Professional Documents
Culture Documents
Microfabrication Lab Georgia Tech 2011: David Gottfried Mikkel Thomas Paul Joseph Greg Book Janet Cobb-Sullivan
Microfabrication Lab Georgia Tech 2011: David Gottfried Mikkel Thomas Paul Joseph Greg Book Janet Cobb-Sullivan
Microfabrication Lab Georgia Tech 2011: David Gottfried Mikkel Thomas Paul Joseph Greg Book Janet Cobb-Sullivan
David Gottfried Mikkel Thomas Paul Joseph Greg Book Janet Cobb-Sullivan
Lecture Outline
Introduction and biological basis for the fabricated device Cleanroom and processing basics Biological applications of microfabrication How this module will work
Poly(ethylene glycol) (PEG) for adhesion-resistant well separations Conventional spin-coating and photolithographic techniques (top-down process) Silane treatment aids PEG covalent attachment
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Customized attachment layers (poly-L-lysine, Ab) for cell-specific interactions Batch processing of entire array Can be coupled with laser capture microdissection (LCM) for specific cell removal
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Cell-Specific Attachment
Overview
Cleanroom Overview GT NRC Cleanrooms Cleanroom Etiquette & Safety Photolithography Reactive Ion Etching (RIE)
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What is a cleanroom?
Definition: A cleanroom is an environment in which particulates, temperature, and humidity are tightly controlled to protect sensitive equipment and processes from contamination. More accurately, a cleanroom has a controlled level of contamination that is specified by the number of particles per cubic meter at a specified particle size.
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What is a cleanroom?
ISO 14644-1 (new definition)
Class Maximum particles/m3 0.1m ISO 1 ISO 2 ISO 3 ISO 4 ISO 5 ISO 6 ISO 7 ISO 8 ISO 9 10 100 1000 10000 100000 1000000 0.2m 2 24 237 2370 23700 237000 10 102 1020 10200 102000 4 35 352 3520 35200 352000 3520000 35200000 8 83 832 8320 83200 832000 8320000 29 293 2930 29300 293000 Class 1 Class 10 Class 100 Class 1000 Class 10000 Class 100000 Room Air 0.3m 0.5m 1 m 5 m FED STD
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Cleanroom Facilities
Pettit Microelectronics Building Opened in 1990 8500 sq. foot cleanroom space Bay and Chase design
Seven class 1000 bays Two class 10 bays
Equipment List
http://grover.mirc.gatech.edu/equi pment/
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Cleanroom Etiquette
Professionalism is expected from all visitors Practice clean habits
Do not touch your bare skin with your gloves Change gloves when they get dirty or are torn Don the garment in the proper manner Start at the head and work down Gloves on last Video demonstration at conclusion of lecture
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Allowable Items
Items you cannot bring into the Cleanroom Ordinary Paper Pencils, Retractable pens Bags or purses Items you can bring into the Cleanroom Handouts on cleanroom paper Ballpoint Pens
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Cleanroom Hazards
Potential hazards inside the cleanroom Toxic, flammable, and corrosive gases Acids and bases Solvents Electrical Sharpsrazor blades, broken wafers
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Evacuation Procedure
Leave the cleanroom immediatelydo not de-gown Exit out nearest door this may not be the door you came in Gather at the front of the Marcus Building on Ferst Drive Remove your gown outside
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Photolithography
Positive resist - Resist is exposed with UV light. Exposed resist becomes soluble in the designated resist developer. Negative resist Resist is exposed to UV light. Exposed resist becomes cross-linked and is resistant to the designated developer for that resist.
R. C. Jaeger, "Introduction to Microelectronic Fabrication," in Modular Series on Solid State Devices. vol. V, G. W. Neudeck and R. F. Pierret, Eds. New York: Addison-Wesley Publishing Company, 1988, p. 232.
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Photolithography
Dosage The amount of energy required to make positive photoresist soluble in developer or negative photoresist insoluble in developer. Generally dosage is specified in photoresist datasheets in mJ/cm2. A millijoule is equal to a milliwatt-second. The power meter for the mask aligners measure power in mW/cm2.
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