds
through a photo-Fries type reaction. The second mechanism is observed at
longer wavelengths and involves formation of colored species derived from
primary hydroperoxides. These two paths were differentiated both by incorporation of Tinuvin 770 into the polymer and by selection of various irradiation
wavelengths# Quinone-diimide products are obtained when wavelengths of
light above 340 nm are used. However, formation of photo-Fries rearrangement
type products and unsubstituted arylamine cleavage products occur when light
below 340 nm is used for photolysis. 2
h v > 340 n m
hv,~ 34Ohm
..... O 2 C ~ N H ~ H = - - - - ~ N
H-----CO~.....
+
R
*'
~ C ~
*'
~ C ~
*,
)
!__o__.
Four types of hydroperoxides were formed, depending upon the structure of the
polyurethane elastomer:
0
.....
..........
o_U_c
.....
!--o--.
(A)
..... O~H~CH~
~--O~H
(c)
(S)
.....
.... - C H ~ N H ~ C ~ O
--HU
(D)
.....
739
The respective hydroperoxides were formed from the CH2 group ~t to the
phenyi group of diisocyanate (A), the CH2 group a to the ester group (B), the
CH2 group ~t to the ether group (C) and the CH2 group a to the carbamate
nitrogen atom (D).
The primary photochemical reactions in polyurethanes leading to accumulation of free radicals, and further reactions of free radicals by UV photolysis of polyurethanes based on i,4-butanedioI-HDI, 1,6-hexanediol-HDl
copolymer, methyl N-ethyl carbamate and diisopropyl hexamethylenebiscarbamate were studied. 22The primary step in photolysis was cleavage of the C-O
bond of the urethane group. Subsequent degradation followed a radical chain
mechanism.
Brauman e t al. 23 found that the substitution of the aliphatic diisocyanate
methylenebis(4-cyclohexyl isocyanate) for MDI gave a polymer resistant to
light-induced discoloration and degradation. As discussed previously, photodecomposition of aromatic polyurethanes is supposed to proceed via cleavage
of N-C and C-O bonds in the urethane group. Photochemical degradation of
aliphatic urethane groups containing a hydrogen atom on the carbon a to the
carbamate nitrogen, was postulated to resemble that of an amide: an initial
N-C, and possibly C-O, bond cleavage in the urethane group was followed by
hydrogen abstraction. Subsequent oxidative degradation of this site apparently
occurs via a hydroperoxide intermediate. This process does not occur readily if
the hydrogens are not activated, as evidenced by the photolytic stability of these
polyurethanes.
Wiles 24 observed a useful way of studying the interaction of photons with
polymers, i.e. to identify the significant chromophores in each system and to
determine the important primary processes following photon absorption. For
example, such an analysis has been useful in assigning the correct relative
importance to Norrish type I and II photoreactions for polymers containing
carbonyl groups. The irradiation of polyurethanes derived from dimethylglyoxime and hexamethylene diisocyanate 25involved two initial processes of N - O
and C-O bond scission. The ratio of N - O and C-O cleavages depends on the
wavelength of the light used. The C-O bond cleavage resulted in polymer
degradation, while the species formed by N--O bond cleavage were thought to
undergo recombination processes. UV irradiation of solutions and films of
polypropylene glycol-TDI copolymers decreased the urethane group absorption 26"27by breaking N--C and C-O bonds. Such was monitored by UV, IR and
N M R spectroscopy. The influence of the physical state of the polymer and
irradiation dose on the reaction were established.
3. E F F E C T
OF PHYSICAL
STATE
ON PHOTODEGRADATION
740
B. P. T H A P L I Y A L and R. C H A N D R A
rigid), surface coatings and adhesives. With the rapid expansion of this class of
materials over the past decades, polyurethanes now include those polymers
which contain a significant number of urethane groups together with a variety
of other structurally important groups, e.g. ester, ether and urea linkages. The
relationship between their chemical and physical forms is crucially important
from the viewpoint of their photostability.
Most commercial polyurethane elastomers derive their high level of strength
and flexibility from the segmented structure. A number of investigators28-33have
shown that polyurethane elastomers consist of alternating hard and soft segments. The soft segments are formed from linear polyether or polyester chains
whose glass transition temperature is sufficiently below the desired service
temperature of the polyurethane. Soft segments which crystallize on chain
extension are particularly desirable from the viewpoint of ultimate tensile
strength. The hard segments originate from a diisocyanate and a chain extender
or a crosslinking agent (e.g. diol or diamine). These hard segments have a T8 or
Tm well above the anticipated service temperature of the polyurethane and
hold the rubber together by "physical crosslinking" (which can involve interchain
hydrogen bonding). These hard segments prevent the material from flowing so
that the elasticity is maintained. These polyurethanes behave as rubbers when
the hard segment content is lower than 40% and as glassy materials when the
hard segment content is greater than 40%.
The photodegradation of polyurethanes34 based on aromatic diisocyanates
can be dependent on the physical state of the polymer. Hoyle eta[. 35-39 have
studied aromatic diisocyanate-based aromatic systems extensively to find out
the effect of the physical state of the polymer on the photostability. In one
investigation39 they have shown that for simple polyurethanes based on MDI
and a single diol, films with low crystallinity and high flexibility degraded
rapidly upon exposure to UV radiation. In the case of segmented polyurethanes
based on MDI and more than one diol, the extent and mechanism of photolytic
decomposition was dependent on the hard segment content in the polymer. As
the content of hard segments increased, both the percent crosslinked gel and
discoloration generated upon photolysis decreased dramatically. The formation
of photo-Fries rearrangement products was found to increase with an increase
in the molecular weight of the poly(ethylene oxide) soft segment.
Fluorescence spectroscopy40was used to determine the effect of flexibility and
crystallinity of the polyurethanes on the degradation pathway. It was observed
that amorphous films yielded an ortho-photo-Fries rearrangement product,
whereas the semicrystalline film did not. Photodegradation of MDI and TDI 4~based polyurethanes depended on the chain flexibility and the matrix crystallinity.
Both absorbance change and gel formation decreased as the stiffness and
crystalline content of the film increases.
There are a wide variety of compositional variables which can affect the
degree of phase segregation and hard segment organization and, accordingly,
741
742
OF POLYURETHANES
743
744
basis of the decay of ethyl phenyl carbamate during photoirradiation and on the
basis of fluorescence emission of the polymer with and without the additive.
SO~R
R3N
H~O
COUMARINS
NAPI-r~OTRIAZOLYLSTILBENF~
Phenyl esters of benzoic acid were the first photostabilizers to be used technically and they are still available because of their low price. Unfortunately most
of them turn yellow on exposure to UV light. This problem limits their use as
UV absorbers for colorless and transparent polymers. It is well known that the
yellowing of these compounds is due to a photochemical rearrangement of the
Fries type, giving derivatives of dihydroxybenzophenones. 67-7 Among the
hydroxybenzophenones, the o-hydroxybenzophenones are good stabilizers
while p-hydroxybenzophenones act as photodegradation sensitizers. The 1,4dihydroxybenzophenone isomer is, however, a very good photostabilizer for
polyurethanesf'
o "-o
*(n,A*)
it~t l (-,,)
0~) H~O(~
l~(n. ;~")
O""H ""0
745
Many workers have found that UV absorbers, e.g. Tinuvin 326 and 2,4
dihydroxybenzophenone, are effective for retardation of the photodegradation
of polyurethanes.63'7~ In addition, benzotriazole derivatives have been used as
stabilizers for polyurethanes.72 As in the case of o-hydroxybenzophenones, the
(o-hydroxyphenyl)benzotriazoles may form internal hydrogen bonds. Their
photostabilization mechanism is considered to be a rapid tautomerism in the
excited state: ~'73'74
N--H
N H
The distribution of a benzotriazole stabilizer (Tinuvin 328) in crystalline polypropylene has been investigated by UV microscopy.76The results show that the
stabilizer accumulates in the non-crystalline region and between polypropylene
spherulites, and is rejected by crystalline regions. These observations are very
important for understanding the photostabilization mechanism of polymers.
The excellent mechanical properties of benzotriazole-polyurethane systems offer
scope for interesting studies which involve varying the crystallinity and flexibility of the polyurethanes.
The hydroxphenyl-s-triazines are a new class of stabilizers which have recently
been investigated by Heller73 and used in polyurethanes.77
Ra
746
B. P. THAPLIYALand R. CHANDRA
(2) The basicity of the triazine ring is reduced by the substituents R, and R: and
the light fastness of the resulting compound increases.
Intramolecular bonds are obviously not a prerequisite for a stabilizing mechanism. Triazoles 73 which are photochemicaily active have, however, no photostabilizing effect and the compounds may act as photosensitizers.
~ "R2
~R2
R3
~
R:
Rt
4H - 1,2,4- triazoles
R3
2H - 1,2,4- triazoies
~S ]2Ni
\~c//
CH3(CH:)3~
~S-
P H O T O D E G R A D A T I O N A N D STABILIZATION O F P O L Y U R E T H A N E S
747
748
The methods of possible direct determination of light stabilizer and antioxidant content of polyurethanes are illustrated by Mody. 92 Different analytical
techniques were used for determining additive concentrations, e.g. GC, HPLC
and GPC. Also, a general method for screening the additives in the polymer
using thin-layer chromatography was developed. These techniques were used to
assure the addition of the proper amount and concentration of the additive to
the polymer before and after processing and during the aging of polyurethanes.
5. C O N C L U S I O N
A better understanding of the mechanisms of photodegradation and photostabilization has produced polyurethanes with increased photoresistance
through the use of more effective stabilizers. However, more knowledge is
needed about the primary and secondary reactions involved in oxidative
photodegradation.
Urethane model systems have already received increased attention and their
use has facilitated the separation of the factors involved in the complex photodegradation process. However, generalizations projected from small-molecule
model compound structures for studies of a single polyurethane in a particular
physical state cannot be of interest for all polyurethanes. Therefore, studies of
photodegradation and stabilization of polyurethanes having different physical
structures may provide better understanding of the urethane systems. In a recent
study 93 it has been observed that morphological changes take place as a result
of photooxidative degradation and are the primary cause of the failure of
aromatic urethane systems. The research field of polyurethane photodegradation,
therefore, offers ample opportunity for the polymer chemist and physicist to
collaborate in work that is not only intellectually stimulating but of practical
importance as well.
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