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Ar P617
Ar P617
Ar P617
2. Chemical composition
Copolymers based on methylmethacrylate and methacrylic acid mainly dissolved in 2-methoxyethanol (AR-P
610, Flash point: 39 °C), 1-methoxy-2-propanol (AR-P 617, Flash point: 38 °C).
2,70
2,60
2,50
2,40
2,30
2,20
2,10
2,00
1,90
1,80
1,70
1,60
1,50
Do/µm
1,40
1,30
1,20
1,10
1,00
0,90
0,80
0,70
0,60
0,50
0,40
0,30
0,20
0,10
0,00
1 2 3 4 5 6 7 8 9 10 11 12 13 14
2000 rpm/µm 0,03 0,08 0,13 0,20 0,30 0,40 0,52 0,67 0,85 1,05 1,30 1,62 1,99 2,50
4000 rpm/µm 0,02 0,04 0,08 0,15 0,21 0,29 0,38 0,48 0,59 0,74 0,92 1,14 1,40 1,75
6000 rpm/µm 0,01 0,03 0,07 0,12 0,17 0,23 0,30 0,38 0,48 0,60 0,76 0,96 1,18 1,45
Allresist GmbH . Am Biotop 14 . 15344 Strausberg Grafik AR-P 617 As of: January 2008 Semitec CPS 20, uncovered chuck, 2" Si-wafer
Table 1 Spezifications of PMMA-Copolymers PMMA/MA 33% in 1-methoxy-2-propanol
Solvent of E-Beam Resist Solids content Viskosity 25°C Film thickness Film thickness Film thickness Film thickness Density cont.
Resist AR-P [%] [mPas] 1000 rpm [µm] 2000 rpm [µm] 4000 rpm [µm] 6000 rpm [µm] 20°C [g/cm²]
1-methoxy-2-propanol
150-nm-pattern over 200-nm-SiO 2-level generated by AR-P 617.03 (Do = 120 nm); electron exposure: LION LV1 (Leica GmbH, Jena); REM: Institut für Halbleiterphysik, Frankfurt/O. GmbH; publication M.3 MNE ´95
Allresist GmbH . Am Biotop 14 . 15344 Strausberg Tabele AR-P 617 As of:: January 2008 Semite CPS 20, uncovered chuck, 2" Si-wafer