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Guimaraes Taylor Snell Eaves etal-JPhysC85 PDF
Guimaraes Taylor Snell Eaves etal-JPhysC85 PDF
et al. The n+ substrate, doped to 2 X 10l8~ m - is~200, pm thick. The other layers are a
buffer layer of 1pm thick 2 X 10l8cm-3 n+GaAs; 1 pm of 1 X 1015cm-3 n-GaAs; 168
ofundoped (A1Ga)As; 1 pmof2 X 10'8cm-3n+GaAs.The Alconcentrationisestimated
to vary from 0.37 (substrate side) to 0.32. Mesas of 200 pm diameter were prepared and
Au/Ge contacts were made to the top n+ and substrate layers.
I
01 0.2 03 04
VIVI
Figure 1. (a) The reverse bias I-V and ( b ) second derivative plots of device KS421/34.2 at
4 K (E = OT).
Typical results for two different samples are shown in figures 1 and 2. The derivative
plots were obtained with conventional modulation and lock-in techniques. The most
striking feature of our data, which contrast with those of Hickmott et al, is that we see
oscillatory structures in the I-Vand derivative plots (dI/d Vand d21/d V2versus V) even
at zero magnetic field (see for example figure l(b)). The amplitude (AZ/Z) of the
oscillatory structure is relatively small, typically 2% at a reverse bias of 0.2V, but
comparable with that reported by Hickmott et al. The structure is enhanced and more
clearly displayed in the derivative plots, particularly the d2Z/dV2 versus V plot. A
maximum in the second derivative plot corresponds to a minimum in the oscillatory part
of the direct I-V plot. The overall periodicity is 36 mV and corresponds to AV =
hwL/e.Our observation of oscillatory structure at zero magnetic field appears to invali-
date the conclusion reached by Hickmott et a1 that the donors in the n-GaAs layer
must be neutralised by magnetic freeze-out before the oscillatory effect can be seen.
Furthermore, we can still resolve well-defined oscillatory structure in the derivative plots
up to -50 K. For example, figure 2(c) shows very clearly resolved structure at 27 K.
At these temperatures the fraction of neutral donors in the n-GaAs region must be
negligible. Note that the poorer signal/noise ratio on figures 2(b) and 3(a) results from
the use of a small modulation voltage, which is required to resolve the fine structure (as
narrow as 1.7 mV) in the derivative plots at 4 K, and that weak sub-maxima are observ-
able in the d2Z/d V 2plot between the principal maxima.
Letter to the Editor L607
I I
01 0.2 03 04
V(V)
Figure2. The reverse bias I-Vand derivative plots of device K421/33.2. ( a ) Direct I-Vcurve
at T = 4 K ( B = 0 T); ( b ) second derivative plot of ( a ) ; ( c ) second derivative plot at 27 K,
B = 0 T. For curves ( b ) and ( c ) the second derivative signal is zero to within experimental
error at V = 0.
We have investigated several mesa structures prepared from the same MBE layer.
There are qualitative differences between various mesas even though they were fab-
ricated from the same MBE slice, some (e.g. KS421/33.2, shown in figure 2) passing more
current at low reverse bias than others (e.g. KS421/34.2, shown in figure 1). At higher
reverse biases (>0.2 V), the currents for all mesas investigated are very similar. In all
cases where the current is large enough to detect, the same oscillatory structure with
characteristic period of A V = h q / e is observed superimposed upon it. The anomalous
behaviour of some mesas at low bias is tentatively ascribed to inhomogeneity of the
barrier thicknesses or to microchannels in the barrier (Lu et aZ1985). Our preliminary
modelling of the I-V characteristics suggest that a variation of barrier thickness of a few
per cent can produce an appreciable change in the low bias current. A particularly
interesting feature of mesas such as KS421/33.2 is that the anomalously large low bias
current is also rich in structure, as can be seen from figure 2(a). It appears that there are
two groups of peaks in the I-V characteristics of these mesas. The first group of peaks,
at low bias, starts with a sharp peak at around 15 mV followed by three other peaks,
separated by 36 mV, which progressively broaden and weaken. A second group begins
with a sharp peak at 159 mV followed by a large number of well defined peaks, up to 20
principal maxima separated by fioL/e being observed in the d2Z/d V 2plots under opti-
mum conditions of temperature and magnetic field.
We suggest that the structure centred around 15 mV can be understood in terms of
the relative positions of the Fermi levels with respect to the conduction band edge in the
n+GaAs top layer and the n-GaAs active layer on the other side of the barrier. Before
L608 Letter to the Editor
w
I
2
+
0
2 4 6 8 10
BIT)
there is any appreciable tunnelling or microchannel current, the bias voltage must be
high enough to bring the edge of the conduction band in the active layer down to the
Fermi level in the degenerate n' layer. At this threshold voltage (which corresponds to
an energy of the order of the shallow donor binding energy, 6 meV) tunnelling can occur
into the travelling wave states of the conduction band continuum in the n- layer. In
the direct I-V plot, figure 2(a), this threshold is revealed as a rise in the current at
around 10mV. It is dramatically enhanced in the strong, sharp structure in the
d2Z/dV2 plots (figure 2 ( b ) ) centred at the voltage representing the inflection point of
the direct I-V curve.
Since the application of high magnetic fields has such an important effect on the I-V
Letter to the Editor L609
References
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