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15h00 OMMIC - F LECOURT PDF
15h00 OMMIC - F LECOURT PDF
15h00 OMMIC - F LECOURT PDF
• D01GH Process
• Electrical Performances & Guaranteed PCM
• D01GH MMICs
• Development of new GaN Process
OMMIC Processes
All rights reserved © 2018 OMMIC
• Epitaxial structure
• In situ passivation to avoid trapping / memory effects
• Thin AlN barrier to mitigate short channel effect
• AlGaN back barrier to improve electron confinement
All rights reserved © 2018 OMMIC
HR-Si(111) substrate
• Technological structure
• Short gate length and short gate-source distance (250nm) to
increase RF performances
• Regrown ohmic contact to minimize access resistance
(Rc < 0.1 ohm.mm and RON < 1 ohm.mm)
All rights reserved © 2018 OMMIC
AlGaN buffer
HR-Si(111) substrate
Via holes (Bosch process), air-bridges, NiCr & GaN resistors, SiN &
SiO2 MIM capacitors to allow mm-wave designs.
No metal layer of passive components directly on substrate.
• 3 stages
• Self bias, single 8V VDD
• Gain : 20 dB
CW on-wafer test
8V / 180mA • Noise figure : 1.2 dB
• P2dB : 21 dBm
• High robustness (40 dBc)
Confidential Information GaN for Microwave Applications – March 22th 2018 29
D01GH MMICs
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• 3 stages
• 3.2 mm gate periphery for
the last stage
• VDD 12 V / 0.7 W/mm DC
Example of 6 W Ka-band PA (small signal)
• 4.5x3.5 mm2
CW in-package test
VDD 12V
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• Gain > 20 dB
• Power : 37.5 dBm
• PAE : 30%
@10dB back-off
• 3 stages
• 3.2 mm gate periphery for the
last stage
• VDD 12 V & 15 V / 0.7 W/mm
All rights reserved © 2018 OMMIC
DC (small signal)
• 4.5x3.5 mm2
Example of 10 W Ka-band PA
Competition (IMS2017)
is 4.5dB
• Gain > 20 dB
• Power : 12.5 W @12V
• Power : 16 W @15V
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• PAE : 30%
on-wafer test
pulsed mode
• Gain : 18 dB
• Power : 37.5 dBm
All rights reserved © 2018 OMMIC
• PAE : 18%
on-wafer test
pulsed mode
• Vt ≈ 0 V
• RON ≈ 1.3 Ω.mm
END