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THE SUMMARY OF CRITICAL HEAT FLUX OF WATER AT SUBATMOSPHERIC PRESSURES IN MICROCHANNELS ARTICLE
Flow boiling in microchannels is one of the most potent convective heat transfer methods. Water has superior thermophysical properties compared to most practical engineering fluids; it is readily available, environmental friendly, and nonhazardous. CHF (Critical Heat Flux) is one of the most important thermal-hydraulic transition phenomena in flow/pool boiling and is of significant engineering importance. Conventional scale studies strongly suggest that CHF conditions are closely related to the heat transfer mechanism prior to their appearance. An experimental study on CHF in microchannel with water at subatmospheric pressures will extend current limited knowledge pertinent to microdomains. This manuscript reports on the results of CHF study of water at subatmospheric pressures in an array of five parallel, 227 m hydraulic diameter microchannels. A computer aid design (CAD) model of the microdevice used in the current study is shown in Fig. 2. The microdevice was micromachined on a polished double-sided n-type (100) single crystal silicon wafer employing techniques adapted from integrated circuit (IC) manufacturing. The microchannels were formed on the top side of the wafer. A profilometer was employed to measure and record various dimensions of the device. Then, the wafer was processed. The wafer was flipped, and the backside was then processed to create an inlet, an outlet, side air gaps, and pressure port taps for the transducers. A photolithography step followed by a buffered oxide etch (BOE) (6:1) oxide removal process was carried out to create a pattern mask. The wafer was then etched through in a DRIE process to create the fluidic ports. Thereafter, electrical contacts/pads were opened on the backside of the wafer by performing another round of photolithography and RIE processing. Finally, the processed wafer was stripped of any remaining resist or oxide layers and anodically bonded to a 1 mm thick polished Pyrex (glass) wafer to form a sealed device. After a successful completion of the bonding process, the processed stack was diesawed to separate the devices from the parent wafer. The setup, shown in Fig. 3, consists of three primary subsystems: the flow loop section, instrumentations, and a data acquisition system. And, the procedure of the main flow loop begin. The main flow loop includes the microchannel device, a pulseless gear pump, a reservoir, a vacuum pump, and a pressure gauge to control the system pressure, a flow meter, and a dissolved oxygen meter. The test section heater is connected to a power supply with an adjustable dc current to provide power to the device. Simultaneously, the inlet pressure and test section pressure drop are collected, and the boiling process in the microchannels is recorded by a Phantom V4.2 high-speed camera (maximum frame rate of 90,000 framess, and 2 s exposure time) mounted over a Leica DMLM microscope. Calibration of the heater is performed prior to the experiment by placing the device in an oven and establishing the resistance-temperature curve for the heater.

The experiments processed is the deionized water was first degassed until the oxide concentration level dropped below 3 ppm. Then the system pressure was adjusted to the desired experimental value. The water flow rate was fixed at the desired value, and experiments were conducted after steady conditions were reached with a desirable system pressure and ambient room temperature (~22C). The electrical resistance of the heater was also measured at room temperature. During the experiment, voltage was applied in 0.5 V increments to the test section heater, and the resistance data for the heater were recorded once the steady state was reached. The procedure was repeated for different flow rates. These are how to estimate the heat losses, electrical power was applied to the test section after evacuating the water from the test loop. Once the temperature of the test section became steady, the temperature difference between the ambient and test section was recorded with the corresponding power. The plot of power versus temperature difference was used to calculate the heat loss (Q loss) associated with each experimental data point. Data obtained from the voltage, current, and pressure measurementswere used to calculate the average surface temperatures and CHF. The uncertainties of the measured values are obtained from the manufacturers specification sheets, while the uncertainties of the derived parameters are calculated using the method developed by Kline and McClintock. In conventional scale, CHF conditions are often led by two different mechanisms: departure from nucleate boiling (DNB) and dryout. For subcooled boiling or low quality saturated boiling for saturated boiling of high exit quality. The CHF condition: single-phase liquid flow, single bubble/slug flow, annular flow, and dryout beginning at the exit of the channel. The droplet entrainment varies little with mass flux and the interfacial wave instabilities are not strongly dependent on the mass flux, at least under the current experiment conditions. The practical limitation given by Gambill and Lienhard (Fig. 1) suggests that the maximum achievable CHF for pe pc0.01 (pe=221 kPa) is 10% of the maximum heat flux obtained from the kinetic theory. It is important to note that the dashed curve in the figure was obtained from the highest measured CHF value ever recorded, and it might very well be that higher values than the available data at the microscale can be achieved in microchannels for enhanced configurations or at higher mass fluxes.
In conventional scale, the CHF in channels is often a strong function of mass flux G, exit quality, xe, channel exit pressure, pe, channel hydraulic diameter, dh, channel length, L, and fluid properties

The system pressure (exit pressure) in a boiling system can have a complex effect on CHF conditions, since it can modify several important independent variables: the liquid-tovapor density ratio (l v), the surface tension (), and the latent heat of vaporization (hfg). Then, this is explaining about fig. 7 boiling number at the CHF condition 0.0037. For annular flow at subatmospheric pressure, the condition leading to CHF is dictated by the presence of liquid film adjacent to the channel wall. The significant reduction in the boling number at CHF conditions for the very high density ratio (i.e., pe=10 kPa) is not completely clear. Other effects such as compressibility, sonic limit, and rarefaction may become significant at such low pressure.

Conclution: In the current study, experiments were conducted to obtain CHF data for flow boiling of water at subatmospheric pressures in microchannels. Flow visualization was performed to aid the identification of CHF mechanism. The effects of independent variables, which are important in macroscale, were evaluated. The main conclusions drawn from the study are as follows: 1. Dryout is the primary CHF mechanism for flow boiling of water in microchannels at subatmospheric pressure, at low to moderate mass fluxes. 2. The CHF values obtained were lower than the limits suggested by Gambill and Lienhard. 3. Performing first order analysis, it was found that the mass quality at CHF conditions did not vary significantly, and the system pressure did not strongly affect CHF.