2003-Jianqiau-Qcm For n2 Sensors

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Sensors and Actuators B 93 (2003) 175–180

A room temperature indium tin oxide/quartz crystal


microbalance gas sensor for nitric oxide
Jianqiao Hua, Furong Zhua, Jian Zhanga, Hao Gongb,*
a
Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602, Singapore
b
Department of Materials Science, National University of Singapore, Lower Kent Ridge,
Singapore 119260, Singapore

Abstract

Nitric oxide (NO) gas sensor using a combination of indium tin oxide (ITO) and quartz crystal microbalance is fabricated. The sensor is
made from the polished AT-cut quartz crystal on which the ITO thin film is deposited using radio frequency magnetron sputtering. The sensor
is sensitive to NO gas at room temperature and avoids the problems related to elevated-temperature sensors. It is shown that the sensor has a
distinct negative frequency shift of 110 Hz within 600 s when it is exposed to 60 ppm of NO. The frequency-changing rate is also found to
increase with NO concentration. The chemical status of elements on the ITO surface before and after NO adsorption is investigated by X-ray
photoelectron spectroscopy (XPS). Possible gas sensing mechanisms are discussed.
# 2003 Elsevier Science B.V. All rights reserved.

Keywords: Indium tin oxide; Quartz crystal; Gas sensing mechanisms

1. Introduction surface [17]. The corresponding frequency shift can be


described by the following empirical equation [10]:
Sensors for toxic gases have attracted much attention due
to the growing concern of environmental protection and Df ¼ Cf02 Dm=A; (1)
safety. A number of semiconductor oxides such as ZnO, where f0 is the resonant frequency of the unperturbed quartz,
SnO2, In2O3 and indium tin oxide (ITO) are used for Df the QCM frequency shift due to the added mass, C a
different gas sensors [1–4]. Most of these sensors are based constant, Dm the added mass and A the area of the sensing
on the resistance variation when the semiconductor oxide material. For example, the sensitivity of QCM having a
films are exposed to target gases. Normally, the conventional resonant frequency of 10 MHz, made with gold electrode of
resistance-type sensors are operated at an elevated tempera- diameter 8 mm, is approximately 0.226 cm2 Hz/ng.
ture, usually within the range of 250–300 8C [4–8]. The In this work, we developed gas sensors with a combina-
requirement for user-friendly sensors drives the effort to tion of ITO and QCM and used them for nitric oxide (NO)
develop more portable, sensitive and cost-effective devices. gas sensing in atmospheric environment. Such sensors have
In addition, it is desirable to develop sensors working at simple layer configuration and can be operated at room
room temperature. temperature. The sensitivity and repeatability of the sensors
QCM has been used widely to monitor the change in mass are investigated. The possible sensing mechanisms are also
loadings by measuring the shift of its resonant frequency [9]. discussed.
A QCM-based sensor consists of a quartz crystal and the
sensing material. A good sensing material can selectively
adsorb the target species/gases. QCM devices made with 2. Experimental
metal electrodes of Pt, Au, Ag, etc. for sensor applications
have been reported [10–16]. The resonant frequency of a ITO films were prepared at room temperature by radio
QCM decreases when gas is adsorbed on the electrode frequency magnetron sputtering using an oxidized target
with In2O3 and SnO2 in a weight proportion of 9:1. The base
*
Corresponding author. Tel.: þ65-8746598; fax: þ65-7763604. pressure in the system was approximately 5:0  108 Torr.
E-mail address: masgongh@nus.edu.sg (H. Gong). The total pressure of the sputtering gas mixture of argon and

0925-4005/03/$ – see front matter # 2003 Elsevier Science B.V. All rights reserved.
doi:10.1016/S0925-4005(03)00186-2
176 J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180

Gas sensing experiments were performed in a system as


shown in Fig. 1 [19]. In this study, all measurements were
performed at room temperature in atmospheric environment.
The sensor was loaded into the main chamber and connected
to a Saunders & Associate network analyzer. The frequency
resolution of the analyzer is 50 Hz. The target nitric oxide
gas was introduced into the test chamber using a calibrated
syringe of minimum volume of 0.1 ml. In atmosphere, the
concentration of the test gas, c, in parts per million (ppm),
can be estimated as:
Vg Vg
c ðppmÞ ¼  106   106 ; (2)
Vg þ V V
where Vg is the volume of introduced gas, and V the volume
of the chamber. We have varied the gas concentration from
60 to 2000 ppm in this work. During the testing process, in
order to ensure the cleanness of the sensor surface and the
accurate gas concentration, the system was pumped down to
Fig. 1. Schematic diagram of a gas testing system for NO detection.
7:5  102 Torr and then purged at least three times before
each new cycle of NO measurement. The time-dependent
hydrogen was adjusted to 3:0  103 Torr during the film sensor responses were recorded at room temperature.
deposition. In a previous work, we have shown that the The chemical status of elements on the ITO surface before
presence of hydrogen during the film deposition can alter the and after NO adsorption was investigated by ex situ X-ray
electrical properties of ITO films [18]. In order to study the photoelectron spectroscopy (XPS). The XPS experiments
correlation between the ITO conductivity and the sensing were performed in a VG ESCALAB 220i-XL instrument
sensitivity, we have made a set of ITO-QCM sensors with with an Al Ka X-ray source (1486.6 eV) operated at a power
ITO electrodes prepared at the different hydrogen flow rates of 150 W. The electron energy analyzer was set at a constant
of 0, 1.0, 1.5 sccm in this study. analyzer mode at pass energy of 20 eV for high-resolution
AT-cut rectangular quartz blanks with dimension of spectra acquisition. The electrical properties of as-deposited
10 mm  10 mm  0:1 mm are used. The corresponding ITO films were obtained by Hall effect measurement.
resonant frequency of the quartz substrate is about
17 MHz. An ITO-QCM sensor was fabricated using the
lift-off photolithography process. The photoresist moulds 3. Results and discussion
were generated by lithography before ITO deposition. The
thickness of ITO film obtained was 110 nm. A similar Three types of gas sensors, labeled as #1, #2, #3, were
process was repeated to form the ITO electrode on the other used for the NO detection. The ITO electrodes of the sensors
side of the quartz crystal. #1, #2, and #3 were deposited at the hydrogen flow rates of 0,

Fig. 2. Typical time-dependent frequency shift of an ITO-QCM gas sensor (#2) as a function of NO concentration.
J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180 177

Fig. 3. Frequency sensitivity, Sf, as a function of NO concentration.

1.0, 1.5 sccm, respectively. There is no observed change in The sensors are sensitive to NO gas with good repeat-
the resonant frequency of the sensors in air. When NO was ability of Df although the starting frequency varies in
introduced into the test chamber, the frequency started to different measurements. Fig. 4 shows the repeatability
shift. Fig. 2 shows the time-dependent frequency shift of experimental results for sensor #2 testing at an identical
sensor #2 exposed in different NO concentrations. It can be NO concentration of 590 ppm. A clear negative frequency
seen that the negative frequency shift increases with increas- shift was always observed when NO was introduced to the
ing NO gas concentration. The frequency shift shows an system. Similar frequency-changing rate (jDf =Dtj) of about
approximate linear relationship with the exposure time. The 0.6 Hz/s was found in three replicate tests within the first
sensor has a negative frequency shift of 110 Hz within 600 s 250 s, which indicates a promising reproducibility of the
when it is exposed to a concentration of 60 ppm NO gas. device. We have found that the frequency-changing rate of
We define the frequency-changing rate, Sf ¼ jDf =Dtj, or 0.6 Hz/s is slightly lower than 0.7 Hz/s of the fresh sample
slopes of Df–Dt curves, as the parameter to reflect the sensor tested. This is probably due to the dissipation of some active
sensitivity [19]. The larger Sf value means the bigger sites on ITO surface after the first exposure to NO gas. From
frequency shift per unit time and thus the higher sensitivity. Fig. 4, diverse frequency-changing rates from 0.6 to 0.8 Hz/s
Fig. 3 shows the corresponding relationship between are observed after the first 300 s. It should be noticed that
Sf and the NO gas concentration. It is obvious that the we pumped out the gases in the chamber and flushed with air
frequency-changing rate increases with increasing NO prior to each test. Although this procedure could remove
concentration. the residual NO gas in the chamber, it might not remove all

Fig. 4. The repeatability of ITO-QCM (gas sensor #2) frequency shift exposed to the NO.
178 J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180

Fig. 5. Time-dependent frequency shifts of QCM using ITO films deposited under different hydrogen flow rates (sensors #1 and #3).

those NO molecules trapped on the chamber wall. The sample #3 made with ITO, prepared at a hydrogen flow rate
trapped NO molecules would escape slowly from the cham- of 1.5 sccm, showed a large frequency response. In a pre-
ber wall leading to a gradual increase of NO concentration vious work, we have shown that the presence of hydrogen
in the chamber. The frequency-changing rate was fluctuated during the film deposition increases film conductivity and
for different measurements, which may be related to the reduces the ITO surface roughness [18,20]. As such, sensor
amount and the release process of trapped NO gas. The #3 had a smoother surface than sensor #1. We know that the
possible corrosion of the ITO electrode may not be the cause higher sensitivity (sensor #3) can be related to either the
of the diverse frequency-shift rate, as it could not explain electrical or the surface morphologic properties of the ITO
that only the second run showed a different behavior in this films. If the surface roughness plays a crucial role in the
case. sensor response, in principle, sensor #1 should have bigger
Fig. 5 shows the frequency responses of sensors #1 and #3 frequency shifts than sensor #3. However, this was not found
working at a NO gas concentration of 1770 ppm. The in our experiment. Therefore, the different sensor sensitiv-
frequency shift for sensor #3 was 3990 Hz, however, it ities of these two samples may be mainly due to the
was 2514 Hz for sensor #1. This implies that sensor #3, difference in electric properties of the ITO electrodes. We
made with a higher conductive ITO of 3000 S, exhibits know that the use of hydrogen in the film deposition creates
higher sensitivity to NO than sensor #1 with ITO of addition number of oxygen vacancies leading to an enhance-
2000 S. Fig. 6 shows the frequency shift of sensors #1 ment in the ITO conductivity. In the NO detection, these
and #3 working under different gas concentrations within oxygen vacancies could be involved in the processes of
the same time interval of 600 s. The results show that physical or/and chemical adsorptions of NO. An increase in

Fig. 6. Frequency shift of QCM gas sensors (#1 and #3) as a function of the NO concentration.
J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180 179

suggesting that the gas adsorption/reaction occurred on the


ITO surface.
The existence of new NO3 species on the NO-exposed
ITO surface indicates the reaction between NO and ITO,
which causes the mass increase. The formation of new
species may also change the mechanical and electronic
properties of the ITO electrode. The possible ITO/quartz
interfacial stress changes may also affect in the resonant
frequency of the device. However, the precise verification of
this interfacial effect is difficult to determine directly using
XPS measurement. Behavior of ITO-QCM sensor is quite
complicated. Apart from NO, some others, like water vapor
and oxygen, may also influence the sensor response. For
example, when the sensor is exposed to oxygen, negatively
charged oxygen species could accumulate on ITO surface by
grabbing electrons from the conduction band [24]. This
causes the formation of an electron-depleted region near
the ITO surface region and makes the ITO surface easier to
absorb the target gases [24]. In order to avoid the inter-
ference, the use of dual sensors or operation of the sensors at
two different temperatures [25] could be an alternative
approach. The corresponding experiments are currently in
progress.

4. Conclusions

Gas sensors based on the ITO-coated quartz crystal


Fig. 7. XPS spectra of (a) O 1s peak of ITO surface before and after NO microbalance have been fabricated. Such sensors are sensi-
adsorption and (b) N 1s peaks before and after the Arþ sputtering of NO- tive to NO gas with good repeatability at room temperature.
exposed ITO surface.
The resonant frequency-changing rates of 0.2, 0.4, 0.7 and
2.0 Hz/s has been found when the sensor is exposed to NO
oxygen vacancies may provide more adsorption/reaction gas at different concentrations of 60, 295, 590 and 1180 ppm
sites, resulting in higher NO mass loading [19], or higher in air, respectively. XPS analyses reveal that NO also reacts
frequency shift. with ITO leading to the formation of NO3 species on its
XPS has been used to examine the chemical binding surface.
energies of O 1s and N 1s for ITO films before and after
NO exposure. Fig. 7(a) shows the O 1s peaks of ITO-film
surface before and after NO exposure, and Fig. 7(b) shows References
the N 1s spectra of NO-exposed ITO surface, before and
after the surface removal with argon ion sputtering. In [1] D.H. Yoon, G.M. Choi, Sens. Actuators B 45 (1997) 251.
Fig. 7(a), an extra shoulder was found in the O 1s profile [2] M.C. Horrillo, A. Serventi, D. Rickerby, J. Gueierrez, Sens.
Actuators B 58 (1999) 474.
from a NO-exposed ITO surface. This peak can be decon-
[3] C.A. Papadopoulos, D.S. Vlachos, J.N. Avaritsiotis, Sens. Actuators
voluted into two components with the binding energies B 42 (1997) 95.
located at 530.8 and 532.3 eV, respectively. The observed [4] G. Sberveglieri, G. Faglia, S. Groppelli, P. Nelli, Sens. Actuators B 8
O 1s peak at 530.8–531.2 eV can be assigned to the lattice (1992) 79.
oxygen in In2O3 [21]. The peak at a binding energy of [5] N.G. Patel, K.K. Makhija, C.J. Panchal, Sens. Actuators B 21 (1994)
193.
532.3 eV can be attributed to a different oxidation state [22].
[6] N.G. Patel, K.K. Makhija, C.J. Panchal, D.B. Dave, V.S. Vaishnav,
Fig. 7(b) suggest that the ITO surface may contain two Sens. Actuators B 23 (1995) 49.
different nitrogen species corresponding to the N 1s peaks at [7] T. Miyata, T. Hikosaka, T. Minami, Sens. Actuators B 69 (2000) 16.
the binding energies of 407 and 400.5 eV, respectively. [8] R. Bene, I.V. Perczel, F. Réti, F.A. Meyer, M. Fleisher, H. Meixner,
The weak peak at 400.5 eV may be attributed to the Sens. Actuators B 71 (2000) 36.
[9] B.P. Binks, Modern Characterization Methods of Surfactant Systems,
adsorbed NO. The strong peak at 407 eV may come from
1999, p. 483.
the NO3 species [23]. This suggests that new chemical [10] G. Sauerbrey, Z. Phys. 155 (1959) 206.
species were formed on the ITO surface. After removing the [11] S.R. Kim, S.A. Choi, J.D. Kim, K.H. Choi, S.K. Park, Y.H. Chang,
surface layer, both of the two nitrogen peaks disappeared, Synth. Mater. 71 (1995) 2293.
180 J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180

[12] M. Teresa, A.C. Duarte, J.P. Oliveira, Sens. Actuators B 26–27 [19] J. Zhang, J. Hu, F. Zhu, H. Gong, Sens. Actuators B 87 (2002) 159.
(1995) 191. [20] F. Zhu, K. Zhang, C.H.A. Huan, A.T.S. Wee, Thin Solid Films 376
[13] H. Nanto, S. Tsubakino, M. Habara, K. Kondo, T. Morita, Y. (2000) 255.
Douguchi, H. Nakazumi, R. Waite, Sens. Actuators B 34 (1996) [21] A. Gurlo, N. Bârsan, M. Ivanovskaya, U. Weimar, W. Göpel, Sens.
312. Actuators B 47 (1998) 92.
[14] M. Teresa, P. Sergio, T. Nogueira, J.P. Oliveira, Sens. Actuators B 68 [22] G. Sarala Devi, S.V. Manorama, V.J. Rao, Sens. Actuators B 56
(2000) 218. (1999) 98.
[15] H. Nanto, N. Dougami, T. Mukai, M. Habara, E. Kusano, A. Kinbara, [23] X. Bao, U. Wild, M. Muhler, B. Pettinger, R. Schlogl, G. Ertl, Surf.
T. Ogawa, T. Oyabu, Sens. Actuators B 66 (2000) 16. Sci. 425 (1999) 224.
[16] K. Henkel, A. Oprea, I. Paloumpa, G. Appel, D. Schmeißer, P. [24] T. Becker, S. Muhlberger, B.C. Bosch-von, G. Muller, T. Ziemann,
Kamieth, Sens. Actuators B 76 (2001) 124. K.V. Hechtenberg, Sens. Actuators B 69 (1–2) (2000) 108.
[17] P. Chang, J.S. Shih, Anal. Chim. Acta 403 (2000) 39. [25] U. Schramm, D. Meinhold, S. Winter, C. Heil, J. Müller-Albrecht, L.
[18] K. Zhang, F. Zhu, C.H.A. Huan, A.T.S. Wee, J. Appl. Phys. 86 Wächter, H. Hoff, C.E.O. Roesky, T. Rechenbach, P. Boeker, Sens.
(1999) 974. Actuators B 67 (2000) 219–226.

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