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Nano Scale Optics With Nearfield Scanning Optical Microscopy (NSOM)
Nano Scale Optics With Nearfield Scanning Optical Microscopy (NSOM)
Nano Scale Optics With Nearfield Scanning Optical Microscopy (NSOM)
4πε r ⎝ r r r ⎠
1 ⎛ 2 2ik ⎞
Er = ⎜ − ⎟ cos θ p (t ) e ikr
4πε r ⎝ r 3 r 2 ⎠
z
Conception of an instrument
E.H. Synge, "A suggested method for extending the
microscopic resolution into the ultramicroscopic region," Phil.
Mag. 6, 356 (1928).
E.H. Synge, "An application of piezoelectricity to
microscopy," Phil. Mag. 13, 297 (1932).
http://www.olympusmicro.com/primer/techniques/nearfield/nearfieldintro.html
http://www.physics.ncsu.edu/optics/nsom/NSOMintro.html
PSTM
Apertureless NSOM (Photon Scanning Tunneling Microscopy)
Shear force
Normal force
Science, 257, 189-195 (1992).
Aperture type
Taped fiber, multiple-taped fiber
Cantilevered AFM/NSOM tips (Si3N4, SiO2)
Other kinds, such as tetrahedral tip, Fluorescent tip
Metal Coating Optional
Apertureless type
Dielectrics, semiconductors or metals
Other kinds, such as nano-particle attached tip
Mircofabrication
Rubbing
Focus ion beam milling
Special techniques, such as solid
electrolysis, self-terminated corrosion
APD
Probe
Laser Scanner
Nanonics Imaging Ltd
Cantilevered
probe
Aperture
System schematic
Fiber mounting
To Piezoelectrics HV Source
Filter
Freq. Gen.
Obj. Lens
Upper Piezo Fiber Tip 532nm Source
Lock-In Detector
Lower Piezo
Tuning Fork PID Controller
Obj. Lens
Filter Computer
APD
Prof. Shalaev’s group Internal to Purdue
System Setup
User Interface
Prof. Xianfan Xu’s group Internal to Purdue
Photon
BS PMT AEM
Counter
AFM/NSOM
White BS PSD Probe
Source
AFM
Spectra
Spacing:
Spectrometer 470 nm
AFM #6 400 #8
250
C / 20 min.
200 300
150
200
100
50 100
600 800 1000 1200 1400 600 800 1000 1200 1400
500
Reflection 700
#14 #16
NSOM
C / 20 min.
400
500
300
300
200
600 800 1000 1200 1400 600 800 1000 1200 1400
Prof. Shalaev’s group Internal to Purdue 1 / cm 1 / cm
Sample Scanning
YAG 1064 nm
xyz piezo stage
Si CCD
Spectrometer
1800 90
1900 nm
Function: 1400 70
60
distance (nm)
1200
1500
T (x,y,λ) =
Counts
1000 50
30
probe with 600
I(x,y,λ)/Io(λ) 500
‘red’ Filter
400
200
20
10
120
1400 1400 1400 1400 1400
110
90
1000 1000 1000 1000 1000
distance (nm)
distance (nm)
distance (nm)
distance (nm)
distance (nm)
80
800 800 800 800 800
70
50
400 400 400 400 400
NF
40
200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800
distance (nm) distance (nm) distance (nm) distance (nm) distance (nm) distance (nm)
650-675 675-700 700-725 725-750 750-775 775-800
Broadband 1400
g g
120
110
1400
g g
1400
g g
1400
g g
1400
g g
1400
g g
imaging 1200
1000
100
90
1200
1000
1200
1000
1200
1000
1200
1000
1200
1000
distance (nm)
distance (nm)
distance (nm)
distance (nm)
distance (nm)
distance (nm)
80
800 800 800 800 800 800
70
50
Mode
400 400 400 400 400 400
40
200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800
Transition
distance (nm) distance (nm) distance (nm) distance (nm) distance (nm) distance (nm)
800-825
g g 825-850g g 850-875 g g 875-900
g g 900-925 g g 925-950
g g
as function 1200
110
100
1200 1200 1200 1200 1200
1500 nm
distance (nm)
distance (nm)
distance (nm)
distance (nm)
distance (nm)
of
80
800 800 800 800 800 800
70
Wavelength
50
400 400 400 400 400 400
40
200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800 200 400 600 800
distance (nm) distance (nm) distance (nm) distance (nm) distance (nm) distance (nm)
devices)
Localized laser ablation
Currently in use for photomask
repair
Nanolithography
J. Microscopy 194, 537 (1999)