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4 Ultraviolet Electroluminescence From
4 Ultraviolet Electroluminescence From
LETTERS
ABSTRACT
We report ultraviolet electroluminescence at 390 nm from diode structures consisting of electrodeposited ZnO nanorods sandwiched between
a transparent SnO2 film and a p-type conducting polymer. The nanorods are embedded in an insulating polystyrene layer. ZnO deposition
occurs at 90 °C and produces vertically oriented nanorods with very high uniformity over areas of ∼20 cm2. Electron diffraction shows the
nanorods to be single crystalline wurtzite ZnO. As-grown films show a broad electroluminescence band over the visible spectrum. Annealing
at moderate temperatures (T ) 300 °C) increases the emission and strongly raises the excitonic contribution. Optimally processed films show
a narrow ultraviolet electroluminescence line at ∼390 nm.
With its large exciton binding energy of ∼60 meV, ZnO is uration, the as-grown material exhibits broad-band electro-
a promising candidate for high-stability, room-temperature luminescence across the spectral region from 350 to 850 nm.6
luminescent and lasing devices. Recent research has dem- Processing and annealing at temperatures of 300 °C in air
onstrated strong ultraviolet and visible photoluminescence1-4 improves the sample quality, reduces the surface roughness,
as well as optically pumped lasing4 in ZnO nanocrystals. So increases the electroluminescence intensity, and shifts the
far, however, p-type doping of ZnO has remained a chal- emission maximum to the ultraviolet region. A narrow UV-
lenge, and as a consequence, only a few LED structures could electroluminescence line is observed at 393 nm in the
be fabrictated successfully.5 Until now, only electrolumi- annealed material.
nescence in the visible region has been observed from homo-5 The ZnO nanorods were grown at 90 °C on 5 × 5 cm2
and heterojunction6 nanorod structures, but ultraviolet (UV) fluorine-doped SnO2 films on glass substrates using a
electroluminescence from nanostructures has remained out standard three-electrode electrochemical cell with a Pt
of reach. In most of the ongoing work, ZnO nanostructures counter electrode and a Ag/AgCl reference electrode. Before
are prepared in a variety of gas-phase methods. Typical deposition, the substrates were cleaned in an ultrasonic bath
deposition temperatures are 300-500 °C for CVD- and of acetone and methanol with subsequent rinsing in HNO3
MOCVD-based techniques,7 600-900 °C for vapor-transport and distilled H2O. The deposition used aqueous solutions of
techniques,8 and 900 °C for thermal evaporation techniques.9 0.1 M KCl and 0.1 mM ZnCl2 saturated with O2 gas. The
Vapor-liquid-solid2 techniques at 900 °C have also been uniformity of the deposition over the complete substrate area
applied. A much lower deposition temperature regime is was excellent. More details on the electrodeposition are given
accessible from solutions. Lincot et al.10,11 have reported in refs 6 and 12.
epitaxial thin film and nanorod growth on sapphire and GaN
Figure 1 a and b shows an electron-diffraction micrograph
grown in electrodeposition at temperatures as low as 80 °C.
and a high-resolution STEM obtained from a single as-grown
Nonepitaxial nanorod growth has been demonstrated by us
nanorod. The images demonstrate clearly that the as-grown
in the same technique on a variety of polycrystalline metal
material is single-crystalline. From the orientation of the
and metal-oxide films.12
nanorod in the microscope, it is concluded that the growth
Here we report ultraviolet electroluminescence from ZnO
direction and the nanorod axis coincide with the c axis of
nanowire heterojunctions prepared in this low-temperature
the wurtzite unit cell. Previous studies12 showed that the
regime. We show that high-quality single-crystalline nano-
carrier mobilities in the as-grown material are as high as 20
wire crystals with surface roughnesses of ∼3 nm can be
obtained at temperatures of 70-90 °C. In an LED config- cm2/Vs.
Annealing took place in dry air at a temperature of 300
* Corresponding author. E-mail: rkoe@pdx.edu. °C for 1 h at atmospheric pressure and was followed by
10.1021/nl051501r CCC: $30.25 © 2005 American Chemical Society
Published on Web 09/17/2005
Figure 1. (a) Electron diffractogram of a single as-grown ZnO
nanorod electrodeposited at T ) 90 °C from an aqueous solution;
(b) high-resolution transmission electron micrograph of an as-grown
nanorod; (c) high-resolution transmission electron micrograph
obtained after annealing at 300 °C.
injection is found to be sufficient to produce visible electro- transport level to the ZnO valence band edge and an
luminescence at room temperature.6 To further reduce the additional 0.7 eV barrier between the SnO2 Fermi energy
insulator coverage, we can thin the polystyrene at the ZnO and the ZnO conduction band edge. It can be expected that
tips by mild plasma-etching in oxygen. Typically we used 3 a more elaborate choice of contact materials will bring about
min, 100 W O2 rf-plasma exposure at a pressure of 30 Pa to substantial reduction of these barriers or that a sequence of
obtain nearly bare ZnO tips as shown in Figure 2. small energy barriers can be constructed in multilayer
Figure 3 shows the electroluminescence results for as- contacts. These refinements may eventually lead to further
grown and annealed ZnO. Although visible broad-band improvement of the luminescence onset voltage and the
luminescence over the 360-850 nm region is observed in current densities in this type of heterojunction device.
the as-grown ZnO nanorods, improved intensities and an Overall, this device presents an interesting alternative to
additional narrow UV emission line is observed in LEDs organic LEDs. Because the optically active material in this
made of material annealed at 300 °C. The UV-emission is hybrid structure is inorganic, stability issues may be less
centered on a wavelength of 393 nm and has a full width of critical than in all-organic LEDs. The device also satisfies
24 nm at half-maximum. The band gap energy of ZnO is all of the requirements for flexible-substrate and large-area
3.37 eV, corresponding to 360 nm. In polycrystalline films applications. Processing temperatures and procedures prin-
and nanostructures, room-temperature photoluminescence cipally allow the use of polymeric substrates such as Kapton,
and lasing has been observed in the region around 390 nm13 and the nanorod/polystyrene composite appears sufficiently
and has been ascribed to bound-exciton and vacancy-related robust to absorb large mechanical strain.
transitions.14,15 A comparison between the photoluminescence To conclude, we have reported narrow-line ultraviolet
and the electroluminescence spectra of the annealed ZnO electroluminescence in ZnO nanorods, grown at 90 °C in
shows nearly identical features in the two spectra, indicating electrodeposition and annealed at 300 °C. The LED con-
that the injection and transport processes in the annealed ZnO sisted of SnO2/ZnO/PEDOT structures with an internal
are very efficient. For the UV transitions to have intensities polystyrene insulator layer. The complete processing pro-
similar to those of the defect transitions, the electronic cedure is compatible with large-area fabrication on flexible
transport for electrons and holes must occur with only a very substrates.
small reduction in carrier energy over the transport path
length, which corresponds to the nanorod height, that is, ∼2 Acknowledgment. We gratefully acknowledge Dr.
µm. The unannealed material shows a weak shoulder in the Chunfei Li for help with the microscopy work.
UV region, indicative of less efficient transport and the
presence of other nonradiative recombination channels, References
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