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Making An Low Pressure Plasma Device: Sanjib Rajbongshi
Making An Low Pressure Plasma Device: Sanjib Rajbongshi
Making An Low Pressure Plasma Device: Sanjib Rajbongshi
device
SANJIB RAJBONGSHI
7th Semester
Mechanical Engineering
Jorhat Engineering College
Jorhat -
Outline of the Talk
1. Introduction
2. Brief Description
3. Conclusion
Introduction
Plasma
It is known as the 4th state of matter.
When we heat a solid it gets converted into liquid, then a liquid into gas. When we
further heat the gas, the gas atoms and molecules get ionized. When this ionization is
very large, then the charged particles behave collectively to form the 4th state of matter
known as Plasma.
Plasma can be used for thin film fabrication, thermonuclear fusion, etching,
Lithography etc.
Plasma production in laboratory:
The plasma produced in laboratory is mainly a sustainable glow discharge (electron
energy=1-102ev and electron density= 108-1012cm-3).
Consider a gas between two electrodes. The naturally occurring electrons and also the
electrons ejected from the cathode due to high field will be accelerated towards the anode
and collides with the gas atoms and ionizes it. If the electronic energy is very large it can
produce secondary ionization and so on. The electrons will be lost from the gas by drift and
diffusion to the walls and by recombination with the positive ions.
Schematic diagram of the experimental system
System Parameter
Acknowledgement: