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Micro Concentrator
Micro Concentrator
Micro Concentrator
Received February 23, 2007; revised May 31, 2007; accepted June 6, 2007;
posted June 12, 2007 (Doc. ID 80397); published September 20, 2007
Metal fingers typically cover more than 10% of the active area of concentrator solar cells. Microfabricated
dielectric optical designs that can completely eliminate front contact shading losses are explored. Essentially
no microconcentrator optical losses need be incurred, series resistance losses can be reduced, and net effi-
ciency gains of roughly 15% (relative) are realistic. © 2007 Optical Society of America
OCIS codes: 220.1770, 350.3950, 350.6050.
The optimal metal grid coverage of concentrator solar redistribution that completely obviates shading
cells reflects the trade-off between shading obscura- losses is illustrated in Fig. 2. Nonimaging 1 / 2 AD-
tion and series resistance Rs (Fig. 1). Cell efficiency MCs predicated on total internal reflection (TIR) rep-
peaks as a function of concentration, with a strong resent solutions [13,14] in the sense that, for given
nonlinear decrease controlled by Rs at high flux maximum input and output angles, 1 and 2, respec-
[2–4]. The metallization fraction of the active area in tively, they (a) provide the possibility of lossless op-
commercial concentrator cells is typically 10–16% tics, (b) represent the most compact device possible
[2–8]. Strategies for redirecting light from the metal for any prescribed metallization coverage for a flat
grid to interfinger regions include (1) prismatic and ADMC entry, and (c) yield V-troughs that are in
microlens refractive covers [3,4], and (2) reshaping many cases of practical interest, as they are particu-
ordinarily rectangular metal fingers [7]. These ap- larly amenable to accurate fabrication.
proaches incur optical losses due to [3–7] (a) absorp- The gridline spacing in most current high-
tion (imperfect reflectivity or transmissivity), (b) efficiency concentrator cells is around 100 m, inde-
problems in realizing precise refractive or reflective
contours, (c) Fresnel reflections at the extra air–
dielectric interfaces, and (d) aberrations. For silicon
solar cells, grid shadowing can be obviated with back
contacts, an option intrinsically precluded for ultra-
efficient III-V photovoltaics (PVs).
The confluence of the realization of cells of the type
in Fig. 1 with the evolution of microfabrication tech-
niques prompts the development of microconcentra-
tors that can completely eliminate front contact shad-
ing losses. Polymeric materials are disadvantageous
because (1) high solar flux may degrade them and (2)
the requisite aspect ratios and optical tolerances are
not currently achievable [9]. But glass elements in
high-flux PV concentrators have proved robust [2–5],
so we consider glass microfabrication procedures.
With the industrial deployment of femtosecond la-
sers, new technologies such as two-photon polymer-
ization [10] and direct microfabrication in glass [11]
can create the master for replication. Direct glass
fabrication and glass solgel materials [12] are the
best candidates for mass production.
The solar cell resides at the exit of a macroconcen-
trator with a typical acceptance half-angle of
Fig. 1. (Color online) Sample commercial triple-junction
⬃5 – 30 mrad, deployed on a dual-axis solar tracker square concentrator solar cells [1,2,6], both with 12% metal
[2–5,13]. The far larger half-angle 1 of light inside grid coverage. (a) 100 mm2 active area, nominal peak effi-
the dielectric microconcentrator, from the exit of the ciency 31%. (b) 1 mm2 active area, nominal peak efficiency
macroconcentrator (often as low as ⬃15– 30°) [3–7] 39%. (c) Simulation results [1] for contributions to effi-
becomes the input design angle for the all-dielectric ciency loss in designing a similar cell tailored so that effi-
microconcentrators (ADMCs) portrayed here. Flux ciency peaks at ⬃500 suns (1 sun= 1 mW/ mm2).
冦 冧
2共sin共1兲 + sin共2兲兲sin共T兲
−1 1 艋 T 艋 2
C= 1 − cos共1 + T兲 , 共3兲
sin共T − 共1/2兲 + 共2/2兲兲csc共T + 共1/2兲 − 共2/2兲兲 2 艋 T 艋 90°
冦 冧
共sin共1兲 + sin共2兲兲cos共T兲
1 艋 T 艋 2
AR = 2共sin共1兲 + sin共2兲兲sin共T兲 + cos共1 + T兲 − 1 . 共4兲
csc共T − 共1/2兲 + 共2/2兲兲 cos共共1/2兲 − 共2/2兲兲cos共T兲 2 艋 T 艋 90°
Convolving reasonable fabrication tolerances with creases when the metal fingers are widened (gridline
the actual width of the metal fingers increases the spacing is lessened), to a coverage ratio of 1 − 共1 / C兲
design equivalent finger width by ⬃20%. The lowest [and C bounded by Eq. (1)]. With 1 ordained by the
C of interest is for 10% metallization coverage. C in- macroconcentrator, there are two design degrees of
October 1, 2007 / Vol. 32, No. 19 / OPTICS LETTERS 2791