Auto SE , the simplest

thin film measurement tool ever !

Introduction

MyAutoView Vision System

The Auto SE is an innovative new thin film measurement tool for determining the thicknesses and optical
constants (n,k) of thin layers and multi layers. The instrument has been introduced by HORIBA Jobin Yvon to simplify thin film analysis whilst maintaining the major
advantages of ellipsometry such as non-destructive analysis, accurate thickness measurement with angstrm resolution, and multi-layer measurement capability.
The Auto SE covers the diversity of thin film applications, in the fields of micro-electronics, flat panel displays,
photovoltaics, biotechnology, chemistry and functional
and optical coatings.

A unique way to position the sample

The Auto SE integrates the unique and patented
MyAutoView Vision System that is mounted within the
standard ellipsometer optics. MyAutoView allows the operator to view the sample spot at all times, and for all
sample types to ensure that the measurement is made at
exactly the right position with the right spot size. The image provided has a field of view of approximately 1mm2
and a resolution of 10 m.
Focusing optics

CCD Camera

Focusing optics

Product Description
The Auto SE is an integrated compact system that
guarantees efficiency and productivity for routine analysis
of thin films. Its design combines automation with experimental modularity.
The instrument includes a 200x200 mm sample stage
motorized in the XYZ axes for automatic
loading and alignment of the sample.
XY horizontal translation allows mapping of thin film uniformity over
the sample area. Each point
on the wafer map is measured
in less than 1 second, with full
spectral information available
over the range 440-850nm.
The user has a choice of 8 different measurement spots that
can be selected by the computer
system. This is very useful for cases where the sample is
patterned or has poor surface quality. In these cases the
user may choose the spot size that fits within the feature or
that removes the effect of sample inhomogeneity. The
user may view exactly where the sample spot is located
using the Vision System, and choose the optimum spot
size accordingly.
The Auto SE also offers a large choice of accessories (such as temperature controlled cell, liquid cell, electrochemical cell, 360 rotation control, transmission
mount, plastic film mount, etc), to accommodate a
wide range of experiments and sample shapes.

Light
Source

Spectrograph

Standard Imaging Design:

CCD camera placed at normal incidence. To visualize an image the
sample must diffuse light, restricting its range of application.
Illumination
Vision

CCD

Focusing optics

Spectrograph
MyAutoView Design:
CCD camera placed in the optical head allowing the visualization of
all samples.

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It is a simple exercise to identify areas where the MyAutoView Vision System increases measurement accuracy.
Sample type

Advantages of the MyAutoView Vision System

A patterned sample

Direct visualization of the measurement spot on the

pattern area.

A sample having spots deposited on the surface

Direct visualization of the measurement spot on the

sample to optimise measurement position.

A rough sample, or an inhomogeneous surface (stripe, stain)

Direct visualization of the measurement spot on the

sample to optimise measurement position.

A microstructured sample

Direct visualization of the measurement spot on the

sample to characterise the 0.8 mm line feature

A sample with a cylindrical or spherical

shape

Direct visualization of the plane surface for positioning of the spot on this area. The image on the right
shows that the spot is not optimally positioned, and is
still on the spherical surface.

Sample placed inside accessories such as a

liquid cell, temperature controlled stage

Easy positioning of the measurement spot on a sample placed inside a liquid cell (this example).

A unique advantage to measure transparent substrates

The Auto SE features a confocal filter between the
measurement spot and the spectrograph to restrict the effect of backside reflection of light from transparent substrates (figure 1).
0

Figure 1: A transparent substrate exhibits backside reflections.

This simplifies the measurement of transparent substrates

as the use of the MyAutoView Vision System allows:

Examples

- Selection of the front reflection only.

- Calculation of the degree of backside reflection for cases where the backside reflection cannot be eliminated.
Conventionally there have been three ways to treat the
backside reflections.
- The software may include a backside treatment function
so that the sample can be measured along with the
backside reflections. The main disadvantage of this is
the correct evaluation of the collected backside reflections.
- The sample is measured without its backside reflections
by roughening the bottom surface of the substrate so
that the light is scattered. This procedure damages the
sample.
- The use of a microspot so that the backside reflections
are spatially separated from the first reflection and
masked.

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The first example below illustrates a 1 mm thick glass substrate coated with a ZnO layer. Images were taken from the
MyAutoView Vision System.
The image shows the front and back reflections exhibited by the 1mm thick glass substrate. The 1 mm thickness of the substrate
allows the clear separation of both reflections.

Selection and measurement of only the front

reflection.

Selection and measurement of the only backside reflection.

Spot exhibited
from the front
reflection

Spectrograph bandpass
Spot exhibited
from the back
reflection

The second example illustrates the case of a thinner transparent substrate which is a 200 m thick plastic sheet.
The image shows the front and back reflections exhibited by the 200m thick plastic
sheet. The 200m thickness of the substrate
does not allow the spatial separation of both
reflections.

Selection and measurement of only the front

reflection.

Selection and measurement of only the backside reflection.

What's behind the technology?

The Auto SE is a spectroscopic ellipsometer that
uses liquid crystal modulation. The technology of modulation is carried out without any moving parts delivering
high accuracy measurements.
Ellipsometry is an optical technique that measures the
change in the polarization state of light, reflected from the
surface of a sample (figure 2). When a light wave interacts with a material, its state of polarization is modified.
The measurement of the variation of polarization between
the incident and the reflected wave makes it possible to
deduce physical and optical information related to the
thin film stack.

Figure 2: The Principle of Ellipsometry

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Spectroscopic ellipsometry has become the standard for

measuring thin films, surface and interface. The technique
provides three types of information:

Thicknesses ranging from a few angstroms to typically 15 microns*

Single transparent or semi-transparent layers or complex
multilayer stacks can be measured. The precision of the
technique enables the detection of native oxide, interface
or surface roughness.
*Thickness range determination enabled by the Auto
SE
Optical constants of materials
- Refractive index (n)
- Extinction coefficient (k)
Optical constants of materials may exhibit graded and /
or anisotropic behaviour. Such phenomena are easily detected by ellipsometry.

Average thickness = 903.4

Standard deviation = 0.120

Average thickness = 903.9

Standard deviation = 0.079

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Material properties
- Crystallinity, composition information provided by the
shape and position of material absorption
- Film porosity expressed in void percentage
The experimental data are usually expressed as two parameters and , which are related to the Fresnel reflection coefficients by:

rp
rs

rp e

i p

rs e i s

= tan e i

Optimized performance ideal for thin

film quality control
100 measurements were performed on a thermal silicon
oxide sample with the Auto SE using 2 different
CCD integration times of 3 and 10 s. The results show excellent repeatability as displayed on the graphs below.

Average refractive index = 1.46563

Standard deviation = 0.00019

Average refractive index = 1.46529

Standard deviation = 0.0001

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Simple Operation
The Auto SE is controlled by the Auto Soft
software integrated into the common software platform
that controls all HORIBA Jobin Yvon ellipsometers.
Auto Soft integrates very intuitive interfaces
based on the use of icons and internet like hyperlink navigation (figure 3). As the software is Multilanguage it is
simple to operate for everyone.
The software was created to fit the needs of three types of
users:
- OPERATOR using a simple interface for routine thin film
control
- ENGINEER with a large variety of analysis functions to
optimize results and/or experimental recipes
- SERVICE with an interface for detection and diagnosis of
possible problems of the system
Figure 4: Experimental Recipe Interface

the DeltaPsi2 mode it is transferred in the Auto

Soft software for routine use.

Launching an analysis routine

Figure 3: Main Interface of Auto Soft Software

Push button operation

By clicking on the icon Experimental Recipe a database
of applications is made available. Recipes are available
for micro-electronics, displays, optical coatings, biotechnology, photovoltaics as well as many other thin film applications (Figure 4). Within these families experimental
recipes allow the fully automated analysis of thin film
samples with a single push button operation. The sample
analysis takes only a few seconds and provides a complete report that fully describes the thin film stack - including film thicknesses, optical constants (n,k), surface
roughness and film inhomogeneities.
The database may be expanded using DeltaPsi2 software
and experimental recipes can be optimised for particular
samples or experimental conditions, such as when a different accessory is used. Once the new recipe is built in

3 steps are necessary to launch the experimental recipe.

- The first step consists of the preliminary adjustments of
the sample for measurement. Loading and sample
alignment are fully automatic, and the Vision System allows the user to see the spot on the sample and to
choose the area of measurement.
- The second stage consists in launching the analysis by
selecting the experimental recipe from the database and
pushing the run button.
- The results are displayed in a few seconds and an analysis report automatically delivered. The user is directly
informed if the results are not in good conformity with
the tolerance limits.

Routine validation
The experimental recipes available in the database have
been tested and validated for routine use to fulfil the requirements of a production environment.
The routine validation includes the analysis of several experimental samples having similar thin film structure, but
of differing thickness or optical constants (n,k) using the
corresponding experimental recipe. Analysis were runned
30 times at the same spot location.
The tables below show the excellent reproducibility of experimental recipes. Each experimental recipe may be
used over a wide variation of film thickness and optical
constants, and is not optimised for a restricted range of
sample type.

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Statistical results of 3 samples of TiO2 film deposited on

Silicon
Average

Maximum

Minimum

St Dev

Total
Thickness[]
n1[632.8nm]
k1[632.8nm]

2195.6
2.47933
0.00000

2196.1
2.47994
0.00000

2195.1
2.47878
0.00000

0.3
0.00032
0.00000

Total
Thickness[]
n1[632.8nm]
k1[632.8nm]

1584.4
2.53861
0.00000

1585.4
2.53916
0.00000

1583.7
2.53780
0.00000

0.4
0.00039
0.00000

Total
Thickness[]
n1[632.8nm]
k1[632.8nm]

851.9
2.44284
0.00000

852.5
2.44332
0.00000

850.6
2.44233
0.00000

0.4
0.00025
0.00000

Statistical results of 3 samples of SiO2 film deposited on

Silicon
Average
1955.958
1.46552
0.00000

Maximum
1956.936
1.46596
0.00000

Minimum
1955.310
1.46505
0.00000

St Dev
0.348
0.00017
0.00000

Total Thickness[]
n1[632.8nm]
k1[632.8nm]

1535.9
1.44682
0.00000

1536.7
1.44706
0.00000

1535.3
1.44659
0.00000

0.3
0.00013
0.00000

L1 Thickness []
n1[632.8nm]
k1[632.8nm]

969.519
1.46714
0.00000

969.721
1.46737
0.00000

969.243
1.46686
0.00000

0.120
0.00015
0.00000

L1 Thickness []
n1[632.8nm]
k1[632.8nm]

Statistic results of 3 samples of SiNx/SiO2 deposited on

Silicon

Statistical results of 3 samples of Al2O3 film deposited on

Aluminium

Total Thickness[]
n1[632.8nm]
k1[632.8nm]

Average
1620.876
1.65415
0.00000

Maximum
1622.453
1.65649
0.00000

Minimum
1619.257
1.65240
0.00000

St Dev
0.753
0.00106
0.00000

Total Thickness[]
n1[632.8nm]
k1[632.8nm]

1492.206
1.68532
0.00000

1493.104
1.68858
0.00000

1490.516
1.68274
0.00000

0.604
0.00120
0.00000

Total Thickness[]
n1[632.8nm]
k1[632.8nm]

1841.038
1.55685
0.00000

1842.417
1.55812
0.00000

1837.970
1.55485
0.00000

0.971
0.00080
0.00000

L1 Thickness []
L2 Thickness []
L3 Thickness []
n2[632.8nm]
k2[632.8nm]

Average
1004.486
3730.569
42.824
1.95223
0.00000

Maximum
1005.616
3732.345
43.459
1.95298
0.00000

Minimum
1003.337
3728.950
42.288
1.95160
0.00000

St Dev
0.688
0.890
0.310
0.00036
0.00000

L1 Thickness []
L2 Thickness []
L3 Thickness []
n2[632.8nm]
k2[632.8nm]

2036.650
7404.792
33.621
1.97270
0.00000

2037.184
7408.541
34.099
1.97335
0.00000

2035.632
7401.510
33.068
1.97187
0.00000

0.291
1.826
0.242
0.00040
0.00000

L1 Thickness []
L2 Thickness []
L3 Thickness []
n2[632.8nm]
k2[632.8nm]

2397.376
968.037
45.538
2.01328
0.00000

2398.660
969.438
46.493
2.01379
0.00000

2396.021
966.631
44.466
2.01265
0.00000

0.800
0.771
0.530
0.00033
0.00000

A typical procedure used by the experimental recipes involves the thickness of the principal layer being determined using fixed optical constants (n,k), and then
refining the analysis using the entire wavelength range.
This allows the recipe to deliver the thickness of the principal layer, the thickness of surface roughness and/or of a
possible interface between the substrate and the layer,
plus material optical constants.

And more
Advanced software for deep understanding of your thin
films
The Auto SE is simply controlled by the Auto
Soft software but it can also be controlled by
DeltaPsi2 software (Figure 5). DeltaPsi software offers extensive procedures for advanced thin film analysis by ellipsometry and contains many features for data and
results management and processing (import/export,
graphical, mathematical, automatic reporting functions).

Figure 5: Main Interface of DeltaPsi2 Software

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Comprehensive diagnostic indicators

When clicking on the "maintenance" icon the user opens
the interface that allows access to the automatic test functions of the Auto SE. The system includes built-in diagnostic indicators for the automatic detection and
diagnosis of problems (Figure 6). If the system detects a
problem the user is directly informed via a pop-up window along with comprehensive operator guidance for
troubleshooting. The XY sample stage integrates reference samples allowing automatic calibration of the
Auto SE should it be necessary. The need for recalibration is detected by the instrument, and initiates an automatic recalibration procedure.

Displays
- TCO: ITO, ZnO, SnO
- Silicon
- Nitride
- Polymers, organic materials
Flat panel displays make extensive use of thin film electrodes. Transparent conducting oxides are the material of
choice including ITO, IZO, ZnO, SnO
Typical properties measured by the Auto SE are:
thickness, optical constants, surface roughness (Figure 7).

Figure 7: Analysis of ZnO film

Figure 6: Maintenance Interface

Application of the Auto SE ?

The Auto SE is a new generation of thin film measurement tool that combines ease-of-use with the accuracy of spectroscopic ellipsometry. The Auto SE is a
turnkey system that is ideal for the quality control laboratory and for industrial lines that need routine thin film
measurement. As thin films are more and more used in
many industries including micro-electronics, displays, biotechnologies, surface treatments, photovoltaics, optical
coatings the need for such a simple and reliable tool become very important.

Some applications
Microelectronic
- Oxide, nitride, oxynitride
- Polymers, photoresist
- Silicon
- PZT
- Laser diodes: GaN, AlGaN
- Transparent electronics

Photovoltaics
- TCO
- Silicon
- Nitride
- Anti-reflective coatings
- Organic materials, polymers
The microstructure of silicon films can be varied from one
extreme of amorphous/nanocrystalline to highly oriented
and/or epitaxial growth.
The characterization of silicon thin films with the Auto
SE provides a wealth of information such as (Figure 8):
- Thickness
- Optical constants (n,k)
- Optical bandgap
- Surface roughness
- Inhomogeneities of silicon films (gradient)
- The shape of optical constants is directly linked to the
microstructure of silicon materials

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Figure 8: Analysis of a-Si film

Functional thin film coatings

- Optical coatings: Anti reflective, self-cleaning, electrochromic, mirrors, filters
- Protective, aesthetic, decorative coatings: Al2O3, polymers, oil
The Auto SE is the ideal tool for these applications
as thicknesses, optical constants (n,k) and transmittance
(T) of the sample are measured non-destructively and with
high accuracy in just a few seconds. The example below
shows the analysis results for typical anti reflective coatings consisting of x4 alternating layers of TiO2 and SiO2
(Figure 9).

Figure 9: Analysis of ARC

Biotechnology
- Organic films, LB, SAM
- Biofilm: ADN, protein
- Solid/liquid, liquid/liquid, liquid/air interface investigation
- Surface functionalization