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High Speed electronics-UoH-3-SoC-IC-Basics - Requirments
High Speed electronics-UoH-3-SoC-IC-Basics - Requirments
∆t
A modern fab.
facility would have a
ρD of (0.15 → 0.5)
It depends on the
maturity of the
process and the
expense charges by
the fab. facility
Pdyn CVdd f
2 2
Pstatic I leakVdd
VS