Download as pdf or txt
Download as pdf or txt
You are on page 1of 27

Control Engineering Laboratory

Background
Pressure sensors
Acceleration sensors
Gyroscopes
Chemical sensors
Biosensors

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

Outline

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

Microsensors

MICRO SYSTEM TECHNOLOGY GROUP

TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

AUTOMATION AND
CONTROL INSTITUTE

Online measurements instead of laboratory

measurements
...what is a sensor...?

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Some application areas


Automobile industry
safety and environmental measurements

Medical applications
continuous measurement of chemical/physical

parameters, home devices, remote


microsurgery, minimum invasion therapy

Consumer electronics, home automation


e.g. accelerometers in HDD, sensors in

camcorders, game controllers, air quality


sensors etc.

Environmental protection
different concentration measurements

Food processing
detection of contaminants and impurities

Process industry
Robotics
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Sensor arrays

MICRO SYSTEM TECHNOLOGY GROUP

Efficient use of IC technology

MICRO SYSTEM TECHNOLOGY GROUP

Prize, size, weight

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Why miniaturizing

Market growth (forecast, 20002004) ~20%


Sold sensors (1996):
44 % pressure sensors,

MST markets (millions US$) for established product types


1996 and 2002 (forecast)

(115 million units, 600 million US$)

38 % chemical sensors
9% accelerometers

4%

(6 million units, 150 million US$)

5% magnetoresistive

HDD heads
Inkjet printheads

10%
0%
%
2%
2%
2%
5%

6%

Heart pacemakers
36%

9%

34%

8%

(24 million units, 240 million US$)

2% gyros

1%
0%
0%
1%
2%2%

In vitro diagnostics
Hearing aids

3%

Pressure sensors

8%

Chemical sensors
Infrared imagers

11%

Accelerometers
34%
29%

Gyroscopes
Magnetoresistive sensors
Microspectrometers

flow, force, temperature, bio


*NEXUS, 1998

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Sensor classification

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

compare to the ~300 billion $US for world semiconductor markets

MICRO SYSTEM TECHNOLOGY GROUP

~14 billion $US (forecast for 2002: ~38 billion $US)

MICRO SYSTEM TECHNOLOGY GROUP

MST markets in 1996*:

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Sensor markets

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Piezoresistive pressure sensors


pressure
membrane

piezoresistor

substrate

Principle of piezoresistive pressure sensor.

Measures material stresses


Properties:
small size
good linearity over wide
dynamic range
moderately high pressure
sensitivity
relative freedom from
hysteresis and creep
Resistors normally arranged

Different types of sensors:

gauge, differential and absolute

in a Wheatstone bridge => the


temperature coefficients
cancel

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

Nonlinearity
Hysteresis
Creep
Angle random walk
Scale factor
Bias drift
ZRO
Sensitivity

MICRO SYSTEM TECHNOLOGY GROUP

Intelligent (smart) sensor

MICRO SYSTEM TECHNOLOGY GROUP

Integrated sensor

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

Sensor related terms

NovaSensor:
standard chip sizes start at
1 mm x 0.7 mm x 0.175 mm

nonlinearity of response to applied pressure depends

upon the location of resistors in the strain field and the


deflection of membrane
as the deflection increases towards 10 % of the
diaphragm thickness, the nonlinearity of the resulting
strain increases
properly designed devices are capable of achieving

nonlinearity less than 0.01 % of the full scale

Entran:
smallest diameter 1.27 mm

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Piezoresistive pressure sensors


Resistor placement:
Square silicon diaphragm =>

deflection results in symmetric stress


distribution with maximum values at
the center of each edge =>
piezoresistors diffused in those
regions (full bridge sensitivity)

Resistor placement in square


diaphragm type of sensor.

Rectangular diaphragm => stress

varies from tensile to compressive


along a path from the long edges
towards the center => resistors
placed perpendicular to the strain
field (resistor placement in this type of
sensor is less critical than in square
diaphragm device)

Calculated stress distributions for device with


diaphragm dimensions of 1 mm x 10 m and applied
pressure of 300 mmHg.
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

increases

MICRO SYSTEM TECHNOLOGY GROUP

sensitivity of piezoresistors decreases as temperature

MICRO SYSTEM TECHNOLOGY GROUP

The performance of the sensor varies over both temperature and pressure

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Piezoresistive pressure sensors

Sacrificial etching using KOH

solution etch holes (diameter 8


m) at the diaph. corners or
edges => polysilicon sacrificial
layer is removed and the silicon
substrate just under the
diaphragm is anisotropically
etched through holes =>
pyramidical cavity as reference
vacuum chamber

Conception for the microdiaphragm processing.

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Piezoresistive pressure sensors


4 polysilicon piezoresistors are formed

in the diaphragm
1 m thick SiN layer deposited on top
of the surface to seal the etch holes
using plasma CVD
7 masks required for the fabrication of
the sensor

Pressure inside the cavity less than 0.3

Piezoresistive pressure sensor - a) schematic


cross-sectional structure, b) scanning electron microscope
photomicrograph.

torr
Pressure sensitivity ~2V/V/kPa
Nonlinearity less than 1 % of full scale
Temperature coefficient of pressure
sensitivity 0.13 % /Celsius
(T: -50...+150 Celsius)
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

plasma-SiN

MICRO SYSTEM TECHNOLOGY GROUP

200 nm thick Si3N4 + 1 m thick

MICRO SYSTEM TECHNOLOGY GROUP

Example:
Diaphragm 40 x 40 m

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Piezoresistive pressure sensors

Properties (compared to

piezoresistive counterparts):
higher pressure sensitivity
lower temperature sensitivity
more nonlinear
require larger die area and more
pressure
Principle of a capacitive pressure sensor.

sophisticated sensing circuitry


no hysteresis
better long-term stability
higher production costs

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Capacitive pressure sensors


The change of capacitance is not linear with respect to deformation or

pressure (but the relationship is reproducible)


The structure of the sensor is relative simple and the fabrication can be

done using conventional micromachining techniques


Disadvantage: small capacitance (generally 1...3 pF) => measurement

circuit has to be integrated on the chip or specially designed to null the


stray capacitance
To achieve high sensitivity and wide operating range => use of ultra thin

diaphragm with center boss


AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Measures average deflection

MICRO SYSTEM TECHNOLOGY GROUP

sensing
capacitors

MICRO SYSTEM TECHNOLOGY GROUP

reference
capacitors

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Capacitive pressure sensors

Frequency or frequency

difference is measured
Resonant pressure sensor.

The resonant element can be

sealed in a vacuum to get better


accuracy

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Other types of pressure sensors

FISO Technologies:
fiber optic in-vivo pressure transducer,
diameter 0.5 mm

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

thermally, electromagnetically or
electrostatically

MICRO SYSTEM TECHNOLOGY GROUP

The resonator is exited e.g.

MICRO SYSTEM TECHNOLOGY GROUP

Measures resonant frequencies

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Resonant pressure sensor

Development of sensors that operate in higher

temperatures
Extended operating range of existing sensors
Improved accuracy and resolution
Improved packaging

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

MICRO SYSTEM TECHNOLOGY GROUP

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Acceleration sensors
Most (all) current accelerometers

consist of a proof or a seismic mass


supported by a suspension frame
Under the influence of acceleration,

Entran:
Smallest diameter 3.43 mm

Mass produced sensors usually

silicon based

the proof mass generates a force =>


displacement or strain in the
suspension element
The means by which the force is

measured are varied, depending on


issues of performance and cost

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Increased integration

MICRO SYSTEM TECHNOLOGY GROUP

Die size reduction

MICRO SYSTEM TECHNOLOGY GROUP

Cost reduction

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

Some future trends:

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

Pressure sensors

Capacitive measurement of acceleration.

One of the two electrodes is the

suspended proof mass, which


deflects with respect to the fixed
electrode when accelerated

High-precision silicon

accelerometers will almost certainly


be capacitive

Capacitive cantilever microsensor


AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Capacitive accelerometers
Fabrication:
A silicon wafer is etched on the back side (or both sides) to
form the suspension and proof mass
Bulk micromachined accelerometers are typically a few
millimeters on each side anodic bonding can be used to
form the fixed electrodes and to provide overrange protection
In surface-micromachined sensors a low-pressure chemical

vapor deposition (LPCVD) or electroplating is used to deposit


and define the proof mass and its suspensions on the front
side of the silicon wafer
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

No temperature dependence

MICRO SYSTEM TECHNOLOGY GROUP

bridge to transduce the


displacement to voltage

MICRO SYSTEM TECHNOLOGY GROUP

Capacitor is used in a capacitive

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Capacitive accelerometers

TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Capacitive accelerometers
Since micromachined
Parameter
Range
Frequency range
Resolution
Nonlinearity
Price

Automotive
50 g (airbag)
2 g (vehicle stability)
0 400 Hz
< 100 mg (airbag)
< 10 mg (vehicle stability)
<2%
10 $ (airbag)
15 $ (vehicle stability)

Navigation
1 g
0 100 Hz
< 4 g
< 0.1 %

Table: Typical specifications of accelerometers


for automotive and inertial navigation applications.

accelerometers are used in wide


range of applications, their
required specifications are also
application dependent and
cover a rather broad spectrum,
e.g.
microgravity measurements:

range of operation greater than


+-0.1 g, resolution less than 1
g, frequency range 0...1 Hz
ballistic and impact sensing
applications: range of over
10000 g, resolution less than 1 g
in 50 kHz bandwidth is required

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

AUTOMATION AND
CONTROL INSTITUTE

MICRO SYSTEM TECHNOLOGY GROUP

Fabrication continues....
A sacrificial spacing layer, typically LPCVD oxide, is removed
after the structural film is deposited to release the structure
from the substrate no anodic bonding is required
The sensors are typically a few hundred microns on each
side, with the thickness of the mechanical and spacer layers
determined by the deposition times of those layers
Performance of the device depends critically on the uniformity
and mechanical properties of the deposited layers
Interface electronics are often integrated on the same chip

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Capacitive accelerometers

Piezoresistive acceleration sensor

sensitivity, small overall sensitivity


(compared to their capacitive
counterparts)

Oil damping...
First micromachined and one of

the first commercialized


accelerometers were
piezoresistive

Fabrication using bulk-

micromachining and wafer-bonding


can be very similar with capacitive
sensors
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Force-balanced accelerometers
The suspended proof mass

Fabrication of the sensing

deflects in response to the


acceleration
The signal is sensed and fed back
to counteract the displacement
Structure virtually stationary
Good dynamic range, ultra
sensitive
Commonly used in navigational
applications
Capacitive sensing

element same as for open-loop


accelerometers
Feedback-control requires
sophisticated electronics
Cost increase reduced by
integrating the electronics on
the same chip with the sensing
element
Analog Devices: 2.5 x 2.5 mm

(with readout electronics)


AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Disadvantages: large temperature

MICRO SYSTEM TECHNOLOGY GROUP

structure and fabrication process as


well as their readout circuitry

MICRO SYSTEM TECHNOLOGY GROUP

Main advantages: the simplicity of the

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Piezoresistive accelerometers

circuit responds to the change of current, adjusts the bottom


deflection voltage to move the proof mass back to its original
position, maintaining the tunneling current constant
Acceleration measured reading the bottom deflection voltage
First introduced by Jet Propulsion Laboratory, Pasadena

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Other types of accelerometers


Thermal devices
thermal transduction
temperature flux from heater to a heat sink is inversely proportional to their
separation
change in distance between heater and heat-sink plates is measured
free convection heat transfer
hot air bubble which heat distribution changes in the presence of acceleration
the heat profile is sensed

Resonant devices
Optical
Electromagnetic
Piezoelectric
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Proof mass is displaced due to acceleration, the read-out

MICRO SYSTEM TECHNOLOGY GROUP

Used e.g. as sensitive acoustic sensors

MICRO SYSTEM TECHNOLOGY GROUP

The high sensitivity of electron tunneling is utilized

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Tunneling accelerometers

Better temperature sensitivity


Packaging
Interface circuit with low drift read-out/control circuit having

high sensitivity, low noise level and long dynamic range

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Gyroscopes
Vibrating mechanical elements to sense rotation
No rotating parts => easy to miniaturize and fabricate using

micromachining techniques
Silicon micromachining process for fabrication of vibratory
gyroscopes fall into four categories:
1) silicon bulk micromachining and wafer bonding
2) polysilicon surface micromachining
3) metal electroforming and LIGA
4) combined bulk-surface micromachining

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Long-term stability

MICRO SYSTEM TECHNOLOGY GROUP

Cost reduction

MICRO SYSTEM TECHNOLOGY GROUP

Some future trends:

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Accelerometers

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

MICRO SYSTEM TECHNOLOGY GROUP

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Gyroscopes
Gyroscopes can be classified into

three different categories:


inertial-grade devices (optical
gyroscopes, ring laser
gyroscopes)
tactical-grade devices (fiber
optical gyroscopes)
rate-grade devices

Table: Performance requirements for different


classes of gyroscopes.

The research has mainly

concentrated on silicon
micromachined rate-grade
sensors (automobile industry)
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

Principle of gyroscope.

MICRO SYSTEM TECHNOLOGY GROUP

based on the transfer energy


between two vibration modes of
structure caused by Coriolis
acceleration

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

All vibratory gyroscopes are

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

Gyroscopes

fixed amplitude
when rotated => Coriolis effect => differential sinusoidal force
develops on the individual tines
force is detected as differential bending of the tuning fork tines or
torsional vibration of the tuning fork stem
Vibrating beams
vibrating part is beam (or membrane)

Vibrating shells (vibrating ring)


AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Gyroscopes
Mechanisms to drive the vibrating structure into resonance are

primarily:
electrostatic
electromagnetic
piezoelectric

Detection mechanisms used to sense the Coriolis-indused

vibration in the second mode are:


capacitive

x-y gyro,
8mmx8mm,
capacitive sensing

piezoresistive
piezoelectric
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

2 tines connected to a junction bar are differentially resonated to a

MICRO SYSTEM TECHNOLOGY GROUP

Tuning forks

MICRO SYSTEM TECHNOLOGY GROUP

Vibrating gyros:

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Gyroscopes

Temperature range 40+85


Structure of vibrating ring gyroscope.

SEM image

Celsius
Zero bias drift < 10 degrees/s
Resolution ~0.5 degrees/s
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Gyroscopes
Example II:
Tuning fork gyroscope

Combs are exited so that

electrostatic forces are


generated which do not depend
on the lateral position of the
mass
Simple(r) fabrication
Easy integration with on-chip
electronics
Gyro dimension 0.7 x 0.7 mm
Low cost sensor

Schematic drawing of the comb-drive tuning


fork gyro.

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

having equal natural


frequencies
Ring is electrostatically vibrated
Rotation => Coriolis => energy
transferred from primary mode
to secondary flexural mode
Rotation monitored capacitively
Less temperature sensitive

MICRO SYSTEM TECHNOLOGY GROUP

Example I:
Vibrating ring gyroscope

Two identical flexural modes

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Gyroscopes

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Chemical sensors
Detect the concentration

Structure:
chemical reaction in

Qualitative or quantitative

sensitive layer and


transformation into
electric signal

measurements
~60 % of sensors are gas
sensors

Electronics

Transducer

Sensitive layer

Chemical reaction

Transformation
into electrical
Change of
signal
physical state

Evaluation

Sensor
signal

Structure of chemical sensor.


AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

TAMPERE UNIVERSITY OF TECHNOLOGY

MICRO SYSTEM TECHNOLOGY GROUP

AUTOMATION AND
CONTROL INSTITUTE

MICRO SYSTEM TECHNOLOGY GROUP

Some sensor manufacturers:


NovaSensor
VTI Technologies
Analog Devices
Triton Technologies
EG&G
Delco
CSEM
TEMIC (Daimler-Benz)
Bosch
Motorola
Honeywell
Sensonor
Samsung
General Motors

Chemical
substance

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Mechanical sensors

Medicine
Nutrition
Process control
Laboratory

measurements

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Chemical sensors
Conventional methods:
achieve good results, but
complicated and expensive measuring methods
amount of reagents needed
measurements done in laboratory
slow

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Automobiles

MICRO SYSTEM TECHNOLOGY GROUP

Environment

MICRO SYSTEM TECHNOLOGY GROUP

Application areas:

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Chemical sensors

have short response times


have intelligent signal processing
sensor arrays/matrices
real time measurement
biocompatible and no cross-sensitivity

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

MICRO SYSTEM TECHNOLOGY GROUP

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Interdigital transducers
Electric resistance or

Chemical sensor based on interdigital


transducer.

dielectric constant variation


of sensitive layer changes
when interacting with certain
substance
Capacitive measurement
Response (selectivity,

sensitivity, response time)


optimized by choosing the
operating temperature

IDC and integrated heater (TU Berlin).

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

use only small amounts of reagents

MICRO SYSTEM TECHNOLOGY GROUP

are accurate and robust

MICRO SYSTEM TECHNOLOGY GROUP

are easy to manufacture

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

The goal is to develop sensors (systems) which:

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP

Chemical sensors

Operating temperature: 380

Celsius
Maximum temperature
deviation: less than 2.8 %
Heating power: 3.5 W
Sensitive layer: NiCr/Au
Sensor with on-chip heating.

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

TU Berlin

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Pellistors
Porous alumina bead

Pellistor principle.

Sensor array thin film membranes, membrane size


1.25x1.25 mm2, 250 Celsius achieved with 100 mW
heating power.
TU Berlin, Uni Magdeburg

containing suitable catalyst


surrounds a thin platinum
wire which acts both as
heater and resistor
thermometer membranes
(thin film technology)
Increase of temperature is
measured (resistance change,
in suitable bridge circuit)
When gas is burnt, specific
activation energies are
released
Not very selective
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Substrate material: quartz glass

MICRO SYSTEM TECHNOLOGY GROUP

Sensitive area: 4x7 mm2

MICRO SYSTEM TECHNOLOGY GROUP

Chip dimensions: 14x10 mm2

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Interdigital transducers

refractive index material


embedded in/between lower
index materials
Optical grating couples the
incoming light (He-Ne, laser)
into the waveguide
Substance to be analyzed
changes the refraction index of
the waveguide
The amount of light striking the
detector (e.g. photodiode) is
proportional to concentration
of the substance
Optical fibers (interferometers)

Optical waveguide.

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Optical sensors

OWLS instrument by Microvacuum

The light intensity is measured

with the photo detectors as the


angle of incidence of the laser
light is varied from -6 ...+6
degrees. From the measured
mode spectra, the covering
medium's physical parameters
(thickness, optical refractive
index, density etc.) are
calculated

Waveguide material (SOL-GEL)


Si xTi(1-x)O2 , (x~0.250.05)
Waveguide film
refractive index (nF)=1.770.03
thickness (dF)=170-220 nm
Substrate glass slide
L=48 mm, w=16 mm, H=0.5 mm
refractive index (nS)~1.53
Grating
area 2x16 mm, depth ~20 nm, grating
periodicity 2400 lines/mm (0.4166
m)

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Film or fiber made of high

MICRO SYSTEM TECHNOLOGY GROUP

Coupling grid structure

MICRO SYSTEM TECHNOLOGY GROUP

Optical sensors

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

refract = taittaa

Ta2O5, SiO2
Manufacturing process
compatible with industrial
CMOS production lines

Normal MOSFET vs. ISFET.

ISFET = Ion Sensitive Field

Effect Transistor
MOSFET = Metal Oxide
Silicon Field Effect Transistor
IMEC (Siemens), IFT, MESA
(Sentron), TIMA
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Chemical sensors
Resonance quartz sensor

Bimetal sensor
Chemical reaction => heat =>
bending of bimetal cantilevers
The motion is measured

Resonating quartz sensor.

Chemical reaction in the

sensitive layer changes the


resonator mass => resonator
frequency changes
Frequency measured
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

measured changes Vgs =>


change in Ids => Ids kept
constant (voltage to
reference electrode adjusted)
=> Vgs proportional to pH
Free area of sensitive layer
few m2
Sensitive layer: Al2O3, Si3N4,

MICRO SYSTEM TECHNOLOGY GROUP

The substance to be

MICRO SYSTEM TECHNOLOGY GROUP

Sentron

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

ISFET sensors

SAW = Surface Acoustic Wave


Detection mechanism of the sensor is a mechanical (acoustic) wave
alternating voltage applied to interdigital transducer is electromagnetically

transformed into acoustic wave


in receiving transducer acoustic signal is transformed back to electric signal
analyzed substance reacts on the sensitive layer => wave transmission
changes (velocity and/or amplitude of the wave)
operation from 25 to 500 MHz
High sensitivity, good linearity, stability, versatility

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

SAW sensors
Fabricated on substrates such as SiO2, LiTaO3, LiNbO3, (ZnO, GaAs,

SiC, LGS, AlN, PZT, PVdF)


Fabricated using photolithographic process
cleaning and polishing the piezoelectric substrate
metal (aluminum) deposited uniformly onto the substrate
device spin-coated with photoresist
device exposed to UV light through mask (and exposed areas
removed with a developing solution)
remaining photoresist is removed => IDT
Performance of the sensor optimized by selecting the length, width,
position, and thickness of the IDT
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

piezoelectric substrate

MICRO SYSTEM TECHNOLOGY GROUP

SAW sensors

MICRO SYSTEM TECHNOLOGY GROUP

output transducer

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

input transducer

Healthcare Industry
In vitro diagnostics
In vivo diagnostics

Blood glucose monitoring at home


Renal Failure monitoring

Environmental diagnostics

Environmental
Monitoring

Biochemical Oxygen Demand

Food industries

Food and Drink Industry

Fish freshness & Sucrose

Bioprocess Monitoring

Fermentation monitoring and


control

Agriculture & Related


Industries

Pesticides

Research & Development

Bimolecular interactions

Military

Biological and chemical warfare

Processin industries
Military
Biological research

renal = munuaissucrose = sokeri, sakkaroosi


pesticide = tuolaistorjuta-aine

AUTOMATION AND
CONTROL INSTITUTE

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

TAMPERE UNIVERSITY OF TECHNOLOGY

antibody = vasta-aine
receptor = reseptori
enzyme = entsyymi
metabolism = aineenvaihdunta
immuno- = combining form (indicating immunity)

Biosensors

Same measuring principles as for chemical sensors


Structure:
biologically sensitive elements (enzymes, receptors and antibodies)

integrated with the sensor (also nucleic acids, bacteria, cell


organisms, or even whole tissues of higher organisms)
interaction between sensitive layer and molecules of the substance
=> modulation of physical or chemical parameters
modulation is converted into an electrical signal (electrochemical,
optical, mass or thermal changes are most common)
Biosensors divided into two groups:
1) metabolism sensors
2) immuno-sensors
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Examples

MICRO SYSTEM TECHNOLOGY GROUP

Medicine

General Area

MICRO SYSTEM TECHNOLOGY GROUP

Major application areas in:

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Biosensors

receptor and transducer are integrated into one single sensor


measurement of target analytes without using reagents (compare to

conventional methods where many steps are used and each step may
require a reagent to treat the sample)
Continuous monitoring capability
sensors can regenerate and reuse the immobilized biological
recognition element
AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

Metabolism sensors

Used to detect chemically

active molecules
Biosensitive enzymes as
biocatalysts to detect
molecules in a substance and
catalyze a chemical reaction
analyzed substance
chemically transformed
cource of reaction detected
and evaluated (chemical
sensor)

Phosphate measurement with metabolism sensor.

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

Simplicity, speed

MICRO SYSTEM TECHNOLOGY GROUP

Very selective and sensitive measurements possible

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP
MICRO SYSTEM TECHNOLOGY GROUP

Biosensors

Lock and key principle as

Immuno-sensing using an optical transducer.

Detect chemically inactive

molecules
Antibodies as biosensitive
elements

detection method
antigen molecule interacts with
the analysed substance =>
immobilized antibody
molecules (lock) on the sensor
surface bond with the antigen
molecule (key) in the
substance
only one type of antigen can
bond with certain type of
antibody
Bonding process can be registered
directly (transducer) or indirectly
(antigen markers)

AUTOMATION AND
CONTROL INSTITUTE
TAMPERE UNIVERSITY OF TECHNOLOGY

HELSINKI UNIVERSITY OF TECHNOLOGY

Control Engineering Laboratory

MICRO SYSTEM TECHNOLOGY GROUP

Immuno-sensors

MICRO SYSTEM TECHNOLOGY GROUP

MICRO SYSTEM TECHNOLOGY GROUP


MICRO SYSTEM TECHNOLOGY GROUP

antigen = antigeeni
(a substance that stimulates the production of antibodies)

You might also like