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ICP-MS Chapter 2 INTRODUCTION
ICP-MS Chapter 2 INTRODUCTION
Part 2 - PlasmaQuant® MS
0
Features of the PlasmaQuant® MS
▪ Eco Plasma
▪ iCRC Interference
Management
▪ HD Quadrupole
▪ ADD10 Detector
Strengths of the PlasmaQuant MS
Innovative
and Patented
Technology
Lowest
Highest
Operating
Sensitivity
Cost
2
Innovative Design Concepts
➢Performance optimization
3
Simplified Maintenance Process
4
Plasma generation
▪ Robust for high salt matrices and organic solvents using a conventional torch
5
Argon Gas Cost Savings
Cylinders
Replacement Cost $US120
Total Gas Flow of a 18L/min
typical ICP-MS
Time to Replacement 1 day
(8hr working day)
6
Plasma Robustness
▪ Maintenance free
ReflexION in the PlasmaQuant® MS
23.10.2017 9
Reflecting Ion Mirror – 3D Control
ReflexION in the PlasmaQuant® MS
23.10.2017 11
Integrated Collision Reaction Cell
▪ Ar based interferences
▪ H2 is best
80Se 40Ar40Ar+
▪ Competitors push
All-Helium mode
Collision-Reaction Cells
Analyte
75As
Interference
40Ar35Cl
40Ca35Cl
He gas
14
Mass Analyzer – 3MHz Quadrupole
▪ No regular cross-calibrations
Cross
calibration
Intensity
Analog
Signal
Pulse Counting
21
Two New Models
PlasmaQuant MS Elite
▪ Configured for maximum sensitivity
▪ Minimum 1.5 Mc/s/ppb on In115
▪ Challenges magnetic sector-field ICP-MS
▪ Not everyone needs high sensitivity
▪ But no one offers such high sensitivity on quad ICP-MS
PlasmaQuant MS
▪ Configured for routine applications
▪ Minimum 0.5 Mc/s/ppb on In115
▪ Exceeds other quadrupole ICP-MS
▪ Cone interface and sample introduction optimized for
higher throughput, routine sample matrices