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HW1 SemiDevices
HW1 SemiDevices
HW1 SemiDevices
7-Calculate the junction depth and the total amount of dopant introduced after boron
predeposition performed at 950°C for 30 minutes in a neutral ambient. Assume the
substrate is n-type silicon with N D = 1.8 ×10 16 cm −3 and the boron surface
−3
concentration is N 0 = 1.8 ×10 cm .
20
15 atoms
10-If arsenic is diffused into a thick slice of silicon doped with 10 boron at a
cm 3
temperature of 1100°C for 3 hours, what is the final distribution of arsenic if the
15 atoms
surface concentration is held fixed at 4 ×10 ? What are the diffusion length
cm 3
and junction depth?