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Cmos Fabrication: - Lithography - Etching - Oxidation - Doping - Deposition
Cmos Fabrication: - Lithography - Etching - Oxidation - Doping - Deposition
Lithography
Etching
Oxidation
Doping
Deposition
PHOTOLITHOGRAPHY
PHOTOLITHOGRAPHY
Using photolithography to pattern polysilicon with positive photoresist
The process of selectively removing
un-exposed (or exposed)
photoresist is called development.
The photoresist is patterned
During etching of the desired
material, patterned photoresist acts
as a mask to protect desired regions
of the material being etched
The pattern of the original mask is
transferred to the desired material
by means of photolithography
PHOTOLITHOGRAPHY
Etching
OXIDATION
DEPOSITION
EPITAXY
IC processing loop
INVERTER LAYOUT
METAL GATE,
POLY-GATE,
VDD
PMOS
In
Out
NMOS
Silicide
n+ Poly
STI
Gate oxide
n+
n+
p-doping
Shallow
Trench
Isolation
p+ Poly
p+
n-doping
n-well
Source-drain
extensions
GND
p+
PMOS
POLY GATE
STI
Source-drain
extensions
VDD
n-tub
NMOS
UCSD Esener 5. 21
UCSD Esener 5. 23
TEM Cross-section