Stepper introduction

Outline
• Stepper view 
• Basic Specification 
• Exposure Sequence 
• Positive Resist Chemical Reaction 
• Alignment Function
• Hyper Shot 
• Feedback system 

AU Optronics Corp.
Stepper view

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Stepper to see through
Reticle Loader
System
Optical
System

Control
Rack
Stage

Plate loader System

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 Stepper Optical System (Lamp Unit)
Fly eye Blind
Filter

i line
Second reflection mirror
First reflection mirror

Shutter
g+h line

Reticle

i line
Input lens 2nd relay lens
1.25
g+h+i line Projection
1st Relay lens lens

Long wavelength

Substrate

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 Plate Loader System
Stage

Load Arm

Unload Arm

Transfer table
Pre-align pins
Pre-align
reference pins

Carrier Arm

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 Stepper Reticle Loader System Reticle Stacker

Reticle Changer
Pre-alignment mechanism
Vacuum

Movement

Barcode read

Reticle Cache

Reticle Library

Stage PPD
Pellicle Particle Detect

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Stepper coordinate system

Xr Reticle coordinate

Yr

Projection lens Yp
X 1.25

Ypj Ypj’
Ypj”

Projection coordinate Xpj” Cluster

Xpj’
coordinate
Map coordinate
Xp
Xpj

Plate coordinate system

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Exposure Simulation

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 Basic Specification Ⅰ

Stage stepping repeatability: 3  0.1 m

 Stitching accuracy:  1.0m
Alignment microscope : 580 X 440 mm
X-Y Stage Stroke : X=± 255mm Y=± 305mm
 Overlap accuracy:

Alignment Method Single Random matching

PGA |mean|+3  0.6m |mean|+3  1.0m

EGA |mean|+3  0.5m |mean|+3  1.0m (98%)

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 Basic Specification Ⅱ
Lens Projection magnification: 1:1.25
DOF(Depth of focus): 10 m
Focus offset input range : ≦ 50 m
 Lamp wavelength: g line(436nm) + h line(405nm) + I line(365nm)
 Illumination Uniformity ( Ee ):  1.5%

Ee 
 Er  Ei 
100
Ei
Er=real energy Ei = theoretical energy

Blind System Minimum aperture: 3.5 × 3.5mm

Reticle rotation repeatability:  0.08% (Random)

Reticle size : 6 inch

AU Optronics Corp.
 Positive Resists Chemical Reaction
O
O OH
C
N2 g + h light

Inhibitor Acid
R
R
I
I I I I
I I I
Coater
I
I I I I
I I I
Glass
Exposure
I
I I I I I
Stepper
I A A AA I I I
I I AA

I I I I
I I I I I Developer
I I

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 Exposure Sequence

Reticle Transfer

Baseline Check (1-st reticle)

Plate Transfer Reticles Alignment check

Primary check
Secondary check

Exposure Plate Alignment

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Baseline Target

•Calibration the relation position between

LSA microscope & Fiducial Mark (Stage) &
Reticle center
•Make sure pattern accurate & clear show on
glass

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 Provisional baseline calculation

He-Ne Laser

CCD(PA, PY)

FM1→PY , PA
FM2→Pθ , PX CCD(Pθ,PX) He-Ne Laser

by LSA mark

LSAA beam
PX
PA
LSAX beam

P
LSAY beam
Y
FM1 A
Plate Pθ
FM2
F 440mm
580mm
LSAθ beam

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Fiducial mark

ISS mark
ISS = Image scanning slits
用於確認 Reticle 上的原點座標

LSA mark LSA = Laser step alignment

用於量測Stage相對於microscope的位
置座標
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Reticle Alignment: CCD
CCD

RTX2 RY X1
He-Ne Laser

Reticle
Vacuum Surface
Digital Microscope
Pre-alignment

X motor

Reticle Table
Θ motor Y motor

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Reticle Alignment Check by ISS mark
Moving

Stage上的 ISS mark Reticle 上的 ISS mark

Signal

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 Calculation of each LSA baseline
Plate microscope PX
Plate microscope PA
PXx/PXy marks

Baseline mark
PAx/PAy marks Exposure area

440m
m
Retcile microscope Retcile microscope
RYX1 RθX2

Plate microscope PY

Plate microscope Pθ(PT)

PYx/PYy marks
580m PTx/PTy marks
m

Base line check end

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Reticle error(primary check):

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Plate Alignment

40m

60m
Scan

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 Alignment Method
PGA：
Plate 上的 Alignment mark 至少 2 個以上，其會針對 Plate 的 Shift、rotation。

PXx

PYy PT
y
EGA：
Plate 上的 Alignment mark 至少 3 個以上，其會針對 Plate 的 Shift、rotation、Scaling、orthogonality

PA PX

PY PT

AU Optronics Corp.
 Plate Alignment Correction Value
Plate alignment residue
• Plate Shift offset (x, y) um
• Plate Scaling offset (x, y) um
• Plate Rotation offset () urad
• Plate Orthogonality () urad

Shift Scaling Rotation Orthogonality

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Reticle Alignment Correction Value
Pattern residue
• Pattern Shift offset (x, y)
• Pattern Rotation offset () urad
• Pattern Magnification offset () ppm
Shift Rotation Magnification

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 Dithering & Hyper-Shot
A shot B shot A shot B shot

2 mm overlap zone on
each reticle
Magnification 1 : 1.25

A shot B shot A shot B shot

5 mm on plate

100%
50 %
0%

HS exposure zone

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 Dithering

A shot B shot

A shot B shot

2.64 mm
10 pixel
“千鳥”

2.64 mm
30 pixel

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 Hyper Shot Blind Unit (H/S)
保護玻璃 石英玻璃

Light source

Light

後板 前板

Blind Base
HS Blind

Normal Blind Exposure Area

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Pattern to measure overlay

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