(1) WWWR 24.

2
In the manufacture of microelectronic devices, a thin film of solid silicon (Si) is
uniformly deposited on a wafer surface by the chemical decomposition of silane (SiH4)
in the presence of H2 gas. If the gas composition is maintained at 40 mol % SiH4 and
60 mol % H2, determine

a. the weight fraction of these species

b. the average molecular weight of the gas mixture
c. the molar concentration, cA , of SiH4 if the feed gas is maintained at 900 K and
a system pressure of 60 torr.

(2) ID 14.23

Helium gas at 25 and 4 bars is stored in a spherical Pyrex container of 200-mm

inside diameter and 10-mm thickness. What is the rate of mass loss from the container?
 (1) Problem 24.2 (WWWR)

Assume 1 mole:
mole MW kg wt fraction
Si H4 0.5 32.13 16.06 0.941
H2 0.5 2.02 1.01 0.059

kg
(a) wt Si H4 = 32.13  0.4 mole = 12.85 kg
mole

kg
wt H2 = 2.02  0.6 mole = 1.11 kg
mole
total = 12.85 + 1.21 kg = 14.06 kg
wt fraction :
12.85
Si H4 = = 0.914
14.06
1.21
H2 = = 0.086
14.06
(b) Average molecular weight = total weight per 1 mole = 14.06 kg/ kmole
(c) At 900K and 60 torr,
60torr
P (1.013  105 Pa )  7997 Pa
760torr
P 7997 Pa mole
C   1.069 3
RT  Pa m  3
m
 8.314  900 K
 mole K 
So molar concentration of 50 mole % sitter

 mole  mole
Csilane  (0.4) 1.069 3   0.427 3
 m  m
 (2) PROBLEM 14.25 (ID)
KNOWN: Temperature and pressure of helium stored in a spherical pyrex container of
prescribed diameter and wall thickness.
FIND: Mass rate of helium loss.
SCHEMATIC: