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Gas Sensing Mechanismo of Metal Oxides The Role of Ambient Atmosphere, Type of Semicondutor and Gases PDF
Gas Sensing Mechanismo of Metal Oxides The Role of Ambient Atmosphere, Type of Semicondutor and Gases PDF
Gas Sensing Mechanismo of Metal Oxides The Role of Ambient Atmosphere, Type of Semicondutor and Gases PDF
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Gas sensing mechanism of metal oxides: The role of ambient atmosphere, type of
semiconductor and gases - A review
School of Electrical & Electronics Engineering (SEEE) & Centre for Nanotechnology & Advanced Biomaterials (CeNTAB)
SASTRA University, Thanjavur – 613 401, India
*
Author for correspondence: John Bosco Balaguru Rayappan, email: rjbosco@ece.sastra.edu
Received 01 Aug 2014; Accepted 08 Oct 2014; Available Online 08 Oct 2014
Abstract
Metal oxide thin films have emerged as a promising choice in the gas sensor industry. Several key parameters such as physical and
chemical characteristics of the metal oxides, synthesis techniques used, nature of gases, type of atmosphere and the operating temperature
collectively influence the sensor properties. The chemiresistive property change in the conductivity associated with adsorption and
desorption of gas molecules on the metal oxide surface, is the principle of sensing mechanism. However, owing to the multitude of factors
involved, understanding the interaction mechanism behind the sensing property remains a challenge. In this review, the chemical kinetics of
reduction-oxidation (REDOX) reactions occurring at the metal oxide surface during its interaction with various gases in dry and wet
atmospheres have been analysed. Along with, the sensing characteristics of the metal oxide materials toward the detection of toxic gases, the
various determining factors of sensing behaviour of metal oxides and the role of gas molecules have been discussed. For this study, the most
toxic, combustible and hazardous gases such as CO, CO2, NO2, SO2, NH3, H2S and C2H5OH have been considered as target gases while,
ZnO, SnO2, In2O3, WO3 and CuO, NiO represent n-type and p-type semiconductors respectively to study the influence of base materials.
Keywords: Metal oxide gas sensor; REDOX reactions; Temperature; Nanostructures; Thin films
Table 1. Mechanism of sensitization by metal or metal oxide additive (Reprinted with permission from Ref. [20] Yamazoe, Sens. Actuat. B
5 (1991) 7. © Elsevier Publishing).
Role of noble metal Activation and spill-over of sample gas Electron donor or acceptor
Origin of gas-sensitive Change of oxidation state of noble
Change of adsorbed oxygen concentration
properties metal
Example Pt-SnO2 Ag2O-SnO2, PdO-SnO2
depends upon the type of majority carriers in the sensitization or response enhancement by additives are found
semiconducting film and the nature of gas molecules (whether to be different in different metal oxide materials. Yamazoe
oxidizing or reducing) in an ambient atmosphere. For n-type [20] have proposed two types of sensitization mechanisms;
materials, oxidizing gases (acceptor) increase the resistance of chemical and electronic as shown in Table 1. In chemical
thin film while, reducing gases (donor) decrease and are sensitization, the promoters residing on the metal oxide surface
correspondingly converse for p-type materials [31]. The facilitates the chemical reactions between target gas and metal
mechanism of receptor function (REDOX) together with the oxide surface through the spill- over phenomenon, for example
transduction function describes the chemiresistive behaviour of Pt, Pd–SnO2 [20]. On the other hand, in electronic
the metal oxide gas sensors. The metal oxide sensors can be in sensitization, the electrical property of the metal oxide is
the form of sintered pellets or thick and thin films. In specific, changed through the change in redox state of the promoter, by
the geometry of the crystallites of the grown crystals and their acceptor or donor charges from gas molecules, for example
interconnectivity between crystallites play a most responsible Ag- SnO2 [20].
role in determining the receptor and transduction functions. “Promoters are additives to metal oxides, which help
This is one of the main reasons behind the influence of in improving their sensing characteristics by lowering the
nanotechnology in this field, which manipulates matter on an energy required for chemisorption of gas molecules on the
atomic and molecular scale. Thus nano dimension plays a semiconductor surface” [35]. “Adding a suitable dopant can
major role in the development of gas sensors [32]. stabilize a particular valence state and increase the electron
The chemiresistance property of the metal oxides can exchange rate or stabilize the metal oxide against reduction”
be related to the width of the space charge region formed on [35, 36]. The choice of the synthesis method and the
the crystallites due to the transfer of electrons during the composition of mixture of precursors used in the synthesis
adsorption and desorption of gas molecules. The width of the strongly affect the surface of metal oxide and hence its sensing
space charge region acts as a potential barrier in the characteristics [36].
conduction process between the grains and induces changes in
the Fermi level. The process of creation and annihilation of 1.3. Thin film based sensors
electrons form the conduction band results in band bending In the recent past, synthesis of nanostructured metal
and Fermi level modulation. When oxidizing gas interacted oxide thin films with and without the doping elements has
with n-type material the band bends upward due to the been reported to obtain smaller grain size [37]. Thin films with
depletion of electrons and while, the band bends downward smaller grain size are favorable as the increased surface to
due to the accumulation of electrons for reducing gas. Hence, volume ratio, carrier concentration and enhanced catalytic
one can infer the direct relation between space charge region activity, facilitate its interaction with larger number of gas
and band bending which depends on the carrier concentrations molecules.
in the grain that, in turn, depends upon the size and shape of The thin film formation process involves several steps
the grain. such as thermal accommodation, adsorption of metal atoms on
the substrate and nucleation followed by crystallization or the
1.2. Influencing factors formation of microstructure. Thus, the thin films synthesized
In 1972, Seiyama et al. [33] reported that additives from the techniques like paste/slurry, chemical and physical
can promote gas sensitivity and rate of response under certain vapour deposition techniques, etc. [37–40], result in different
conditions by modifying its surface. In 1991, Yamazoe et al. electrical, optical and magnetic properties. In each case,
[20] have found an inverse correlation between the response growth process (assembly of molecular building blocks) is
and its grain size. The grain size in the metal oxide thin films different leading to variance in nucleation, growth direction,
can be controlled by modifying the synthesis parameters [34] crystallographic orientation (atomic stacking energy), packing
and adding suitable dopants with appropriate host materials density, interfacial energy and diameter of the crystallites. To
[20]. Reducing crystallite size might have influenced on the date, thin film technology has been either empirical or semi-
width of space charge region which, aids the chemisorption of empirical. Although basic research in understanding and
gas molecules and sensing process. The mechanism of relating several growth parameters has been reported [41,42],
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it would take decades of research to have a complete Rapid industrial growth and increase in automobiles
understanding and precise control of the thin film growth. have led to drastic intensification in the concentration of toxic,
Besides the nature and properties of the thin film, the hazardous and greenhouse gases in the atmosphere. These
environmental conditions such as operating temperature and gases can be extremely dangerous and life threatening when
humidity determine the sensing performance and the concentration levels exceed the threshold [22]. In the
characteristics of the thin film gas sensors. The operating context of receptor mechanism of metal oxide based gas
temperature influences the receptor function through its effect sensors, these gases can be classified as oxidizing (eg. CO2,
on the chemical dynamics at gas-solid interface and thus NO2) and reducing (eg. CO, SO2, NH3, H2S, C2H5OH) gases.
determines the important sensing properties such as response, The interaction of each of these gases with metal oxides will
selectivity, stability, response and recovery times [36]. In be discussed separately in the following sections.
addition, humidity level in the atmosphere has a larger
influence on the sensor response [21], as the water vapour 2.1. Wet atmosphere
absorbed on the metal oxide surface affects the electronic and Humidity poses a great challenge in the metal oxide
ionic conducting properties of the semiconducting metal based gas sensors. In many cases, increase of humidity in the
oxides. The review articles published so far have focused on atmosphere greatly impedes the response of sensor [21,71].
specific aspects such as general gas sensing principles The water undergoes dissociative adsorption on metal oxide
[20,35,43–51], response and conduction mechanisms [52–57], surfaces as given in Eq. 1 and the resultant ions will be
influence of structural parameters [58], nanostructures adsorbed on the metal oxide surface [72].
[28,29,34,39,59–65], environmental gases [22,31,66,67], and
the theory behind the gas sensing principle [44,68–70]. (1)
Although, numerous research articles have been published on
thin film based gas sensors, greater attention is required on the In wet atmosphere, ratio of water molecules to active
sensing behaviour of metal oxide materials especially of thin sites (metal in metal oxide) decides the adsorption mechanism.
film form, the relation between sensing characteristics and the Chemisorption mechanism is followed at low humidity level
most influencing parameters namely the operating while physisorption is observed at higher levels of humidity.
temperature, type and concentration of gas molecules. Hence, Heiland and Kohl [73] proposed two possible
in this review, we address the REDOX mechanisms associated mechanisms for explaining the effect of humidity on metal
with the interactions of metal oxide thin films of both n- and p- oxide surfaces, which were subsequently verified
type conductivities for the selected oxidizing and reducing gas experimentally [21,74,75] using the tin oxide material. As
molecules of different concentrations in dry and wet shown in Figure 2 and Eqs. 2 and 3, the mechanisms were
atmospheric conditions. For this review, the most toxic, simply based on the number of water molecules interacting
combustible and hazardous gases such as CO, CO2, NO2, SO2, with each lattice site on the metal oxide surface.
NH3, H2S and C2H5OH have been considered. And the
considered base materials are zinc oxide (ZnO), tin oxide ( )
(SnO2), indium oxide (In2O3), tungsten trioxide (WO3) and (2)
copper oxide (CuO), nickel oxide (NiO) as examples of n-type ( )
and p-type semiconductors respectively. (3)
2. Role of ambient atmosphere Figure 2(a) and Eq. 2 corresponds to a case of a water
molecule interacting with two metal oxides, where two Sn-OH
Receptor function, first phase of sensing dipoles are formed from the dissociated hydroxyl ion and by
phenomenon, is a chemical process between target gas in the combination of hydrogen ion and a lattice oxygen. Two free
atmosphere and metal oxide surface. The atmosphere is electrons are produced from each oxygen vacancy ( ) in the
composed of many gases; some of which aid, impede, or have lattice during the formation of Sn-OH bond. On the other hand,
negligible effect on the receptor function. The lower layer of if each water molecule interacts with only a single metal oxide
atmosphere is mainly composed of nitrogen, oxygen and water as shown in Figure 2(b) and Eq. 3, while, the dissociated
besides traces of other gases. The ambient of a metal oxide hydroxyl ions are bonded with each metal site, the hydrogen
surface while sensing is normally classified as dry and wet, ion diffuses into the lattice to bind with lattice oxygen, thus
based upon the humidity level. As will be discussed, in wet forming two hydroxyl bonds per metal site. The rooted OH
atmosphere, water molecules have a major role and influence group acts as a donor due to lower electron affinity and
on the receptor function while oxygen plays a decisive role in ionization. Therefore, irrespective of the mechanism,
the dry atmosphere. The dense water molecules and high adsorption of water molecules on the metal oxide surface
electronegativity of oxygen can make them easily adsorbed by changes the sensing properties of the metal oxide surface. It
the metal oxide surface, as electron acceptor. Similarly, the may be due to the change in conductivity from the free
interaction of target gas with metal oxide would cause changes electrons produced or change in the electron affinity due to the
in the resistance of the metal oxide. Therefore, the response of deep-rooted hydroxyl bonds or simply by the occupation of the
metal oxide towards a specific target gas is net change in active sites by the adsorbed water molecules.
resistance produced due to gas-solid interaction in the ambient Morrison [76], Henrich and Cox [77] have suggested
atmosphere. Thus, the response of a metal oxide surface another possible mechanism, co-adsorption of water molecules
strongly depends on the composition of atmosphere; especially on the other adsorbate. It seems to be a formation of water
water (wet atmosphere) and oxygen (dry atmosphere) which vapour layer on the surface due to higher humidity level.
defines the baseline for the sensor response and calibration. Figure 3 shows the schematic representation of humidity
sensing by metal oxide surface, described by Kannan et al.
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Figure 2. Mechanisms of humidity adsorption on the surface of tin oxide; (a) one water molecule for two metal sites and (b) one water
molecule per metal site.
Figure 3. Schematic representation of humidity sensing at ZnO (Reprinted with permission from Ref. [75] Kannan et al. Sens. Actuat. A
164 (2010) 8. © Elsevier Publishing).
[75]. It explains that, at low humidity, adsorption of water humidity levels, which is characteristic p-type behaviour.
molecules on the metal oxide surface obeys chemisorption However, Kannan et al. [75] have reported a decrease in
process as explained by Eq. 2 and 3 and at higher humidity resistance, indicating n-type behaviour. Figure 4 shows a
levels, all the active sites on metal oxide surface are occupied comparison of the resistance variation of ZnO films with
by water molecules and later it can be formed as an additional humidity reported by these authors. The approximate linear
layer on the surface following the physisorption process. The change in resistance with humidity up to 75% of RH in either
free movement of proton occurs along the water layer as cases show the donor behaviour of water molecules followed
shown in Figure 3 and during physisorption process, resistance by chemisorption explained by the Eq. 2 & 3 and Figure 2. The
of the film is decreased. Further increase in humidity leads to abrupt change in resistance at RH above 75% is because of the
co-adsorption where the water molecules try to dislodge the co-adsorption mechanism suggested by Morrison, Henrich and
adsorbents occupying the active sites. During the Cox. Bai et al. [21] and Hotovy et al. [79] have reported that
chemisorption, resistance drastically decreases while it is being RH around 50% is optimum for sensing gases by both n and p
slowed down during physisorption at higher humidity level - type materials. Since humidity severely affects the sensing
and the conductivity changes almost ceased during co- response of metal oxides towards gas molecules, it is
adsorption at much higher humidity levels. Author has customary to study and optimize the effect of humidity in the
reported that physisorption leads to capillary condensation and design and development of metal oxide based gas sensors.
the conduction process mainly follows Grotthuss transport
mechanism [75,78]. 2.2. Dry atmosphere
Bai et al. [21] have observed an increase in the The atmosphere with RH less than 20% humidity is
resistance of ZnO nanostructured thin films for relative termed as dry atmosphere. Apart from humidity, other
humidity (RH) levels from 10-75% and a decrease at higher components in the atmosphere such as nitrogen (N 2) and
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Figure 4. Resistance vs. Relative Humidity plot for n-type [75] and p-type [21] ZnO metal oxide thin films.
oxygen (O2) has a characteristic influence on the gas-solid Thus, the adsorption and desorption of oxygen molecules is
interaction. In the following section, the role of these associated with corresponding changes in the resistance
atmospheric gases in the sensing characteristics of metal measured on the metal oxide surface. The chemisorption
oxides has been discussed. process of oxygen on the metal oxide surface can be described
as given in Eq. 4 [57]. It can be seen that the concentration of
2.2.1. Nitrogen (N2) electrons on the metal oxide surface acts as an active site for
The molecular nitrogen is the most abundant gas in the oxygen adsorption. The number of electrons gained by the
atmosphere, but it is chemically non-reactive with other gas oxygen (O2) during the adsorption decides the ionic strength
molecules and metal oxide surface. The triple bond in the ( ) of the adsorbed species ( ). Barsan and Weimer
molecular nitrogen makes it a strong and chemically inactive [57] and Yamazoe et al. [15] reported that at higher
gas, as it requires more energy to break its bonds. Hao et al. temperatures, molecular species turn to atomic; either lattice
[80] demonstrated the chemical inactivity of nitrogen gas with ( ) or dissociative ( ), which can also be effectively
p-type semiconducting copper oxide. CuO thin film showed an enhanced by catalysts or dopants [20].
increase in electrical resistance when reacted with reducing
gas. When reducing gas was replaced gradually by nitrogen, (4)
then there was no change in the resistance besides the
reduction in resistance due to desorption of the reducing gas
molecules, proving the inertness of the nitrogen gas. The following Eq. 5 describes the adsorption process
Therefore, nitrogen is often used as carrier gas to study the in the case of oxygen deficient sites ) on the metal oxide
chemical kinetics of the interaction between a test gas and the surface. Oxygen from the ambient diffuses to the oxygen
metal oxide surface. vacant sites in metal oxide surface, by consuming one or two
free electrons. Thus, the chemisorption of oxygen molecules
2.2.2. Oxygen (O2) reduces the mobility of electrons leading to reduction in
In the atmosphere, oxygen is the second largest conductance in n-type materials as well as reduces the active
element after nitrogen. Oxygen plays a predominant role in the sites for further adsorption.
adsorption process due to its high electronegativity of about
3.65 and lone pairs of electrons, making it easily adsorbed on (5)
the surface of metal oxides. Diatomic oxygen is a non-reactive
species in the gas phase, while interacting with the metal oxide 2.3. Reduction-Oxidation (REDOX) mechanisms for
surface, it act as an electron acceptor and gets ionized [81] and oxidizing and reducing gas molecules
form an ionic layer on the surface. This helps in sorption of 2.3.1. Oxidizing gases
other gas molecules on to the metal oxide surface. In dry 2.3.1.1. Oxygen (O2)
atmosphere, chemisorbed oxygen molecule strongly influenced In the context of REDOX mechanisms, gases such as
the receptor function. Thus, the principle of metal oxide gas O2, NO2, CO2 which have the tendency to accept electrons
sensor mainly depends upon the oxygen concentration and its from the metal oxide surface, are termed as oxidizing gases.
rate of adsorption and desorption. During the adsorption Oxygen is the dominant one among oxidizing gases, which
process, the oxygen molecule gains an electron from the metal adsorbs quickly with metal oxide surfaces compared to others.
oxide surface and turned to ionic form ( ) [82]. Thus The adsorption can be enhanced by increasing the operating
electrons trapped on the surface of grains, and results in the temperature, using dopants and by reducing the grain size [20].
increase of the width of space charge region and hence the Below the temperature of 200 °C, O2 can accept one electron
height of potential barrier. This, in turn, reduces the and above 200 °C, it can accept two electrons from the metal
conduction of electron between the grains, which influence the oxide surface, and it is given in the Eqs. 6 and 7 [15,78]. The
transduction process of the metal oxide surface. In addition, adsorbed oxygen molecules/atoms are desorbed quickly, when
the grain boundary resistance also plays a crucial role in interacts with other gas molecules.
determining the surface resistance of the sensing element.
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(6) If the metal oxide thin film has oxygen vacancy in the
surface, nitrogen dioxide turns to nitrogen monoxide (NO) by
} (7) loss of one oxygen atom as given in Eqs. 16 and 17 to vacant
site in the metal oxide surface. The adsorption of oxygen from
the NO2 molecule on to the vacant site leads to decrease in
conductance of the n-type metal oxide [88]. X-ray
2.3.1.2. Carbon dioxide (CO2)
photoelectron spectroscopy (XPS) studies revealed the reaction
The linear bonded atoms of carbon dioxide (CO 2)
mechanism described in Eq. 18 of interaction of NO 2 gas
molecule have stable structure and there is no lone pair of
molecules with In2O3 surface [89] and the same phenomena
electrons to bond. Ostrick et al. [83] have reported that at low
was described with Au doped WO3 thin film [90]. Eq. 18
temperatures the dissociated hydroxyl and hydrogen ions from
explains that NO2 directly adsorbed on the metal sites by
water molecules at the surface of metal oxide react with
electron capture and desorbed as NO [91].
gaseous CO2 to form carbonate ions as given in Eqs. 8-
11, with the intermediate products, formate ions and
(16)
bicarbonate ions [72]. At high temperatures, CO2 molecules
interact with the layered oxygen ions ( to directly form ( ) (17)
carbonate ions [84] as given in Eq. 12. Thus, the consumption → →
of electrons by each CO2 molecule during its interaction with }
→
the metal oxide surface leads to reduction in conduction, which
(18)
can be used for sensing CO2.
2.3.2. Reducing gases
(8)
Reducing gases are those, which act as electron
(9) donors when interacting with metal oxide surface. During this
(10) interaction, reducing gases desorb or remove the chemisorbed
oxygen ions and physisorbed hydroxyl ions from the metal
(11) oxide surface. The variation in the resistance of the material is
(12) used to detect the concentration of reducing gases such as SO 2,
CO, H2, NH3, H2S and C2H5OH by the chemical changes
The observed chemical kinetics of CO2 molecule following REDOX reaction.
interaction is in close agreement with CdO nanostructured thin
film [85]. However, Kim and co-workers [71] have reported 2.3.2.1. Sulfur dioxide (SO2)
the CO2 detection behaviour of lanthanum coated tin oxide in Sulfur dioxide is one of the most toxic gases that
the ambient of dry air, pure oxygen, nitrogen as well as in wet makes the metal layer non-resistant by bonding with its strong
atmosphere. Lanthanum coated tin oxide showed better electron pairs. Normally NO2, SO2 reacts with water molecules
sensing performance in the oxygen atmosphere, compared to to form an acid in atmosphere that is given in Eq. 19.
others, while worst performance at the higher relative humidity
level. Besides the oxygen adsorption, CO2 molecules further (19)
oxidized the metal oxide surface and increase the surface
resistance. Here the interaction of stable CO2 on the surface In the wet atmosphere, hydroxide ions and SO2 make
achieved might be the existence of the additive lanthanum a surface more acidic, it strongly corrodes the material. At low
present on the surface [71]. Based on the results, the following humidity or dry atmosphere, SO2 molecules interact with
REDOX mechanism is proposed to explain the interaction of adsorbed oxygen on the surface to form sulfate (SO 4) ions and
oxygen and CO2 on the metal oxide surface. it increases the conductance of the n-type material. Further, the
continuous interaction of SO2 molecules directly bond with
(13) metal sites by completely desorbing the adsorbed oxygen from
the surface and continues to replace the lattice oxygen from the
first layer, and after the incorporation the resistance of it
2.3.1.3. Nitrogen dioxide (NO2) remains constant. The proposed mechanism is given in Eqs. 20
Nitrogen dioxide is a strong oxidizing agent and has and 21.
strong electrophilic property [86], which makes this molecule
to be quickly adsorbed on the metal oxide surface. NO 2 can (20)
react with metal oxide surface both in the presence and
absence of oxygen as given in the Eqs. 14 and 15 [87]. It can (21)
be seen that the oxidation of NO2 leads to the reduction of
conduction electrons in the conduction band. Rodriguez et al. [92] and Kim [93] investigated the
adsorption of SO2 on the ZnO and NiO surface. In ZnO,
formation of sulfite and sulfate on the surface was confirmed
(14) by XPS analysis. NiO material also showed the same process
and both the studies revealed the formation of sulfate, Eq. 22
explains the adsorption and desorption of SO2 on ZnO
material, the same process followed in NiO sample. If, oxygen
(15) vacancy or available metal (M) sites are more in the metal
oxide surface, then SO2 molecules react with the active sites
and forms sulfur and oxygen ( ). In n-type
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Figure 5. CO gas – SnO2 solid interaction mechanism at ambient temperature (Reprinted with permission from Ref. [74] Barsan et al.,
Fresenius. J. Anal. Chem. 365 (1999) 287. © Springer-Verlag).
Figure 6. H2S gas sensing mechanism on copper oxide thin film (Reprinted with permission from Ref. [101] Ramgir et al., Sens. Actuat. B
151 (2010) 90. © Elsevier Publishing).
reaction is said to be sulfurization reaction, which is given in laboratories and industries for various research purposes and
Eqs. 32 and 33. applications. Based on whether the surface of metal oxide is
acidic or basic, functional group of the adsorbed ethanol
(32) dissociates as water vapour or hydrogen molecule.
(33) Dissociation into water vapour (dehydration) or hydrogen
molecule (dehydrogenation) process led to desorption of
In situ Raman and impedance measurements also carbon dioxide gas molecule and water vapour via the
reveal the same reaction of sulfurization with tin oxide formation of cyclobutadiene (C2H4) and acetaldehyde
[98,100]. This same reaction was observed in the CuO thin (CH3CHO). Also, desorption of ethanol was determined by the
film, ( ), where copper sulfide partial pressure of oxygen in the ambient atmosphere. Cyclic
turned back to copper oxide when reacted with oxygen process of ethanol adsorption reduces the oxygen content in
( ) [101]. In WO3 material, wet the atmosphere, hence the intermediate products react with the
lattice oxygen in the metal oxide surface, and creates oxygen
atmosphere did not affect the response of H2S. It was shown vacancies in the lattice and these process are given in Eqs. 37-
that, 90% of RH slightly decreases the response value to 41 [96,110–116]. These REDOX mechanism process increases
~20% of total response [102]. the electron concentration in metal oxide surface by desorption
The following reaction scheme (Figure 6) and the of oxygen from the surface and lattice. However, the in-situ
resultant band bending sequence depicts the hydrogen sulphide gas chromatography study of ethanol reaction with metal oxide
interaction with CuO. material revealed the desorption of carbon dioxide from the
surface [117].
2.3.2.5. Ammonia (NH3)
The lone pair of electrons of NH3 provide strong (37)
electron acceptor behaviour. But it acts as an electron donor to
(38)
the metal oxide, when reacted with the adsorbed oxygen ions
on the surface by reverting the trapped electrons. Nguyen et al. (39)
[103] proposed the mechanism that generates free electrons (40)
accomplished by the number of oxygen ions reacted with NH 3 (41)
molecules, given in the Eqs. 34-36. Eq. 34 has been adopted
by most of the authors [104–108]. By the adsorption of dissociated H and OH ions on
the oxygen adsorbed surface of the metal oxide can modify the
surface to be acidic or basic nature. At low humidity level
} (34) (36%) lack of hydroxyl ions lead to follow the Eqs. 37 and 38,
while at higher humidity (96%), the mechanism will follow the
Eqs. 39 and 40, because of enhancement of hydroxyl ion
(35)
concentration. The infrared spectrum analysis confirmed that
(36) 50% of RH has not affected on the response of the sensor [21].
In humid atmosphere, the kind of reactions that takes 3. Role of metal oxides
place on the surface, which would modify its resistance are yet
to be investigated. However up to 60 and 72% of RH did not Metal oxide materials are the main source of gas
affect the sensing performance of the sensor [105,109]. sensor industry. The investigations on metal oxide revolve
around studying their properties and methods of increasing the
2.3.2.6. Ethanol (C2H5OH) sensitivity and selectivity towards specific gases at different
Ethanol is the most important organic molecule to be operating conditions. Specific metal oxides such as, Cr 2O3,
detected in the ambient since it is being used in many Mn2O3, Co3O4, NiO, CuO, SrO, In2O3, WO3, TiO2, V2O3,
8 Cognizure
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Figure 8. (a) TEM image of SnO2 (a) nanoparticles, (b) nanorods and (c) nanoflowers (Reprinted with permission from Ref. [105] Rout et
al., Nanotechnology 18 (2007) 205504. © IOP Publishing Ltd.).
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Figure 13. The possible ways of ethanol molecule interacts on the metal oxide surface.
1. Sputtering (RF/DC) Source – Substrate distance, Substrate temperature, Anode potential, Ratio of Argon and
other (oxygen) gas, Working pressure, Deposition time, DC: applied voltage and RF:
applied power and impedance matching
2. Spray pyrolysis Substrate temperature, Substrate-Spray nozzle distance, Spray nozzle/gun diameter,
Solution flow rate, Applied gas pressure, Applied frequency (power) – Ultrasonic spray and
Applied flame in the ambient – Flame spray
3. Sol gel Precursor medium, Stabilizing agent, Ratio of solute and stabilizing agent, Ageing
(Processing) time, Drying temperature, Preheating temperature
Dip Coating
Dip / Retrieval speed, Dip duration and Number of Dip
Spin Coating
Substrate rotation speed and Number of cycles
4. Hydrothermal Precursor medium, Surfactant, Processing temperature and duration, Washing method and
Medium, Drying temperature and duration and Sintering temperature and duration
5 Thermal Evaporation Target or Source, Reactive atmosphere, Working pressure, Applied voltage/current,
Substrate and target distance and Annealing temperature
electrons transferred between the metal oxide and target gas example, Zhou et al. have reported changes in the sensing
decides the response of the metal oxide. The charge transfer properties of SnO2 metal oxide thin films synthesized by sol-
between the metal oxide and the gases in turn depends on the gel (dip coating) towards detection of H2S gas by varying the
number of active sites available on the surface, which depends processing (stirring) time of the precursor solution from 1 hr
on the carrier density and the structural arrangements of the [140] to 5 hours [141]. This increase in processing time alters
surface. the material behaviour towards sensing. Similarly, the sensing
The metal oxide materials synthesized by various response can be optimized in the sputtering method by
methods such as sputtering, thermal evaporation, spray obtaining different crystal orientations through substrate
pyrolysis, sol-gel (dip and spin coating), sonochemical, vapour temperature. The ZnO thin films with 002 and 100 plane
phase solution and hydrothermal method produced thin films orientations have been obtained at substrate temperature of 153
with different morphologies like nanoparticles, nanorods, °C and 130 °C respectively [119]. The thin film with plane
nanowires, nanoflowers, etc. It can be seen that these materials orientation 100 reportedly has relatively smaller grain size of
have shown entirely different response behaviour towards 20.66 nm and showed better response for CO2 molecules.
various gases. The wide variations in the response and Thus, thin film surfaces with certain crystalline orientation and
selectivity behaviour of various metal oxides are due to the grain size has better sensing towards a particular gas molecule.
optimization of their respective synthesis parameters in Every crystallographic plane has its own surface state density,
addition to the operating temperature. Table 2 describes some electronic energy levels - donor/acceptor energy making the
key parameters to be considered in various synthesis methods. chemisorption characteristics. Hence, the response of a metal
The property of the metal oxide depends strongly on the oxide film towards a particular gas strongly depends on the
synthesis method and its preparation conditions [144]. For orientation of the crystal surface [58]. Further, morphology of
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Table 3. The material property and sensing parameter of zinc oxide material.
Lattice
Sensing Parameter
Synthesis Parameter Crystallite
Plane Morphology Ref.
method size (nm) Temperature
a (Å) c (Å) Gas Response
(°C)
Wet chemical ~ 10
101 3.24 5.21 18 Nanoflower CO 300 [178]
process (100 ppm)
~ 50
Sol-gel 002 3.25 5.2 15 Nanoparticles NH3 300 [105]
(80 ppm)
~ 37
Spin coating 101 3.265 5.214 73.48 Nanoparticles NO2 200 [123]
(100 ppm)
70-110/0.2- ~ 100
Hydrothermal 101 - - Nanorods H2S 25 [130]
1.3 (10 ppm)
Sputtering 100 - - 20.66 - CO2 100 ~ 2.17 [119]
Table 4. The ethanol sensing response of anion and cation doped – ZnO material.
the metal oxide affects the response as it changes the number varying selectivity and sensing properties of thin films
of active sites for adsorption. Among, the ZnO based metal produced by different synthesis techniques.
oxide sensors with nanorod [134], nanowire [132], nanoflower Density functional study reveals that the electrical
[104], nanotube [131] and granular nanoparticle [173] properties and hence the sensing properties of zinc oxide
morphologies reported, granular nanoparticles were found to depends on its geometrical structure [70]. Spencer [70] have
have better response to ethanol. The grain size, which can be extended the study to show that the dopants can alter the
controlled by the synthesis parameters play a major role in electronic properties of the material and enhance the sensing
determining the sensing properties [174]. The sensitivity was response. The dopants can enhance the sensing characteristics
highly enhanced because of the grain size reduction [20] and it of the metal oxide surfaces by lowering the energy required for
is one of the most important factors of the metal oxides since it chemisorption of gas molecules. The precise choice of the type
controls all the operating characteristics of the gas sensor of dopant and optimizing its concentration is required for
[174]. For better understanding, let us consider ZnO as an getting better sensing performance [23]. The dopants in the
example to have an insight on the influence of synthesis metal oxide semiconductors can be broadly classified as
method on its structural and sensing properties. Table 3 n-type/anion (metal atoms such as Aluminium (Al), Gallium
provides a list of ZnO films produced by different synthesis (Ga), Indium (In) and Tin (Sn)) and p-type/cation (transition
methods along with their structural and sensing parameters. It metal atoms such as Manganese (Mn), Iron (Fe), Cobalt (Co),
can be seen that sensing property depends on all the structural and Copper (Cu)). Table 4 summarizes the sensing response of
properties listed and varying sensing characteristics can be ethanol for the selective dopants in the zinc oxide thin film. It
expected by choosing different synthesis method. can be seen that, ZnO with n-type dopant (Al) responded well
The lattice parameters of ZnO thin films listed in at room temperature [175] as well as at elevated temperatures
Table 3, corresponds to hexagonal wurtzite structure. [23]. Zhou et al. [176] have reported that compared to Li and
However, since different synthesis method is chosen, they 3d transition metal (Mn, Co and Cu) doping in ZnO, Al has
showed response to different gases and operating temperature better electrical conductivity. The impurity Al in ZnO
as they have different grain sizes, crystal orientations and increased the conductance by decreasing the grain and grain
morphology. The difference in the grain size, crystal boundary resistance than undoped ZnO. In contrast, Cu in ZnO
orientation and morphology modifies the nature of the active increased the grain and grain boundary resistance. Obviously,
sites for the adsorption of gas molecules. The direct it shows grain and grain boundary resistance can control and
dependence of carrier density on the grain or crystallite size, enhance the transduction and receptor function of the metal
surface morphology and crystal orientation explains the oxide gas sensor. Therefore, by doping with appropriate choice
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5. Conclusions References
Although, metal oxide films produced by various 1. V.-M. Guérin, J. Rathousky, T. Pauporté, Sol. Energy Mater.
synthesis methods demonstrate different sensing properties, Sol. Cells 102 (2012) 8.
regardless of the synthesis method, the following implicit and 2. H.-J. Park, K.-H. Lee, B. Kumar, K.-S. Shin, S.-W. Jeong, S.-W.
explicit practical considerations with reference to material Kim, J. Nanoelectron. Optoelectron. 5 (2010) 135.
3. C. Klingshirn, Phys. Status Solidi 244 (2007) 3027.
preparation and the film growth must be considered to 4. M. Godlewski, E. Guziewicz, K. Kopalko, G. Łuka, M. I.
determine the response of a specific material towards a Łukasiewicz, Low Temp. Phys. 37 (2011) 235.
specific gas. The most dominant feature of the sensing element 5. R. Chakraborty, U. Das, D. Mohanta, A. Choudhury, Indian J.
namely “grain size”, which influences the individual grain Phys. 83 (2009) 553.
resistance as well as the grain boundary resistance at the 6. R. Saravanan, K. Santhi, N. Sivakumar, V. Narayanan, A.
material surface must be tailor made by exactly controlling the Stephen, Mater. Charact. 67 (2012) 10.
nucleation and growth processes. This can be achieved not 7. Z. L. Wang, Appl. Phys. A 88 (2007) 7.
only by optimizing the synthesis parameters but also by 8. E. Comini, G. Faglia, G. Sberveglieri, In: E. Comini, G. Faglia,
introducing specific dopants with modulated concentrations. G. Sberveglieri (Eds.), Solid State Gas Sensors, Springer (2009)
p. 47–107.
While selecting the dopants, the type of the semiconducting 9. C. G. B. Garrett, W. H. Brattain, Phys. Rev. 99 (1955) 376.
host material, the electron affinity of the dopants 10. W. H. Brattain, C. G. B. Garrett, Physica 20 (1954) 885.
(cation/anion), its ionic radii, and the possibility of orbital 11. W. H. Brattain, J. Bardeen, Bell Labs Tech. J. 32 (1953) 1.
hybridisation may be considered to fine tune the grain size for 12. T. Seiyama, A. Kato, K. Fujiishi, M. Nagatani, Anal. Chem. 34
better sensing and transduction functions. For further (1962) 1502.
enhancement of the sensing properties, the grain size has to be 13. T. Seiyama, S. Kagawa, Anal. Chem. 38 (1966) 1069.
made comparable to the extent of space charge region. The 14. N. Taguchi, Gas Detecting Device, US Patent 3, 695, 848
correct choice of the type of dopant and its concentration helps (1972).
in engineering the carrier concentration, desired density of 15. N. Yamazoe, G. Sakai, K. Shimanoe, Catal. Surv. Asia 7 (2003)
63.
states and hence the band gap, which increases the surface 16. N. Yamazoe, Y. Kurokawa, T. Seiyama, Sensor. Actuator. 4
catalytic activity aiding the enhancement of the adsorption of (1983) 283.
the desired gas at the surface. The enhancement of surface 17. P. Tyagi, A. Sharma, M. Tomar, V. Gupta, Chem. Sensors 4
adsorption not only increases the response of the sensing (2014) 18.
element but also significantly reduces the operating 18. A. Sharma, M. Tomar, V. Gupta, J. Nanosci. Lett. 2 (2014) 27.
temperature almost to the room temperature. The room 19. C. Xu, J. Tamaki, N. Miura, N. Yamazoe, Sens. Actuat. B 3
temperature gas sensor can also be realized through quantum (1991) 147.
confinement processes. The effect of humidity, which is a 20. N. Yamazoe, Sens. Actuat. B 5 (1991) 7.
major hindrance for the metal oxide based gas sensors can be 21. Z. Bai, C. Xie, M. Hu, S. Zhang, D. Zeng, Mater. Sci. Eng. B
149 (2008) 12.
reduced to less than 2% by making electronic conductivity 22. K. Wetchakun, T. Samerjai, N. Tamaekong, C. Liewhiran, C.
more dominant than ionic by careful engineering of the grain Siriwong, V. Kruefu, A. Wisitsoraat, A. Tuantranont, S.
boundary resistance. In principle any metal oxide discussed Phanichphant, Sens. Actuat. B 160 (2011) 580.
can sense a given gas molecule. However, refining their 23. F. Paraguay, M. Miki-Yoshida, J. Morales, J. Solis, W. E. L.,
surface properties to match the LUMO level of the gas of Thin Solid Films 373 (2000) 137.
interest with the surface energy of the selected sensing 24. A. Fort, M. Mugnaini, S. Rocchi, V. Vignoli, E. Comini, G.
material is required to effectively sense a particular gas Faglia, A. Ponzoni, Sens. Actuat. B 148 (2010) 283.
molecule. 25. J. D. D. Prades, A. Cirera, J. R. R. Morante, Sens. Actuat. B 142
The possibility of changing the nature of sensing (2009) 179.
26. J. Guérin, K. Aguir, M. Bendahan, Sens. Actuat. B 119 (2006)
materials from n- to p-type or p- to n-type conductivity during 327.
the gas solid interaction has to be explored to minimize or 27. J. J. J. Velasco-Velez, C. Wilbertz, T. Haas, T. Doll, Procedia
even eliminate the most challenging issue of selectivity. Chem. 1 (2009) 642.
Further, the grain boundary scattering in the nano scale 28. V. E. Bochenkov, G. B. Sergeev, Adv. Colloid Interface Sci. 116
materials during gas solid interaction and its relation to the (2005) 245.
film thickness need to be explored as another option for 29. M. M. Arafat, B. Dinan, S. A. Akbar, A. S. M. A. Haseeb,
enhancing the selectivity. Sensors 12 (2012) 7207.
30. R. Boppella, P. Manjula, S. Arunkumar, S. V Manorama, Chem.
Sensors 4 (2014) 19.
31. G. F. Fine, L. M. Cavanagh, A. Afonja, R. Binions, Sensors 10
(2010) 5469.
Cognizure 15
www.cognizure.com/pubs © Cognizure. All rights reserved.
Science Letters Journal Sci. Lett. J. 2015, 4: 126
32. X. Wang, S. S. Yee, W. P. Carey, Sens. Actuat. B 24-25 (1995) 80. N. D. Hoa, S. Y. An, N. Q. Dung, N. Van Quy, D. Kim, N. Van
454. Quy, Sens. Actuat. B 146 (2010) 239.
33. T. Seyama, H. Futata, F. Era, N. Yamazoe, Denki Kagaku 40 81. S. R. Morrison, Sens. Actuat. B 11 (1987) 283.
(1972) 244. 82. O. K. Varghese, C. A. Grimes, Encycl. Nanosci. Nanotechnol. 5
34. S. Xu, Z. L. Wang, Nano Res. 4 (2011) 1013. (2004) 505.
35. S. Kannan, L. Rieth, F. Solzbacher, Sens. Actuat. B 149 (2010) 83. B. Ostrick, M. Fleischer, H. Meixner, C.-D. Kohl, Sens. Actuat.
8. B 68 (2000) 197.
36. G. Korotcenkov, Sens. Actuat. B 107 (2005) 209. 84. M. J. Madou, S. R. Morrison, Chemical Sensing with Solid State
37. E. Comini, C. Baratto, G. Faglia, M. Ferroni, A. Vomiero, G. Devices, Academic Press, San Diego (1989).
Sberveglieri, Prog. Mater Sci. 54 (2009) 1. 85. T. Krishnakumar, R. Jayaprakash, T. Prakash, D. Sathyaraj, N.
38. S. Barth, F. Hernandez-Ramirez, J. D. Holmes, A. Romano- Donato, S. Licoccia, M. Latino, A. Stassi, G. Neri,
Rodriguez, Prog. Mater Sci. 55 (2010) 563. Nanotechnology 22 (2011) 325501.
39. J. G. Lu, P. Chang, Z. Fan, Mater. Sci. Eng. R 52 (2006) 49. 86. S. L. Bai, J. W. Hu, R. X. Luo, D. Q. Li, A. F. Chen, C. C. Liu,
40. F. Fang, J. Futter, J. Kennedy, A. Markwitz, 2011 Fifth Int. X. Xu, IEEE Sens. J. 12 (2012) 1234.
Conf. Sens. Technol. (2011) p. . 87. M. B. Rahmani, S. H. Keshmiri, M. Shafiei, K. Latham, W.
41. J. L. Gomez, O. Tigli, J. Mater. Sci. 48 (2012) 612. Wlodarski, J. du Plessis, K. Kalantar-Zadeh, Sens. Lett. 7 (2009)
42. Z. Zhang, M. G. Lagally, Science 276 (1997) 377. 1.
43. T. Hübert, L. Boon-brett, G. Black, U. Banach, Sens. Actuat. B 88. S. Kannan, H. Steinebach, L. Rieth, F. Solzbacher, Sens. Actuat.
157 (2011) 329. B 148 (2010) 126.
44. N. Yamazoe, K. Shimanoe, Sens. Actuat. B 138 (2009) 100. 89. A. Gurlo, N. Barsan, M. Ivanovskaya, U. Weimar, W. Göpel,
45. G. Heiland, Sensor. Actuator. 2 (1982) 343. Sens. Actuat. B 47 (1998) 92.
46. N. Yamazoe, Sens. Actuat. B 108 (2005) 2. 90. H. Xia, Y. Wang, F. Kong, S. Wang, B. Zhu, X. Guo, J. Zhang,
47. C. Wang, L. Yin, L. Zhang, D. Xiang, R. Gao, Sensors 10 (2010) S. Wu, Sens. Actuat. B 134 (2008) 133.
2088. 91. A. Sharma, M. Tomar, V. Gupta, Sens. Actuat. B 156 (2011)
48. Y. Shimizu, M. Egashira, MRS Bull. 24 (1999) 18. 743.
49. N. Barsan, D. Koziej, U. Weimar, Sens. Actuat. B 121 (2007) 92. J. A. Rodriguez, T. Jirsak, S. Chaturvedi, M. Kuhn, A.
18. Rodriguez, Surf. Sci. 442 (1999) 400.
50. D. Kohl, J. Phys. D Appl. Phys. 34 (2001) R125. 93. C. M. Kim, Bull. Korean Chem. Soc. 27 (2006) 2037.
51. S. Basu, P. K. Basu, Sens. Transducers J. 134 (2011) 1. 94. M. Hübner, C. E. E. Simion, S. Pokhrel, N. Bârsan, U. Weimar,
52. N. Yamazoe, K. Shimanoe, Sens. Actuat. B 160 (2011) 1352. A. Tomescu-Stănoiu, Sens. Actuat. B 153 (2011) 347.
53. W. Göpel, Prog. Surf. Sci. 20 (1985) 9. 95. M. Hübner, C. E. Simion, A. Haensch, N. Barsan, U. Weimar,
54. C. Engler, W. Lorenz, Surf. Sci. 104 (1981) 549. Sens. Actuat. B 151 (2010) 103.
55. N. Yamazoe, K. Shimanoe, J. Sens. 2009 (2009) 875704. 96. B. M. Matin, Y. Mortazavi, A. A. Khodadadi, A. Abbasi, A. A.
56. G. Korotcenkov, V. Brinzari, J. R. Stetter, I. Blinov, V. Blaja, Firooz, B. Mehrabi Matin, A. Anaraki Firooz, Sens. Actuat. B
Sens. Actuat. B 128 (2007) 51. 151 (2010) 140.
57. N. Barsan, U. Weimar, J. Electroceram. 7 (2001) 143. 97. J. Xu, X. Wang, J. Shen, Sens. Actuat. B 115 (2006) 642.
58. G. Korotcenkov, Mater. Sci. Eng. R 61 (2008) 1. 98. R. Kumar, A. Khanna, V. S. Sastry, Vacuum 86 (2012) 1380.
59. G. Jiménez-Cadena, J. Riu, F. X. Rius, G. Jime, Analyst 132 99. T. W. Capehart, S. C. Chang, J. Vac. Sci. Technol. 18 (1981)
(2007) 1083. 393.
60. X.-J. Huang, Y.-K. Choi, Sens. Actuat. B 122 (2007) 659. 100. T. Pagnier, M. Boulova, A. Galerie, A. Gaskov, G. Lucazeau, J.
61. J. Huang, Q. Wan, Sensors 9 (2009) 9903. Solid State Chem. 143 (1999) 86.
62. E. Comini, Anal. Chim. Acta 568 (2006) 28. 101. N. S. Ramgir, S. K. Ganapathi, M. Kaur, N. Datta, K. P. Muthe,
63. E. Comini, G. Sberveglieri, Mater. Today 13 (2010) 36. D. K. Aswal, S. K. Gupta, J. V. Yakhmi, Sens. Actuat. B 151
64. T. Asefa, C. T. Duncan, K. K. Sharma, Analyst 134 (2009) 1980. (2010) 90.
65. O. K. Varghese, C. A. Grimes, J. Nanosci. Nanotechnol. 3 102. C. S. Rout, M. Hegde, C. N. R. Rao, Sens. Actuat. B 128 (2008)
(2003) 277. 488.
66. K. R. Nemade, Sens. Transducers J. 132 (2011) 1. 103. T. Nguyen, S. Park, J. B. Kim, T. K. Kim, G. H. Seong, J. Choo,
67. S. M. Kanan, O. M. El-Kadri, I. A. Abu-Yousef, M. C. Kanan, Y. S. Kim, J. Beom, T. Kyu, G. Hun, Y. Shin, Sens. Actuat. B
Sensors 9 (2009) 8158. 160 (2011) 549.
68. D. E. Williams, Sens. Actuat. B 57 (1999) 1. 104. N. K. Singh, S. Shrivastava, S. Rath, S. Annapoorni, Appl. Surf.
69. V. M. Aroutiounian, G. S. Aghababian, Sens. Actuat. B 50 Sci. 257 (2010) 1544.
(1998) 80. 105. C. S. Rout, M. Hegde, A. Govindaraj, C. N. R. Rao,
70. M. J. S. S. Spencer, Prog. Mater Sci. 57 (2012) 437. Nanotechnology 18 (2007) 205504.
71. D. H. Kim, J. Y. Yoon, H. C. Park, K. H. Kim, Sens. Actuat. B 106. J. B. K. Law, J. T. L. Thong, Nanotechnology 19 (2008) 205502.
62 (2000) 61. 107. A. Wei, Z. Wang, L.-H. Pan, W.-W. Li, L. Xiong, X.-C. Dong,
72. O. Wurzinger, G. Reinhardt, Sens. Actuat. B 103 (2004) 104. W. Huang, Chin. Phys. Lett. 28 (2011) 080702.
73. G. Heiland, D. Kohl, In: T. Seiyama (Ed.), Chemical Sensors 108. M. Stankova, X. Vilanova, E. Llobet, J. Calderer, C. Bittencourt,
Technology, Elsevier, Amsterdam (1988) p. 15–38. J. J. Pireaux, X. Correig, Sens. Actuat. B 105 (2005) 271.
74. N. Barsan, M. Schweizer-Berberich, W. Göpel, Fresenius J. 109. G. K. Mani, J. B. B. Rayappan, Sens. Actuat. B 183 (2013) 459.
Anal. Chem. 365 (1999) 287. 110. D. Chen, X. Hou, H. Wen, Y. Wang, H. Wang, X. Li, R. Zhang,
75. P. K. Kannan, R. Saraswathi, J. B. B. Rayappan, Sens. Actuat. A H. Lu, H. Xu, S. Guan, J. Sun, L. Gao, Nanotechnology 21
164 (2010) 8. (2010) 035501.
76. S. R. Morrison, The Chemical Physics of Surfaces, Springer, 111. F. Hellegouarc‟h, F. Arefi-Khonsari, R. Planade, J. Amouroux,
New York (1990). Sens. Actuat. B 73 (2001) 27.
77. V. E. Henrich, P. A. Cox, The Surface Science of Metal Oxides, 112. R. S. Khadayate, R. B. Waghulde, M. G. Wankhede, J. V Sali, P.
Cambridge University Press, New York (1994). P. Patil, Bull. Mater. Sci. 30 (2007) 129.
78. S. Capone, P. Siciliano, Encycl. Nanosci. Nanotechnol. 3 (2004) 113. P. P. Sahay, S. Tewari, S. Jha, M. Shamsuddin, J. Mater. Sci. 40
769. (2005) 4791.
79. I. Hotovy, V. Rehacek, P. Siciliano, S. Capone, L. Spiess, Thin 114. L. A. Patil, M. D. Shinde, A. R. Bari, V. V. Deo, Curr. Appl
Solid Films 418 (2002) 9. Phys. 10 (2010) 1249.
16 Cognizure
© Cognizure. All rights reserved. www.cognizure.com/pubs
Science Letters Journal Sci. Lett. J. 2015, 4: 126
115. R. C. Singh, O. Singh, M. P. Singh, P. S. Chandi, R. Chand, M. 153. J. Leng, X. Xu, N. Lv, H. Fan, T. Zhang, J. Colloid Interface Sci.
Pal, P. Singh, Sens. Actuat. B 135 (2008) 352. 356 (2011) 54.
116. E. Comini, G. Faglia, G. Sberveglieri, D. Calestani, L. Zanotti, 154. C. M. Ghimbeu, M. Lumbreras, J. Schoonman, M. Siadat,
M. Zha, Sens. Actuat. B 111-112 (2005) 2. Sensors 9 (2009) 9122.
117. J. Xu, J. Han, Y. Zhang, Y. Sun, B. Xie, Sens. Actuat. B 132 155. X. Chang, S. Sun, Y. Yin, Mater. Chem. Phys. 126 (2011) 717.
(2008) 334. 156. E. Llobet, G. Molas, P. Molinàs, J. Calderer, X. Vilanova, J.
118. L. Schmidt-mende, J. L. Macmanus-driscoll, Mater. Today 10 Brezmes, J. E. Sueiras, X. Correig, J. Electrochem. Soc. 147
(2007) 40. (2000) 776.
119. P. Samarasekara, N. U. S. Yapa, N. T. R. N. Kumara, M. V. K. 157. S. Park, H. Kim, C. Jin, S.-W. Choi, S. S. Kim, C. Lee,
Perera, Bull. Mater. Sci. 30 (2007) 113. Thermochim. Acta 542 (2012) 69.
120. L. Shi, A. J. T. Naik, J. B. M. Goodall, C. Tighe, R. Gruar, R. 158. J. L. Solis, S. Saukko, L. B. Kish, C. G. Granqvist, V. Lantto,
Binions, I. Parkin, J. Darr, Langmuir 29 (2013) 10603. Sens. Actuat. B 77 (2001) 316.
121. L. Liao, H. B. Lu, J. C. Li, H. He, D. F. Wang, D. J. Fu, C. Liu, 159. T. Vogt, P. M. Woodward, B. A. Hunter, J. Solid State Chem.
W. F. Zhang, J. Phys. Chem. C 111 (2007) 1900. 144 (1999) 209.
122. J. Y. Park, S.-W. Choi, S. S. Kim, Nanoscale Res. Lett. 5 (2010) 160. J. Pike, S. Chan, F. Zhang, X. Wang, J. Hanson, Appl. Catal. A
353. 303 (2006) 273.
123. M. A. Chougule, S. Sen, V. B. Patil, Ceram. Int. 38 (2012) 2685. 161. D. Jundale, S. Pawar, M. Chougule, P. Godse, S. Patil, B. Raut,
124. N. Tamaekong, C. Liewhiran, A. Wisitsoraat, S. Phanichphant, S. Sen, V. Patil, J. Sens. Technol. 1 (2011) 36.
Sensors 10 (2010) 7863. 162. P. Samarasekara, N. T. R. N. Kumara, N. U. S. Yapa, J. Phys.
125. P.-S. Cho, K.-W. Kim, J.-H. Lee, J. Electroceram. 17 (2006) Condens. Matter 18 (2006) 2417.
975. 163. Y. Zhang, X. He, J. Li, H. Zhang, X. Gao, Sens. Actuat. B 128
126. Y. Zeng, L. Qiao, Y. Bing, M. Wen, B. Zou, W. Zheng, T. (2007) 293.
Zhang, G. Zou, Sens. Actuat. B 173 (2012) 897. 164. I. Singh, R. K. Bedi, J. Mater. Sci. 46 (2011) 5568.
127. V. A. T. Dam, M. A. Blauw, S. H. Brongersma, M. Crego- 165. D. Gopalakrishna, K. Vijayalakshmi, C. Ravidhas, Ceram. Int.
Calama, Procedia Eng. 5 (2010) 172. 39 (2013) 7685.
128. G. K. Mani, J. B. B. Rayappan, J. Alloys Compd. 582 (2014) 166. I. Hotovy, J. Huran, P. Siciliano, S. Capone, L. Spiess, V.
414. Rehacek, Sens. Actuat. B 78 (2001) 126.
129. S. K. Gupta, A. Joshi, M. Kaur, J. Chem. Sci. 122 (2010) 57. 167. H. Steinebach, S. Kannan, L. Rieth, F. Solzbacher, Sens. Actuat.
130. C. Wang, X. Chu, M. Wu, Sens. Actuat. B 113 (2006) 320. B 151 (2010) 162.
131. Y.-J. Chen, C.-L. Zhu, G. Xiao, Sens. Actuat. B 129 (2008) 639. 168. X. Li, V. E. Henrich, Phys. Rev. B 48 (1993) 17486.
132. Q. Wan, Q. H. Li, Y. J. Chen, T. H. Wang, X. L. He, J. P. Li, C. 169. C. Luyo, R. Ionescu, L. F. F. Reyes, Z. Topalian, W. Estrada, E.
L. Lin, Appl. Phys. Lett. 84 (2004) 3654. Llobet, C. G. G. Granqvist, P. Heszler, Sens. Actuat. B 138
133. W. Guo, T. Liu, H. Zhang, R. Sun, Y. Chen, W. Zeng, Z. Wang, (2009) 14.
Sens. Actuat. B 166-167 (2012) 492. 170. N. Gyu, I.-S. Hwang, H. Kim, J. Lee, I.-D. Kim, N. G. Cho,
134. L. Wang, Y. Kang, X. Liu, S. Zhang, W. Huang, S. Wang, Sens. Sens. Actuat. B 155 (2011) 366.
Actuat. B 162 (2012) 237. 171. Z. Wen, L. Tian-mo, Physica B 405 (2010) 1345.
135. X. Zhou, Q. Xue, H. Chen, C. Liu, Physica E 42 (2010) 2021. 172. K. L. A. Kumar, S. Durgajanani, B. G. Jeyaprakash, J. B. B.
136. H. J. Pandya, S. Chandra, A. L. Vyas, Sens. Actuat. B 161 Rayappan, K. Lokaiah, A. Kumar, J. Bosco, B. Rayappan, Sens.
(2012) 923. Actuat. B 177 (2013) 19.
137. P. Shankar, J. B. B. Rayappan, Sens. Lett. 11 (2013) 1956. 173. Y. Zhang, X. Zheng, X. Zhong, S. Deng, Meas. Sci. Technol. 23
138. C. M. Ghimbeu, M. Lumbreras, M. Siadat, R. C. van (2012) 105107.
Landschoot, J. Schoonman, R. C. van Landschoot, Sens. Actuat. 174. G. Korotcenkov, S.-D. Han, B. K. Cho, V. Brinzari, Crit. Rev.
B 133 (2008) 694. Solid State Mater. Sci. 34 (2009) 1.
139. S. A. Waghuley, Indian J. Pure Appl. Phys. 49 (2011) 816. 175. D. Y. Kim, J. Y. Son, Electrochem. Solid-State Lett. 12 (2009)
140. G. Shuping, X. Jing, L. L. Jianqiao, Z. Dongxiang, Sens. Actuat. J109.
B 134 (2008) 57. 176. Z. Zhou, K. Kato, T. Komaki, M. Yoshino, H. Yukawa, M.
141. J. Liu, S. Gong, J. Xia, L. Quan, H. Liu, D. Zhou, Sens. Actuat. Morinaga, K. Morita, J. Eur. Ceram. Soc. 24 (2004) 139.
B 138 (2009) 289. 177. D. Sivalingam, J. B. B. Rayappan, S. Gandhi, S.
142. X. Du, S. M. George, Sens. Actuat. B 135 (2008) 152. Madanagurusamy, R. K. Sekar, U. M. Krishnan, Int. J. Nanosci.
143. L. Xi, D. Qian, X. Tang, C. Chen, Mater. Chem. Phys. 108 10 (2011) 1161.
(2008) 232. 178. T. Krishnakumar, R. Jayaprakash, N. Pinna, N. Donato, A.
144. A. Gurlo, M. Ivanovskaya, N. Barsan, M. Schweizer-Berberich, Bonavita, G. Micali, G. Neri, Sens. Actuat. B 143 (2009) 198.
U. Weimar, W. Göpel, A. Dieguez, Sens. Actuat. B 44 (1997) 179. T. Thuy, N. Han, H. Hoang, K. Yul, K. Binh, K. Pillai, J. Yi, T.
327. T. Trinh, N. H. Tu, H. H. Le, K. Y. Ryu, K. B. Le, Sens. Actuat.
145. H. Steffes, C. Imawan, F. Solzbacher, E. Obermeier, Sens. B 152 (2011) 73.
Actuat. B 78 (2001) 106. 180. D. Sivalingam, J. B. Gopalakrishnan, J. B. B. Rayappan, Sens.
146. S. K. Lim, S. Hwang, D. Chang, S. Kim, Sens. Actuat. B 149 Actuat. B 166-167 (2012) 624.
(2010) 28. 181. Y. Li, K.-M. Li, C. Wang, C.-I. Kuo, L.-J. Chen, Sens. Actuat. B
147. S. C. Kulkarni, R. Y. Borse, Sens. Transducers J. 125 (2011) 161 (2012) 734.
194.
148. P. Feng, X. Y. Xue, Y. G. Liu, T. H. Wang, Appl. Phys. Lett. 89 Biographies
(2006) 243514.
149. G. Sberveglieri, L. Depero, S. Groppelli, P. Nelli, Sens. Actuat. Prabakaran Shankar received his M.Sc. degree in Physics
B 26-27 (1995) 89.
150. Y. Shen, T. Yamazaki, Z. Liu, D. Meng, T. Kikuta, N. Nakatani,
from Bharathidasan University, Tiruchirapalli, India in 2010.
Thin Solid Films 517 (2009) 2069. He is pursuing his Ph.D degree in SASTRA University,
151. E. K. Heidari, C. Zamani, E. Marzbanrad, B. Raissi, S. Thanjavur, India, from 2011 to date. He is carrying out his
Nazarpour, Sens. Actuat. B 146 (2010) 165. research work in the development of nanomaterials for gas
152. A. Ponzoni, E. Comini, M. Ferroni, G. Sberveglieri, Thin Solid sensors.
Films 490 (2005) 81.
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Prabakaran Shankar et al.: Gas sensing mechanism of metal oxides: The role of ambient atmosphere, type of semiconductor
and gases - A review. Sci. Lett. J. 2015, 4: 126
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