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U.S. Patent 8,132,286, Entitled String Cleaning System, To Chiappetta Et Al., Issued Mar. 13, 2012.
U.S. Patent 8,132,286, Entitled String Cleaning System, To Chiappetta Et Al., Issued Mar. 13, 2012.
Chiappetta et al.
(54)
US 8,132,286 B2
(Continued)
30 03 402 A1
Libohova, Westbury, NY (U S)
6/1981
OTHER PUBLICATIONS
Notice:
stringclean.c0m/>. lpg.
(Continued)
(65)
US 2009/0107525 A1
(60)
25, 2007.
(51)
(52)
(58)
G01D 3/00
(2006.01)
24/518; 24/543
ABSTRACT
Int. Cl.
(56)
(57)
6/1900 Pletcher
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US 8,132,286 B2
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US. PATENT DOCUMENTS
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3791330
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3/l96l
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Hertzler
M
ems
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Haddad
S
A
A
A
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* clted by examlner
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1
2
The latch may be integral With the ?rst support and/or may
BACKGROUND
1. Field
strings.
2. Description of Related Art
Many types of musical instruments use strings to generate
sound. Musical instrument strings may consist of nylon, steel,
intestinal material (i.e., gut), or any other suitable materi
20
25
dispose the string betWeen the ?rst support and the second
support. A latch coupled to the ?rst support is engaged With
the ?rst opening of the second support to maintain the ?rst
support in a substantially ?xed relationship With respect to the
second support.
35
one or more strings With a cloth (e.g., US. Pat. No. 4,528,889)
40
strings.
All conventional string cleaning techniques pose one or
more problems. Some are extremely inef?cient and time
consuming, such as that described in US. Pat. No. 4,112,808.
The devices mentioned above may provide insu?icient pres
sure on the strings, present di?iculties in placing the cloth or
45
55
SUMMARY
the second support opposite the ?rst edge. The apparatus may
also include a second cleaning material coupled to a ?rst side
of the second support, and a latch coupled to the ?rst support,
the latch to engage the ?rst opening of the second support to
maintain the ?rst side of the ?rst support in a substantially
50
some embodiments;
FIG. 6 is a side elevational vieW of a string cleaning appa
ratus during use according to some embodiments;
FIG. 7 is a side elevational vieW of a string cleaning appa
ratus during use according to some embodiments;
FIG. 8 is a side elevational vieW of a string cleaning appa
ratus during use according to some embodiments;
65
in the art to make and use the described embodiments and sets
support.
US 8,132,286 B2
3
ings 12a and 12b. Stops 1511 through 150 may thereby assist
3.
edges 19a and 19b (not shoWn). Beveled edges 19a and 19b
may facilitate moving second support 3 betWeen a string and
another object located proximate to the string, such as a
?ngerboard or a fret. For example, beveled edges 19a and 19b
20
35
45
integral With ?rst support 2 and includes ?rst leg 2111, second
leg 2211, release element 23a, and projections 24a and 24b.
50
60
65
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5
20
30
aWay from latches 14a and 14b While avoiding the application
of too much force on larger-diameter strings located closer to
latches 14a and 14b.
passes through opening 12b may bias leg 22b toWard leg 21b
and alloW projection 240 to pass completely through opening
ally pressed to bias leg 22b toWard leg 21b during passage of
60
US 8,132,286 B2
8
7
Some embodiments may provide one or more of: suf?cient
comprises:
a release element to compress the ?rst latch and to alloW the
in
1. An apparatus comprising:
a ?rst support;
a ?rst cleaning material coupled to a ?rst side of the ?rst
support;
a second support rotatably coupled to the ?rst support at a
20
25
a ?rst latch integral With the ?rst support, to engage the ?rst
opening of the second support, and comprising a proj ec
35
second support.
second support.
8. An apparatus according to claim 1, Wherein the second
Wherein the ?rst latch and the second latch are disposed
betWeen the ?rst stop and the second stop.
7. An apparatus according to claim 1, Wherein the ?rst
opening is de?ned by at least one beveled portion of the
support comprises:
support;
latch engages the ?rst opening of the second support;
second support;
40