IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, VOL. 34, NO.
5, SEPTEMBER/OCTOBER 1998
Destruction of Volatile Organic Compounds
Used in a Semiconductor Industry by a
Capillary Tube Discharge Reactor
Hitoshi Kohno, Alexander A. Berezin, Jen-Shih Chang, Senior Member, IEEE, Minoru Tamura,
Toshiaki Yamamoto, Akira Shibuya, and Shigeo Honda, Member, IEEE
Abstract— Nonthermal plasma technologies offer an innova-
tive approach to the problem of decomposing various volatile
organic compounds (VOC’s). We focused on dc capillary tube
discharge plasma reactors to study the decomposition/destruction
efficiency for toluene, EGM, trichloroethane, and trichlroethylene
at 50–2300-ppm levels in dry air. The effects of gas flow rate,
VOC concentration, and reactor operating conditions on decom-
position and analysis of reactant conversion for each VOC were
investigated. The results show that VOC destruction efficiency
as high as 90% can be achieved, even under a short residence
time (3.8 ms) with a destruction energy efficiency of up to 95
g (VOC)/kWh. Laboratory-scale plasma technology was success-
fully demonstrated for its potential application for VOC control
in the semiconductor clean-room environment.
Index Terms—Aerosols, capillary tube discharge reactors, envi-
ronmental technology, gas discharge, nonthermal plasma, plasma
chemistry, volatile organic compounds.
I. INTRODUCTION
V OLATILE organic compounds (VOC’s), such as toluene
(C H CH ), o-xylene C H (CH ) , trichloroethane
(TCA, C H Cl ), EGM (ethylene glycolmono-ethylether,
C H O ), and trichloro-ethylene (TCl, C HCl ) are typical
emission gases from semiconductor industries. These gases
must be removed from the clean-room environment.
Various technologies have been investigated for decompos-
ing the VOCs, including catalytic oxidation, thermal decom-
position, carbon adsorption, and condensation. More recently,
nonthermal plasma technologies (electrical discharge process-
ing) have offered an innovative approach to the problem of de-
composing various VOC’s [1]–[36]. Nonthermal plasma VOC
destruction technologies include nanosecond pulsed corona
Paper MSDAD 97–40, presented at the 1995 Industry Applications Society
Annual Meeting, Lake Buena Vista, FL, October 8–12, and approved for
publication in the IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS by the
Electrostatic Processes Committee of the IEEE Industry Applications Society.
This work was supported in part by Asahikogyosha Company Ltd. and in part
by the Natural Sciences and Engineering Research Council of Canada (JSC,
AAB). Manuscript released for publication March 30, 1998.
H. Kohno, M. Tamura, A. Shibuya, and S. Honda are with the Research
and Development Center, Asahikogyosha Company Ltd., Chiba, 275 Japan.
A. A. Berezin and J.-S. Chang are with the Department of Engineering
Physics, McMaster University, Hamilton, Ont., L8S 4L7 Canada.
T. Yamamoto was with the Center for Environmental Technology, Research
Triangle Institute, Research Triangle Park, NC 27709-2194 USA. He is now
with the Department of Energy Systems Engineering, College of Engineering,
Osaka Prefecture University, Osaka, 599-8531 Japan.
Publisher Item Identifier S 0093-9994(98)06788-7.
0093–9994/98$10.00  1998 IEEE
953
[2], [5], [11], dielectric barrier discharge [3], [14], [33], surface
discharge [14], [18], [19], [21], [24], ferroelectric packed-bed
[2], [5]–[10], electron beam [26]–[32], and flow-stabilized dc
discharge processes [4], [12], [20], [22], [23]. For a recent
review, see [36].
Plasma chemical processes have been known to be highly
effective in promoting oxidation, enhancing molecular dis-
sociation, and producing free radicals to enhance chemical
reactions. In nonthermal plasmas, electron mean energies are
considerably higher than those of the components of the
ambient gas. The majority of the electric energy goes into
the production of energetic electrons, rather than into the
heating of gas and ions. The energy in the plasma is, thus,
directed preferentially to the electron-impact dissociation and
ionization of the background gas to produce radicals that, in
turn, decompose the targeted toxic air or VOC’s. This is in
contrast to the use of thermal plasma furnaces or torches and
several chemical techniques in which the whole gas is heated
in order to break up the VOC’s [1].
Plasma reactor design concepts can be divided into two
categories. The first type aims to design reactors in which
plasmas are created in a wide cross section of flow channel,
such as electron beam and pulse corona. The second type
is aimed at gas passing through the narrow plasma region,
such as barrier silent, dc, packed-bed reactors. Reactors can
be classified by their physical construction and method of
energization based on these design concepts. Each physical
arrangement has several advantages for reactions, while the
energization is closely coupled with the reactor design.
A capillary tube plasma reactor belongs to the latter type
of design concepts. It consists of a small-diameter pyrex glass
cylindrical tube with needle-type electrodes placed at the end
of a cylindrical tube [1]. A high-voltage dc is applied to form
streamer coronas or repeated spark discharge.
The packed-bed plasma reactor, which is of a similar
category to the silent discharge [1], [3] (or dielectric barrier
discharge), uses high dielectric pellets powered by lower fre-
quencies, such as ac line frequency or little higher. However,
the packed-bed plasma reactor must be distinguished from the
gas-phase corona reactor or the silent discharge reactor, in
which the dielectric plates are separated by a few millimeters
and a line AC frequency up to a few kilohertz are commonly
used. Successful decomposition was demonstrated for toluene,
methylene chloride, and trichlorotrifluoroethane (CFC-113)
954 IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, VOL. 34, NO. 5, SEPTEMBER/OCTOBER 1998

(a)

(b)

Fig. 1. (a) Schematics of the experimental setup. (b) Schematics of the capillary tube discharge reactor.

by a packed-bed plasma reactor [5]–[10]. The nonthermal
plasma approach was deemed to be most appropriate for low-
concentration VOC applications [4]–[7]. Despite the fact that
some gas heating takes place during the discharge, the basic
assumption of nonthermal plasma (different temperatures of
charged and neutral species) remains likely valid in all cases
considered in the present paper.
A laboratory-scale capillary tube plasma reactor was in-
vestigated to control toluene (C H CH ), EGM (C H O ),
trichloroethane (C H Cl ), and trichloroethylene (C HCl ) at
50–2300-ppm levels in dry air. This study developed baseline
engineering data to demonstrate the feasibility of the plasma
reactor for the destruction of various VOC’s at the above ppm
levels.
KOHNO et al.: DESTRUCTION OF VOC’S USED IN A SEMICONDUCTOR INDUSTRY 955

(a) (b)
Fig. 2. (a) Typical current and voltage waveforms of capillary tube reactor discharges. (b) Single-pulse current waveform and voltage waveform of
capillary tube reactor discharges.

II. EXPERIMENTAL SETUP

The schematic diagram of the testing apparatus is shown in
Fig. 1. To clarify the destruction process, dry air (N : 8O%
vol, O : 20% vol) was used as a balanced gas and relatively
simple and reactive VOC’s, such as toluene, EGM, TCE, and
TCA, the major emission source among VOC’s, were used.
Air supplied from the laboratory is divided into two air flows
after silica gel air dryers. Each flow rate is controlled with
a flow meter. One air flow is introduced into the bubbler
which contains liquid VOC’s. The air with almost saturated
VOC vapor is mixed with the other air flow and diluted
to the prescribed VOC concentration. Initial concentration of
VOC is measured by a VOC meter (VLC Snifer). Discharge
byproducts of treated air are qualitatively and quantitatively
analyzed by Fourier transform infrared (FTIR) spectrometer Fig. 3. Typical time-averaged discharge current as a function of applied dc
(Bio-Rad model FTS-4O) and gas chromatography (GC), Q
voltage for various VOC’s at gas flow rate g = 1 L/min.
respectively, after gas sampling before and after plasma reactor
and activated carbon filters. The accuracy of GC for VOC
measurements is 0.5 ppm. DC high voltage is applied be-
tween electrodes. To protect the dc high-voltage power supply,
a ballast resistor is used. An optical particle counter is used
for aerosol particle size distribution and density measurement
downstream of plasma reactors [12]. The pressure drop of the
plasma reactor is determined by standard manometers.
The schematic of the capillary tube plasma reactor in
shown in Fig. 1(b). The capillary walls confine the streamer
corona discharge and force the flue gas to pass through the
streamer corona discharge region with minimal sneakage [1].
The capillary tube plasma reactor is made of quartz and
consists of a 2.5-mm i.d. and 100-mm-long tube with two
needle electrodes (with 10-mm gap length). DC high voltage
is imposed between two electrodes.

III. FUNDAMENTAL CHARACTERISTICS OF CAPILLARY
TUBE DISCHARGE REACTORS
A. Current–Voltage Characteristics
Typical current and voltage waveforms are shown in Fig.
2(a). In this case, spark discharges are repeated at 4-kHz
Fig. 4. Pressure drop characteristics of capillary tube discharge reactor with
and without gas discharges.
frequency, and applied dC voltage is effected by a spark, as
shown in Fig. 2(a). Fig. 2(b) shows a single pulse current
waveform and corresponding voltage waveforms. The current
956 IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, VOL. 34, NO. 5, SEPTEMBER/OCTOBER 1998
(a)
Fig. 5. (a) Destruction efficiency of toluene as a function of gas flow rate and (b) discharge current for various initial concentrations.
pulse height can be as high as 20 A, and pulsewidth is
around 200 ns. However, the pulse frequency is low enough to
avoid significant gas heating. Typical time-averaged discharge
current as a function of applied dc voltage for various VOC’s
at gas flow rate L/min is shown in Fig. 8. The pressure
difference on the capillary tube ranged from negligible to 2500
mm of water, as determined by the manometers at both ends
of the tube. The time-averaged current–voltage characteristics
show negative differential conductivity with
the polarity, such as the applied voltage (gas flows from the
negative to positive electrode). Fig. 3 shows that the discharge
current is significantly influenced by a type of trace VOC
in air. However, the current–voltage characteristics are not
significantly influenced by a gas flow for the case of lower
gas flow rate, where the velocity is less than 10 m/s. For a
higher gas flow rate, where the velocity is more than 21 m/s,
the voltage to obtain a given discharge current increases with
increasing gas flow rate due to the flow stabilized effect, as
suggested by Chang et al. [1], [12].
B. Pressure Drop Characteristics of Capillary Tube
Discharge Reactors
The pressure drop in the capillary tube discharge reactor
(Fig. 4) shows an increase with flow rate and the presence
of gas discharge. At comparable flow rates (e.g., 9 L/min),
the pressure drop for a 2-mm i.d. is observed to be about five
times greater than for an i.d. of 3 mm. The increase of pressure
drop with discharge is likely due to the heating effect on gas
(b)
pressure and/or the effect of the increase of concentration of
molecular species during the discharge.
IV. DESTRUCTION OF TOLUENE
Toluene destruction efficiency as a function of gas flow
rate for various toluene concentrations at the fixed discharge
current is shown in Fig. 5. Fig. 5 shows that the destruction
efficiency of toluene gas nonmonotonically decreases with in-
creasing gas flow rate (or decreasing residence time) of VOC’s
in a plasma channel. The destruction efficiency of toluene also
increases nonmonotonically with increasing discharge current.
In a capillary tube reactor, the space occupied by VOC’s
containing air is always under energetic electron showers,
hence, an effective collision between electrons and VOC’s
molecules is proportional to the electrons and/or VOC’s den-
sities. The destruction efficiency is approximately proportional
to the residence time; up to 86% of destruction efficiency
is achieved with even 23.4 ms residence time at
mA for a 1246-ppm toluene initial concentration. A slight
increase of the destruction efficiency at higher flow rates (Fig.
5) is likely related to nonmonotonic dependency of radical
formation and enhancement of discharge stability, due to the
effective cooling of the electrode. 100% removal of remaining
toluene and other byproducts is also observed downstream of
the activated carbon filters.
Typical FTIR adsorption spectroscopy output before and
after glow discharge is shown in Fig. 6. Fig. 6(b) shows that
gaseous byproducts, such as CO , CO, NO , and H O, are
KOHNO et al.: DESTRUCTION OF VOC’S USED IN A SEMICONDUCTOR INDUSTRY 957

(a)

(b)

Q
Fig. 6. (a) FTIR absorption for toluene experiment before discharge at g = 1 L/min and No = 1042 ppm. (b) FTIR absorption for toluene experiment
after discharge at Qg = 1 L/min, V = 11 kV, I = 1 mA, and No = 1042 ppm.
958 IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, VOL. 34, NO. 5, SEPTEMBER/OCTOBER 1998

Fig. 7. Voltage dependence of aerosol particles generation for toluene at Qg = 1 L/min and No = 600 ppm.

Fig. 8. Electron impact dissociation of toluene and possible byproducts.

produced. Ozone, however, which is commonly generated by dissociation of molecules [14], [15]. For toluene, the reactions
a corona discharge, is not clearly observed, since a capillary of toluene with radicals (such as O and O ) are insignificant,
tube high-energetic plasma may destroy ozone, due to the heat except OH radicals, where the reaction rate of these radicals
generated by gas discharges. In addition to gaseous byproducts, are [16]
a significant amount of brown particles deposited near the exit
side of the plasma reactor is observed. Toluene is dissociated C H CH O
to CO and CO as gaseous compounds, mainly to form C H CH O H: cm /s
carbon and nitrogen hydride bonded particles and tears. Fig. 7 C H CH O
shows the voltage dependence of aerosol particles generated, C H CHO H O: cm /s
where the maximum aerosol particle density coincides with the
C H CH OH
maximum toluene destruction efficiency, as shown in Fig. 5(a).
The principle processes of the VOC’s destruction induced C H CH H O: cm /s
by energetic electrons in plasma are electron and radical impact C H CH OH: cm /s
KOHNO et al.: DESTRUCTION OF VOC’S USED IN A SEMICONDUCTOR INDUSTRY 959

(a) (b)

Fig. 9. Destruction efficiency of trichloroethylene as a function of (a) applied voltage and (b) gas flow rate.

On the other hand, the charge transfer reactions of toluene produced by plasma processes where O , CO, CO , NO , and
with ions and recombination of toluene ions and electrons are H O are also observed as discharge byproducts [14].
significant [16] Hence, the mechanism of toluene destruction by an ener-
getic electron induced plasma process can be summarized as
C H CH O , O , N , or N follows:
C H CH O, O , N, or N : cm /s 1) dissociation and ionization of O , N , and toluene by
C H CH e C H CH : cm /s electrons to form O, O , N, H, hydrocarbon radicals,
and ions;
However, the ion densities are much lower, by 4–5 orders 2) formation of OH radicals from radical atom–molecule
of magnitude, compared with radical densities. Hence, the and ion–molecule reactions [16], [36];
following energetic electron impact dissociations may provide 3) dissociation of toluene by OH radicals and negative ions
additional probable reaction channels (see Fig. 8): to form hydrocarbons;
4) oxidation of hydrocarbons to form CO, CO , and H O;
C H CH C H CH 5) oxidation of nitrogen and oxygen to form NO and O
C H CH H [13], [15] and finally trace N O and HNO formations
C H C H [15];
C H C H 6) formation of aerosol particles by ion induced aerosol
formations [15] from hydrocarbons and nitrates.
since the electron density is as high as 10 cm in the
discharge channel [34], where the reaction rate is of the
order of 10 cm /s and a function of electron mean en- V. DESTRUCTION OF TRICHLOROETHYLENE
ergy [16]. Significant amounts of COOH H, COOH CH , Fig. 9 shows the destruction efficiency of TCE for various
COOH C H , N H CH , and OH C H molecules observed discharge currents and gas flow rates. Dissociation efficiency
in aerosol particles [6], and C H observed in a gas phase [14], at currents exceeding 1 mA shows some decrease, likely due
also support existence of the above electron impact dissociated to falling current–voltage characteristics of gas discharge. The
byproducts formation channels. The dissociated byproducts are flow rate dependence for destruction efficiency of TCE shows
also reacting with oxygen, nitrogen, and hydrogen free radicals greater destruction efficiency for lower flow rates.
960 IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, VOL. 34, NO. 5, SEPTEMBER/OCTOBER 1998

(a)

(b)

Fig. 10. Typical FTIR spectrum (a) before and (b) after discharge for TCE at Qg = 1 L/min.
KOHNO et al.: DESTRUCTION OF VOC’S USED IN A SEMICONDUCTOR INDUSTRY
(a)
Fig. 11. (a) Destruction efficiency of trichloroethane as a function of discharge current at
Q
function of discharge current at g = 1 L/min.
Typical FTIR spectra for TCE before and after capillary tube
discharge are shown in Fig. 10. The major discharge byprod-
ucts are CO , CO, NO , HCl, and COCl . Their (relative)
concentrations show comparatively weak dependence on the
applied voltage. TCE can be dissociated or ionized by a direct
electron impact as follows:
C HCl C Cl H
C HCl Cl
CHCl CCl
C HCl
C HCl Cl
C Cl H
since significant high electron concentrations can be generated
by pulse corona discharges, as described above.
TCE can be destroyed by oxidation processes, due to rad-
icals generated by corona discharges. However, based on the
chemical kinetic model proposed by Chang et al. [14], negative
ions, such as Cl , C , CO , CO , ClO , HCCl , HC Cl ,
etc., may also play an important role in a destruction process.
These can be observed from the discharge byproducts, such
as H O, CO, COCl , NO , HNO , HCl, and CO . Since HCl
and COCl are trace as observed in final discharge byproducts,
Cl , which cannot be observed by FTIR, is considered to
be a final major chlorine compound. Absorbance peak wave
number of 1793 cm is identified as trace COCl species,
however, this peak cannot be found after passing through
961
(b)
Qg = 1 L/min. (b) Destruction efficiency of EGM as a
activated carbon filters which were installed before exhaust,
as the other discharge byproducts. The experiments also show
that the formation of aerosol particles is significantly reduced
under corona discharge field, since TCE may be destroyed
before forming aerosol particles under corona discharges.
VI. DESTRUCTION OB TRICHLOROETHANE
The TCA destruction efficiency in Fig. 11(a) shows rela-
tively less variation with current than the TCE test. However,
for TCA, the relative concentrations of discharge products
show greater apparent variability than for the TCE case.
Typical FTIR spectra for TCA destruction tests before and
after capillary tube discharge are shown in Fig. 12. The main
products are CO , CO, NO , HCl, NO , and COCl , as shown
in Fig. 12. No presence of TCA is detected after the activated
carbon filter.
VII. DESTRUCTION OF EGM
The EGM destruction efficiency [Fig. 11(b)] peaks at about
1.5 mA and is generally higher than the TCA test. Typical
FTIR spectra for EGM destruction before and after discharge
are shown in Fig. 13. A somewhat greater variety of products
can be deduced from the FTIR spectra. Fig. 13 shows the
presence of CO , CO, N O, NO , and HNO . The latter shows
a decrease with the discharge current, while nitrogen oxides
are either stable or show some increase at higher discharge
currents.
962 IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, VOL. 34, NO. 5, SEPTEMBER/OCTOBER 1998

(a)

(b)

Fig. 12. Typical FTIR spectrum (a) before and (b) after discharges for TCA.
KOHNO et al.: DESTRUCTION OF VOC’S USED IN A SEMICONDUCTOR INDUSTRY 963

(a)

(b)

Fig. 13. Typical FTIR spectrum (a) before and (b) after discharges for EGM.
964 IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, VOL. 34, NO. 5, SEPTEMBER/OCTOBER 1998
(a)
(c)
Fig. 14. Energy efficiency of VOC destruction based on plug power
for (a) toluene, (b) TCE, (c) TCA, and (d) EGM.
VIII. ENERGY EFFICIENCY OF VOC DESTRUCTION
Energy efficiency based on electrical energy used in the
plasma reactor (based on time-averaged current and
voltage on the reactor) and based on plug (consumed from
the network including the power supply and ballast resistor
loss) power is shown as a function of discharge power
in Fig. 14. Fig. 14 shows that the energy efficiency of VOC
destruction decreases with increasing plug power. The order of
and are 5–95 and 2–5 g (VOC’s)/kWh, respectively.
IX. CONCLUDING REMARKS
The laboratory-scale capillary plasma reactor was used
for VOC destruction in an air stream, and the following
(b)
(d)
EyP and electrical energy used in plasma reactor as a function of discharge power
conclusions are obtained.
1) Toluene, TCE, TCA, and EGM destruction efficiencies
and destruction energy efficiencies increase nonmono-
tonically with increasing discharge current, residence
time, and the VOC’s initial concentration.
2) Toluene destruction efficiencies are as high as 80%, even
under a short residence time (3.8 ms). Both parallel
and series-connected reactor banks, with relatively short
residence times (< 10 ms), are required for much higher
destruction efficiencies and gas flow rates for the present
type of reactors.
3) Toluene, TCE, TCA, and EGY are mainly dissociated to
CO, CO , and H O and nitrogen hydride bonded aerosol
particles and tars.
KOHNO et al.: DESTRUCTION OF VOC’S USED IN A SEMICONDUCTOR INDUSTRY
ACKNOWLEDGMENT
The authors wish to express their appreciation to P. C. Looy,
K. Urashima, T. Ito, and S. Iijima for valuable discussion and
comments.
REFERENCES
[1] J. S. Chang, P. A. Lawless, and T. Yamamoto, “Corona discharge
processes,” IEEE Trans. Plasma Sci., vol. 19, pp. 1152–1167, Dec. 1991.
[2] Y. Kamase, T. Nagahama, and A. Mizuno, “Removal of ethylene by
streamer corona discharge,” in Conf. Rec. IEEE-IAS Annu. Meeting,
1991, pp. 747–751.
[3] D. Evans, J. J. Coogan, G. K. Anderson, L. A. Rosocha, and M.
J. Kushner, “Plasma remediation of trichloro-ethylene in silent dis-
charge plasmas,” J. Appl. Phys., vol. 74, no. 9, pp. 5378–5386, Nov.
1993.
[4] T. Yamamoto, P. A. Lawless, K. Ramanathan, D. S. Ensor, G. H.
Ramsey, and N. Plaks, “Application of corona-induced plasma reactors
to decomposition of volatile organic compounds,” in Proc. 8th Symp.
Transfer and Utilization of Particulate Control Technology, San Diego,
CA, Mar. 1990, pp. 234–238.
[5] T. Yamamoto, K. Ramanathan, P. A. Lawless, D. S. Ensor, J. R.
Newsome, G. H. Ramsey, and N. Plaks, “Control of volatile organic
compounds by an AC energized ferroelectric pellet reactor and a pulsed
corona reactor,” IEEE Trans. Ind. Applicat., vol. 28, pp. 528–534,
May/June 1992.
[6] C. M. Nunez, G. H. Ramsey, W. H. Ponder, J. H. Abbott, L. E.
Hamel, and P. H. Kariher, “Corona destruction: An innovative control
technology for VOC’s and air toxic,” Air Waste, vol. 43, pp. 244–247,
Feb. 1993.
[7] T. Yamamoto, P. A. Lawless, M. K. Owen, D. S. Ensor, and C. Boss,
“Control of volatile organic compounds by a pulsed corona reactor
and a packed bed reactor,” in Non-Thermal Plasma Technologies for
Pollution Control, NATO ASI Series, vol. 34, pt. B, B. M. Penetrante
and S. E. Schultheis, Eds. Berlin, Germany: Springer-Verlag, 1993,
pp. 223–237.
[8] T. Yamamoto, J. S. Chang, A. A. Berezin, H. Kohno, S. Honda, and A.
Shibuya, “Decomposition of toluene, o-xylene, trichloroethylene, and
their mixture using BaTiO3 packed bed reactor,” J. Adv. Oxidation
Technol., vol. 1, no. 1, pp. 67–78, Mar. 1996.
[9] R. H. Zhang, Y. Yin, T. Yamamoto, and D. S. Bundy, “Control of
ammonia and odors in animal houses by a ferroelectric plasma reactor,”
in Conf. Rec. IEEE-IAS Annu. Meeting, Denver, CO, Oct. 3–6, 1994,
pp. 1545–1549.
[10] T. Yamamoto, B. Mizuno, I. Tamori, A. Ogata, M. Nifuku, M. Michal-
ska, and G. Prieto, “Catalysis-assisted plasma technology for carbon
tetrachloride destruction,” in Conf. Rec. IEEE-IAS Annu. Meeting, Den-
ver, CO, Oct. 3–6, 1994, pp. 1556–1562.
[11] J. S. Chang, T. Yamamoto, H. Kohno, M. Tamura, S. Honda, A.
Shibuya, and A. A. Berezin, “Removal of xylene, trichloroethylene and
their mixtures from air stream by a pulsed corona dischaged induced
plasma reactor,” J. Adv. Oxidation Technol., vol. 2, no. 2, pp. 346–352,
1997.
[12] H. Kohno, S. Honda, T. Yamamoto, J. S. Chang, and A. A. Berezin,
“Generation of aerosol particles by spark discharges in a capillary tube
under air flow with trace volatile organic compounds,” J. Aerosol Sci.,
vol. 25, suppl. 1, pp. S41–S42, 1994.
[13] K. Donohoe, F. H. Shair, and O. R. Wulf, “Production of O3 , NO and
N2 O, in a pulsed discharge at 1 atm,” Ind. Eng. Chem. Fundam., vol.
16, no. 2, pp. 208–215, May 1977.
[14] J. S. Chang, K. Urashima, and T. Ito, “Mechanism of nonthermal
plasma treatment of volatile organic compounds in dry air,” in Emerging
Technologies in Hazardous Waste Management VI, D. W. Tedder. Ed.
Atlanta, GA: ACS Press, 1994, pp. 203–206.
[15] J. S. Chang, “The pole of H2 O and NH3 on the formation of NH4 NO3
aerosol particles and De-NOx under the corona discharge treatment of
combustion flue gases,” J. Aerosol Sci, vol. 20, no. 8, pp. 1089–1097,
Aug. 1989.
[16] A. W. Miziolek, J. T. Herron, W. G. Mallard, J. W. Hudgens, D.
S. Green, W. Tsang, and J. S. Chang, “Importance of chemistry in
nonthermal plasma control of volatile organic compounds and air
toxics,” in Proc. ELMECO’94, 1994, pp. 65–71.
[17] J. S. Chang, R. M. Hobson, T. Kaneda, and Y. Ichikawa, Atomic and
Molecular Processes in an Ionized Gas. Tokyo, Japan: Tokyo Denki
Univ. Press, 1983.
965
[18] S. Yamakuma, A. Osawa, T. Kodama, and Y. Tabata, “Detoxification
of hazardous gaseous substances by discharge plasma—Decomposition
of aromatic organic solvents by surface discharge plasma,” Research
Institute for Industrial Safety, Japan, Res. Rep. R11S-RR-92, 1992, pp.
157–166.
[19] T. Oda, T. Takahashi, H. Nahano, and S. Masuda, “Decomposition of
flurocarbon gaseous contaminants by surface discharge induced plasma
chemical processing,” IEEE Trans. Ind. Applicat., vol. 29, pp. 787–792,
July/Aug. 1993.
[20] J. D. Skalny, V. Sobek, and P. Lukac, “Negative corona induced
decomposition of CCl2 F2 ,” in Non-Thermal Plasma Techniques for
Pollution Control, B. M. Penetrante and S. E. Schultheis, Eds. Berlin,
Germany: Springer-Verlag, 1993, pp. 161–165.
[21] S. Masuda, S. Hosokawa, X.-L. Tu, K. Sakakibara, S. Kitoh, and S.
Sakai, “Destruction of gaseous pollutants by surface induced plasma
chemical process (SPCP),” IEEE Trans. Ind. Applicat., vol. 29, pp.
781–788, July/Aug. 1993.
[22] H. Emi and Y. Otani, “Simultaneous removal of gaseous and par-
ticulate components in cigarette smoke,” in Proc. Tobacco Chemistry
Foundation Meeting, 1993, pp. 1–8.
[23] Y. Otani, H. Emi, J. Moi, and H. Nishino, “Fundamental study on
the simultaneous removal of gaseous and particulate matters in room
environment by fibrous filter,” J. Aerosol Sci, vol. 22, suppl. 1, pp.
S793–S796, 1991.
[24] S. Masuda, S. Hosokawa, X.-L. Tu, M. Tsutsumi, T. Ohtani, T. Tsuka-
hara, and N. Matsuda, “The performance of an integrated air purifier
for control of aerosol, microbial and odor,” IEEE Trans. Ind. Applicat.,
vol. 29, pp. 774–779, July/Aug. 1993.
[25] W. C. Neely, J. P. Wey, E. I. Newhouse, E. J. Clothiaux, C. A. Gross,
and G. S. Ranhotra, “Chemical reaction mechanisms in silent discharge
plasma implications for selection of pollution control applications,” in
Proc. 1st Int. EPRI/NSF Symp. Advanced Oxidation, 1993, vol. 2, p.
473.
[26] J. R. Bayliss, C. P. Burkhart, and A. Kuthi, “An electron beam process
for elimination of low concentrations of VOC’s in waste gas streams,”
in Proc. 1st Int. EPRI/NSF Symp. Advanced Oxidation, 1993, vol. 2, pp.
561–560.
[27] H. R. Paur, H. Matzing, and K. Woletz, “Removal of volatile
organic compounds from industrial off gas by irradiation induced
aerosol formation,” J. Aerosol Sci, vol. 22, suppl. 1, pp. S509–S512,
1991.
[28] H. Scheytt, H. Esrom, L. Prager, R. Mehnert, and C. von Son-
ntag, “Ultraviolet light and electron beam induced degradation of
trichloroethene,” in Non-Thermal Plasma Technologies for Pollution
Control, B. M. Penetrante and S. E. Schultheis, Eds. Berlin, Germany:
Springer-Verlag, 1993, pp. 71–101.
[29] R. C. Slater and D. H. Douglas-Hamilton, “Electron beam initiated
destruction of low concentrations of vinyl chloride in carrier gases,”
J. Appl. Phys, vol. 52, no. 9, pp. 5820–5828, , Sept. 1981.
[30] M. Koch, D. B. Cohn, B. M. Patrick, M. P. Schuetze, L. Bromberg,
D. Reilly, and P. Thomas, “Electric field effects on decomposition of
dilute concentrations of CHCl3 and CCl4 in electron beam generated
air plasma,” Phys. Lett. A, vol. 184, no. 1, pp. 109–113, Dec. 1993.
[31] L. Bromberg, D. B. Cohn, M. Koch, B. M. Patrick, and
P. Thomas, “Decomposition of dilute concentrations of
carbon tetrachloride in air by an electron-beam generated
plasma,” Phys. Lett. A, vol. 173, no. 3, pp. 293–299, Feb.
1995.
[32] M. C. Hsiao, B. T. Merritt, B. M. Penetrante, G. E. Vogtlin, and P. H.
Wallman, “Plasma assisted decomposition of methanol and trichloroety-
lene in atmospheric pressure air streams by electrical discharge process-
ing,” J. Appl. Phys., vol. 78, no. 5, pp. 3451–3457, Sept. 1995.
[33] M. B. Chang and C. C. Lee, “Destruction of formaldgehyde with
dielectric barrier discharge plasma,” Environ. Sci. Technol., vol. 28, no.
3, pp. 181–186, June 1995.
[34] J. S. Chang, K. Urashima, H. Thompson, T. A. Myint, A. Chakrabarti,
and T. Ito, “Modeling of capillary tube plasma reactor corona discharge
parameters in dry air with trace voltaile organic compounds,” in Proc.
12th Int. Symp. Plasma Chemistry, J. Heberlein, Ed. Minneapolis, MN:
Univ. of Minnesota Press, 1995, vol. 2, pp. 995–1000.
[35] H. Matzing, “Chemical kinetics of flue gas cleaning by irradiation with
electrons,” Adv. Chem. Phys., vol. 80, pp. 315–402, 1991.
[36] K. L. L. Vercammen, A. A. Berezin, F. Lox, and J. S. Chang, “Non-
thermal plasma techniques for the reduction of volatile organic com-
pounds in air streams: A critical review,” J. Adv. Oxidation Technol.,
vol. 2, no. 2, pp. 312–329, Dec. 1997.
966 IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, VOL. 34, NO. 5, SEPTEMBER/OCTOBER 1998

Hitoshi Kohno received the D.Sc. degree in bio-
logical and environmental sciences from Saitama
University, Urawa, Japan, in 1997.
In 1983, he joined Asahikogyosha Company Ltd.,
Chiba, Japan, where he is currently a Research
Engineer. He has been engaged in research on
air cleaning technologies using nonthermal plasma
discharge to improve indoor air quality in clean
rooms or other industrial facilities.
Dr. Kohno is a member of the Society of Heating,
Air-Conditioning and Sanitary Engineers of Japan,
Japan Association of Aerosol Science and Technology, and the Institute of
Electrical Engineers of Japan.
Alexander A. Berezin received the Ph.D. degree
in theoretical solid-state physics in 1970 from
Leningrad State Univesity, Leningrad, U.S.S.R.
Following several academic appointments in
Leningrad, U.S.S.R., he joined the Faculty of
Engineering, McMaster University, Hamilton, Ont.,
Canada, where he became a Full Professor in
1996. He has contributed to a variety of subjects
of fundamental and applied nature, including
semiconductor devices, thin films, plasma physics,
electrostatics, isotope effects in physics and biology,
corrosion physics, and environmental technology. He has also authored works
on social and philosophical aspects of science and, in particular, on the
limitations of the peer review system in science.
Jen-Shih Chang (M’90–SM’96) received the
B.Eng. and M.Eng. degrees in electrical engineering
from Musashi Institute of Technology, Tokyo,
Japan, and the Ph.D. degree in experimental space
sciences from York University, Toronto, Ont.,
Canada.
From 1973 to 1974, he was a Researcher
at the Centre de Recherches en Physique de
l’Environment, CNRS, France. From 1975 to 1979,
he was a Project Scientist/Assistant Professor with
the Department of Physics and Center for Research
in Experimental Space Sciences, York University. From 1979 to 1986, he was
an Assistant/Associate Professor with the Department of Engineering Physics,
McMaster University. During 1985–1996, he was a Visiting Professor with
Musashi Institute of Technology, Tokyo Denki University, Tokyo University,
University of Sevilla, Joseph Fourier University, University of Poitiers, and
Tokyo University of Agriculture and Technology. Since 1987, he has been
a Professor at McMaster University, where he is involved in research on
applied electrostatics, air pollution control, solid and liquid waste destruction,
and plasma technologies.
Prof. Chang is currently Chair of the Electrohydrodynamics Technical
Committee of the IEEE Dielectrics and Electrical Insulation Society.
Toshiaki Yamamoto (M’97) received the Ph.D. de-
gree from the Mechanical Engineering Department,
Ohio State University, Columbus.
He is currently a Professor in the Department
of Energy Systems Engineering, Osaka Prefecture
University, Osaka, Japan. Prior to this, he was a Se-
nior Research Engineer with the Research Triangle
Institute, Research Triangle Park, NC, an Adjunct
Professor and a Research Engineer at the University
of Denver, Denver, CO, and a Research Engineer
with United McGill Corporation, OH. His research
interest is the application of electrostatics, including nonthermal plasma
technology, air pollution control, indoor air quality, and electrohydrodynamics
and microcontamination control research. He is the author of numerous
publications.
Dr. Yamamoto is a member of Sigma Xi, the Japan Society of Mechanical
Engineers, Institute of Electrostatics Japan, American Society of Heating,
Refrigeration and Air Conditioning Engineers, and Japan Association of
Aerosol Science and Technology.
Akira Shibuya received the B.Eng. degree in
electrical engineering from Yamagata University,
Yonezawa, Japan, in 1956.
From 1960 to 1986, he was with Ishikawajima-
Harima Heavy Industries Company, Ltd., where he
was engaged in the development and management
of electrostatic precipitators. From 1986 to 1990, he
was with Koshin Electric Company. He is currently
with Asahikogyosha Company Ltd., Chiba, Japan,
where from 1990 to 1994, he was the Director of
the Research and Development Center.
Mr. Shibuya is a member of the Institute of Electrical Engineers of Japan.
Shigeo Honda (M’91) received the M.Sc. degree
in environmental science from Tsukuba University,
Tsukuba, Japan, in 1982.
In 1984, he joined Asahikogyosha Company Ltd.,
Chiba, Japan, where he is currently a Research
Engineer. He has been engaged in research and
development on clean-room technologies for actual
designing.
Mr. Honda is a member of the Society of Heating,
Air-Conditioning and Sanitary Engineers of Japan.

Minoru Tamura received the B.Eng. degree in

aerospace engineering from Tokyo Metropolitan In-
stitute of Technology, Tokyo, Japan, in 1993.
He is a Research Engineer with Asahikogyosha
Company Ltd., Chiba, Japan, where he has been
employed since 1993. He has been engaged in
research on air cleaning technologies using UV
light photochemical reactions with catalyst to treat
polluted outdoor air.
Mr. Tamura is a member of the Society of Heat-
ing, Air-Conditioning and Sanitary Engineers of
Japan.