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2003-Jianqiau-Qcm For n2 Sensors
2003-Jianqiau-Qcm For n2 Sensors
2003-Jianqiau-Qcm For n2 Sensors
Abstract
Nitric oxide (NO) gas sensor using a combination of indium tin oxide (ITO) and quartz crystal microbalance is fabricated. The sensor is
made from the polished AT-cut quartz crystal on which the ITO thin film is deposited using radio frequency magnetron sputtering. The sensor
is sensitive to NO gas at room temperature and avoids the problems related to elevated-temperature sensors. It is shown that the sensor has a
distinct negative frequency shift of 110 Hz within 600 s when it is exposed to 60 ppm of NO. The frequency-changing rate is also found to
increase with NO concentration. The chemical status of elements on the ITO surface before and after NO adsorption is investigated by X-ray
photoelectron spectroscopy (XPS). Possible gas sensing mechanisms are discussed.
# 2003 Elsevier Science B.V. All rights reserved.
0925-4005/03/$ – see front matter # 2003 Elsevier Science B.V. All rights reserved.
doi:10.1016/S0925-4005(03)00186-2
176 J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180
Fig. 2. Typical time-dependent frequency shift of an ITO-QCM gas sensor (#2) as a function of NO concentration.
J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180 177
1.0, 1.5 sccm, respectively. There is no observed change in The sensors are sensitive to NO gas with good repeat-
the resonant frequency of the sensors in air. When NO was ability of Df although the starting frequency varies in
introduced into the test chamber, the frequency started to different measurements. Fig. 4 shows the repeatability
shift. Fig. 2 shows the time-dependent frequency shift of experimental results for sensor #2 testing at an identical
sensor #2 exposed in different NO concentrations. It can be NO concentration of 590 ppm. A clear negative frequency
seen that the negative frequency shift increases with increas- shift was always observed when NO was introduced to the
ing NO gas concentration. The frequency shift shows an system. Similar frequency-changing rate (jDf =Dtj) of about
approximate linear relationship with the exposure time. The 0.6 Hz/s was found in three replicate tests within the first
sensor has a negative frequency shift of 110 Hz within 600 s 250 s, which indicates a promising reproducibility of the
when it is exposed to a concentration of 60 ppm NO gas. device. We have found that the frequency-changing rate of
We define the frequency-changing rate, Sf ¼ jDf =Dtj, or 0.6 Hz/s is slightly lower than 0.7 Hz/s of the fresh sample
slopes of Df–Dt curves, as the parameter to reflect the sensor tested. This is probably due to the dissipation of some active
sensitivity [19]. The larger Sf value means the bigger sites on ITO surface after the first exposure to NO gas. From
frequency shift per unit time and thus the higher sensitivity. Fig. 4, diverse frequency-changing rates from 0.6 to 0.8 Hz/s
Fig. 3 shows the corresponding relationship between are observed after the first 300 s. It should be noticed that
Sf and the NO gas concentration. It is obvious that the we pumped out the gases in the chamber and flushed with air
frequency-changing rate increases with increasing NO prior to each test. Although this procedure could remove
concentration. the residual NO gas in the chamber, it might not remove all
Fig. 4. The repeatability of ITO-QCM (gas sensor #2) frequency shift exposed to the NO.
178 J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180
Fig. 5. Time-dependent frequency shifts of QCM using ITO films deposited under different hydrogen flow rates (sensors #1 and #3).
those NO molecules trapped on the chamber wall. The sample #3 made with ITO, prepared at a hydrogen flow rate
trapped NO molecules would escape slowly from the cham- of 1.5 sccm, showed a large frequency response. In a pre-
ber wall leading to a gradual increase of NO concentration vious work, we have shown that the presence of hydrogen
in the chamber. The frequency-changing rate was fluctuated during the film deposition increases film conductivity and
for different measurements, which may be related to the reduces the ITO surface roughness [18,20]. As such, sensor
amount and the release process of trapped NO gas. The #3 had a smoother surface than sensor #1. We know that the
possible corrosion of the ITO electrode may not be the cause higher sensitivity (sensor #3) can be related to either the
of the diverse frequency-shift rate, as it could not explain electrical or the surface morphologic properties of the ITO
that only the second run showed a different behavior in this films. If the surface roughness plays a crucial role in the
case. sensor response, in principle, sensor #1 should have bigger
Fig. 5 shows the frequency responses of sensors #1 and #3 frequency shifts than sensor #3. However, this was not found
working at a NO gas concentration of 1770 ppm. The in our experiment. Therefore, the different sensor sensitiv-
frequency shift for sensor #3 was 3990 Hz, however, it ities of these two samples may be mainly due to the
was 2514 Hz for sensor #1. This implies that sensor #3, difference in electric properties of the ITO electrodes. We
made with a higher conductive ITO of 3000 S, exhibits know that the use of hydrogen in the film deposition creates
higher sensitivity to NO than sensor #1 with ITO of addition number of oxygen vacancies leading to an enhance-
2000 S. Fig. 6 shows the frequency shift of sensors #1 ment in the ITO conductivity. In the NO detection, these
and #3 working under different gas concentrations within oxygen vacancies could be involved in the processes of
the same time interval of 600 s. The results show that physical or/and chemical adsorptions of NO. An increase in
Fig. 6. Frequency shift of QCM gas sensors (#1 and #3) as a function of the NO concentration.
J. Hu et al. / Sensors and Actuators B 93 (2003) 175–180 179
4. Conclusions
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