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Optical Determination of Thickness and Gap of Semicondutors: September 7, 2016
Optical Determination of Thickness and Gap of Semicondutors: September 7, 2016
of semicondutors
-
September 7, 2016
Matheus Felipe Fagundes das Neves
Departamento de Fsica- Universidade Federal do Parana
Centro Politecnico- Jd. das Americas - 81531-990 - Curitiba - PR-
Brasil e-mail: matheusfneves@gmail.com
Abstract
This paper has the objective to analyse the thickness of a Silicon foil (Si), and the optical gap of Gallium Arsenide
(GaAs) that are both semiconductors. For that, was utilized the optical technique, using the knowledge of thin films
and their interference and interaction with light. Once making the measures, graphs was obtained and the respective
observations and results were taken from them. The results are really close to the nominal value of the thickness and
gap.
1 Theoretical Introduction
Semiconductors are present in our daily schedule. We
may not can see them, but they are in all the electronics
devices that we use, like cell phones, television, remote
control, computers, solar cells, and others. Because of
this, the understanding of some properties and techniques
are very useful for whom want to develop new things,
or just to get more included in what is going on in the
world. Or even respond some simple questions that can
be asked to us, like: Why the soap bubble are colourful
when lit with white light?
2 Experimental Procedure
2
We could observe the light spectrum, that is almost like
the white light, dont using the foils. But the sensor
needed to be positioned far from the source, because of
the intensity of light.
1
Photo-detector Red tide usb 650 on a tripod m = 2nd = ax + b
convex lens 18 mm
where a and b are the angular and linear coefficients.
1
Si and GaAs foils Calling x = and a = 2nd
3
With this, the thickness of Silicon foil was determined and
the optical gap of Gallium Arsenide was obtained. We
could observe too, that the relations of maximum and min-
imum interference pattern are valid. The results obtained
was:
Gap of 1,4 eV to the GaAs, that is clearly near by the
tabulated value 1,424 eV at temperature of 300 K;
The nominal value for the thickness of Si was 12 m and
this experiment resulted in 11 m. That is satisfactory
because, considering the dimensions, the error is negligi-
ble.
5 Bibliographic References
a = 10923nm
d=
2nSi
3
And we can say that the thickness of the Silicon foil is 11
m.
The measure with Gallium Arsenide foil resulted in the
graph shown in figure 2 that indicates how the
transmitted intensity changes according to energy. As
explained, gap is the minimum energy that the electron
requires to make the transition from the valence to the
conduction band. It is observed in the graph at the
moment that occurs the first absorption, it is, when the
intensity starts to grow to the peak. It is observed in the
region equivalent to 1,4 eV. So, we can conclude that the
GaAs has gap of 1,4 eV.
4 Conclusion