Professional Documents
Culture Documents
Mathematical Modeling and Numerical Analysis of The Programming Field in PEO10LiCF3SO3-Polypyrrole Neural Switch
Mathematical Modeling and Numerical Analysis of The Programming Field in PEO10LiCF3SO3-Polypyrrole Neural Switch
Mathematical Modeling and Numerical Analysis of The Programming Field in PEO10LiCF3SO3-Polypyrrole Neural Switch
Iskandarani
Abstract: - The design and numerical modeling using Finite Element Analysis (FEA) of electric field strength
in a programmable neural switch is carried out. The obtained model provided good approximation to the
derived complex analytical solution, which is carried out by means of complex mathematical analysis
employing SCHWARZ-CHRISTOFFEL transform. Effect of electrode separation and field spread in both x
and y directions are studied and explained. Boundary effects on field strength representation is discussed and
numerically reduced through increasing the number of nodes for each element in the finite grid. Edge effect on
field strength is also eliminated using semi-infinite coplanar electrode approximation. Such a switch will
function as a synaptic processor behaving in an adaptive manner and suitable to be used as a compact
programmable device with other artificial neural network hardware.
Key-Words: - Neural, Numerical, Finite Element, Mathematical, Memory, Information Processing, Polymers
M1
Substitution of these points in the SCHWARZ-
CHRISTOFFEL differential equation given by:
-L1 -N1 N1 L1
dz θ θ θ
= C1 (t- t1) ( 1 )-1 (t- t 2) ( 2 )-1...(t- t n ) ( n )-1 (1)
dt π π π U (Re)
(a) At w = ∞ + jVo, t = -∞
Z-Plane Y (Im)
(b) At w = ∞, t = ∞
(c) At w = -∞, t = 0, φ = 0
I K N L
X (Re)
These boundary conditions describe a polygon with
a single vertex. Now applying the following
2d
M
equation:
J
-Π dw φ φ φ
= C2 (t- t a ) ( 1 )-1 (t- t b) ( 2 )-1 ...(t- t n ) ( n )-1 (5)
dt π π π
Fig2: Coplanar Electrodes Cross Section
Gives:
Z-Plane Y (Im)
dw
= C2 t -1 (6)
dt
-L -N N L
X (Re)
Integration of equation (6) gives:
2d M
-M
w = F2 (t) = ∫ dw = C2 ∫ t -1 dt = C2 ln(t) + K 2 (7)
Fig 3: Z-Plane Geometrical Mapping
Vo β = [N] β e or β = ∑ Ni β i (15)
w= ln(t) (9) i =1
π
Where Ni is the interpolation or shape function given
Expression (9) is only defined for t>0 and it has a by:
zero at t = 1 and satisfies the boundary condition (c)
at t = 0. 1 1
N1 = (1 - u) (1 - v), N 2 = (1 + u) (1 - v) (16)
To obtain the complete conformal transformation, 4 4
the variable t needs to be eliminated as follows: 1 1
N3 = (1 + u) (1 + v), N 4 = (1 - u) (1 + v) (17)
4 4
⎛π w ⎞
t = exp ⎜⎜ ⎟⎟ (10) Where u = + 1, v = + 1
⎝ Vo ⎠
For an isoparametric element:
Substituting (10) into (4) gives:
β,x
{ } = [B] {β e} (18)
⎡ exp(π w/ V o) + exp(-π w/ V o ) ⎤ ⎛π w ⎞ (11) β, y
z = d⎢ ⎥ = dcosh ⎜⎜ ⎟⎟
⎣ 2 ⎦ ⎝ Vo ⎠
Where [B] is given by:
Hence, the complete transformation is:
⎡ N1 , x, N 2 , x N3 , x N 4 , x ⎤
⎢ ,y ,y ,y ,y⎥ (19)
Vo ⎛z⎞ ⎣ N1 N 2 N3 N 4 ⎦
cosh ⎜ ⎟
-1
w= (12)
π ⎝d⎠
The field strength expression is given as the gradient (19) is the displacement matrix where, x and y are
of the potential, so: given by:
4 4
dw d ⎛ Vo -1 ⎛ z ⎞ ⎞
|E|= E = = ⎜⎜ cosh ⎜ ⎟ ⎟⎟ x = ∑ N i X i , y = ∑ N i Yi (20)
dz dz ⎝ π ⎝ d ⎠⎠ i =1 i =1
(13)
The element characteristic matrix [K], with material
v property q and element thickness t is given by:
=
π (z 2 - d 2 )1/ 2
Where, 1 ⎡J 22 - J12 ⎤
[Γ] = [J ]-1 = (32)
∝ ⎢⎣ - J 21 J11 ⎥⎦
⎡ N1 u, N 2 , u N3 , u N4 , u ⎤
[D N ] = ⎢ ⎥ (23)
⎣ N1 , v N 2 , v N3 , v N 4 , v⎦ Where; ∝ = det [J] = (J11 J22 - J21 J12)
⎢∑ Ni , Vx i ∑ Ni , Vyi ⎥
⎣ i =1 i =1 ⎦
600
7 Discussion and Conclusion
(1) Ag Ag+ + e-
Fig 7: Negative Bias Showing Hysterisis
(2) pp+ + e- pp°
(3) Ag+ + CF3SO3- AgCF3SO3 Positive Closed Loop Programming
+ -
(4) Li + e Li 600
400
300
2. Positive Cycle 200
100
(a) Ag → Ag+ + e-
0
(b) CF3SO3-(α) → CF3SO3-(β) 0 10 20 30 40 50 60 70
(d) Ag+ + CF3SO3-(β) → AgCF3SO3 Gate Biasing Voltage (mV)
600
500 10) is evident. This is also consistent with field
400 theory and the increment of distance away from the
300 field lines linking the device structure.
200 Further analysis lead to the following conclusions
100 regarding the modeled field strength:
0
-80 -60 -40 -20 0 20 40 60 80
Gate Biasing Voltage (mV)
(1) As the separation between the electrodes
increases, the field value decreases as
Fig 6: Gate Bidirectional bias shown in figure 11.
(mV/um)
0.4 d=5 um
12. 0.3 d=7.5um
0.2
0.1
(3) Increasing the nodes per modeling element 0
in the finite mesh resulted in more uniform 0 5 10 15
field strength and better representation of Travelled Distance along Y-axis (um)
the derived analytical solution, as field Fig. 12: Effect of Electrode Separation on the
approximation and numerical simulation is Programming Field of Neural Switch
affected by the total number of nodes used
in constructing the grid needed for analysis.
Figure 13 illustrates the reduction in Numerical Simulation
simulation error as a function of used nodes.
0.5
Numerically Simulated Electric Field Strength (En) for
d=5um
0.4
Average Error
0.7
0.3
Electric Field Strength
0.6
En(Y=2.5)
0.5 En(Y=4.5) 0.2
(mV/um)
0.4 En(Y=6.5)
En(Y=8.5) 0.1
0.3
En(Y=10.5)
0.2 En(Y=12.5) 0
0.1 En(Y=14.5)
0 20 40 60 80 100 120
0
Percentage nodes used in the simulation
0 5 10 15 20
0.5
0.4 implementations and studies in the fields of
(mV/um)
En(Y=2.5)
0.3 En(Y=4.5) memories, neural networks, intelligent computers
0.2
En(Y=6.5)
En(Y=8.5)
and medical applications to name a few. The device
0.1 En(Y=10.5)
En(Y=12.5)
uses organic materials and depends on ionic-
0 En(Y=14.5) electronic interaction, which might not be the fastest
0 10 20
in comparison to other types of materials and ways
Travelled Distance in um ( X-axis)
of carrier transport. In addition, hysteresis, which is
Fig. 10: Field Characteristics for Neural Switch though to occur due to charge storage, contributed to
the observed level shifting and slowness in response.
Numerically Simulated Electric Field Strength However, as it is usually the case in determining
(En) for X=0 um range of values to which a corresponding logical
0.7
action is considered, we can safely ignore hysteresis
Electric Field Strength
0.4 d=5 um
0.3 d=7.5um application. The RNS design and implementation
0.2
0.1
provides a good insight into the process of
0 combining high charge storage materials to provide
0 5 10 15 intelligent switching elements. Such a switch may
Travelled Distance along Y-axis (um)
be used to control and modulate the communication
Fig. 11: Effect of Electrode Separation on the between different artificial neurons.
Programming Field of Neural Switch