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SEM Based Defect Classifier For VSB Mask Writer
SEM Based Defect Classifier For VSB Mask Writer
© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc.Confidential and Proprietary to Center for Deep Learning in Electronics Manufacturing and its IP Members.
VSB writer system is a complex & reliable system
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Rarely, something can go wrong
Need to diagnose and fix defects ASAP
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
A quick overview of the VSB mask writer
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
A quick overview of the VSB mask writer
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Mask vendors to diagnose and fix defects ASAP
To provide best customer service and support
© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Writer defects need to be diagnosed and fixed
ASAP
Root cause the defect; repair and/or replace parts
Shape errors
Position errors
Dose errors
© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
There are two SEM defect classification methods
To identify the writer’s defects
Note: Data not to scale
For illustrative purpose
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
D2DB example D2D example
Reference CAD & defect SEM Reference SEM & defect SEM
Note: Data not to scale
For illustrative purpose
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Hard for humans to classify the error
A Die-to-database example
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Hard for humans to classify the error
Needs overlaying, zooming-in/out; still hard due to noise, LER
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Yet another case: hard to classify
A Die-to-die example
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Yet another case: hard to detect and classify
Needs overlaying, zooming-in/out; still hard due to noise, LER
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
We built DL models for classification methods
DL works great on image patterns ‒ match, differentiate, group, etc.
Reference CAD images
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We built DL models for classification methods
DL works great on image patterns ‒ match, differentiate, group, etc.
Reference CAD images
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary 15
Though, design CAD and SEM need alignment
A new DL model; algorithmic methods limited for different domain images
Image alignment
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D2DB DL model shows ~ 93% accuracy
For different CD-SEM machines; visualization shows confidence
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D2D DL model also show ~ 91% accuracy
For different CD-SEM machines; visualization shows confidence
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A SEM-based defect classifier system: D2DB & D2D
Possible with several DL models and Digital Twins to synthesize data
Reference CAD images Reference SEM images
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Mask vendors to diagnose and fix defects ASAP
To provide best customer service and support
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Mask vendors to diagnose
ef e c t and fix defects ASAP
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To provide best customer
No uracyservice and support
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
Mask vendors to diagnose
ef e c t and fix defects ASAP
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To provide best customer
No uracyservice and support
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
DL is great for SEM analysis!
DL augments human taking faster and accurate decisions with large data
SEM denoising
CAD2SEM digital twins SEM2CAD digital twins
Filter good quality SEM CAD to SEM Image alignment VSB writer defect classification
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© Copyright 2021 Center for Deep Learning in Electronics Manufacturing, Inc. NuFlare confidential and proprietary
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