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Third-Order Nonlinear Effects: ω χ (E (ω) ) = P + P = ǫ χ + 3χ - E (ω) - (ω)
Third-Order Nonlinear Effects: ω χ (E (ω) ) = P + P = ǫ χ + 3χ - E (ω) - (ω)
Third-Order Nonlinear Effects: ω χ (E (ω) ) = P + P = ǫ χ + 3χ - E (ω) - (ω)
2.1Introduction
where P(1) and P(3) the linear and third-order nonlinear polarization. (1) and (3)
are the linear and third-order nonlinear susceptibility, respectively. The polariza-
tions are marked into the real and imaginary parts as follows
(1) (1)
P(1) = PR + iPI
(3) (3) (3) (2.2)
P = PR + iPI
The (1) and (3) can be also marked into real and imaginary parts as follows
(1) (1)
(1) = R + iI
(3) (3) (3) (2.3)
= R + iI
(1) (3) (1)
where R and R are real part and directly related with the refraction. I and
(3)
I are imaginary parts and related with absorption.
2.2Nonlinear Refraction
(1) (3)
Reff = R + eR |E()|2 (2.5)
with
(3) (3)
eR |E()|2 = 3R |E()|2 (2.6)
(3) (3)
eR |E()|2 R |E()|2 (2.7)
(1)
n02 = 1 + R (2.14)
Generally, the R(3) |E()|2 /n02 term is much smaller than 1. Using the Taylor series
expansion, the formula (2.15) can be expressed as
(3)
R
n n0 + |E()|2 (2.16)
2n0
Table2.1Typical values of and response time for linearly polarized light [2]
Mechanism (m2 /W ) Response time (s)
Electronic polarization 1020 1015
Molecular orientation 1018 1012
Electrostriction 1018 109
Saturated atomic absorption 1014 108
Thermal effects 1010 103
Photorefractive effectsa Large Intensity
dependent
a The photorefractive effect can cause large nonlinear effect, which cannot usually be described
with nonlinear susceptibility (3) (or ). The nonlinear polarization process of the photorefractive
effect is not the same as the other physical mechanisms listed
1
|E()|2 = I (2.22)
0 cn0
Substituting formula (2.22) into formula (2.16), one obtains
(3)
R
n n0 + I (2.23)
20 cn02
Based on formulas (2.17) and (2.23), the nonlinear refraction coefficient is written as
(3)
R
= (2.24)
20 cn02
According to formula (2.24), one can obtain value. The different physical mecha-
nisms can cause different values. The typical value andresponse time are listed in
Table 2.1. In formula (2.24), < 0 corresponds to self-defocusing effect and > 0
can lead to self-focusing effect. The self-focusing effect can generate the nanoscale
spot, which is very useful for nanolithography and high-resolving light imaging, etc.
2.3Nonlinear Absorption
dE (1) (3)
= + I E (2.27)
dz 2cn0 I 20 c2 n02 I
0 (1) (3)
= + = + I I (2.28)
2 2 2 2cn0 I 2 2
20 c n0
with
1 exp(0 L)
Leff =
0
For 0 0, the linear absorption of materials is neglectable, and the third-order
nonlinear absorption is dominant. In this case, exp (0 L) (1 0 L), thus
Leff L. Based on formula (2.36), the exiting light intensity becomes
I0
Ie (2.38)
1 + I0 L
An alternative way to obtain the exiting light intensity is through the formula
(2.35) with 0 = 0, which yields
I
= I 2 (2.39)
z
Formula (2.38) can be solved by the separation of variables, which yields
I0
I(z) = (2.40)
1 + I0 z
Formula (2.40) is consistent with formula (2.38) and can be used to calculate the
light spot intensity profile after passing through the nonlinear absorption materials
with weak linear absorption characteristics (0 0).
The nonlinear refraction can induce self-focusing super-resolution effect (for
> 0), and the nonlinear absorption can lead to the generation of aperture-type
super-resolution effect (for < 0), or subwavelength energy absorption region
(for > 0), which can be applied to the nanolithography and nanoscale optical
data storage, etc.
References