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2014 J. Opt. 16 105007
(http://iopscience.iop.org/2040-8986/16/10/105007)
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Journal of Optics
J. Opt. 16 (2014) 105007 (9pp)
doi:10.1088/2040-8978/16/10/105007
In this paper, a novel meta surface is proposed for super-focusing. This surface contains two slits
surrounded by nite corrugations for enhanced focusing. This simple surface has the superfocusing ability to focus both near and far eld light in a hot-spot with an FWHM much smaller
than half the wavelength of the incident light. The structure is suitable for one dimensional and
two dimensional focusing applications. The enhanced transmission through the double slit is also
utilized for directional beaming over a wide cone of angles. Moreover, various structures have
been proposed for super-focusing in the visible and ultraviolet wavelengths. The proposed
structure lends itself to various applications, including subwavelength imaging and
nanolithography.
Keywords: super focusing, super lens, plasmonics
(Some gures may appear in colour only in the online journal)
1. Introduction
Extraordinary optical transmission (EOT) is an optical phenomenon in which a structure containing subwavelength
apertures in an opaque screen transmits more light than
expected in the transmission through individual apertures
[1, 2]. Recently, enhanced light transmission and beaming
from a single subwavelength aperture surrounded by gratings
has also been reported [35]. This effect allows for the
manipulation and localization of the light in the subwavelength scale.
In general, light passing through a subwavelength slit
should strongly diffract as suggested in [6]. However, if the
slit is surrounded by gratings, it has been proven both theoretically and experimentally that Surface Plasmon Polaritons
(SPPs) are the main cause behind subwavelength focusing
and beaming of the emerging light [59].
The ability to focus the light in a single spot with a high
electric eld intensity and a full width at half maximum
(FWHM) of (/2) or less, namely super-focusing, is extremely
useful for subwavelength imaging and nanolithography [10].
Although super-focusing with FWHM values such as (/9) is
achievable with metamaterials shaped as lenses [11], these
structures are complex and lossy. On the other hand, a
2040-8978/14/105007+09$33.00
M El Maklizi et al
structure.
M El Maklizi et al
slits and the required gratings on each side. The number of the
gratings is minimized in order to avoid phase retardation,
which may cause the focal spot to spread and the power in the
side lobes to increase. A schematic of the nal design is
shown in gure 2. As demonstrated, the focusing effect of the
proposed structure (shown in gure 1) stems from the physical origin of the single slit structure. SPPs travel on the
surface of the metal from the two slits, which then diffract off
the grating. The additional slit plays an important role in
narrowing the focusing width and adjusting the phase difference between the different gratings. It also increases the
SPPs coupled power through the subwavelength hole, which
in turn increases the light transmitted through the meta
surface.
The effect of the additional slit can also be understood
using the classical theory of diffraction for multiple slits [22].
This theory can be projected on the proposed structure here to
state that increasing the number of slits fullls the condition
of the formation of a focus. This is the result of the constructive interference of all the diffracted SPPs, which are
more stringent and, hence, the resultant peak at the focus is
sharper and has a reduced FWHM. Similar behavior is
obtained using an antenna array system to create a highly
directive beam.
Another physical interpretation is based on the phenomenon of super-oscillations [23]. Super-oscillation states
that a mask, which is often a source of super-oscillatory elds,
can form by precise interference, an arbitrarily small spot at a
specic distance from the mask [23]. The tradeoff here comes
in the form of unwanted sidebands which cannot be eliminated and often receive high energy that sometimes can be
even higher than the hot-spot. However, the spot size can be
one-tenth this size or smaller. This phenomenon, of the
energy channeled into the super-oscillatory region increasing
polynomially with the speed of oscillation, is explained by
Ferreira and Kempf in [24]. This simply means that the
polynomial reduction of the size of the optical hot-spot causes
less concentrated energy in the hot-spot. This effect has
received several interpretations from the quantum mechanics
perspective. After Bucklew and Saleh [25] demonstrated that
one-dimensional (1D) binary images can be obtained with
arbitrary resolution by using an ideal, band-limited imaging
system, Aharonov [26] showed that weak quantum mechanical measurements can have values outside the spectrum of
the corresponding operator. Further systematic quantum
mechanical studies have solidied that argument and shown
that indeed a local measurement of a value, such as a wave
number of an optical wave, can be outside the range seen
when a global measurement is taken [27]. In 2006, Berry and
Popescu [28] demonstrated that implication of the argument,
where optical waves could form arbitrarily small spatial
energy localizations that propagate far from the source
without the need for evanescent waves. Super-oscillations
have two key characteristics, both of which are shown in our
results. The rst key characteristic of super-oscillations is the
rapid oscillating phase in the region surrounding the hot-spot
region. The phase of the electric eld at the focal point along
the transverse direction can reveal useful details about the
3. Super-focusing effect
In this section, the super-focusing effect is demonstrated
through an optimization of the various parameters of our
structure. This optimization is done by analyzing the main
parameters that affect the size of the spot through a parametric
study and a creation of a library of most of the likely cases.
The effect of these parameters will be discussed in section 5.
The target function is mainly minimizing the FWHM at the
specied wavelength. Hereafter, various optimized situations
are shown, including examples for the super-focusing effect
in the visible and UV bands. This super-focusing effect can
have a mathematical denition for the produced focal spot as
explained using the transfer matrix formalism in [29], which
makes it possible for the transmittance and reection of the
near eld of the grating as well as the real-space electromagnetic elds to be calculated. Helsth [30] proposed two
mathematical denitions for the focal spot in situations where
the evanescent waves are the relevant states or the effective
components of the system.
One denition is applicable, whether the electric eld can
be evaluated analytically or not. Based on this denition, the
electric eld is dened by assuming the contribution of the
evanescent eld to be elementary sources which allows them
to be summed up. This denition is termed the evanescent
point spread function:
h (x , z ) =
1
2
k a
eik x x+ k x z dk x +
1
2
kb
eik x x k x z dk x . (1)
Unlike far elds, which are well approximated by geometrical optics, near elds require rigorous description and
analysis. However, far elds are a useful starting point to
dene the effect of evanescent waves in the near eld. The
derivation in [31] starts from the angular representation of an
optical far eld:
E ( s x , sy , sz ) =
E k x , k y; 0
lim
kr
k z 2 + k y2
k 2
kx
ky
kz
ikr s x + s y sz
k
k dk dk .
k
x
y
(2)
M El Maklizi et al
Figure 3. Results for the double slit model in the visible range: (a) the eld intensity distribution showing a focal point at a distance of 0.35
microns from the structure; (b) the intensity (measured in arbitrary units) vs the distance along the y-axis at a distance of 0.35 microns from
the surface, showing a peak at an intensity of approximately 1.8 (au) and an FWHM of 220 nm.
rejected in the far eld, and the limit of the integral becomes:
(k
2
z
+ k y2 < k 2.
E 0 1 k b+ k a x 2
E ( x, z0 )
,
e 2
(3)
E ( s x , sy , sz )
=
2iksz E k x , k y; 0 eikr
r
E (r , 0) =
.
ireikr
2
(k
2+k 2
y
2
k b2 A J1 ( k b r ) k a f0 J1 ( k a r )
.
2 k b r
2 k a r
(7)
(4)
(6)
E k x , k y
)k
eikr k x x+ k y y k z z
1
dk x dk y.
kz
(5)
M El Maklizi et al
The deep UV range is an important range mainly for lithography applications. Our proposed structure for this range has
the following geometrical properties: slit width (ws) is 30 nm,
distance between each slit and the center of the metal is
500 nm, metal thickness (t) is 200 nm, and the grating period
(p) is 100 nm. The gratings depth (d) is taken to be 110 nm,
the grating width (wg) is 10 nm, the number of gratings on the
outer sides of the side slits is three, and the number of gratings
between the slits is ve. The distance x is 80 nm. Wide-band
excitation is exploited for a wavelength band from
116 nm196 nm using TM polarization. The simulation
parameters are dx and dy 2.5 nm and dt 0.023 4609 fs. This
proposed model shows a super-focusing effect at two wavelengths, namely at 171 nm with an FWHM of 80 nm and at
117 nm with an FWHM of 54.5, nm as shown in gure 6.
Further optimization allows super-focusing of almost (/3).
Our proposed structure for this focusing power has the following geometrical properties: slit width (ws) is 30 nm, distance between each slit, the center of the metal is 145 nm,
metal thickness (t) is 200 nm, and the grating period (p) is
10 nm. The gratings depth (d) is taken to be 20 nm, the
grating width (wg) is 5 nm, the number of gratings on the
outer sides of the side slits is 12, and the number of gratings
between the slits is 21. The distance x is 27.5 nm. Wide band
excitation is exploited for a wavelength band from
116 nm196 nm using TM polarization. The simulation
parameters are dx and dy 7.7 nm and dt 0.008 659 42 fs. The
structure with these properties allows both a narrow FWHM
in the hot-spot and low power in the immediate side loops,
reaching a maximum of 30% at wavelengths 186.716 nm and
Figure 4. Results for the phase of the double-slit model in the visible
range at a wavelength of 670 nm at the focal point at a distance of
0.35 microns from the structure.
Re(E)
0.8 0.8
-2.5
X (microns)
0.9
0.7
-2
0.6 0.6
-1.5
0.5
0.4 0.4
-1
0.3
-0.5
0.2 0.2
0.1
0.5
1.5
2.5
3.5
0
-3.5
-3
-2.5
-2
-1.5
Y(microns)
Y (microns)
-1
-0.5
0.5
(b)
(a)
Figure 5. Results for the single slit model in the visible range: (a) the eld intensity distribution, showing a focal point at a distance of 3.8
microns from the structure; (b) the intensity (measured in arbitrary units) vs the distance along the y-axis at a distance of 3.8 microns from the
surface, showing a peak at an intensity of approximately 1.0 (au) and an FWHM of 340 nm.
5
M El Maklizi et al
2
0
2.0
1.8
0.2
1.6
0.4
1.4
0.6
X (microns)
E intensity
1.6
1.2
0.8
0.4
1.2
0.8
0.8
1.2
1.4
0.6
1.6
0.4
1.8
-2.2
-1.9
-1.3
-1.6
0.2
2
-2.2
-1.0
-2
-1.8
y (microns)
-1.6
-1.4
Y (microns)
-1.2
-1
-0.8
(b)
(a)
2
0.2
1.8
1.6
1.3
1.0
X (microns)
E intensity
0.4
0.7
1.4
1.2
0.6
1
0.8
0.8
0.6
0.4
0.4
0.2
0.1
-2.2
-1.9
-1.3
-1.6
-1.0
1.2
-2.2
-2
-1.8
-1.6
-1.4
-1.2
-1
-0.8
Y (microns)
y (microns)
(d)
(c)
Figure 6. Super-focusing in the deep UV at 171 nm (a)(b) and 117 nm (c)(d): (a) the electric eld intensity (measured in arbitrary units) vs
the distance along the y-axis at a distance of 0.6 microns from the structure, showing a peak at an intensity of approximately 2.1 and an
FWHM of 80 nm; (b) the 2D electric eld intensity, showing a focal point at a distance of 0.2 microns from the structure; (c) the intensity
(measured in arbitrary units) vs the distance along the y-axis at a distance of 0.6 microns from the structure, showing a peak at an intensity of
approximately 1.6 and an FWHM of 54.5 nm; (d) the electric eld intensity, showing a focal point at a distance of 0.6 microns from the
structure.
M El Maklizi et al
2.5
Re(E)
2.5
0.02
0.04
X (microns)
0.05
0.08
1.5
1.5
0.1
0.12
0.14
0.16
0.5
0.5
0.18
0.2
0.2
0.4
0.6
0.8
1.2
1.4
0
0.1
Y (microns)
0.2
(a)
2.5
Re(E)
0.02
1.8
0.04
1.6
0.06
X (microns)
0.5
(b)
1.4
0.08
1.2
0.1
1.5
0.12
0.8
0.14
0.6
0.16
0.4
0.18
0.2
0.4
0.3
y(microns)
0.5
0.2
0.2
0.4
0.6
0.8
1.2
1.4
0.2
0.3
0.4
Y (microns)
y(microns)
(c)
(d)
0.5
Figure 7. Super-focusing in the deep UV at 186.716 nm (a), (b) and 186.18 nm (c), (d): (a) the 2D electric eld intensity showing a
focal point at a distance of 0.04 microns from the structure; (b) The electric eld intensity (measured in arbitrary units) vs the
distance along the y-axis at a distance of 0.04 microns from the structure, showing a peak at an intensity of approximately 2.5 and an
FWHM of 64 nm; (c) the electric eld intensity, showing a focal point at a distance of 0.04 microns from the structure; (d) the
intensity (measured in arbitrary units) vs the distance along the y-axis at a distance of 0.04 microns from the structure, showing a
peak at an intensity of approximately 2.4 and an FWHM of 70 nm.
Figure 8. Results for the phase of the double slit model in the UV
M El Maklizi et al
1
0.6
2
0.4
2.5
3
0.8
1
X (microns)
1.5
0.5
1.5
0.5
2
0.4
2.5
3
0.2
0.2
-3
-2
-1
Y (microns)
1.5
0.5
2
0.4
2.5
3
0.2
3.5
3.5
3.5
0.8
1
X (microns)
0.8
1
X (microns)
0.5
0.5
-3
-2
-1
-3
-2
Y (microns)
(a)
(c)
(b)
1
0.5
0.5
0.8
1
1.5
0.6
2
0.4
2.5
3
0.8
1
X (microns)
X (microns)
-1
0
Y (microns)
1.5
0.6
2
0.4
2.5
3
0.2
3.5
0.2
3.5
-3
-2
-1
0
-3
Y (microns)
(d)
-2
-1
Y (microns)
(e)
Figure 9. Results for the double slit beaming model: (a) the 2D electric eld intensity (measured in arbitrary units), showing a beam at
incident wavelength of 750 nm at a 0 angle with the horizontal and an FWHM of 600 nm; (b) the 2D electric eld intensity (measured in
arbitrary units) showing a beam at incident wavelength of 750 nm at a 10 angle with the horizontal; (c) the 2D electric eld intensity
(measured in arbitrary units), showing a beam at incident wavelength of 750 nm at a -10 angle with the horizontal; (d) the 2D electric eld
intensity (measured in arbitrary units), showing a beam at incident wavelength of 750 nm at a 30 angle with the horizontal; (e) the 2D
electric eld intensity (measured in arbitrary units), showing a beam at incident wavelength of 750 nm at a -30 angle with the horizontal.
Figure 10. Graphs of the effect of tooth depth on an FWHM (a) and the effect of tooth width on an FWHM (b).
M El Maklizi et al
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