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A SEM-based DL diagnosis system

For identifying VSB mask writer defects


- Ajay Baranwal, et. al.

© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc.Confidential and Proprietary to Center for Deep Learning in Electronics Manufacturing and its IP Members.
VSB writer system is a complex & reliable system

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Rarely, something can go wrong
Need to diagnose and fix defects ASAP

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
A quick overview of the VSB mask writer

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
A quick overview of the VSB mask writer

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Mask vendors to diagnose and fix defects ASAP
To provide best customer service and support

© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Writer defects need to be diagnosed and fixed
ASAP
Root cause the defect; repair and/or replace parts

Shape errors

Position errors

Dose errors

© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
There are two SEM defect classification methods
To identify the writer’s defects
Note: Data not to scale
For illustrative purpose

Single Die reticle example 2x2 Die-array example

Die-to-database method Die-to-die method


Compares with corresponding CAD data Compares two Dies

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
D2DB example D2D example
Reference CAD & defect SEM Reference SEM & defect SEM
Note: Data not to scale
For illustrative purpose

CAD & SEM images SEM images

Die-to-database classifier Die-to-die classifier


Compares with corresponding CAD data One Die acts as a reference

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Hard for humans to classify the error
A Die-to-database example

Reference CAD Defect SEM

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Hard for humans to classify the error
Needs overlaying, zooming-in/out; still hard due to noise, LER

Reference CAD Defect SEM

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Yet another case: hard to classify
A Die-to-die example

Reference SEM Defect SEM

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Yet another case: hard to detect and classify
Needs overlaying, zooming-in/out; still hard due to noise, LER

Reference SEM Defect SEM

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
We built DL models for classification methods
DL works great on image patterns ‒ match, differentiate, group, etc.
Reference CAD images

Deep NN Position error Dose error


Trained on millions of
DT created synthetic SEM

Shape error Normal

Type of error probability

Defect SEM images

© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary 14
We built DL models for classification methods
DL works great on image patterns ‒ match, differentiate, group, etc.
Reference CAD images
e rs
e t e s
a m
r im win a g
p a t
N M
E ita l
2 M S i g
, K
1Deep 5NN0 a d
e r s 8 h
Trained on millions of
t
Position error Dose error

a y th i
DT created synthetic SEM
i w
6 l w l y
2 ne d o n
r a i l e
T sib
Shape error Normal

o s Type of error probability

Defect SEM images


P

© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary 15
Though, design CAD and SEM need alignment
A new DL model; algorithmic methods limited for different domain images

Image alignment

Misaligned CAD & SEM Aligned CAD & SEM

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D2DB DL model shows ~ 93% accuracy
For different CD-SEM machines; visualization shows confidence

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D2D DL model also show ~ 91% accuracy
For different CD-SEM machines; visualization shows confidence

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A SEM-based defect classifier system: D2DB & D2D
Possible with several DL models and Digital Twins to synthesize data
Reference CAD images Reference SEM images

a. Position error b. Dose error

c. Shape error d. Normal


Defect SEM images Defect SEM images
Die-to-database Die-to-die
classification method Error classification
classification method

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Mask vendors to diagnose and fix defects ASAP
To provide best customer service and support

1% 9% 2%
92. acy 85. acy 90. acy
c c ur c c ur c c ur
A A A

Dose error Shape error Position error

© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Mask vendors to diagnose
ef e c t and fix defects ASAP
d
To provide best customer
No uracyservice and support
cAc 2%
96.

1% 9% 2%
92. acy 85. acy 90. acy
c c ur c c ur c c ur
A A A

Dose error Shape error Position error

© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Mask vendors to diagnose
ef e c t and fix defects ASAP
d
To provide best customer
No uracyservice and support
c Ac 2%
96.
e rs
e t e s
a m
r im win a g
p a t
N M
E ita l
2 M S i g
1% , K
1 855.90% y a d 2%
92. acy
ur e r s 8 rac
cc ith
90. acy
ur
A c c
a y i th A
u
w A c c

6 l w l y
2 ne d o n
r a i l e
T sib
Dose error
o s Shape error Position error
P

© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
DL is great for SEM analysis!
DL augments human taking faster and accurate decisions with large data

SEM denoising
CAD2SEM digital twins SEM2CAD digital twins

Filter good quality SEM CAD to SEM Image alignment VSB writer defect classification

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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
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