Prohibition Against Filing of Parallel Applications: Substantive Conditions For Protection

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At any time before the grant or refusal of a utility model registration, an applicant for a

utility model registration may, upon payment of the prescribed fee, convert his
application into a patent application, which shall be accorded the filing date of the initial
application. (Sec. 58, R.A. No. 165a)

Prohibition against Filing of Parallel Applications

An applicant may not file two (2) applications for the same subject, one for utility model
registration and the other for the grant of a patent whether simultaneously or
consecutively.
(Sec. 59, R.A. No. 165a)

INDUSTRIAL DESIGN AND LAYOUT-DESIGNS (TOPOGRAPHIES) OF INTEGRATED


CIRCUITS

Definition of Terms

1. An Industrial Design is any composition of lines or colors or any three-dimensional


form, whether or not associated with lines or colors: Provided, that such composition or
form gives a special appearance to and can serve as pattern for an industrial product or
handicraft. (Sec. 55, R.A. No. 165a)

2. Integrated Circuit means a product, in its final form, or an intermediate form, in


which the elements, at least one of which is an active element and some or all of the
interconnections are integrally formed in and/or on a piece of material, and which is
intended to perform an electronic function; and

3. Layout-Design is synonymous with 'Topography' and means the three-dimensional


disposition, however expressed, of the elements, at least one of which is an active element,
and of some or all of the interconnections of an integrated circuit, or such a
threedimensional disposition prepared for an integrated circuit intended for manufacture.

(As amended by Republic Act No. 9150, Protection of Layout-Designs (Topographies) of


Integrated Circuits)

Substantive Conditions for Protection

Only industrial designs that are new or ornamental shall benefit from protection under this
Act.

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