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A Brief History of ... Semiconductors
A Brief History of ... Semiconductors
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A brief history of ... semiconductors Semiconductor materials
A brief history of . . .
semiconductors
Tudor Jenkins
Institute of Mathematical and Physical Sciences, University of Wales,
Aberystwyth SY23 3BZ, UK
E-mail: tej@aber.ac.uk
Abstract
The development of studies in semiconductor materials is traced from its
beginnings with Michael Faraday in 1833 to the production of the first
silicon transistor in 1954, which heralded the age of silicon electronics and
microelectronics. Prior to the advent of band theory, work was patchy and
driven by needs of technology. However, the arrival of this successful
quantum theory of solids, together with a concentration on the growth of
pure silicon and germanium and an understanding of their properties, saw an
explosion in activity in semiconductor studies that has continued to this day.
silver Ag
germanium Ge
copper Cu
silicon Si
glass
aluminium Al
platinum Pt
10–12 10–6 10 0 10 6
electrical conductivity (S m -1)
Figure 3. Left to right: Shockley, Bardeen and Brattain. Photograph reprinted with permission of Lucent
Technologies Inc./Bell Labs.
100 µm thick piece of germanium and transistor polycrystalline rod of germanium. This was
action was observed. The length of the surface dipped in a melt of germanium, rotated and slowly
around the semiconductor, from contact to contact, withdrawn, or pulled, from the melt. As the seed
ruled out a surface effect. Transistor action had crystal is withdrawn from the melt, the molten
been proved to be effectively a bulk effect as germanium adhering to the crystal solidifies, using
described by the theories of Shockley [22]. the crystal structure of the seed as a template.
Because the point contact transistor was In this way, large single crystals of germanium
difficult to make, difficult to control and unstable, were grown, which could be doped in a precise
effort was now made to produce a junction fashion [24]. In April 1950, Teal’s team grew
transistor. Initial efforts used polycrystalline a single crystal of germanium containing a thin
semiconductor material, but the use of such region of p-type material embedded in an n-type
material, where charge carriers would be scattered material. As the seed crystal was pulled out of
and trapped unpredictably by grain boundaries an n-type germanium melt, gallium was quickly
and twins, would produce devices that were added to make the melt p-type. When a layer
irreproducible and of low quality, hardly a good of p-type material had formed of the required
thing for mass production. It was recognized, thickness, antimony was added to the melt. This
notably by Gordon Teal, that what was needed was compensated the gallium and turned the melt back
high purity, single crystal material. into n-type material. This crystal was cut into n–
The use of single crystal materials for p–n rods and contacts applied to the three regions
semiconductor devices was controversial at this of doping [25]. The electrical properties of the
time. Much of the progress in this field was transistor thus made were largely consistent with
due to a team led by Teal. In 1948, Teal and Shockley’s proposed junction transistor. This
John Little grew a single crystal of germanium transistor was more reliable than the point contact
based on a technique developed by Jan Czochralski version, generated less noise and could handle
in 1918 [23]. Teal used a small single crystal higher powers. The junction transistor was now
(known as a seed crystal) taken from a large the rival of the thermionic valve . . . if only it could