Tugas Kelompok TRK-1

Ananda Santia Citra Dewi

Ghassan Tsabit Rivai
Inne Puspita Sari
Irfan Faisal Pane
Yoga Wiranoto

1406607856
1406552976
1406608070
1406564300
1506800350

P5-9B In order to study the photochemical decay of aqueous bromine in bright sunlight, a
small quantity of liquid bromine was dissolved in a water contained in a glass battery
jar and placed in direct sunlight. The following data were obtained at 25C :
Time (min)

10

20

30

40

50

60

Ppm Br2

2.45

1.74

1.23

0.88

0.62

0.44

a. Determine wether the reaction rate is zero, first, or second order in bromine, and
calculate the reaction rate constant in units of your choice.
b. Assuming identical exposure conditions, calculate the required hourly rate of
injection of bromine (in pounds) into a sunlight body of water, 25,000 gal in
volume, in order to maintain a sterilizing level of bromine of 1.0 ppm.
c. What experimental conditions would you suggest if you were to obtain more data ?
Jawaban
Rx

A Products

a. Determine the reaction rate order and reaction rate constant

Asumsi :
V konstan
Reaksi homogen dan terjadi dalam batch
General Mole Balance :
dCA
=r A =k C A
dt
dCA
=k C A
dt
k
( A)+ ln (C A )
d C A
ln
=ln
dt

Data yang diperlukan :

t (min)

10

10

10

10

10

A
ppm)
C

0.71

0.51

0.35

0.26

0.18

C A ppm
(
)
t
min

0.071

0.051

0.035

0.026

0.018

d C A
dt

Metode Grafik untuk menentukan

Br2
0.08
0.07
f(x) = - 0x + 0.09
R = 0.96

0.06
0.05
ppm / min

0.04
0.03
0.02
0.01
0
15

20

25

30

35

40

45

50

55

60

65

Time (min)

Data yang diperlukan :

d C A ppm
(
)
dt
min
ln(

C A
)
t

ln(C A )

0.081

0.061

0.043

0.03

0.0215

0.014

-2.501

-2.797

-3.169

-3.507

-3.84

-4.269

0.896

0.554

0.207

-0.128

-0.478

-0.821

Metode Grafik hubungan ln (CA) dengan ln (dCA/dt) :

Br2
0
-0.5
-1
-1.5
-2

ln (dCA/ dt) -2.5

f(x) = 1.02x - 3.39

R = 1

-3
-3.5
-4
-4.5
-1

-0.8 -0.6 -0.4 -0.2

0.2

0.4

0.6

0.8

ln (CA)

Berdasarkan grafik diatas didapatkan persamaan garis :

y=1.0242 x3.3866
dimana :
k
( A )
ln

( ddtC )= ln ( C )+ln
A

Sehingga dapat diketahui :

1
Berdasarkan nilai 1 , maka dapat disimpulkan bahwa reaksi terjadi pada orde
1
Nilai ln (kA) dapat dicari menggunakan regresi linear, maka :
ln k = - 3.397
k = 0.034 min-1
b. Calculate the required hourly rate of injection of bromine (in pounds) !
Diketahui :
Volume : 25,000 gal

rA : 1 ppm

Asumsi :
Pemaparan dilakukan pada kondisi yang serupa
Mencari nilai F

CA=

FA
V

F A =C A V
F A =kr A V

FA=

0.034
min
mg
1 gr
lbs
3.7851 l
60
1

25000 gal
min
hr
l
1000mg 453.6 gr
gal

F A =0.425

lbs
hr

c. What experimental conditions would you suggest to obtain more data ?

- Meningkatkan nilai konsentrasi awal (CAO)
- Menambahkan lama waktu reaksi (t)
- Memberikan variasi nilai volume (V)
- Memasukan nilai konversi (X) dengan berbagai variasi
P5-12A Tests were run on a small experimental reactor used for decomposing nitrogen oxides
in an automobile exhaust stream. In one series of tests, a nitrogen stream containing
various concentratrions of NO2 was fed to a reactor, and the kinetic data ohtained are
shown in Figure P5-12. Each point represents one complete run. The reactor operates
essentially as an isothermal backrnix reactor (CSTR). What can you deduce about the
apparent order of the reaction over the temperature range studied?
The plot gives the fractional decomposition of NO 2 fed versus the ratio of
reactor volume V (in cm3) to the NO2 feed rate, FNO2 (g mo/h), at different feed
concentrations of NO2 (in parts per million by welght).
Jawaban
Data yang diberikan adalah Plot dari persentase dekomposisi NO2 terhadap
X=

Dekomposisi NO 2
100
n

Asumsi bahwa r A=k C A

V
F A0

Untuk sebuah CSTR

atau

V=

FA 0 X
r A

V
X
X
=
= n
F A 0 r A k C A

dengan n=0,

X =k

V
F A0

X memiliki hubungan linear terhadap

V
F A0

seperti dalam gambar dibawah dan

reaksi tersebut termasuk orde nol. Perubahan temperatur hanya akan mempengaruhi
laju reaksi, namun tidak untuk ordo reaksinya karena variabel temperatur tidak terikat
dengan ordo reaksi

P5-13B Microeletronic devices are formed by first forming SiO2 on a silicon wafer by
chemical vapor decomposition. This procedure is followed by coating the SiO 2 with
a polymer called a photoresist. The pattern of the electronic circuit in the placed on
the polymer and the sample is irradiated with ultraviolet light. If the polymer is a
positive photoresist, the sections that were irradiated will dissolve in the appropriate
solvent, and those sections not irradiated will protect the SiO2 from further treatment.
The wafer is then exposed to strong acids, such as HF, which etch (i.e.. dissolve) the
exposed SiO2. It is extremely important to know the kinetics of the reaction so that
the proper depth of the channel can be achieved.

The dissolve reaction: SiO2 + 6HF H2SiF6 + 2H2O

From the following initial rate data, determine the rate law.
Etching Rate (nm/min)
HF (wt %)

60
8

200
20

600
33

1000
40

1400
48

A total of 1000 thin wafer chips are to be placed in 05 dm3 of 20% HF. If a spiral
channel 10 m wide and 10 m in length were to be etched to a depth of 50 m on
both sides of each wafer, how long should the chips be left in the solution (time)?
Assume that the solution is well mixed

Jawaban
Well Mixed Batch Reactor
*) Mole Balance:

in out + generation = accumulation

v

r z dV
0

dNs
dt

rs . V

dNs
dt

dimana

r s =k .C F

k .C F . V

dNs
dt

(1)

*) Mencari Mol SiO2 dan Mol HF

Mol SiO2 :

Ns=

gram A . . s
=
mol
Mr s

Mol HF

N F=

gram W . .V
=
mol 100 . Mr F

(2)

(3)

*) Substitusikan (1), (2), (3)

rs . V

k .C F . V
NF
k .(
) .V
V

dNs
dt

A . s d
.
Mr s dt

A . s d
.
Mr s dt

A . s d
.
Mr s dt

k .(

W . .V
) .V
100 . Mr F .V

k .(

W.
) .V
100 . Mr F

=k .(

.W

Mr s
A . s

Mr s
A . s

) .V
100 . Mr F

d
dt

ln +. ln W

d
dt (*)

d
)
dt
ln

(4)

*) Memasukan data ke dalam Excel

Satuan nm diubah ke m (1 nm = 10-9 m), kemudian di ln kan
Ln (-d
/dt)
Ln W

-16.629

-15.425

-14.326

-13.816

-13.479

2.079

2.996

3.497

3.689

3.871

Ln W vs Ln(-d/dt)
-13
2
-14

2.5

3.5

f(x) = 1.77x - 20.46

R = 0.98

Ln W vs Ln (-d/dt)
Linear (Ln W vs Ln (-d/dt))

-15

-16

-17

Persamaan garis
persamaan 2, dimana:

= 1.7746x - 20.46 , disamakan dengan

d
)
dt
= . ln W + ln
ln

: =1.7746 1.775

Slope

Intercept : ln =20.46
=1.289 109
*) Mencari nilai A
Diketahui di soal:
- Lebar : 10

m = 10 . 10-6 m

- Panjang :10 m
- Kedalaman (depth) : 50

m = 50 . 10-6 m

- Jumlah wafers = 1000

A= panjang x lebar x jumlah wafers x jumlah sisi
A=0.2m

*) Mencari nilai Mr
Mr s =Mr Si O2=28+2 ( 16 )
Mr Si O2=60 g/mol
Mr F=Mr HF
Mr HF=20 g/mol

*) Mencari Nilai

H O =1000
2

kg
m3
3

H O =10 g /m
2

s =2.32

g
=2.32. 106 g /m3
ml
6

s =2.32. 10 g /m

*) Mencari nilai V
V =0.5 dm 3
V =0.5 . 103 m3

*) Substitusi untuk mencari nilai K

=k .(

1.289 105=k .(

) .V
100 . Mr F

106 g
m3

Mr s
A . s

1.775

g
100 20
mol

(0.5 103 m3 )

60 g/mol
0.2 m 2.32 . 106 g /m3

k =3.2533 107
*) Mencari Final Concentration
Mula-mula kita menghitung nilai NS :

NS=

A . . s 0,2 .50 106 . 2,32 106

=
0,387 mol
Mr S
60

NF=

C HF =

w . .V
20 .106 . 5 103
=
5 mol( Mol mulamula)
100 M r F
100 .20

5 mol2,32 mol
0,2 0,107 atau 10,70
5 mol

*) Mencari nilai t (waktu)

6

d Ns d NF
=
dt
dt

6 k . C F . V =

.V
dW

100. Mr F dt

NF
. V
dW
6 k .(
) .V=

V
100. Mr F dt
6 k .(

6 k .(

.V
. V
dW
) .V=

100 . Mr F . V
100. Mr F dt

) .V
100. Mr F

. (

100. Mr s 1 1
1
) . dt= dW
s
V
W
t

w1

1
6 k .(
) dt= dW
100. Mr F
0
w0 W

6 3.2533 107 (

1.775
w1

g
100 20
mol
106 g
m3

6 3.2533 10 (

106 g
3
m

g
100 20
mol

t=

w0

1
W

1.775

1.775
10,70

t=

20

1
W 1.775

Menggunakan Kalkulator dengan mencari nilai t (Solve) :

Didapatkan nilai t = 331 min

dW

dW