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Selfhealingtransistorsabhijit 170424193021
Selfhealingtransistorsabhijit 170424193021
ABHIJIT.M
1BY13EC004
Under the guidance of
Dr. Seema Singh
The need for self healing transistors
Devices for a starchip
Evolution of MOS devices
Healing process
Self healing applied to memory cells
Further research
References
2
Breakthrough Starshot, is a program to develop a
proof-of-concept light sail spacecraft fleet
capable of making the journey to Alpha
Centauri at 20% the speed of light.
3
•The spacecraft fleet would have 1000 craft, and each
craft, named StarChip, would be a very small
centimetre-sized craft weighing several grams.
4
Twenty years in space is still too long for an
ordinary silicon chip, because on its journey it
will be bombarded by more high-energy
radiation than chips encounter on Earth.
5
Two options for addressing chip damage are
to select a path through space that minimizes
radiation exposure and to add shielding.
6
Among various device structures, the sillicon
nanowire gate all around FET (SiNW GAA FET)
has been considered as a promising
candidate for a starchip due to its inherent
radiation hardness.
7
The evolution from
basic planar FETs to
SiNW GAA FET
8
A basic MOSFET
9
In a planar FET, as the channel length
reduces, the control of the gate over the
channel region also reduces. This affects
transistor performance.
10
This wrap-around nature of the gate
enhances the gate control over the channel,
thus reducing the short channel effects and
leakage currents.
11
In these nanodevices, current flows through
the nanowire or is pinched off under the control of
the voltage on the gate electrode, which surrounds
the nanowire. Hence, nanowire FETs’ other name:
“gate-all-around” transistors.
12
Gate-all-around transistors have been
constructed from dense stacks of 8-
nanometerwide nanowires on a conventional
silicon surface.
13
14
Joule heating (also referred to as resistive or
ohmic heating) describes the process where the
energy of an electric current is converted into heat
as it flows through a resistance.
15
When Si is thermally
oxidized, the interface
between Si and oxide is
deficient of oxygen giving
rise to “dangling bonds”.
16
Interface traps are also generated when MOS
samples are exposed to ionizing radiation.
17
The damaged oxide changes the I-V
characteristics of the device, reducing current in
nMOS transistors and increasing current in pMOS
transistors.
18
Annealing is heating the wafer at high
temperature for a specific time to repair
lattice damage.
19
Self healing
The self healing process can be
understood as the thermal annealing of
oxide layer by the gate as a nano heater.
20
To demonstrate self
healing, the fabricated
devices consisted of
dual gate contacts. One
for normal operation
and other to generate
joule heat during
annealing.
21
The temperature of the gate can surpass
900°C within 10ns, which is sufficient to
remove the interface traps and trapped
charges in the gate dielectric.
22
Electrically programmable memories
These devices work by storing charge on a floating
gate. Programming and erasing is done by electron
conduction through thin SiO2 .
23
Flash memory uses Fowler-Nordheim(FN)
tunneling for a program and erase
operations.
24
Today, efforts at NASA and KAIST are focusing
on the elimination of the second gate contact
for heating.
25
“Sustainable Electronics for Nano-Spacecraft in Deep Space Missions”
D.-I. Moon1, J.-Y. Park2, J.-W. Han1, G.-J. Jeon2, J.-Y. Kim2, J.-B. Moon2, M.-L.
Seol1,C. K. Kim2, H. C. Lee2, M. Meyyappan1, and Y.-K. Choi2.
J. C. King and C. Hu, IEEE Electron Device Lett., vol. 15, p. 475, 1994
26