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TECHNICAL SEMINAR

Dept. of Electronics and Communication Engineering

ABHIJIT.M
1BY13EC004
Under the guidance of
Dr. Seema Singh
 The need for self healing transistors
 Devices for a starchip
 Evolution of MOS devices
 Healing process
 Self healing applied to memory cells
 Further research
 References

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 Breakthrough Starshot, is a program to develop a
proof-of-concept light sail spacecraft fleet
capable of making the journey to Alpha
Centauri at 20% the speed of light.

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•The spacecraft fleet would have 1000 craft, and each
craft, named StarChip, would be a very small
centimetre-sized craft weighing several grams.

•They would be propelled by several ground-


based lasers of up to 100 gigawatts.

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 Twenty years in space is still too long for an
ordinary silicon chip, because on its journey it
will be bombarded by more high-energy
radiation than chips encounter on Earth.

 Radiation leads to the accumulation of


positively charged defects in the chip’s silicon
dioxide layer, where they degrade device
performance.

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 Two options for addressing chip damage are
to select a path through space that minimizes
radiation exposure and to add shielding.

 A far better approach, is to let the devices


suffer damage but to design them so that
they can heal themselves with heat.

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 Among various device structures, the sillicon
nanowire gate all around FET (SiNW GAA FET)
has been considered as a promising
candidate for a starchip due to its inherent
radiation hardness.

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The evolution from
basic planar FETs to
SiNW GAA FET

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 A basic MOSFET

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 In a planar FET, as the channel length
reduces, the control of the gate over the
channel region also reduces. This affects
transistor performance.

 In a FinFET, the gate wraps around a thin


slice of (preferably undoped) silicon, also
known as a “fin”, and current flows along
the top and side surfaces of the fin.

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 This wrap-around nature of the gate
enhances the gate control over the channel,
thus reducing the short channel effects and
leakage currents.

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 In these nanodevices, current flows through
the nanowire or is pinched off under the control of
the voltage on the gate electrode, which surrounds
the nanowire. Hence, nanowire FETs’ other name:
“gate-all-around” transistors.

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 Gate-all-around transistors have been
constructed from dense stacks of 8-
nanometerwide nanowires on a conventional
silicon surface.

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Joule heating (also referred to as resistive or
ohmic heating) describes the process where the
energy of an electric current is converted into heat
as it flows through a resistance.

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 When Si is thermally
oxidized, the interface
between Si and oxide is
deficient of oxygen giving
rise to “dangling bonds”.

 These dangling bonds act


as interface traps.

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 Interface traps are also generated when MOS
samples are exposed to ionizing radiation.

 These interface traps trap electrons in the gate


dielectric, leading to tunneling of electrons
through gate oxide.

 Interface traps lead to low quality oxides and


degradation in the device performance.

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 The damaged oxide changes the I-V
characteristics of the device, reducing current in
nMOS transistors and increasing current in pMOS
transistors.

 To remove these interface traps, oxide layer


annealing is done.

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 Annealing is heating the wafer at high
temperature for a specific time to repair
lattice damage.

 When the oxide is exposed to high


temperatures, the bonds broken by ionizing
radiation are formed again. Thus, the
damages caused by ionizing radiation are
fixed.

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Self healing
The self healing process can be
understood as the thermal annealing of
oxide layer by the gate as a nano heater.

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 To demonstrate self
healing, the fabricated
devices consisted of
dual gate contacts. One
for normal operation
and other to generate
joule heat during
annealing.

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 The temperature of the gate can surpass
900°C within 10ns, which is sufficient to
remove the interface traps and trapped
charges in the gate dielectric.

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Electrically programmable memories
These devices work by storing charge on a floating
gate. Programming and erasing is done by electron
conduction through thin SiO2 .

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 Flash memory uses Fowler-Nordheim(FN)
tunneling for a program and erase
operations.

 The tunnel oxide is inevitably susceptible


against FN mechanism.

 However, the device mechanism can be


maintained by application of the self healing
process.

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 Today, efforts at NASA and KAIST are focusing
on the elimination of the second gate contact
for heating.

 Those at KAIST are investigating the capability


of a different design, called a junctionless
nanowire transistor, which heats the channel
during normal operation.

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 “Sustainable Electronics for Nano-Spacecraft in Deep Space Missions”
D.-I. Moon1, J.-Y. Park2, J.-W. Han1, G.-J. Jeon2, J.-Y. Kim2, J.-B. Moon2, M.-L.
Seol1,C. K. Kim2, H. C. Lee2, M. Meyyappan1, and Y.-K. Choi2.

 “Self-Healing Transistors for Chip-Scale Starships” IEEE spectrum.

 J. C. King and C. Hu, IEEE Electron Device Lett., vol. 15, p. 475, 1994

 “Ionizing Radiation Effects in MOS Devices and Circuits” by T. P. Ma, Paul V.


Dressendorfer.

 “Lecture - 14 Oxidation IV – Oxide Charges and Oxidation Systems” Dr. Nandita


Dasgupta Department of Electrical Engineering Indian Institute of Technology,
Madras.

 “Modeling and Simulation of Negative Bias Temperature Instability” Robert


Entner.

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