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A 1-nW 95-ppm/◦C 260-mV startup-less

bandgap-based voltage reference


Gajendranath Chowdary Kalyan Kota Shouri Chatterjee
Department of Electrical Engineering Aura Semiconductors Limited Department of Electrical Engineering
IIT Hyderabad, Hyderabad, India Bangalore, India IIT Delhi, New Delhi, India
Email: gajendranath@iith.ac.in Email: kalyan.kumar@aurasemi.com Email: shouri@ee.iitd.ac.in

VDD VDD
Abstract—We present an ultra-low-power fractional bandgap-
based voltage reference and a unique method of generating a MN1 R VP T AT
M P2
small proportional-to-absolute-temperature (PTAT) current. The VX +VP T AT
PTAT current is used to generate a BJT complementary-to- N A
MN2
absolute-temperature (CTAT) voltage. We have achieved tem-
R VP T AT
perature compensation of the generated reference voltage by B MPSF
VX
subtracting a sub-threshold MOS CTAT voltage from the BJT VP T AT
CTAT voltage. The difference between the two CTAT voltages is VA R
temperature stable from -50◦ C to 85◦ C with a mean variation MN1
L

LOAD
LOAD
of less than 95 ppm/◦ C measured across chips, without any
MP1
additional trim. The proposed technique eliminates the need for MN2
additional start-up circuitry, which is mandatory for conventional
architectures. The 260-mV voltage reference designed in a 180-
nm CMOS process has a measured line regulation of 0.23 %/V (a) (b)
and consumes 1 nW at room temperature.
Fig. 1. PTAT current generation circuit schematics, (a) discussed in [5], and
I. I NTRODUCTION (b) proposed in this work.

Ultra-low power and low-voltage circuits require nano-


watt sub-1V voltage references. Band-gap references (BGRs)
at 27◦ C, and consumes 1 nW at room temperature.
are generally used to generate a process-voltage-temperature
(PVT) independent reference voltage. Classically, one elim- II. P ROPOSED PTAT CURRENT GENERATION
inates the temperature dependence of a BGR by adding
a proportional-to-absolute-temperature (PTAT) voltage and a The schematic of the PTAT current generation circuit in [5]
complementary-to-absolute-temperature (CTAT) voltage. The is shown in Fig. 1(a). In [5], MN1 is a device with a gate-
circuitry used to generate the PTAT current and the start- source voltage of 0 V, and is operating in deep sub-threshold.
up circuit, largely decide the total power consumption of the MN2 is smaller than MN1 , and the voltage across MN2 is
BGR. The start-up current in the circuit is required to be higher PTAT. With the help of the two op-amps, a PTAT current
than the leakage current of the MOS devices to enable proper proportional to the voltage across MN2 is generated.
operation. The PTAT current generation circuit and the start- The circuit in Fig. 1(a) suffers from three drawbacks:
up circuit limit the BGR to operate with tens of nano-watts of • MN1 and MN2 should be sized such that VP T AT is
power [1]–[3]. greater than at least 3kT /q (75 mV) to avoid VDS
[1]–[4] have shown voltage references consuming several dependence on VP T AT . A large VP T AT requires a large
tens of nanowatts of power. Like in a conventional BGR resistor to obtain a small PTAT current (e.g 75 MΩ to
circuit, [1]–[3] also use an op-amp, a significant source of generate a current of 1 nA).
power dissipation. In this paper, we propose an ultra-low- • The circuit uses two op-amps to obtain a PTAT current.

power startup-circuit-free op-amp-less BGR-based circuit with • Body effect of MN1 and MN2 degrades the linearity of

a unique method of PTAT current generation. the PTAT current.


A low PTAT voltage allows us to generate small PTAT From the above, it is clear that generating sub-nA PTAT
currents in the circuit without using a large resistor. We have currents and restricting total power consumption to 1-nW is
generated a CTAT voltage from the PTAT current, and have not trivial. There are no bandgap-based circuits available in
generated the final reference voltage by subtracting a CTAT the literature that operate at a power consumption of 1 nW.
voltage from the former. The voltage reference was fabricated In this work, a PTAT current is generated using three
on a 0.18-µm CMOS process. The circuit generates 260 mV pMOS devices MP1 , MP2 and MPSF as shown in Fig. 1(b).
with a mean temperature coefficient (TC) of 95 ppm/◦ C at a MP1 is in deep sub-threshold, and MP2 sources the same
0.7-V power supply, with a line regulation (LR) of 0.23 %/V current as demanded by MP1 . VSD of MP1 and MP2 is well

978-1-7281-3320-1/20/$31.00 ©2020 IEEE

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16 VDD
VP T AT voltage [mV]
L
14 VP T AT = VSG (T ) = m(T )φT ln N
)

12 R VP T AT

10 N MN4a MN4b
M M
8 MP2
Slow Typical Fast MPSF VCT AT
6 VCT AT
VP T AT
-40 -20 0 20 40 60 80 100 R
VE
Temperature [◦ C] VREF

L MN3a MN3b
Fig. 2. Simulations of the proposed PTAT voltage across process corners VE
MP1 3 1 1
and temperature.

above 5kT /q for all temperatures and process corners. This is


achieved with the help of a negative feedback loop from node Fig. 3. Complete schematic of the proposed band-gap based reference. A
PTAT current is pushed through a BJT to generate a CTAT voltage VE on the
B to A. Any difference between the currents in MP1 and MP2 left side. VREF = VE /3 − 2VCT AT is implemented in the shaded region.
is sensed, converted to a voltage, and applied at the gate of
MPSF , which is fed back to the gate of MP2 . Sufficient gain
in the feedback loop is provided by MP1 and MP2 . The aspect minimized by reducing the PTAT current non-linearity. By ne-
ratio of MPSF is chosen to be small in order to make VSD glecting the higher order non-linearities, VE can be expressed
of MP2 greater than 5kT /q. VSG of MP2 is a PTAT voltage as [7].
which can be obtained by equating the currents through MP1
L VE (T ) = Ego (1 − α1 ∆T − β1 ∆2T ), (3)
and MP2 . The ratio, N is chosen to be as small as possible
to generate a low PTAT voltage. The source to gate voltage where α1 and β1 are the first and second order temperature
of MP2 can be found by equating the currents through MP1 coefficients of VE and their typical values are −5 m/◦ C
and MP2 . The source to gate voltage of MP2 is given as: and −1 µ/◦ C2 at 27◦ C respectively. The higher order non-
VP T AT = VSG (T ) linearities at the output can be compensated, if we use the
(1) curvature compensation technique as reported by [8]. A frac-
L
) = m(T )φT ln tion of VE is generated by dividing the voltage across the BJT
N with the help of diode connected devices as shown in Fig. 3.
where L and N are the multipliers of MP1 and MP2 respec- The divider is sized such that it draws less than 15% of the
tively, with an unit width of W , m(T ) is the subthreshold total PTAT branch current to avoid loading. The worst case
slope, and φT is the thermal voltage. error due to loading is less than 2 mV. The divider current is
A VP T AT of 9 mV requires 6 MΩ to generate a 1.5 nA chosen such that the leakage through the nwell-psub diodes in
PTAT current. A low PTAT voltage also reduces the non- the divider is less than 0.1% of the divider current across PVT
linearity in the PTAT voltage. No explicit start-up circuit is variations. V3E has a temperature coefficient of 667 µV/◦ C.
required for the proposed PTAT generation scheme, since there The shaded portion in Fig. 3 shows the structure of a novel
is no other stable operating point. The simulation results of the compensation scheme to eliminate the effect of temperature
proposed PTAT current across the process corners is shown in coefficient of BJT to obtain a temperature compensated output
Fig. 2. voltage. The MN4 (MN4a , MN4b ) transistor sinks the same
III. P ROPOSED FRACTIONAL BAND - GAP REFERENCE amount of current as that of MN3 (MN3a , MN3b ). The drain to
source voltage of MN3 and MN4 is sufficiently maintained to
The generated PTAT current is pushed through a BJT as
be greater than 5φT for all temperatures and process corners.
shown in Fig. 3 to generate a CTAT voltage, VE . MN3a and
The gate to source voltage of MN4 can be expressed as
MN4a operate in deep subthreshold. The currents through the
two devices can be equated to obtain the gate-source voltage 1 W3 
VGS (T ) = m(T )φT ln × −∆
of MN4a . M W4 (4)
The generated VE as given in [6]: = VGS (To )(1 + α2 ∆T + β2 ∆2T ) − ∆,
T T T
VE (T ) = Ego (1 − ) + VE (To )( ) + (n − 1) ln( ) (2) where M is the multiplier of MN4 , W3 and W4 are the widths
To To To of MN3 and MN4 respectively, m(T ) is the subthreshold slope
where, VE (T ) is the voltage across the BJT as a function of factor whose value is a function of temperature, α2 and β2 are
temperature, Ego is the energy bandgap voltage of silicon at the first and second order non-linear coefficients of the CTAT
room temperature, n is a constant (≈1.5), T is the absolute voltage of MOS generated respectively, and the error because
temperature, and To is the room temperature. of the body effect of MN3 and MN4 is ∆.
The linearity of VE is dependent on the current passing With the help of (4), it is found that, to cancel the tempera-
through the BJT. The non-linear variation of VE can be ture coefficient of V3E , a large multiplier M of 300 is required.

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280
260

VREF [mV]
600 240
BJT CTAT voltage, VE
220 Line regulation : 0.23 %/V
500 200
CTAT voltage [mV]

180
400
160
0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8
300 VE Supply voltage, VDD [V]
3
200 (a)

Current consumption [nA]


100 6
MOS CTAT voltage, −2 × VCT AT 5
0 4
-40 -20 0 20 40 60 80 3
Temperature [◦ C] 2
1
264
0
263 -40 -20 0 20 40 60 80 100
VREF [mV]

262 Temperature [◦ C]
(b)
261
260 Fig. 5. Measurements of (a) VREF as a function of supply voltage, and (b)
259 current consumption as a function of temperature at 1 V supply.
-40 -20 0 20 40 60 80

Temperature [◦ C] 4
Mean = 260 mV
σ = 3.69 mV
Fig. 4. Measured BJT CTAT voltage, MOS CTAT voltage along with the 3

Number of samples
output reference voltage, VREF , as a function of temperature.

Two such stages are cascaded to relax the constraint on the


1
required multiplier M . The source and body of MN4a and
MN4b are not connected together, resulting in a body effect
coefficient ∆ (= ∆1 +∆2 ) to appear at the output voltage. ∆1 245 250 255 260 265 270 275
is CTAT as the source-body voltage of MN4a is CTAT. The Reference voltage, VREF [mV]
source-body voltage of MN4b is VREF which is insensitive (a)
to temperature. However, it was observed that ∆2 is PTAT 5
Mean = 95 ppm/◦ C
because of the temperature dependence of the body-effect σ = 35 ppm/◦ C
4
coefficient. The effective variation in ∆ with temperature is
Number of samples

observed, in simulation, to be less than 1.3 µV/◦ C. The body 3


effect error ∆ results in the output voltage of Ego /3 − ∆
(260 mV) instead of Ego /3 (360 mV). The output voltage of 2

the circuit is given by: 1

VREF = VA − VGS
Ego 0 40 80 120 160 200
= (1 − α1 ∆T − β1 ∆2T ) (5) Temperature coefficient [ppm/◦ C]
3
(b)
− VGS (To )(1 + α2 ∆T + β2 ∆2T ) − ∆
Fig. 6. Histogram of (a) VREF , and (b) temperature coefficient, for 9
The terms with the temperature coefficients are engineered to measured parts.
cancel. Further, VGS (T0 ) is tiny because it is the voltage drop
required for a leakage current, and the final voltage reference
is Ego /3 − ∆. With the help of a deep nwell process (not in The net error ∆ is the sum of ∆1 and ∆2 .
this paper), VREF will be an exact fraction of Ego without
any body effect induced non-linearity. IV. M EASUREMENT RESULTS
The difference between the thresholds of MN3a , MN4a and
Fig. 4 shows the measured DC performance of the BGR as
MN3b , MN4b are given by:
a function of temperature. The output voltage, VREF , exhibits
less than 120 ppm/◦ C from -50◦ C to 85◦ C at a supply voltage
p p 
∆1 = γ φs + VSB4A − φs
p p  (6) of 1 V. Fig. 4 also shows the measured BJT CTAT voltages,
∆2 = γ φs + VSB4B − φs
i.e., corresponding to VE and V3E , and the MOS CTAT voltage
where ∆1 and ∆2 are the VT differences, γ is the body effect as a function of temperature.
coefficient of the MOS device, and φs is the surface potential. Fig. 5 shows the variation of VREF with supply voltage and

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TABLE I
C OMPARISON WITH OTHER STATE - OF - ART VOLTAGE REFERENCES .

This
[1] [2] [3] [7] [9] [10] [11] [12] work
TC (ppm/◦ C) 215 12.8 5.3 147 10 3.1 33 26 95
Min VDD (V) - - 0.5 0.9 1.4 1.0 1.0 ≥ 1.2 0.65
Power (W) 108n 28.7n 29.5p 100n 36n 0.8µ 192p 9.3n 0.98n
Line reg. (%/V) 0.45 0.92 0.036 - 0.27 0.03 0.02 0.08 0.23
Area (mm2 ) 0.21 0.48 0.0093 0.094 0.045 0.115 0.0045 0.55 0.075
Range (◦ C) -20 to 80 -10 to 110 -20 to 80 -40 to 120 0 to 80 -40 to 125 -20 to 100 0 to 110 -50 to 85
Reference (V) 1.18 1.76 0.175 1.09 0.66 0.635 0.693 1.24 0.26
Process (µm) 0.35 0.35 0.13 0.18 0.35 0.18 0.18 0.18 0.18
Type BG BG ∆VT BG VT BG Hybrid Hybrid BG

a sub-1V power supply, with ultra-low power consumption.


The 260 mV voltage reference designed in a 180 nm CMOS
process is the lowest-power bandgap-based voltage reference
that is currently available in the literature.
MP1MP2
182 µm

BJT MOS CTAT R EFERENCES


Resistor [1] Y. P. Chen, M. Fojtik, D. Blaauw, and D. Sylvester, “A 2.98nW bandgap
voltage reference using a self-tuning low leakage sample and hold,” in
2012 Symposium on VLSI Circuits (VLSIC), June 2012, pp. 200–201.
412 µm
[2] J. M. Lee, Y. Ji, S. Choi, Y. C. Cho, S. J. Jang, J. S. Choi, B. Kim,
H. J. Park, and J. Y. Sim, “A 29nW bandgap reference circuit,” in 2015
Fig. 7. Photo-micrograph of relevant portion of the 180 nm CMOS chip. IEEE International Solid-State Circuits Conference - (ISSCC) Digest of
The silicon area of the voltage reference circuit is 0.075 mm2 . Technical Papers, Feb 2015, pp. 1–3.
[3] M. Seok, G. Kim, D. Blaauw, and D. Sylvester, “A portable 2-transistor
picowatt temperature-compensated voltage reference operating at 0.5 V,”
IEEE J. Solid-State Circuits, vol. 47, no. 10, pp. 2534–2545, Oct 2012.
the measured current consumption of the circuit with temper- [4] K. Ueno, T. Hirose, T. Asai, and Y. Amemiya, “A 300 nW, 15 ppm/◦ C,
20 ppm/V CMOS voltage reference circuit consisting of subthreshold
ature. The line regulation of the reference circuit is 0.23 %/V. MOSFETs,” IEEE J. Solid-State Circuits, vol. 44, no. 7, pp. 2047–2054,
The current consumption is 1.5 nA at room temperature and July 2009.
increases to 5.4 nA at 85◦ C. At room temperature, for a [5] S. Jeong, Z. Foo, Y. Lee, J. Y. Sim, D. Blaauw, and D. Sylvester,
“A fully-integrated 71 nW CMOS temperature sensor for low power
0.7 V supply, the power consumption is 1 nW. In Fig. 6 we wireless sensor nodes,” IEEE Journal of Solid-State Circuits, vol. 49,
have shown the variation and temperature stability of VREF no. 8, pp. 1682–1693, Aug 2014.
for 9 packaged samples. The mean temperature coefficient is [6] R. J. Widlar, “New developments in IC voltage regulators,” IEEE J.
Solid-State Circuits, vol. 6, no. 1, pp. 2–7, Feb 1971.
95 ppm/◦ C with a standard deviation of 35 ppm/◦ C. The [7] Y. Osaki, T. Hirose, N. Kuroki, and M. Numa, “1.2-V supply, 100-nW,
measured value of VREF has a mean of 260 mV, with a 1.09-V bandgap and 0.7-V supply, 52.5-nW, 0.55-V subbandgap refer-
standard deviation of 3.7 mV. In Tab. I we have compared ence circuits for nanowatt CMOS LSIs,” IEEE J. Solid-State Circuits,
vol. 48, no. 6, pp. 1530–1538, June 2013.
the performance of our circuit with other state-of-art voltage [8] G. Ge, C. Zhang, G. Hoogzaad, and K. A. A. Makinwa, “A single-trim
references. Our circuit is the first bandgap-based reference to CMOS bandgap reference with a 3σ inaccuracy of ± 0.15% from -40◦ C
be at a power consumption of 1 nW (to the knowledge of the to 125◦ C,” IEEE J. Solid-State Circuits, vol. 46, no. 11, pp. 2693–2701,
Nov 2011.
authors). Unlike non-bandgap-based circuits (such as [11]), [9] G. D. Vita and G. Iannaccone, “A sub-1-V, 10 ppm/◦ C, nanopower
our technique provides a specific known voltage (260 mV, or voltage reference generator,” IEEE J. Solid-State Circuits, vol. 42, no. 7,
Ego /3 using a deep n-well process), over process, voltage and pp. 1536–1542, July 2007.
[10] H. Luo, Q. Sun, R. Zhang, and H. Zhang, “A 1 V 3.1 ppm/◦ C 0.8-µW
temperature. Fig. 7 shows a micro-graph of the relevant portion bandgap reference with piecewise exponential curvature compensation,”
of the chip. The circuit occupies 0.075 mm2 of active area. in 2018 IEEE Asian Solid-State Circuits Conference (A-SSCC), Nov
2018, pp. 97–98.
V. C ONCLUSION [11] Y. Ji, J. Lee, B. Kim, H. Park, and J. Sim, “A 192pW hybrid bandgap-
Vth reference with process dependence compensated by a dimension-
In this work, we have developed a temperature-insensitive induced side-effect,” in 2019 IEEE International Solid- State Circuits
Conference - (ISSCC), Feb 2019, pp. 308–310.
voltage reference generation technique, using a BJT-based [12] Y. Ji, C. Jeon, H. Son, B. Kim, H. Park, and J. Sim, “A 9.3nW all-
CTAT and a MOS-based CTAT. We have also demonstrated in-one bandgap voltage and current reference circuit,” in 2017 IEEE
a novel PTAT current generation technique by using a small International Solid-State Circuits Conference (ISSCC), Feb 2017, pp.
100–101.
resistor to generate a sub-nA current. Both of the above tech-
niques are integrated to build a sub-nW BGR operating from

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