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Binh1996 PDF
Binh1996 PDF
95
N . GARCIA
Fisica de Sistemas Pequeiios, CSIC, Universidad Autonoma de Madrid, CIII, 28049
Madrid, Spain
AND
S . T. PURCELL
Laboratoire d'Emission Electronique, DPM-URA CNRS, Universite Claude Bernard
Lyon I , 69622 Villeurbanne, France
1. Introduction . . . . . . . . . . . . . . . . . . . .
. 63
11. Electron Emission from a Metal Surface: Summary of the Basic Results. . 64
A. Metalivacuum Barrier . . . , . . . . . . . . . . . 64
B. Emission Currents . . . . . . . . . . . . . . . . . . 66
C. Energy Distribution of Emitted Electrons . . . . . . . . . 72
D. Current Density Distribution , . . . . . . . . . . . . . . 74
E. Current Stability . . . . . . . . . . . . . . . . . . 78
111. Electron Emission from Nanotips . . . . . . . . . . . . . . 81
A. Experimental Setup and Procedures. . . . . . . . . . . . . 82
B. Confinement of the Field Emitting Area . . . . , . . . . . . 84
C. Field Emission Characteristics from Nanotips: Experiment . . . . . 97
D. Field Emission Characteristics from Nanotips: Discussion . . . . . . 104
IV. Applications . . . . . . . . . . . . . . . . . . . . . 112
A. Atomic Resolution under FEM . . . . . . . . . . . . . . 112
B. Monochromatic Electron Beam . . . . . . . . . . . . . . 115
C. Local Heating and Cooling by Nottingham Effect . . . . . . . . 118
D. Fresnel Projection Microscopy , . . . . . . . . . . . 124
E. Ferromagnetic Nanotips: Atomic Beam Splitter . . . . . . . . . 145
V. Conclusions . . . . . . . . . . . . . . . . . . . . . 149
References . , , . . . . . . . . . . . . . . . . . . 150
1. INTRODUCTION
gun (FEG) replaced the thermionic emitter as the electron source in the
scanning electron microscope. In 1965, Crewe [l] made the first experi-
mental demonstration that a dramatic improvement in resolution could
be made by the use of the FEG, because this permitted the electron beam
to be focused into a probe area of only a few angstroms in diameter.
Further developments can be expected if new improvements of the field
emission (FE) tip can be realized, in particular by decreasing (1) the size
of the emitting area, (2) the angular dispersion of the emitted flux, (3) the
extraction voltage, and (4)the width of the energy distribution of the
emitted electrons; and by increasing the stability of the emission. This
chapter summarizes the improvements in all of these aspects that can be
realized by the use of a nanotip as a FE source. These nanotips are
single-atom sharpness nanoprotrusions, 2 to 5 nm in height, on top of
hemispherical base tips for which the whole FE current is emitted from
the topmost apex atom [2, 31.
The object of this chapter is to present the consolidated results obtained
with controlled field emission from nanotips and in particular to discuss
the specific effects related to the fact that the source is atomic size. This
chapter does not present an exhaustive review of field emission. A good
number of review papers and books exist in the literature about field
emission and its applications, even at its very beginning [4-81. However,
in Section I1 we summarize the basic results of field emission theory,
including discussions of thermionic emission, in order to place the field
emission from nanotips in the global context of electron sources. Charac-
teristics of field emission from nanotips are then presented and discussed
in Section 111.
The usefulness of the very specific properties of nanotips is convincing
only if they permit new advances to be developed. The demonstration
of their utility will be explored in Section IV. Among other examples,
nanometric-resolved images of synthetic polymers and RNA-based biolog-
ical molecules will be presented and discussed. They were obtained with
the Fresnel projection microscope (FPM), using the nanotip as an atom-
size electron source.
11. ELECTRON
EMISSION FROM A METALSURFACE:
SUMMARY OF THE BASICRESULTS
A . MetallVacuum Barrier
Position (A>
FIGURE1 . Potential energy for an electron in the vicinity of a metal surface with and
without applied fields. The decrease in the effective barrier due to the Schottky effect is
3.8 F”z.
charge, and urnis the electron velocity. For no between 10” and loz3cm-3
and u, = lo8 cm * s-‘ near the Fermi energy E F ,j, is -10I2 A . cm-2.
Only a small fraction of this current escapes from the metal due to the
surface tunneling barrier which is presented schematically in Fig. 1. This
barrier is higher than EF by the value of the work function #, about 2 to
5 eV at zero applied field, and it is modified by the application of an
electric field F, which decreases the potential energy by an amount of
-eF,x outside the metal, x being the distance from the tip surface. Near
the surface the emitted electron experiences an image force, which comes
from the attraction of the induced positive charge in the metal. The stan-
dard form for potential energy of an electron V ( x ) at a distance x from
the cathode with the zero of energy at the bottom of the conduction band is
V ( x )= EF + # -eF,x - - - E F
e2
+ # -eF,x 3.6
-- forx >x,
4x X (1)
V ( x )= 0 for x < x,
with the energies in eV, the fields in VIA, the distance x in A,and x, =
3.6/(EF + #) = 0.3 A is chosen such that V(x,) = 0.
The potential energy given by Eq. (1) shows a maximum at
66 VU THIEN BINH ET AL.
B . Emission Currents
1. Thermionic Emission
In zero applied field, the thermionic current J, is given by considering the
flux from all the electrons that have energy normal to the surface greater
than the barrier height 4:
I. Thermionic Emission
Vacuum
FIGURE2. Schematic diagrams for electron emission from a metal, with the respective
energy distributions of the emitted electrons. I. Thermionic emission: (a) without applied
field; (b) in the presence of applied field (Schottky ernmission). 11. Field emission (FE).
68 VU THIEN BINH ET AL.
J =?!I
h3
+X
-=
--m
Emin= EF + 4 + P: + PZ
-. 2m
Integration gives
Jx = - h3
2ekBTexp
(-")kBT I+Xexp (-&)
--m2 m k ~ TdpyI:mexp (-L)
2mkBT dpz, 00
J41r mek2
x2 = d
h3
T exp (-&)
= AoT2exp (-A),
kB T
(9)
TABLE I
PARAMETERS OF SOME THERMIONIC
EMISSION
CATHODES AT
ZEROAPPLIEDFIELD
W LaB6 ZrOIW
TABLE I1
VARIATION
OF THE WORKFUNCTION AND CORRESPONDINGEMISSION
CURRENT
DENSITIESWITH APPLIED
FIELDI N THE SCHOTTKY
REGIME
2. Field Emission
Application of an external electric field lowers the potential barrier and
also modifies the position of the maximum x, and the barrier width as
shown in Table 111. For Fo < lo7 V/cm, the barrier width is large and it
is practically opaque to the electrons. Appreciable tunneling occurs for
F, > 2-3 x LO’. The tunneling current was named field emission because
there is no need to heat the cathode in order to deliver the electron current.
The Fowler-Nordheim (F-N) model describing the electron emission
from metals by application of a high electric field was developed by assum-
ing that the temperature of the metal is 0 K, the free-electron approxima-
tion applies inside the metal, the surface is smooth and planar, and the
potential barrier closing the surface in the vacuum region consists of an
image force potential and a potential due to the applied electric field F,.
The emitted flux is found by considering the product of the supply function
for the flux of electrons impinging on the barrier and the transmission
TABLE I11
MAXIMUM,
xo, AND WIDTH,Ax (ATEF) OF THE TUNNELING
(4 = 4.5 eV)
BARRIER
~
probability, D(E,). D(EJ depends on the height and width of the barrier,
and the subscript x specifies that the transmission probability depends
only on the component of energy normal to the surface. D(E,) for a free
electron gas in the WKB approximation is given by [lo]
Considering the fact that the electrons tunnel in the narrow range of energy
near E F , Eq. (10) results in
with
and
e 3 / 2 I/?.
~ F
w = o = for F, in V /A and 4J in eV.
4J 3-8T
Do corresponds to the transmission probability at the Fermi level, and
t ( w ) and u ( w ) are nondimensional, slowly varying functions derived from
elliptic integrals [l 11 to take into account the image forces during the
tunneling process. For FE, t(w) = 1 and u(w) ranges from 0.4 to 0.8.
The tunneling current for a given function D(E,) is
J , = 1.55 x 10”- Fi
4t2(W)
with J , in A/cm2, 4J in eV, and F, in VIA. In Table 1V we give some
numerical estimates of the applied fields necessary to achieve current
densities of lo6 and lo7 A/cm2.
As the current density impinging on the metal surface from the inside
of the metal is about 10” A/cm2, applied fields for density currents of
ELECTRON FIELD EMISSION FROM ATOM SOURCES 71
TABLE IV
CURRENT
DENSITIES
AND CORRESPONDING
FIELDSFOR VARIOUS
WORKFUNCTIONS
j , = lo6 A/cm2 j , = lo7 Alcm2
4 2v2A
t (w) [
I = 1.55 x 1 0 - 6 q e x p -0.685 -
43'2 v(w)
pv
]. (14b)
Let us now discuss the energy distribution of the emitted currents for
both thermionic and field emission. The width of the distribution is one
of the main parameters of importance in the use of the electron beam
in microscopy.
1. Thermionic Emission
At high temperature the thernal tail of the Fermi-Dirac distribution,
f ( E ) , becomes
As the electrons are emitted in all directions within the half-space, the
normalized total energy distribution, F,(E), is given by
F,(E) dE = -exp
(kB n2 (-")kB T dE.
2. Field Emission
The energy dependence of the electron density emitted in the field emission
process, J ( E ) , is described by the total energy distribution (TED), origi-
nally derived by Young for a free electron gas [14]. It turns out to depend
simply on the product of a transmission probability factor and the Fermi-
Dirac distribution function:
with
[
and
B = 1.58 x 10" exp
-6.85 X
1
:7~(~)43n
1 t(w)4'/2
-z= 1.025-.
d Fo
The maximum in the energy distribution relative to EF occurs for
TABLE V
CURRENT
DENSITIES
(INA/cm2) AND TED PEAKPOSITIONS
AND FWHMs (INeV) FOR
VARIOUSFIELDSAND TEMPERATURES (a = 4.5 eV)
Fo (V/cm) 107 3 x 107 s x 107 8 x lo7 I 0'
77 K
J 1.65 X lo-'' 4.65 X 10' 5.27 X lo5 1.26 X 10' 8.44 X lo8
Emx 0.0114 -0.0 195 -0.0230 -0.0262 -0.0280
AE 0.0612 0. I38 0.212 0.323 0.396
300 K
J 2.56 X lo-" 4.86 X 10' 5.35 X lo5 1.27 X 10' 8.47 X 10'
Emm 0.00942 -0.0364 -0.0520 -0.0654 -0.0716
AE 0.136 0.203 0.281 0.396 0.472
1000 K
J - 8.43 x 10' 6.41 x 10' 1.36 x 10' 8.85 x lo8
Emax - 0.0555 -0.0373 -0.0966 -0.121
AE - 0.458 0.487 0.593 0.669
1500 K
J - - 8.43 x lo5 1.50 X 10' 9.41 x lo8
Emax - - 0.0471 -0.0694 -0.113
AE - - 0.680 0.746 0.816
widths are tabulated in Table V. Note that the predicted FWHMs are
-0.3 eV, which is generally in agreement with experiment.
A graphical representation of Eq. (18) is given in Fig. 3. Several charac-
teristics of the TED to note are as follows.
I . The high-energy slope (a) is mostly temperature-dependent.
2. The low-energy slope (b) is mostly field-dependent.
3. At a temperature T* = d/2kB,the average number of FE electrons
under E F is equal to those coming from over the Fermi level and
Em, = EF. The temperature T* is called the inversion temperature.
For T < T * , most of the field emitted electrons are under EF and
Em,,< EF. Conversely, for T > T * ,there are more electrons emitted
with energy higher than E F , and the maximum in the energy distribu-
tion is over the Fermi level.
4. For useful current densities (>lo5 A/cm-*), the width of the energy
distribution has a lower limit of -0.2 eV at 77 K and -0.3 eV at 300 K.
the emitting surface and the current density in the beam at some distance
from the emitter, which has been influenced by the local field of the
whole tip.
1 . Thermionic Emission
As most metals melt before they reach a sufficiently high temperature to
obtain thermionic emission, the most widely used thermionic cathode
consists of a W wire, 100-200 pm in diameter, bent like a hairpin. Only
the bent tip of the filament contributes to the emission. The emission area
is in the range of 10-'-10-* mm2. In order to reduce the emitting area,
sharpened filaments are used either by direct electropolishing of the hairpin
wire or by soldering to a heating wire a small electropolished tip with
small radius of curvature at the apex, but the size of the emission source
remains much larger and the current density much lower than FE sources.
2. Field Emission
The density distribution inside the field emitted beam is determined by
the field distribution over the emitting area, which means the tip apex.
76 VU THIEN BINH ET AL.
To obtain a high electric field F, at the emitter apex, we use the property
that F, near a charged conductor is inversely proportional to the radius
of curvature r of its surface [15].
I I I
- 0.8
a 0.4 -
0.2 -
0 45 90 135 180
Angle from apex (deg)
FIGURE5. Variation of p(O)lp(O)(from ref. [IS]) and of the current density, J(O)/J(O),
given by Eqs. (13)-(14) away from the apex of a hemispherical FE tip.
71
78 VU THIEN BINH ET AL.
FIGURE6. Schematic representation for the virtual radial projection point source V tor
a microtip relative to the surface apex and its geometric center C .
that the electron trajectories are not radial. Calculations of the electron
trajectories [19] have shown that the full beam opening, BC, decreases to
0" with a ratio of
01,
0.5 I- < 0.7.
0,
Actually, this means that the FE e beam is radially emitted from a virtual
radial projection point source, V, which is the intersection point of all the
asymptotes of the electron trajectories far away from the tip (Fig. 6), with
virtual source size roughly of
A = 2.rrr2(1- cos 0,-).
The virtual point V is situated on the tip axis and is shifted behind the
hemispherical apex geometric enter C , by a distance of at least the value
of the radius of the tip. This compression phenomenon induced by the
tip shank can also be treated as the expression of a refractive index, in
electron optics terms, with the tip playing the role of an intrinsic electron
lens [20]. The effective beam opening angle from a hemispherical tip is
then in the range of 45 to 80".
E . Current Stability
For both thermionic and field emission sources, the reproducibility and
stability of the emission current are determined primarily by the reproduc-
ibility and stability of the cathode work function. This can be seen from
ELECTRON FIELD EMISSION FROM ATOM SOURCES 79
Eqs. (9) and (13), which show that the thermionic and FE current densities
are exponentially dependent on the work function.
1 . Thermionic Emission
For thermionic emitters, various low-work-function surface treatments
are often employed because of the greatly increased currents-for ex-
ample, by depositing on the W surface (+ = 4.5 eV) either a layer of
LaB, ( n = 4 , 6 , 9 ) to lower the work function to 2.52 to 3.35 eV depending
on the boron concentration [21], or a layer of ZrO to reach a value of
+ = 2.8 eV [22]. The decreases in the work function arise from the presence
of adsorbed surface double layers. In these cases a dipole moment pin,,
can be associated with each adsorbate atom. The corresponding change
of the work function due to the adsorbed layer is given, in the first approxi-
mation, by
A$ = 2TpindNaea (25)
where N , is the maximum number of adsorption sites per unit area, 8, is
the fraction of occupied sites, and pin,,is the adsorbed atom moment. This
equation implies a linear relation between A 4 and the value Ba, and pin‘,,
i.e., changes in the chemical composition of the first monolayer of the
emitter surface. The stability of the emitted current is therefore controlled
by the stability of the adsorbed layer. This is a very demanding prerequisite
for hot cathodes working inside an electron gun environment and espe-
cially when the largest possible current density is drawn. Holding the
cathode work function to a constant value is thus a very complex techno-
logical problem which, added to the difficulty of fabricating homogeneous
emitters, has impeded the extensive use of such techniques, as the use
of single crystal LaB6 cathodes, for example [23].
2. Field Emission
FE currents depend exponentially on 43‘2 [Eq. (14)], and thus the reproduc-
ibility and stability of the FE current are strongly influenced by adsorption
during operation of the emitter. This is the main cause for the regular
“regeneration” of the tips in actual FE guns.
Figures 7 and 8 show, as illustrative examples, the variations for hemi-
spherical and buildup tips due to the adsorption of gases on the surface
from the UHV environment. There is a rapid regular decrease in the FE
currents until a few percent of the initial values during the first 10 to 20
min as a consequence of the formation of adsorbed layers. The actual
duration is a function of the surrounding working pressure and is traced
by a smooth continuous variation of the FEM pattern. The following
80 VU THIEN BINH ET AL.
I I
W<111>Hemispherical Microtip
-
40 -~-~ -
3
-
20
Time (min)
FIGURE7. Total FE currents in UHV for a hemispherical microtip at fixed applied
voltage measured as a function of time from a flash cleaning.
L ' ' I
0.3
* 0.2
8
U
9
0.1
0.0
0
1 2 4 6 8 10 12 14 16
Time (rnin)
FIGURE 8. Total FE currents in UHV for a buildup microtip at fixed applied voltage
measured as a function of time from a flash cleaning.
ELECTRON FIELD EMISSION FROM ATOM SOURCES 81
EMISSION
111. ELECTRON FROM NANOTIPS
TABLE VI
COMPARISON OF ELECTRON
SOURCE PROPERTIES OF MICROSCOPIC
TIPS A N D NANOTlPS
Most of the experimental results that are presented in this chapter were
obtained with the experimental installation whose schematic diagram is
shown in Fig. 10. This installation includes, in the same ultrahigh-vacuum
chamber, the possibilities of in siru tip treatments, field electron emission
microscopy (FEM), field electron emission spectroscopy (FEES), and
field ion microscopy (FIM). The tip mounting includes both a mechanical
movement and electrostatic and magnetic deflection systems, which allow
transfer among FEM, FEES, and FIM measurements at will and within
the same environment. The whole device is inside a chamber which has
FIGURE 15. 3D calculated field distribution with atomic resolution over a n equipotential m-face for a nanotip (p,) = 4 n m and base diameter =
4 nm). ( a ) A complete view of the nanoprotrusion o n top of the 50-nm-radius base tip. (b) A close view of the nanoprotrusion apex to show the local
field enhancement over the topmost atom. The color x a l e represents the I-ange of variation of the fi f x t o r . which is between lo4 and 10' cm-'.
(From ref. [34].)
F I G U R E 21. A M l E spots observed o n the screen for W a n d Au nanotips. These metallic ion beams come
from the ionization of the fast diffusing atoms toward the apex of the protrusions. After quenching. E'EM
and FIM show the superposition of the three emitting spots due to gas imaging ions ( F I M ) . electrons ( F E M ) .
and metallic ions (AMIE). This is shown o n the right-side image obtained with a W nanotip.
ELECTRON FIELD EMISSION FROM ATOM SOURCES 83
Fluorescent scr
Electrostatic le
FIGURE10. Experimental setup used for studying the fabrication and emission proper-
ties of nanotips. The UHV system contains FEM, FEES, and FIM facilities in the same
chamber.
FIGURE1 1 . Schematic diagram showing the three possibilities for FE tips to exhibit
confinement of the emission area to nanometer dimensions.
ELECTRON FIELD EMISSION FROM ATOM SOURCES 85
a b
FIGURE12. FIM images of an electrochemically etched ultrasharp tip with an estimated
radius of about 2 nm. (a) The best image voltage (BIV) is on the apex three-atom facet ( I 11).
(b) The BIV is on the zones underneath, with consequently a loss in the resolution of the
ending trimer, in order to show the structure underneath the hemispherical tip end.
1 . Ultrasharp Tips
Ultrasharp tips are tips with ending radii of about a few nanometers. The
field emission confinement is then simply a result of the reduction of the
high field apex area. The fabrication techniques to decrease the tip radius
to a few nm can be either an ex situ electrochemical etching technique or
an in situ mechanism using ion bombardment.
The electrochemical tip etching technique [7, 81 can be controlled to
produce very sharp tips [24]. In Fig. 12 we show the FIM image of a
W(111) tip with a radius of about 20-25 A.
It was obtained after an
electrochemical etching in NaOH (2N) with a controlled pulsed AC cur-
rent, followed by a very gentle field evaporation of the first adsorbed layer
after the introduction into the vacuum. One can notice, from this example,
that the (1 11) plane at the tip apex for this tip is a three-atom plane.
Another possibility is the in situ etching of initial tips having radius of
-100 nm by ion bombardment during FE under a pressure of to
ton of Ar or Ne [25]. This technique can be pushed toward the obtention
of ultrasharp tips with a radius in the range of 10 nm (Fig. 13).
86 VU THIEN BINH ET AL.
80 I I I I
70 -
Sputter Voltage 500 V
-
W
m Sputter Current lOpA
2 60
3G
' 50 -
g 40 -
3rd 30 - -
3w" 20 - 0
-
10 1 I I I I I
0 10 20 30 40 50
Sputter Time (min)
FIGURE13. Evolution of the tip radius with argon sputtering time. The inset is the
FEM image at the end of the sputtering cycle. The radii were estimated from the voltages
needed to have a fixed FE current of 1 X lo-'* A.
The use of these ultrasharp tips for FE applications gives rise to the
following comments :
1. The production of such a tip, either by electrochemical etching or
in situ sputtering, needs a priori a tip radius control by FIM, which
is not very convenient for FE gun settings.
2. With the electrochemical fabrication, the tip must be etched as
shortly as possible before its introduction into vacuum due to possible
tip evolution and blunting by corrosion outside the vacuum chamber,
especially if one wants to keep the value of the radius in the range
of several nanometers.
3. The source size for electron emission is roughly determined by the
radius of the tip, which is still at best -20 X 20 atoms.
4. The beam opening angles are those of a hemispherical cap ending
tip that is in the range of 45 to 80" as discussed in Section II.D.2.
Therefore, a diaphragm is needed to collimate the beam, which re-
sults in a relatively low current density available for use in the fi-
nal beam.
5 . A very unstable emission if the ultrasharp electrochemical etched
tip is used. To keep this nanometric radius, the initial tip cannot
ELECTRON FIELD EMISSION FROM ATOM SOURCES 87
b
FIGURE 14. Equipotential lines for a hyperbolic tip (radius = 50 wand applied voltage =
175 V) and a point charge at 2 A from the apex (from ref. [33b]). (b) Equipotential lines
corresponding the superposition of the potentials given in (a). The dashed region corresponds
to the tunneling region. (c) The same as in (b) including the image force correction. In this
case, the tunnel bamer is lower and the equipotentials near the protrusion are almost flat.
where po is the height of the protrusion, z is the distance from the micro-
scopic base-tip apex, and F, is the field at the apex without the protrusion.
The field at the top of the protrusion (z = p,,) is -3 times that of the
ELECTRON FIELD EMISSION FROM ATOM SOURCES 89
substrate in its vicinity; this value does not depend on the protrusion
height in this model.
Numerical calculations based on the superposition principle give a more
precise 3D potential distribution at the atomic scale of the whole tip,
which consists of a base tip with a nanoprotrusion at the apex [34]. The
base tip is also described by a hyperboloid function, but the protrusion
is now modeled on the atomic scale by a cluster of electrostatic charges
placed at the center of the spheres at the atomic sites that shape the
protrusion. The value of each of the charges is given by minimizing the
electrostatic energy of the complex capacitor consisting on one hand of
the hyberboloid and the cluster of spheres, all of them at the same potential
Vtip,and on the other hand of a plane orthogonal to the tip axis, describing
the screen, located a few centimeters away at another fixed potential. The
3D potential distribution is then calculated for a given voltage between
this tip and the screen by summation of the different potentials created
by the hyberboloid plus all the charges. The field is derived afterward from
the calcualted potential distribution. This method, assuming no symmetry
except for the base tip, allows calculations of the potential and field distri-
butions in 3D with atomic resoluton for any protrusion shape.
Figure 15 (see color plates following page 82) is an example of such a
calculation of the 3D field distribution over a conical protrusion with
( I 1 I) axis, base radius 2 nm and height 4 nm, placed on top of a 50-nm-
radius base tip. The variation of the parameter p of Eq. (21), which is
equivalent to the field distribution, is plotted in Fig. 16 for a cross section
through protrusions with different heights and a fixed cone angle of 53"
(Fig. 16a), and for different heights and cone angles (Fig. 16b). For small
protrusions a value of 3.2 for the enhancement factor is found forp, = 1 nm.
The numerical results confirm the estimated value of the field enhancement
given by Eq. (26), (see Fig. 16a). This /3 value is practically constant for
po < 1 nm, which emphasizes the role of the electrostatic screening from
the base tip.
A second result must be noted. For a given geometry of the protrusion
end (i.e., a constant cone angle of -53O) and for p, 2 2 nm, the field at
the apex is -9.5 times that of the substrate in its vicinity. This enhance-
ment factor is much larger than the value of 3 estimated by the analytical
approach [Eq. (26)]. As the FE is an exponential function of PV, protru-
sions with po 2 2 nm result in a confinement of the emission area exclu-
sively over the top of the protrusions. This is the essential reason for the
choice of nanotips as advanced FE sources.
01
-4 -3 -2 -1 0 1 2 3 4
Distance from Apex (nm)
a
I I I I I I I
-4 -3 -2 -1 0 1 2 3 4
Distance from Apex (nm)
b
FIGURE16. (a) Field distribution over the apex of nanotips with conical protrusions of
different heights and a fixed cone angle of 53". (b) Field distributionover the apex of nanotips
with conical protrusions of different heights and a fixed base radius of 2 nm. (From ref. [34].)
The final geometry of the tip apex is then governed by the equilibrium
between two opposing diffusion processes, the first driven by the gradient
of the electric field, and the second driven by the capillary forces (gradient
of the surface chemical potential) [35].
Depending on the value of the applied electric field, two different tip
end geometries can be obtained: buildup tips for F around 0.5 V/A and
nanotips for F larger than 1 VIA. the specific properties attached to each
of these two profiles are described next.
Buildup Tips. Consider the case when the applied field is around 0.5
V/& this procedure is termed the buildup technique [321. The applied field
induces a gradient across some low-index facets with, as consequence, the
enlargement of these facets. It can be performed either with positive or
C d
FIGURE17. FEM of a buildup sequence. (a)-(d) Evolution of the FEM pattern from a
hemispherical W(11 I ) tip (a) to a buildup tip (d), due to the enlargement of the three facets
{ 112) under temperature and field. All the patterns are at the same scale in order to show
the confinement to one spot of the emission area during the buildup.
92 VU THIEN BINH ET AL.
negative polarity. With negative polarity one can follow in time the varia-
tion of the apex geometry by FEM because the field value is in the range
of FE. For W(111) tips, the facets which are enlarged are the three (112)
planes around the tip axis. Taking the facet enlargement to its limit ends
in the intersection of the three facets with a comer at the (1 11) apex (Fig.
17). This corner can end in one or three atoms and becomes a small
triangular facet after a controlled field evaporation.
This local region of high curvature creates a predictable local field
enhancement [19]. The calculation of the field distribution at atomic scale
gives an enhancement factor in the range of 1.4 compared to the surround-
ing field, as shown in Fig. 18 [34]. This enhancement factor is small because
the angle between (112) and (111) is only -20". It is enough to allow
preferential FE over the protruding apex, but without being exclusive as
indicated by FEM patterns and local current measurements over the tip
end cap. In Fig. 19 is shown the same FEM pattern but with increasing
FE voltages and MCP gain, which clearly illustrates the apparent con-
finement is partially an artefact due to signal detection sensitivity.
Thus, for buildup tips the FE current is not confined to the apex atoms.
The buildup only enhances preferentially the FE over the intersection
corners of some facets by a ratio of ZlZ, = 15, without being exclusive.
Derived methods to increase the local angular beam confinement by
using concomitantly the buildup and the selective work function reduction
(with oxygen processing or ZrO coating, for example) [36] are now cur-
rently used in commercial FE guns.
I I I I I I I
-4 -3 -2 -1 0 1 2 3 4
Distance from Apex (nm)
FIGURE18. Field distribution over the apex of a ( 1 1 1 ) buildup tip (dashed line) and a
nanotip (height po = 2 nm and cap diameter 4 nm). (From ref. [34].)
ELECTRON FIELD EMISSION FROM ATOM SOURCES 93
a b C
FIGURE19. (a)-(c) Comparison of the FEM pattern of a buildup tip (a) with the corre-
sponding FIM pattern (b). It shows the one-atom boundary between the {112} facets and
the three-atom comer forming the apex of the tip. An increase of the FE voltage and the
MCP gain shows that the emission area is not confined to the topmost atoms, as revealed
by the FEM pattern (c) of the same buildup tip shown in (a).
suited as an electron source in view of the size of the emitting area and
the confinement of the electron beam. The confinement of the FE area
over the apex atom implies specific FE characteristics, which will be
described below.
ELECTRON FIELD EMISSION FROM ATOM SOURCES 97
In this section the measured field emission properties of the nanotips are
presented. The measurements include: (1) the beam opening angle, (2)
the current stability in time, (3) the I-V characteristics, and (4) the total
energy distribution. To clarify the presentation, the experimental measure-
ments presented in this section are separated from their interpretations,
which will be presented in Section 1II.D.
5 m
4 m
u 2oooo
1OOOO
0
-10 -5 0 5 10
Beam Angle (deg)
FIGURE23. Measurement of the angular distribution of the FE current of a nanotip by
the probe hole technique.
98 VU THIEN BINH ET AL.
.o
11.2 ~
7
c
0.8 -
W
= 0.25 %
g 0.6 -
Y
5
U 0.4 -
0.2 - 6.0 65 70 -
0.0
0
' I
2
I I I
4
I
6
I I I
8
Time (hour)
FIGURE24. Total current emitted by a W nanotip as a function of time for current of
about I nA.
ages. This indicates that the total FE'current comes exclusively from the
nanoprotrusion apex even at higher voltages.
' I
I I
I1
t
2o
'O
01
1 I I I I I I I
0 10 20 30 40 50 60 70 80
Time (min)
FIGURE25. Total current emitted by a Pt nanotip as a function of time for current in
the 50-nA range.
3 . I-V Characteristics
The variation of the field emission current from a nanotip versus the
applied voltage is plotted as In(ZlV2)versus 1/V. An example of such I-V
characteristics is shown in Fig. 26. The main difference from the Fowler-
Nordheim relation of Eq. (14) is the current saturation at high voltages
[2]. This means that, relative to field emission from a metal surface, there
is a progressively weaker emission current on increasing to higher applied
I I I I I I
- 10-'0 -
z
%
&
-
4
> 10-12 -
-
I I I I
10-l~ ~ I I
6 7 8 9 10'~
1/v (volt-')
FIGURE
26. FE I-V characteristics from a nanotip.
100 VU THIEN BINH ET AL.
10-14 . I I I
J 10-17 -
-
I I I
lo-'*
fields, This current saturation behavior is not observed for buildup tips
(Fig. 27), and is therefore a signature of an exclusive FE from the apex
of the nanotip when localized FE is observed.
I I I 1 I I I
1 .o
B
-
.-NLd
P) 0.8
0.6
0
v
C
y 0.4
C
s
0
0 0.2
0.0
-1.2 -1.0 -0.8 -0.6 -0.4 -0.2 0.0 0.2
Energy Relative To EF (eV)
FIGURE28. TEDs of the W(111)microtip before formation of the nanotip. The fits by
Eq. (18) are represented by the solid curve over the experimental points.
28. The value of EF for microscopic tips was constant and was then taken
as the reference level for all the spectra. The measured FWHMs for the
spectra in Fig. 28 were 0.23 eV and 0.30 eV for 1650 V and 2250 V,
respectively, a variation which is a consequence of the increase of the
slope of the tunnel barrier.
The TED spectra were recorded for different VAppafter formation of
protrusions on top of the macroscopic tip. Four salient features, which are
not present for microscopic tips, can be discerned in the experimental
observations.
I I I I I I 1
1.0 -
- ~~
w (111)
0.8 - (1) : Build-up tip
-
E2 0.6 -
(2) - (4) : Nanotips
with increasing
-
v
m
Y
protrusion height
C
0.4 -
U
-
0.2 -
-
-2.5 -2.0 -1.5 -1.0 -0.5 0.0 0.5
Energy Relative to EF (eV)
FIGURE 29. Evolution of the TEDs versus height of nanoprotrusion, showing the ap-
pearance of localized peaks not at EF.
2. The peaks are not pinned at the Fermi level, and a linear shift of the
whole spectrum is observed as a function of VApp.This is illustrated
in Fig. 31, where the dependence of the TEDs with a two-peak
spectrum are given. The positions of the peak maxima as a function
of VAppare plotted in Fig. 32. All the data fall on parallel lines,
*
with slopes of 1.65 0.02 meV per applied volt, showing that the
separation between the peaks remains constant. The total shift of
the peaks for the range of V,,, in this experiment was -0.7 eV. Note
that no shift was detectable for microscopic tips and for similar
changes of VAYp.The shifts and the intensity variations of the peaks
during their shlft were reversible; they could be varied reproducibly
by changing VApp.
3. None of these peaks could be fitted satisfactorily by Eq. (18). For
the same FWHM, the spectra from the microscopic tip have wider
tails on the low-energy sides and sharper maxima than the peaks
from the protrusion.
4. The FWHMs of the peaks vary little with V,,,. For example, for
the TEDs of Fig. 31, the FWHMs remain -0.24 eV for all values
Of vApp*
1.0
F
3 0.8
3
88 0.6
c
v
2m 0.4
1
0
u 0.2
0.0
-2.0 -1.5 -1.0 -0.50 0.0 0.50
Energy Relative to EF (eV)
b
FIGURE30. Examples of TEDs from high nanotips with (a) one and (b) two peaks not
pinned at EF.
1200 I
looo 1 I I
53q+(a!
800
WJ
600
3
400
200
--2.5
n
-2.0 -1.5 -1.0 -0.5 0.0 0.5
Energy Relative to EF(eV)
FIGURE31. Evolution of a two-peak TED from a nanotip as a function of applied
voltage, showing displacement with applied field. (From ref. [41].)
We
O
CI
-0.4
u
>
Y
.r(
cd
2 -0.8
d
E
0
?
P
' Z -1.2
a"
%u
L -1.6
900 lo00 1100 1200 1300 1400 1500
v.4pp
FIGURE32. Position of the peaks of Fig. 31. The shift is 1.65 meV per applied volt and
is reversible. (From ref. [411.)
ELECTRON FIELD EMISSION FROM ATOM SOURCES 105
Ja.
diffraction at the tunneling opening [43] give a full angular spread 8, of
8, = 4
This relation is obtained by using the WKB approximation for the tunnel-
ing probability T ( E ) ,given by
evaluated at E = EF and the field distribution F(8) over the apex, given by
F(8)=zFo(I -:).
For Fo = 0.5 V/A and 6 = 4.5 eV, Eq. (29) gives an angular spread
8, = 52". To verify the validity of this approach, the problem was solved
using the time-dependent Schrodinger equation (TDSE) of a Gaussian
wave packet moving toward a constriction which represents the tunnel
apex atom. The TDSE was solved numerically by means of an algorithm
based on a fourth-order Trotter formula [44]. It gives a value for 8, = 50".
In conclusion, the geometric factor attached to the nanoprotrusion ge-
106 VU THIEN BINH ET AL.
ec=2
:/-. (34)
ELECTRON FIELD EMISSION FROM ATOM SOURCES 107
2 . Stability
The long-term stability behavior of FE from nanotips can be assessed by
comparison with hemispherical and buildup tips. For these latter cases
the current stability is explained by considering the adsorption of the
residual gas over the emitting area. As noted in Section II.E, hemispherical
and buildup tips have a limited stability due to the formaton of an adsorbed
layer which varies the work function (see Figs. 7 and 8). The FE stability
of the nanotips presented in Fig. 24 is simply explained if one considers
the very small probability of having an adsorbed atom on the apex atom
coming from the surrounding gas phase (-5. lo-" to lo-'' torr). An estima-
tion of the impinging frequency v can be calculated, just by considering
the gas kinetics equations, which gives v = s-l for a surrounding
pressure of torr, i.e., a time interval of -3 h. This value is in the
range of the experimental measurements.
When the FE current is increased, the temperature at the protrusion
increases due to the Nottingham effect within the localized band structure.
Note that this effect has been used to measure the local energy exchange
during the FE process from a nanotip, which will be presented in the
following section 1V.C. The probability of a rearrangement of the nanotip
apex on an atomic scale increases at higher temperature, or equivalently
higher FE current, leading to abrupt changes in the total current. This is
the cause of the observed reversible and/or irreversible discrete jumps in
the current in Fig. 25. The upper limit for the FE current is also explained
by the very high increase of the temperature during FE, leading to the
destruction of the protrusion by surface diffusion or by local melting.
. . .
FtGURE 33. Simplified model of FE from single-atom nanotips for two values of VApp.
The lightly and darkly shaded bands signify the position of the band for two different values
of V A p p .
peaks in the TED spectra then occur because the emitted electrons reso-
nantly tunnel to the vacuum only through these bands. This situation is
depicted schematically in Fig. 33 for the case of a one-band TED.
Resonant tunneling through atomic energy levels of adsorbed atoms,
which have been broadened due to interaction with the surface under-
neath, was first introduced by Duke and Alferieff [46] and later developed
more fully by Gadzuk [47, 481. This was used to explain the small bumps
added to the energy distributions of the clean microscopic tips observed
in FEES experiments [27] with chemisorbed atoms on metallic surfaces.
It must be emphasized that the presence of chemisorbed atoms in these
experiments only slightly modified the standard peak of a clean micro-
scopic tip, in contrast to the spectra from the protrusions which consist
solely of well-defined peaks. This latter behavior could have its origin in
the atomic size and shape of single-atom protrusion tips, and in particular
on the reduced coordination number of the atom that constitutes the apex
compared to a single atom on a surface.
The shifts of the peaks run counter to a metallic behavior of the topmost
atom. The linearity of the shifts versus V,, shown in Fig. 32 means linear
shifts versus applied field F at the cathode surface because F = PV,,,.
This shift and its linearity versus the applied voltage are explained by a
ELECTRON FIELD EMISSION FROM ATOM SOURCES 109
where x is the distance from the surface to a position within the cathode.
Thus the energy of the emitted electrons (x = 0) varies linearly with
vApp as
AE = exOpVApp (36)
by taking into account the relation between F and VApp.
Applying Eq. (36) to our experimental results of AEIVA,, = 1.65
meV/V and taking p as 5 to 10 X lo6 m-l for a protrusion of 2-3 nm height
[34], gives x, of 2-3 A for the single-atom protrusion. This value should
be compared to the screening length of a metal surface, which is less than
0.5 [49], and also with the estimation of field shift with single adsorbed
Ba, which is 1.3-1.7 A [27]. It is also roughly the dimension of an atom
and this strongly supports the idea that the observed peaks in the TED
spectra are related to localized levels at the topmost atom.
Calculations of the electronic structure over metal protrusions for differ-
ent materials, structures, and geometries (height) [50] have been recently
developed using the tight-bonding formalism. The main advantage of this
semiempirical method is that complex objects containing nonequivalent
atoms can be calculated. The calculations were done for single-atom end-
ing pyramidal protrusions for different metals (W, Fe, and Cr). Different
heights and crystallographic orientations were considered. Figure 34 is
an example of the results, showing the local denisty of states of the topmost
atom. The main points of interest related to this work are as follows:
1. The local density of states over the apex atom of the pyramidal
protrusion evolves toward a peak structure when the height, p,, of
the protrusion is increased layer by layer, starting with one adsorbed
atom on a surface. This electronic structure comes to a steady state
for po 2 4 layers.
2. The final steady-state electronic structure is characterized by a pre-
-
dominant peak localised 1 eV over the Fermi level. However, the
110 VU THIEN BINH ET AL.
2.5
2.0
9
9 1.5
*
P)
0
*
vl v3
Y
1.0
3
E: 1.0
0.5
0.0
-5 -3 -1 1 3 5 -5 -3 -1
E[eVI WeVI
a b
FIGURE34. (a) Local density of states of a W surface atom of a semiinfinite W (001)
crystal. (b) Local density of states of a W atom at the apex of a (001) pyramid of height 2
4 atomic planes above the (001) surface from ref. [50b]. The vertical line corresponds to
EF.(From ref. [50bl.)
calculations have been done for zero applied field and do not take
into account a possible field shifting. The experimental measurements
of many nanotip TEDs show that the extrapolated zero-field position
of the bands are found quite generally to lie in the 1 to 2 eV range
above E F , in agreement with the calculations.
3. This local density of states distribution is specific to a single-atom
ending protrusion. The conventional surface LDOS structure is re-
covered when the last atom is stripped off.
It is premature to compare too strictly the calculations with the experi-
mental results and to expect a fit between the two sets of values. However,
the theoretical results confirm most of the previously specific experimental
characteristics of the TED spectra from the single-atom nanotips.
All these results, experimental and theoretical, assert that the free-
electron behavior for field emission is not valid for the atomic-scale emit-
ting source of a nanotip. Consequently, the local density of states specific
to each nanoprotrusion must be considered in interpreting the experiments
with an atomic-scale probe as in scanning tunneling microscopy and scan-
ning tunneling spectroscopy experiments with atomic resolution, instead
of the commonly used free-electron model [51, 521.
10-l~ I I I
1 0 - l ~- -
z
h
*w
-
cw10-17 -
J
10-18 -
10-l~ I I 1
1.6 l o 3 1.8 2.0 2.2 1 0 ‘ ~ 2.4
1/v (Volt-‘)
a
I I I I
-
-
-
-
It is found, for example, that the field away from the apex decreases rapidly
[34], whereas the field is constant for a planar geometry. Consequently, the
analysis of the I-V characteristics for nanotips have to take into account
the protruding geometry in the calculation of the tunneling barrier. The
results [33a, 531, plotted as In(J/F2)versus 1/F, show a saturation of the
current but only in the very high-field region.
A second parameter is the presence of localized peaks for FE from
nanotips. The relation between the presence of the localised peak(s) in
the TED and the current saturation for the I-V characteristics is shown
in Fig. 35. They show clearly that the presence of the peaks and their
shifting (Fig. 35b) are concomitant with the current saturation (Fig. 35a).
The presence of localized bands that shift with the applied voltage dramati-
cally changes the supply function, which could be the predominant factor
for the current saturation.
Conventional Fowler-Nordheim analysis is then not valid, because con-
sidering the tip as planar and the electrons as a free-electron gas are not
valid assumptions for nanotips.
IV. APPLICATIONS
Ilb
FIGURE36. (continued) 11. Intensity of the wave packet reflected and transmitted by
the tunneling model in I for a tilt angle of 30". (a) In the presence of the tunnel barrier, the
two coherent waves emitted by the two atoms do not merge and the atomic resolution is
observed. (b) In the absence of the tunnel barrier, the two transmitted waves interfere and
no atomic resolution can be observed. (From ref. [33b].)
ELECTRON FIELD EMISSION FROM ATOM SOURCES 115
l5 r
- 0
-2 -1 0 1 2
Distance from Apex (nm)
b
FIGURE37. Variation of the tilt angle between the tip axis and the direction of the
maximum field over each of the atoms forming the trimer apex of a protrusion as a function
of the protrusion height. (a) 3D calculated field distribution with atomic resolution over an
equipotential surface for a trimer nanotip (po = 4 nm and base diameter = 4 nm). It shows
a local enhancement of the field just over each of the atoms forming the trimer apex. (b)
Plot of the /3 factor showing the local field enhancement over each of the three atoms of
the trimer apex for three different heights of the nanoprotrusion. The indicated angles are
the tilt angle over the apex atoms. Tilt angles > 20" are obtained for protrusions with a
height >4 nm. (From ref. [34].)
a b
FIGURE38. (a) FEM patterns showing three emitting spots from a nanoprotrusion. (b)
FEM pattern of the same nanotip showing the presence of an absorbed atom indicated by
the arrow. (From ref. [33al.)
-
d
t
d
FWHM=lOOmeV
-
0.6 Nanotip (80 K)
0
G
W
-
2
fz 0.4 -
-
"
I
0
0.2 -
-
0.aI
.1.0 -0.8 -0.6 -0.4 -0.2 0.0 0.2
Energy Relative to EF (eV)
b
FIGURE39. TEDs of microtips and nanotips for different temperatures: (a) W; (b) Pt.
118 VU THIEN BINH ET AL.
110 I I I I I
-
-
-
-
I I I I I
40
0 50 100 150 200 250 300
Temperature (K)
FIGURE40. Variation of FWHM of the TEDs from the Pt nanotip with temperature.
The experimental data falls on a straight line.
During the field electron emission process, energy exchanges take place
between the emitted electrons and the cathode surface. These exchange
processes, or so-called Nottingham effect [56], can cause a heating or
cooling at the emitter surface when the average energy of the replacement
electrons, which is near EF,is different from that of the emitted electrons.
The Nottingham effect is negligible for macroscopic tips with apex radii
greater than a few tens of nanometers and FE current < 1 pA [57]. This
is partly because both the replacement electrons and the emitted electrons
come from energy levels close to EF and thus the energy exchange per
emitted electron is limited. The localized peak distribution in the TED
and its shifting lead to questions about the local heating or cooling at the
nanotips. Experimental measurements show that there is considerable
heating induced by the FE process in the case of nanotips and, further-
ELECTRON FIELD EMISSION FROM ATOM SOURCES 119
more, they show that local temperatures of areas with atomic scale can
be measured [%I.
FIGURE41. Simplified potential diagram for a nanotip emission which depicts the addi-
tional energy-exchange paths during field emission in the presence of localized bands at the
apex of the nanotip.
120 VU THIEN BINH ET AL.
FIGURE 42. Effect of a flip-flop process on the TED from a nanotip presenting two
bands. The inset shows change in the total number of counts at one particular energy during
a flip-flop. (From ref. 1.581.)
ELECTRON FIELD EMISSION FROM ATOM SOURCES 121
I I I I
"
950 975 1000 1025 1050 1075
FIGURE43. Frequency of a flip-flop at a nanotip apex versus V,,,. (From ref [58].)
shown in the inset of Fig. 42. The effect of the emission current on the
flip-flop frequency is shown in Fig. 43. For an increase of the FE voltage
from 950 V to 1070 V, the flickering frequency increases from -0.1 Hz
to -11 Hz. This corresponds to an increase in the temperature in the
range of 30 K for a FE current increase from -3 x A to -9 x lo-'* A.
The second method is based on the following experimental observation:
The shape of the peaks in the TED from single-atom protrusion tips is
temperature-dependent . Figure 44a shows a broadening of the high-energy
edge of the TED of a nanotip for controlled increasing temperature by
using the heating loop at fixed FE voltage and current. As shown in Fig.
44b, for increasing applied voltage and F E current there is a broadening
of the high-energy side due to the emission-induced temperature increase,
in addition to the shift of the spectra characteristic of the nanotips. The
local temperature increases at the apex of the protrusion tip found by
fitting the spectra for different FE currents are shown in Fig. 45. The
temperature increase can reach a value of -210 K for -1 X A. For
higher FE currents the temperature increase is even larger. The protrusion
becomes unstable and it can be destroyed by a local melting for I >
-10-7 A.
1.o
G?
0
2 0.8
8 0.6
v
c
2 0.4
v,
1
0
u 0.2
0.0
-1.0 -0.8 -0.5 -0.3 0.0 0.3 0.5
Energy Relative to EF(eV)
a
b
FIGURE 44. (a) TEDs from a protrusion tip with one localized band: room temperature
and 590 K. The higher temperature is created by loop heating current. (b) Spectra from the
same nanotip for different applied voltages and different emission currents. The spectrum
at higher voltage shifts to lower energy [4]. It has been numerically shifted by A E to the
position of the lower voltage peak (small dots) to show the broadening of the high-energy
side of the spectrum that is related to the temperature increase. (From ref. [ 5 8 ] . )
this allows emission from localized levels well above EF of the support
tip. This phenomenon is explained by the partial filling of the bands by
the tail of the Fermi sea, which acts as a supply function [60]. In this
case, energy conservation in the FE process is obeyed.
Experimentally, the linear shifting is typically -0.5 eV for the range of
ELECTRON FIELD EMISSION FROM ATOM SOURCES 123
250 I I 1 1 I
-
-
I I I I I
Under such conditions, the peaks above EFcan provide significant cooling
of the tip due to Nottingham energy exchange effects, because the emission
comes exclusively from electrons above the Fermi level.
A side consequence of a band being positioned on the high-energy tail
that has been noticed is that the FE is strongly dependent on the tempera-
ture, in complete contrast to normal FE, which has a very weak tempera-
ture dependence [see Eq.(15)]. This is simply because the supply function
increases as the temperature is raised and the total current is then propor-
tional to exp(-AElkT) for AE S- kT.
Projection
microscope
4-- -4- -
MCP
where i and o are the image and object dimensions and D and d are the
distances of the projection point to the screen and to the object, respec-
tively. Equation (37) shows that the magnification increases by approach-
ing the object to the projection point and could reach values in the range
107-106for projection point-object distances between 10 nm and 100 nm,
with the screen located 10 cm away. With recent technological develop-
ments due to scanning tunneling microscopy (STM) [65], tip-sample dis-
tances of less than 1 nm can now be routinely handled by using piezodrives
for controlled nanometric displacements. This has given rise to renewed
interest in this projection microscope [61, 66, 671.
Among the nanotip characteristics, two are of particular interest for
the projection microscope: the atomic size of the emitting area and the
126 VU THIEN BINH ET AL.
FIGURE48. Schematic representation of the virtual radial projection point source Vfor
a nanotip relative to the surface apex and its geometric center C. Both C and V are much
closer to the apex than for the hemispherical tip (Fig. 6). (From ref. [62].)
ELECTRON FIELD EMISSION FROM ATOM SOURCES 127
where Tois the amplitude of the incidence wave, yo and z, are the trans-
verse coordinates in the object plane, k is the wave vector, rloand r,, are
128 V U THIEN BINH ET AL.
where w = zt, sin(a) is the illumination of the beam at the object, and a
is the half-beam opening.
T(y,, z,) describes the transmission function of the mask object. For
example, for an opaque object, T(y,, z,) is 0 inside the object and 1 outside
the object. If the object is three-dimensional, the x component is averaged
because it is the direction of propagation.
The intensity at each point on the screen is then
W,)= lWP,>l2 (40)
Within the experimental situation,
x:, (y2 + z’,). (41)
This implies that
2. Experimental Procedures
In the Fresnel projection microscope [61, 621, the electron point source
is a W( 111) single-atom nanotip spot-welded to a joule heating loop and
in contact with a liquid nitrogen reservoir. The sample and the object
holder are attached to a nanodisplacement system which is composed
of a commercial piezomotor for the x direction and home-made inertial
movement driven by a piezotube for the y - z displacements. The overall
displacements are in the range of centimeters in the x , y , z directions.
The resolution in the displacements is given by the minimum bending and
elongation of the piezotube, which are in the range of 0.1 nm. The projec-
tion image is formed -10 cm away from the tip on a multiple-channel
plate coupled to a fluorescent screen. These images are visualized and
analyzed through a numerical image acquisition system.
The entire microscope system is vibration-isolated with a simple pneu-
matic system, without any internal antivibration system as is normally
employed in STM microscopy. Shielding of the stray magnetic field is not
needed to obtain nanometric resolution [61, 621.
The absolute dimensions of the samples and the scales given in the
figures are measured directly by following the displacement of the projec-
tion image on the screen versus the motion of the object due to the
130 VU THIEN BINH ET AL.
FIGURE49. Fresnel diffraction patterns (VFE= 300 V) by nanometric carbon holes and
fibers. The illuminated area corresponds to the e beam coming from a W nanotip. (From
ref. [61].)
3 . Experimental Results
these images the underlying FEM patterns of the tips used to obtain
these fringes were composed of multiple spots over the whole screen,
which means an actual source that was not limited to one atom. The
diffractograms presented in ref. [66] must be interpreted as Fraunhofer
diffraction. The same conclusion was reached when some diffraction
patterns presented in refs. [66,72] were reinterpreted in ref. [74]. This
confirms that conventional FE tips with extended electron source area
have to be considered as plane wave sources.
b C
F ~ G U R53.
E Detailed observations of some characteristic features of the polymers. Im-
aging voltages are between 260 and 275 V. (a) Self-organization into polyhedral supramolecu-
lar structures. The polyhedric shape of the holes reflects the presence of nanometric struc-
tures of the polymer fibers constituting the network. These structures are also echoed
in the rich diffractograms inside the polymer holes, as shown by a comparison with the
diffractograms of carbon network in Fig. 49. (b) Periodic supramolecular structure of a
polymer fiber. The diffractogram suggests the presence of a twist shape. (c) A polymer clew
with its surrounding diffraction pattern. (From ref. [62].)
136 VU THIEN BINH ET AL.
b
FIGURE54. (a). FPM images of an RNA free-standing fiber at two different magnifica-
tions, showing the presence of a periodic variation of the fringe pattern (the high-magnification
part is framed inside the low-magnification image). (b). Comparisons with the Fresnel diffrac-
togram: The upper image is the FPM image; the middle diffractogram are simulated diffraction
from a 2D mask presented in the lower part, which mimics the shadow of the A-RNA
conformation (diameter of 2.3 nm and period of 3 nm). The numerical simulations use a
wavelength value of 0.7 8, and a projection virtual source-sample distance of 500 A. (From
ref. [75].)
b
FIGURE 55. High-magnifications FPM images given the characteristic details of RNA
networks. They are indicated by the numbered arrows. (1) 2-nm fiber network and connec-
tions without extra material at the crossing point. Figure 56 compares such connections to
a simulated Fresnel diffractogram. (2) High-density connection zone. (3) Fibers less than
2 nm in diameter with a connection without extra material. (4) A loop inside a network.
This has to be compared with a loop along a fiber shown in Fig. 60. (From ref. [75].)
a b
FIGURE57. Four-branch connection point with extra material showing a diffraction
image very different from Fig. 56. (a) Calculated Fresnel diffractogram (A = 0.7 A, point
source-object distance = 500 A); the mask of the object, not at the same scale, is shown
as an insert. (b) FPM image of a connection with extra material showing fringes inside the
connection zone. (From ref. [75].)
A B
FIGURE58. (A) Low-magnification FPM image of an RNA network; the arrow indicates
the presence of a supercoiled fiber. (B) High-magnification FPM images of the supercoiled
fiber of the framed zone. (a) The initial structure; the arrow indicates a small-diameter fiber
extending from the supercoiled conformation. (b) The same fiber modified after e-beam
irradiation, showing a decrease in its diameter. (From ref. [751.)
FIGURE 59. (A) Low-magnification FPM image showing a cut RNA fiber with a crooked
free end. (B) The FPM image of the free-end frame zone (a), and comparison with the
calculated Fresnel diffractogram of a crooked-end fiber shown in the insert. (C) From (a)
to (c), FPM image evolution of the free-end conformation under increasing e-beam irradiation
doses. (From ref. [75].)
ELECTRON FIELD EMISSION FROM ATOM SOURCES 141
C
142 VU THIEN BINH ET AL.
B
FIGURE60. Loop structure along an RNA fiber. (A) Low-magnification FPM image.
(B) Detail of the loop which is framed (a), and comparison with the Fresnel diffractogram
(b) (A = 0.7 A, point source-object distance = 500 A); the insert represents the loop mask,
not at the same scale, that was used for the simulation. (From ref. [75].)
Magnetic Stray Field. The sharp diffraction figures obtained are exper-
imental proofs that the projection microscope using a nanotip as coherent
nanosource does not need magnetic protection in order to perform Fresnel
diffraction. This is confirmed by the following estimation of the image
blurring due to the stray magnetic field. The measured permanent magnetic
ELECTRON FIELD EMISSION FROM ATOM SOURCES 143
field is about 0.5 gauss (-0.5 X tesla) with AC stray field B(o)in
the range of 1 to 5 milligauss -5 x tesla) near the microscope
chamber. Under these experimental conditions, simple calculations [80]
of the deviations of the image at the screen by the Lorentz force effects
and/or the change of the phase due to the vector potential due to the stray
fields gives
A(i) = 2 x lo2 x B (45)
with A(i) in meters and B in tesla. For the measured range of the stray
field B ( o ) , the deviations are from 20 to 100 pm. They are substantially
smaller than the fringe widths at the screen, which were in the millimeter
range. Thus the blurring will not prevent the observation of the interfer-
ence fringes, as is fully supported by the experimental results.
Irradiation Effects. Irradiation effects are consequences of collisions
between the incoming electrons and the atoms of the specimen. Different
main processes can be envisaged:
Elastic scattering, the atom remains in its ground state, and the elec-
tron conserves its energy but changes direction
Inelastic scattering that excites the atom
Inelastic scattering that ionizes the atom
Capture of the incident electron by the atom, followed by a multielec-
tron excitation as in the Auger process, for example
The primary damage process is inelastic scattering, which causes either
molecular excitation or ionization. The energy dissipated is either con-
verted to molecular vibrations with temperature increases or causes bond
scissions as the loss and diffusion of hydrogen and the production of
radicals. The damage depends on the energy dissipated in the specimen
per unit volume (J ~ m - or~ electron
) dose ( q = f7 = e n , in C cm-2), which
is proportional to the number of incident electrons per unit area. However,
the knowledge of the individual damage processes is very poor because
the range of primary and secondary processes is very broad and complex.
For practical electron microscopy, damage processes and in particular
the loss of mass can be observed by following the evolution of the images
or, in our case, the diffraction patterns under the irradiation.
From the values of the currents and the dimensions of the objects,
during the observations of the polymers (PS-PVP) the electron exposures
were in the range of 1016-10*7electrons cm-2 s-’. For these polymers, no
damage or charging effects were noticed during 15 min- to 1-h-duration
observations, i.e., for an electron dose in the range of lot9to 3.6 X 10”
electrons cm-*.
144 VU THIEN BINH ET AL.
e f
FEM observations of Fe nanotip
process
FIGURE 61. Evolution of the field emission pattern from an Fe nanotip as a function
of temperature. (a)-(e) Cooling sequence from (a) - 1100 K to (e) liquid nitrogen temperature.
(f)-(g) Consecutive heating sequence from (f) liquid nitrogen to (j) 1100 K. The splitting
and merging are reversible and are illustrated schematically on the right-hand side. (From
ref. [83].)
the two beams could be very similar (i.e., Fig. 61e). The same asym-
metry in the intensity occurs during the splitting and the merging.
4. As long as the protrusion has a certain height and the structure
underneath is not destroyed, the process is reversible with tempera-
ture without measurable change in the localization of the spot.
ELECTRON FIELD EMISSION FROM ATOM SOURCES 147
b
FIGURE63. Sequence showing the progressive moving toward each other of two sextu-
plet Fe AMIE spots (-10.5 kV, -800 K). The sextuplet pattern of each spot is conserved
during the displacement and the partial overlapping. The duration of this sequence is a few
minutes. (From ref. [83].) (a) Fe-AMIE: experimental observations of the overlapping of
2 sextuplet spots. (b) Schematic representation of the above overlapping process.
V. CONCLUSIONS
The size reduction to one atom of the field emission area, which is the
main characteristic of the nanotips, is obtained by taking advantage of
the protrusion effect to enhance locally the field over the topmost atom
of the nanoprotrusion. The field emission beam, which comes exclusively
from this atom, manifests specific properties that are attached to the
atomic size of these nanosources. Applications of the intrinsic physical
properties of the nanotip lead to the possibilities of having atomic resolu-
tion under FEM, or to measure the energy exchange down to atom size
area. The nanotip is a coherent, monochromatic e-beam source. The use
of the nanotip as a point source in a projection microscope transforms
it into a versatile, low-energy, high-resolution electron microscope: the
Fresnel projection microscope.
Most of the main physical properties of the nanotips are explained by
taking into consideration the physical mechanism of electron tunneling
through an atom with a field-deformed triangular barrier. However, some
properties observed experimentally are still under consideration such as,
for example, the splitting of the e beams and the AMIE with ferromag-
netic nanotips.
150 VU THIEN BINH ET AL.
ACKNOWLEDGMENTS
REFERENCES