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High Performance Green Leds For Solid State Lighting
High Performance Green Leds For Solid State Lighting
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Materials Department, University of California, Santa Barbara, California 93106, USA
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Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan
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Laboratoire de Physique de la Matière Condensée, Ecole Polytechnique, 91128 Palaiseau Cedex, France
Color mixed LEDs using red, Limitation of nitride and ��� = �� × ��� × ���
yellow, green, and blue LEDs, phosphide LEDs in green- �
have a higher fundamental limit yellow region of spectrum �� = "#,� ∆�! = �! − �"#
!
for luminous efficacy and better • “Green Gap”
color tunability Large excess forward voltage ΔVF
leads to low wall plug efficiency
Solid-State Lighting 2017 Suggested Research
M. Auf der Maur, et al., Phys. Rev. Lett. 116,
Topics Supplement. DOE Office of Energy Efficiency G. Lheureux, et al., J. Appl. Phys. 128, 235703 (2020).
027401 (2016).
& Renewable Energy September 2017.
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R&D approach
Engineering against
Shockley-Read-Hall
Advanced design
Polarization engineering
p++GaN
n++GaN
n-GaN
Advanced characterization
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Project outcomes: origin of excess voltage in green LEDs
Compared blue and green LEDs with either 1 or 5 Simulated 0.45 V penalty at 10 A cm-2 going from
QWs 1 QW to 5 QW for blue LEDs
100% Polarization
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Project outcomes: origin of excess voltage in green LEDs
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Project outcomes: V-defect engineering
Demonstrated from 522–621 nm for GaN on Si UCSB approach: V-defect engineering on sapphire
Attribute low VF to V-defects from superlattice Difference between GaN on Si and GaN on sapphire
Semipolar sidewall QWs • low polarization barrier is threading dislocation and V-defect density
Improved hole injection into deeper QWs Increase TD, V-defect density by increasing NH3 flow
F. Jiang, et al., Photonics Res. 7, 144 (2019). C. Lynsky, et al., J. Cryst. Growth, Accepted (2020).
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Project outcomes: V-defect engineering
Panchromatic 3 slm NH3 4 slm NH3 5 slm NH3
10 nm p+ GaN cathodoluminescence TDD ~ 4x108 cm-2 TDD ~ 6x108 cm-2 TDD ~ 1x109 cm-2
shows increase in TDD
100 nm p-GaN, [Mg] = 5×1019 cm-3
from ~4x108 to ~1x109 cm-2
10 nm p-AlGaN EBL, [Mg] = 9×1019 cm-3
30 nm n-GaN
2.2 μm n-GaN, [Si] = 5×1018 cm-3 NH3 flow Avg size large Density large Density small Total defect
3 samples grown with (slm) defects (nm) defects (cm-2) defects (cm-2) density (cm-2)
either 3, 4, or 5 slm NH3
2.2 μm UID GaN flow during the temperature 3 184 ± 15 1.95 × 108 2.18 × 108 4.13 × 108
ramp and HT UID GaN 4 206 ± 17 2.64 × 108 3.56 × 108 6.19 × 108
Single Side Polish (SSP) Sapphire
5 174 ± 27 5.05 × 108 1.16 × 109 1.66 × 109
2.6x increase 5.3x increase 4x increase
10 nm p+ GaN
30 nm n-GaN
1.0
Normalized EL Intensity
0.8
0.6
0.4
0.2
0.0
400 450 500 550 600 650 700 750 800
Wavelength (nm)
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Thank you
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