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A 0.5-V MTCMOS/SIMOX Logic Gate
A 0.5-V MTCMOS/SIMOX Logic Gate
Abstract— This paper proposes a multithreshold CMOS gate and the substrate terminals is contradictory to scaling
(MTCMOS) circuit that uses SIMOX process technology. This theory [6], and it generates leakage current through the thin
MTCMOS/SIMOX circuit combines fully depleted low-threshold gate oxide in the scaled-down MOSFET’s. In addition, the
CMOS logic gates and partially depleted high-threshold power-
switch transistors. The low-threshold CMOS gates have a leakage current of depletion-mode MOSFET’s is over one
large noise margin for fluctuations in operating temperature in order of magnitude larger than that of enhancement-mode low-
addition to high-speed operation at the low supply voltage of threshold MOSFET’s [1]–[3]. This causes the increase of the
0.5 V. The high-threshold power-switch transistor in which the power consumption in the active mode for large scale integra-
body is connected to the gate through the reverse-diode makes it tors (LSI’s) [1]–[3], in which the power consumption due to
possible to obtain large channel conductance in the active mode
without any increase of the leakage current in the sleep mode. the leakage current contributes to total power consumption.
The effectiveness of the MTCMOS/SIMOX circuit is confirmed This paper describes ultra-low-voltage circuit technology
by an evaluation of a gate-chain test element group (TEG) and with enhancement-mode MOSFET’s and no large back-
an experimental 0.5-V, 40-MHz, 16-b ALU, which were designed gate bias. Section II describes a novel MTCMOS circuit
and fabricated with 0.25-m MTCMOS/SIMOX technology. scheme [7] that uses SIMOX process technology [8]. This
Index Terms— CMOS digital integrated circuits, CMOSFET MTCMOS/SIMOX circuit combines fully depleted low-
logic devices, low-voltage circuits, power control, silicon-on- threshold CMOS logic gates and partially depleted variable
insulator technology. high-threshold MOSFET’s. In Section III, the effectiveness
of the circuit is confirmed by evaluating a gate-chain test
I. INTRODUCTION element group (TEG) and a 16-bit arithmetic logic unit
(ALU), which were designed and fabricated with 0.25-
R EDUCING supply voltage without any sacrifice of speed
is the most effective way to lower power consumption in
battery-operated portable equipment. Toward this end, various
m MTCMOS/SIMOX technology. A summary is given in
Section IV.
low-voltage circuits with low-threshold MOSFET’s have been
studied [1], [2]. We proposed multithreshold CMOS (MTC- II. CIRCUIT SCHEME
MOS) circuit technology [3] with low-threshold CMOS logic The MTCMOS/SIMOX circuit scheme is shown in Fig. 1.
gates and high-threshold power-switch transistors and showed Combining fully depleted low-threshold CMOS logic gates
that it provides high-speed operation in the active mode and and a partially depleted high-threshold power-switch transistor
low-power operation in the sleep mode. Using MTCMOS makes it possible to achieve both high-speed operation in the
technology, a 1-V digital signal processor (DSP) [4] for mobile active mode and low-power operation in the sleep mode at
phone applications has recently been developed. Improvements an ultra-low supply voltage of 0.5 V. In what follows, the
in MTCMOS device technology promise to lead to higher characteristics of each part of the MTCMOS/SIMOX circuit
operating frequencies. are described. For the low-threshold CMOS logic gates, the
However, higher frequencies will greatly increase power fully depleted MOSFET’s can improve speed at ultra-low
consumption even if the supply voltage is 1 V. To reduce supply voltage. This is because the circuits composed of
power consumption, it is necessary to lower the supply voltage the fully depleted MOSFET’s are not affected by junction
below 1 V without sacrificing speed. Operation at a supply capacitance, which increases significantly at a supply voltage
voltage of around 0.5 V is also expected to open the way for below 1 V in conventional bulk MOSFET’s whose bodies are
direct power supply by sunlight for portable communications tied to the supply line. In addition, the current drivability of the
terminals because the 0.5 V is equal to the voltage generated by fully depleted MOSFET’s is better than that of conventional
one solar-battery cell. An ultra-low-voltage circuit consisting bulk MOSFET’s. The subthreshold swing of the fully depleted
of depletion-mode MOSFET’s that operates at a supply voltage MOSFET is small and the threshold voltage can be reduced
of 200 mV has been reported [5], but the circuit needs back- without any increase in subthreshold current. For the power-
gate bias, which is much larger than the supply voltage, to switch transistor, a partially depleted MOSFET whose body
increase the threshold voltage and to reduce the leakage current is connected to the gate can reduce the threshold voltage
in the sleep mode. The large applied voltage between the and increase the channel conductance in the active mode
without increasing the leakage current in the sleep mode. The
Manuscript received August 30, 1996; revised April 7, 1997.
T. Douseki, S. Shigematsu, M. Harada, H. Inokawa, and T. Tsuchiya are technique of connecting the body directly to the gate and
with the NTT System Electronics Laboratories, Atsugi-shi, Kanagawa, 243- varying the threshold voltage at the operating mode is used
01, Japan. in ordinary DTMOS [9]. However, it cannot be applied to a
J. Yamada is with the NTT Technology Department, Shinjuku-ku, Tokyo,
163-19, Japan. circuit with a supply voltage over 0.8 V. The static current
Publisher Item Identifier S 0018-9200(97)06306-3. characteristics of the DTMOS are shown in Fig. 2(a). When
0018–9200/97$10.00 1997 IEEE
IEEE JOURNAL OF SOLID-STATE CIRCUITS, VOL. 32, NO. 10, OCTOBER 1997 1605
Fig. 1. MTCMOS/SIMOX circuit scheme. Fig. 3. Characteristics of drain current in high-threshold MOSFET’s.
TABLE I
0.25-m MTCMOS/SIMOX DEVICE CHARACTERISTICS (VDD = 0:5 V)
A. Gate-Chain TEG
To evaluate the delay time and power consumption of the
logic gate, we designed and fabricated a gate-chain TEG
containing many logic gates for such things as the inverters,
NAND gates, and NOR gates. The TEG makes it possible to
evaluate the delay time and the power consumption in relation
to the number of the fanouts and the wire length. The TEG
comprises standard cells. The channel width of a standard
cell for the low-threshold CMOS logic gates is 3 m for the
(a) nMOSFET and 6 m for the pMOSFET. The channel width of
a standard cell for the high-threshold power-switch transistors
is 20 times larger than that for the low-threshold CMOS logic
gates. The delay times in the 2-NAND logic gate are 80 ps at
the supply voltage of 1 V and 197 ps at 0.5 V in the unloaded
condition.
The delay-time of a fundamental logic gate, a two-input
NAND gate with three fanouts and wiring length of 1 mm, was
also evaluated. The dependence of the delay time in the funda-
mental logic gate with our MTCMOS/SIMOX circuit scheme
on the supply voltage is shown in Fig. 6. The delay-time
characteristics of conventional half- and quarter-micrometer
bulk MTCMOS circuits [4] are also shown for comparison.
The figure shows that only the MTCMOS/SIMOX circuit can
(b) operate at a supply voltage of 0.4 V without any increase in
the delay time. At the supply voltage of 1 V, the delay time is
Fig. 5. Measured leakage current of the sleep-control circuit: (a) micropho-
tograph of the measured sleep-control circuit and (b) characteristics of the 273 ps, which is less than half that of the quarter-micrometer
leakage current. bulk MTCMOS circuit. At the supply voltage of 0.5 V, the
delay time is 710 ps, which is less than 40% of that of the half-
micrometer bulk MTCMOS circuit at 1 V. To analyze the main
strate the effectiveness of the MTCMOS/SIMOX circuit. We
factors in the delay-time reduction, we calculated the delay-
used a SIMOX wafer in which the thicknesses of the gate time components of each MTCMOS circuit from the measured
oxide, the active silicon layer, and the buried oxide are 5, delay-time data for the fanouts and the wiring length. The
50, and 100 nm, respectively. Variations of the thicknesses results are shown in Fig. 7. The largest reduction factor is the
of the active silicon layer and the buried oxide are less than wiring delay-time related to the large current drivability of the
2 nm, and the standard deviation of threshold voltage in fully SIMOX device. The second is the intrinsic delay-time related
depleted low-threshold MOSFET’s is within 10 mV [10]. to the junction capacitance. These results becomes more clear
Low and high threshold voltages were obtained by changing for low supply voltage below 1 V.
the channel doping level. The dual-poly gate process was The influence of the power-switch transistor on the delay
used to ensure operation in the fully depleted mode at low- time is shown in Fig. 8. Since our power-switch transistor with
threshold MOSFET’s and suppress short-channel effects. The the variable-threshold MOSFET/SIMOX has large channel
channel length of the low-threshold MOSFET’s was set to conductance and small threshold-voltage variation [10], the
the minimum value of 0.24 m for high-speed operation. delay time and variation are less than those of a conventional
The channel length of the high-threshold MOSFET’s was set MOSFET/SIMOX with fixed-body bias. At the supply voltage
to 0.32 m so that the variation of the threshold voltage of 0.4 V, the delay time with our power-switch transistor
would be small and the effect of the variable threshold scheme is 1125 ps. This is 10% shorter and its variation 30%
voltage would be large at the supply voltage of 0.5 V. smaller than that with the conventional power-switch transistor
The threshold voltage and the drain saturation current of scheme.
the low- and high-threshold MOSFET’s are summarized in The total performance of the MTCMOS circuits were cal-
Table I. culated from the measured delay-time and power consumption
IEEE JOURNAL OF SOLID-STATE CIRCUITS, VOL. 32, NO. 10, OCTOBER 1997 1607
(b)
(a) (b)
Fig. 8. Comparison of power-switch transistor schemes: (a) variable-
Fig. 7. Delay-time components of fundamental logic gates: (a) V DD = threshold MOSFET/ SIMOX and (b) conventional MOSFET/SIMOX with
0:5 V and (b) VDD = 1 V. fixed-body bias.
(1)
(a)
(b)
Fig. 10. Microphotograph of the test chip.
Fig. 12. Waveforms of the sleep-control signal: (a) waveforms of the internal
sleep-control signal and (b) response of the virtual supply-voltage line.
TABLE II
TEST CHIP FEATURES
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