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Three Phase Gas
Three Phase Gas
centrifugal forces
Dr.-Ing. M. Creutz
In underwater thermal cutting processes of metal structures, such as underwater plasma arc
cutting, gaseous and solid contaminants are emitted. The melted material of the joint remains as a
suspension of metalloid particles with particle sizes ranging from some millimetres down to sub
micron particles [1-5]. Plasma and cutting gases lead to high vortex flows and flotation of the
small particles. The contaminants reduce the optic transparency of the water and thus have to be
avoided in processes controlled by systems based on visual observation. Under water cutting
processes are already being used for the demolition of nuclear power plants [6] and [7].
Especially for that purpose, contaminants have to be completely removed. For the process of
sucking off the contaminants and separating them into gas, clean water and slurry, a tool is
developed that is shown in figure 1. The tool is intended to form an integral part of the plasma
arc cutting system. Investigations on the exhaust of multiphase suspensions have been carried out
[8]. This text focuses on the separation only.
Due to its application in under water cutting processes there are a number of important demands
regarding the design of a separator:
The separator can be used in all applications, where two- or three-phase flow has to be separated
under space limited conditions. For instance in thec hemical and in the off-shore industry it can
be used as a combination of pump and separator.
Technical realisation
In figure 2 the separator is shown schematically. It consists of a stationary casing and a rotating
shaft with an impeller. In contrast to the impeller of a centrifugal pump, this impeller is open on
both of its sides. The three phase flow enters the separator axially. By the centrifugal forces
inside the impeller, liquid and solids are forced in the radial direction into a ring chamber. The
gas flows through the impeller and leaves the separator. Inside the impeller, a rotating liquid
level is formed. The position of this level is variable and has a large influence on the pressure in
the ring chamber. The ring chamber consists of two parts divided by a cascade. Due to the
centrifugal force of the rotating flow, large solid particles can not pass this cascade. Both of the
ring chambers form a spiral and have two tangential outlets. A suspension of water, large
particles and in a small amount of gas leaves the separator through the first outlet (outlet 1).
Clean water with small size particles leaves the separator through the other outlet (outlet 2).
Some aspects of controlling the system In figure 3 the complete cleaning system including the
sucking, the separation and transportation of under water contaminants is shown schematically.
For each of the components the pressure of water and gas is shown. For simplicity, the flow of
clean water is not recognised. Regarding the gas phase, no large pressure variations occur in the
separator and in the pipeline. The difference between the hydrostatic pressure in the under water
surrounding and the gas pressure in the separator is the driving force for the sucking process.
Figure 3: Scheme of the complete process of sucking, separation and transportation and pressure
behaviour in the different apparatus
For a given pressure difference and gas flow rate, the liquid flow rate which is sucked off
together with the gas is fixed. High liquid velocities are required to enable the slurry
transportation. Thus, the frictional pressure drop in the suspension pipeline can not be neglected.
This pressure drop depends on the liquid flow rate and has to be attained by the separator. For
this reason, both, the back pressure and the liquid flow rate are imposed on the separator. In
contrast to a centrifugal pump for which both parameters depend on each other, in the separator
they are independent due to the variation in the liquid level. For this reason, the separator acts as
a slug catcher.
Experimental investitgations have been done on the separation quality and the transient
behaviour of the separator [9].