 Thermal evaporation is the oldest technique and most accessible technique for growth of

thin metallic films

 Typical resistive heating elements are carbon (C), molybdenum (Mo), tantalum (Ta),
tungsten (W) and BN/TiB2 composite ceramics
 The major advantages of thermal evaporation are high film deposition rates
 Thermal evaporation technology however is limited to the evaporation of metals with
relatively low melting points, such as aluminium (Al) and zinc (Zn).
 Average working distances are 300 mm to 1 meter. (E-beam evaporation technique)
 E-beam technology is probably the fastest deposition source available today.
 Using high-power E-beam sources, deposition rates as high as 50 microns per second have
been attained
 The MBE process is essentially a refined form of vacuum evaporation