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IIIIII L L L L
IIIIII L L L L
عام: الشعبة/القســم
االولي: المستوي/الفرقـة
: كــــود المقــــرر
Abstract:
The transistor FET is divided into a mosfet and JFET , where the JFET is divided into an
N-channel and a B-channel, the B-channel is characterized by a better conductivity than
the B-channel. Parties, the source and the drain have a communication channel of a
different type from the third-party type of gate, distinguished from the regular transistor
with small size and high speed
1. Introduction
At the beginning of the twentieth century, reliance on vacuum valves was in the
electronics industry, and with the development of semiconductor technology that
distinguished from valves in terms of small size and high efficiency, and after the
success of an American team in inventing a dipole called a transistor, which
revolutionized the electronics industry because of its high efficiency and fast operating
speed, there are two types of transistors,
Bipolar transistor (Bjt) nbn or bnb and a transistor effect of the field(FET) is divided into
two types JFET or MOSFET, we will talk in this research about a transistor J FET
channel N and channel B in terms of work theory and curve properties with an
explanation of the working areas of the transistor saturation region cutting area
breakdown region and region Umayyad With an explanation of the types of JFET
channel N and channel B and the renewal of the difference between them and the
internal structure and the properties curve for each type, we will talk about the methods
of analysis and design, different and at the end we will mention some of the different
applications of JFET
We will now study properties in terms of operating theory, properties, and operating area
There are two types of field effect transistor with a link, either N channel or B channel
Figure1. 1
and the internal composition of the transistor consists of a communication channel that
works on the connection between the source and the drain is of type N channel or
channel B where in type N the majority of the electron The majority of gaps consist of
the gate area being of a different type from the conduction channel, and the gate
connection must be reverse in relation to the connection of the
conduction channel and it forms around the gate a buffer zone
called fig1.2
When applying a voltage equal to zero, attraction will form between the gate and the
communication channel, which works on me, which increases the area of
communication, as the current will continue to increase linearly until reaching the
maximum value of the voltage VDD At this moment, the value of the current will be
established and we will get higher The passage of a current between the drain and the
source, and the current of the source is equal to the current of the drain, but with an
increase in the voltage on the permissible values, a transistor will collapse, where we
notice the presence of a battery that makes a difference between the source and the drain
for the passage of electrons. Each component has its own rated voltage
Figure1.3 1 3
And when a negative voltage is applied, it will repel the two regions, and the charge
carriers will go to the negative battery, which leads to the widening of the depletion area
and the narrowness of the communication channel. When continuing to increase the
value of the negative voltage, the depletion area will expand until contact occurs
between the two depletion regions and at this moment the current ID equals zero The
greater the voltage, the more breakage will occur and the voltage will be VP
We notice in the fig 1.3 am the thickness of the depletion area between the gate and the
drain is greater than its thickness in the area between the gate and the source because
reversibility between the drain and the gate is higher than reversibility between the
source and the gate
2. When steady VGS at zero, the current continues in the linear amplifier until the
voltage VDS reaches its highest value in this case the current is constant ID at this value
4
and the value is ID at the highest value and this region is called the saturation region and
the transistor is a good condeuctor The transistor works as an open switching
2- The active region consists of the curved discontinuity with the curve of the cutting
regionVP meaning that there is no drain current moving in the circuit and in this region
the transistor works as an amplifier of the voltage
3-When a negative voltage is applied to the gate VGS the current continues to decrease
and the thickness of the depletion area continues to increase until the lead to weak
electrons between the drain and the conductor. When contact occurs between the two
depletion regions, the value of the current ID equals zero and in the event of more
interference with the increase VGS It will induce a breakdown of the transistor and call
this region the cut-off or pinch- off area where the transistor acts as a closed switch
4- When applying a positive voltage higher than the rated voltage of the transistor, a
breakdown of the transistor will occur
5
2.2. Self bais N-chanal JFET
fig 3.2
7
4. 2. JFET N-channel
The n- channel is the same as the P-channel structure, but it differs in terms of the
installation of the communication channel and the gate where the communication
channel is of the type N where the majority are for electrons and the direction of current
from the drain to the source and the installation of the type B
The properties curve fig 3.3 is very free from B-channel, but
when we want to reduce the current we apply a negative voltage
and not a positive opposite to type B, and this type is considered
better than type B in terms of conductivity because the majority
of the donor electrons are
Fig3.3
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[1] Name of the authors, “Title of the paper or the book,” Publisher, Vol., PP., Year.
Example:
[1] Hamdi Awad, “neural networks and its applications,” IEEE Transaction in Control
systems, vol. 22, pp. 15-21, 2001.