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1 s2.0 S0925838816311458 Main
1 s2.0 S0925838816311458 Main
a r t i c l e i n f o a b s t r a c t
Article history: Cu2FeSnS4 (CFTS) thin films have been synthesized by sulfurization of the sputtered metallic layers. The
Received 8 January 2016 disappeared coexistence phase (Cu2FeSn3S8) and reduced strain have been observed in CFTS thin films
Received in revised form accompanying the ritardando heating rate of sulfurization, and no impurity phase is detected in the
27 February 2016
samples. It is found that the S content at the bottom of CFTS thin films turns out to be very sensitive to
Accepted 18 April 2016
Available online 19 April 2016
the heating rate. The CFTS thin film sulfurized under faster heating rate has S-poor state with a bilayer
structure and lots of micro-grains occupy the bottom of the CFTS thin film, while it has been obviously
improved by reducing the heating rate. The optical transmission spectrum reveals that valence band
Keywords:
Cu2FeSnS4
maximum and conduction band minimum of CFTS are away from one another gradually with the
Sputtering decreasing heating rate, corresponding to the enhanced band gap energy of CFTS from 1.42 to 1.47 eV. As
Thin films for these four CFTS devices, the highest open circuit voltage is 129 mV with short circuit current of
Sulfurization 3.25 mA/cm2, which increased by 17.3% and 30.0%, respectively, compared to the previous work.
© 2016 Elsevier B.V. All rights reserved.
http://dx.doi.org/10.1016/j.jallcom.2016.04.166
0925-8388/© 2016 Elsevier B.V. All rights reserved.
X. Meng et al. / Journal of Alloys and Compounds 680 (2016) 446e451 447
thin films. CFTS device [21,22]. The winder band gaps of ZnO and buffer layer
In this paper, we report that CFTS thin films have been synthe- allow the majority of photons to be absorbed in the narrow-gap
sized by using a two-stage process and four different heating rates absorber (CFTS). Electron-hole pairs generated by the photons in
used in the experiments. Here, we choose sulfur powder as a sulfur the CFTS absorber are separated by the built-in electric field in the
donor, which can effectively avoid the environmental and health p-n junction and contribute to cell’s photocurrent. Electron-affinity
risks compared to using H2S gas as the sulfur source to fabricate difference at the buffer/absorber heterointerface results in a con-
such composites. The calculations and mechanisms associated with duction band discontinuity △Ec.
specific tuning in crystal lattice, morphology and the band gap have X-ray diffraction (XRD; D/MAX-2200, Rigaku Co.) was used to
been discussed, in order to study the structure, surface/section analyze the crystalline structures of CFTS thin films by using Cu Ka
profile and optical properties of polycrystalline CFTS thin films in radiation. Raman scattering experiment was performed with a
detail. Furthermore, based on the research results, the open circuit micro-Raman spectrometer (Jobin Yvon Lab RAM HR 800UV Micro
voltage (Voc) and short circuit current (Jsc) of CFTS device have been PL, 488 nm lasers). The surface/section profile and the composition
enhanced 17.3% and 30.0%, respectively, compared to the previous of CFTS thin films were analyzed by scanning electronic microscopy
work [10], and these results may offer the possibility to realize the (SEM, FEI, S-4700) with an energy dispersive X-ray spectroscopy
Cu-Fe-Sn-S system materials for low-cost thin film solar cells. (EDX) compositional analyzer. X-ray photoelectron spectroscopy
(XPS) technique was carried out by WSCALAB X-ray photoelectron
2. Experimental spectrometer instrument using a source of Al Ka radiation to
confirm elemental oxidation states for CFTS. Optical properties of
CFTS thin films were formed by sulfurized the sandwich struc- CFTS thin films were measured by UVeviseNIR spectroscopy
ture Sn/Fe/Cu metallic precursors on glass/Mo-glass substrates (Perkin-Elmer Lambda 950), and the current density-voltage (J-V)
using RF magnetron sputtering. The deposition order of metal layer characteristics of the CFTS devices was obtained under AM1.5
was substrate/Sn/Fe/Cu, which can effectively prevent the oxida- global spectrum with their radiance set at 1000 W m2 (ABET
tion of iron during the post-annealing process. All precursors were Technologies, Sun 2000). All measurements were performed at
done under a high purity Ar gas atmosphere which flow rate is 20 room temperature.
sccm and with background pressure of 5 104 Pa pumped by
turbo molecular pump. In this paper, the precursors were grown at 3. Results and discussion
room temperature on glass substrates (25 25 mm2) using the Sn,
Fe and Cu targets with high pure of 4 N and the sputtering pressures Fig. 2 shows the XRD patterns and relevant calculation param-
were set to 1.2 Pa, 1.6 Pa and 1.6 Pa for Sn, Fe and Cu, respectively. eters of CFTS thin films sulfurized with different heating rates. As
Formation of the CFTS thin film was performed in RTP tubular
furnace. Precursors were placed in graphite box with sulfur powder
(0.5 g) and the annealing temperature was held at 550 C using
different heating rates ranging from 10 to 40 C/min. The whole
annealing process was performed in an atmosphere of N2 with a
constant working pressure of 1300 Pa. The four samples were
designated as S10, S20, S30 and S40, respectively, where the
numbers represent the heating rate of sulfurization. To investigate
the electrical properties of CFTS, thin films were synthesized on
Mo-coated glass (25 25 mm2) using the above-mentioned
experimental parameters. CdS thin films as buffer layer were
deposited by chemical bath deposition (CBD) under standard at-
mospheric pressure using CdSO4, ammonia and (NH2)2SC mixed
aqueous solution at 72 C for around 10 min. Intrinsic ZnO (i-ZnO)
and aluminum-doped ZnO (AZO, 2% Al2O3) thin films were
deposited by RF sputtering process at room temperature. No metal
grid was deposited on the thin film device. Finally, the CFTS device Fig. 2. (a) XRD patterns of Cu2FeSnS4 thin films sulfurized at different heating rates.
Inset shows position and full width at half maximum (FWHM) of (112), (220) and (312/
with the layer-structure as shown in Fig. 1(a) has been prepared,
116) diffraction peaks; (b) Cell volume of Cu2FeSnS4 and inset is lattice constant (a and
and Fig. 1(b) presents a typical schematic of band alignment of the c); (c) Williamson-Hall method plots, and ε represents the strain in the thin films.
Fig. 1. (a) Schematic diagram of device structure for Cu2FeSnS4; (b) Simulated schematic diagram of band alignment for Cu2FeSnS4 device.
448 X. Meng et al. / Journal of Alloys and Compounds 680 (2016) 446e451
Fig. 5. Surface and section profile images of Cu2FeSnS4 thin films sulfurized by different heating rates: (a, b) 40 C/min; (c, d) 30 C/min; (e, f) 20 C/min and (g, h) 40 C/min.
Table 1
Element composition values of Cu2FeSnS4 thin films determined from EDX analysis.
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This work was supported by the National Natural Science D.R. Perniki, V.A. Akhavan, H. Kesrouani, D.A.V. Bout, B.A. Korgel, ACS Appl.
Foundation of China (61474045), the State Key Basic Research Mater. Interfaces 5 (2013) 9134e9140.