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Laser Technik Journal - 2007 - G Rtler - Excimer Lasers The Powerful Light Source in The UV and VUV
Laser Technik Journal - 2007 - G Rtler - Excimer Lasers The Powerful Light Source in The UV and VUV
Excimer Lasers
The powerful light source in the UV and VUV
46 LTJ June 2005 No. 2 © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
LASER SOURCES
energy [eV]
6
However, this has changed dramatically. As a 5 B2 Σ and the halogen atom repel each other and
result of effective improvement over the last C Π2 the molecule falls apart. The energy levels
4
15 years, excimer lasers have now become C→A for a XeCl* molecule are shown in Figure 2.
fully competitive with other commercially- 3 B→X In fact, XeCl in the X-state is loosely bonded
used laser systems (Figure 1). 2 (around 1 eV). Even thermal vibrations are
There are two main segments of the world already strong enough to break this weak
1
market for excimer lasers nowadays. One is A2Π bond. Excimer lasers have a high quantum
0 Xe+Cl
in microlithography with about 400–500 X2Σ efficiency. The radiative transition is directly
systems per year. These lasers are very so- –1 to the ground level. For the most important
0.2 0.3 0.4 0.5 0.6 0.7
phisticated devices, designed for 24-hour formation channel at least one Xe+ is needed
operation at repetition rates of up to 4 kHz. r [nm] to create a XeCl* molecule. The formation of
They are used as deep UV light sources in XeCl* is described in the following reaction
steppers for microelectronic manufacturing FIGURE 2: Energy levels of a XeCl* mole- equations [3]:
under clean room conditions. The other big cule. The potential energy of the lower
level decreases with larger inter-nuclear Xe+ + Cl- + Ne => XeCl* + Ne
market is the medical area with a volume Xe2+ + Cl- => XeCl* + Xe
distance. This means that the rare gas
of about 700 systems per year. The main Xe* + HClv=1,2 => XeCl* + H
atom and the halogen atom repel each
application for medical excimer lasers is in other and the molecule falls apart. Xe** + HCl => XeCl* + H
refractive corneal correction. This applica-
tion requires relatively low-energy lasers The theoretical maximum obtainable quan-
with moderate repetition rates of from 200 10–90 % transmission. The properties of the tum efficiency is about 33% (12 eV ionisa-
Hz to 500 Hz. laser beam, for example the bandwidth, are tion, 4 eV radiation). Commercially available
mainly determined by the optical resonator. system normally have an efficiency of from
Houtermans in 1960 proposed the use of 0.2% (F*2; 157 nm) to 2% (KrF*, 248 nm)
Basics of Excimer lasers
molecules that can exist in the upper laser (electrical input / optical output).
The laser is a source of an intensive coherent level but are unstable in the lower level as
light field. It has a close analogy with an elec- a laser medium [4]. One possible laser me-
Technical realisation
tric amplifier, which has a positive feedback dium that can be used here is a combination
loop. It is well known that this arrangement of a rare gas and a halogen. The first rare In principle, a pulsed gas laser consists of
starts to oscillate if the feedback is positive gas halogen excimer laser was the electron- three main components:
and the amplification is higher than the pumped XeBr-laser from Searles and Hart in ● the laser tube,
losses. 1975 [2]. The first discharge-pumped XeCl- ● the pulsed power module and
Oscillation condition: Amplification > losses laser was constructed in 1977 by Ischenko ● the resonator.
et al.. A discharge-pumped excimer laser In the laser tube a high pressure gas di-
The same thing occurs in a laser. The light is has many advantages compared with an scharge is initiated. This is where the excimer
amplified by a (light) amplifying medium. In molecules are generated and the laser radi-
the case of an excimer laser, this medium is a THE COMPANY ation is emitted. The pulsed power module
gas mixture. Normally the lower energy level generates the high voltage / high current
in the molecules is more populated than the TuiLaser pulse to initiate the gas discharge. Finally,
upper level. But under certain conditions, this Munich, Germany the resonator is necessary for coherent la-
population state can be inverted, the upper ser radiation. In the following, these three
level is then more populated than the lower TuiLaser is the leading manufacturer of components will be described in detail. Also
one. This inversion is needed for laser opera- compact excimer lasers. Based in Mu- integrated within the laser systems are: a gas
tion. It requires not only the pumping of the nich, the heart of the high-tech south of management system with vacuum pump; a
upper laser level but also depletion of the Germany, in the vicinity of two internati- controlling unit with interface to the user;
lower level. Otherwise due to the operation onally famous universities (LMU and TU and an energy stabilisation module with an
itself the lower level will become highly popu- Munich) TuiLaser is situated in the perfect internal energy monitor.
lated and the inversion will be neutralized so place to perform ambitious R&D. With a
that only a very short laser pulse is then pos- rapidly growing team of currently 95 em-
Laser tube
sible. This takes place in nitrogen lasers. ployees, TuiLaser is producing UV lasers
The laser medium amplifies light by means for an extensive base of users who rely on The technical realisation of an excimer
of stimulated emission. The feedback is real- the company for delivering state-of-the- laser is quite demanding. The laser gas is
ized by two mirrors which form a resonator. art laser technology. For more informa- highly corrosive and reacts with most of the
One mirror has a 100% reflection (or a value tion please visit www.tuilaser.com commonly used materials. In recent years
very close to that) and the other typically has excessive research has been carried out in
© 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim www.laser-journal.de LTJ 47
LASER SOURCES
48 LTJ June 2005 No. 2 © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
LASER SOURCES
1000 V 4.0
40 14 1600
1100 V 3.5
Standard Deviation [%]
35 12 1400
1200 V
3.0
Power in W
30 1300 V 10 1200
Energy [mJ]
25 2.5 1000
1400 V 8
20 1500 V 2.0 800
6
15 1.5 600
4 400
10 1.0
1300 V 2 200
5 0.5 1100 V 1400 V 0 0
0 0.0 1200 V 1500 V 0
200M400M600M800M 1G
0 500 1000 1500 2000 0 500 1000 1500 2000 Number of Pulses
frequency in Hz repetition rate in Hz standard deviation voltage energy
FIGURE 6: Output energy depending on FIGURE 7: Pulse-to-pulse fluctuation FIGURE 8: The first billion pulses of a long
repetition rate and voltage, 193 nm. The depending on repetition rate and voltage, term test; constant laser pulse energy
output energy was measured in depen- 193 nm (corresponding to Figure 6). The (black) of 8 mJ at 193 nm @ 1kHz; high
dence on the operating voltage and the fluctuations are under 2% up to 1 kHz, voltage (blue) and standard deviation
repetition rate. A linear rise is observed then a small rise to 3.5% can be observed. (green).
up to 2 kHz.
© 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim www.laser-journal.de LTJ 49
LASER SOURCES
integrated premix gas supply. These laser to laser tube lifetime level. This would elimi-
systems do not require any additional gas nate the maintenance of the laser system
installation and can be easily integrated in during the normal operation of the system
experimental set-ups. Figure 9 shows the and reduce the costs of ownership again.
interior of this new laser system. Compact Tube lifetimes up to 5 billion pulses should
industrial excimer laser systems with a hig- be possible for compact high-repetitive ex-
her output energy are also underway. Their cimer laser systems. In principle, repetition
energy is stabilised in the order of 30 mJ for rate up to 4 kHz and more are feasible, but
193 nm and 248 nm, i.e., it is a factor of three applications requiring more than 1 kHz are
higher compared with the mini excimer la- still under development.. In the semicon-
sers. Repetition rates up to 2 kHz have been ductor fabrication excimer laser systems that
demonstrated. The pulse-to-pulse stability is FIGURE 9: Stand-alone mini excimer laser are used as illumination sources in the litho-
about 2% as is known from the newest mini with integrated gas supply. These laser graphy operate with 4 kHz [6] 24-h per day.
excimer laser generation [7]. These devices systems do not require any additional gas 6 kHz and more are under development.
are especially designed for applications like installation and can be easily integrated in As result of the development during the last
micro-structuring of matter in an industrial experimental set-ups. decade is achieved. Additionally, the time
environment. In Figure 10, a prototype of intervals between maintenance are exten-
this new compact laser system is shown. ded. Thus, long-term operation without any
interruptions can be guaranteed in industrial
applications. The price for „UV-photons“ is
Applications
dramatically reduced. Excimer lasers, espe-
Excimer lasers are used in many medical, cially in the compact class, can be used for
industrial and science applications. In the many new applications and introduce these
following, a short overview will be given and due to the described advantages into the
a few examples for these applications will be industrial fabrication.
discussed. Excimer lasers and other gas lasers like the
The main medical application of the com- CO2 laser are not a technology of the last
pact excimer lasers is their use in vision century, they are one of the key laser techno-
FIGURE 10: Prototype of the newest type
correction systems in ophthalmology. More logies for the 21st century. They just started
of compact excimer lasers. These devices
than 5,000 lasers are installed worldwide. are especially designed for applications
to go into the industry and there will be a lot
In this application the cornea is treated ef- such as micro-structuring of matter in an of new products to be manufactured with
fectively with the non-thermally damaging industrial environment. the help of excimer lasers in the future.
and precisely controllable ArF excimer laser
beam , to correct the aberrations of the hu- displays. In lithography, more than 2,500
References
man eye. A new medical application is the lasers (highly repetitive, narrow band) are
use of 308 nm excimer radiation for psoriasis installed worldwide as UV light sources in [1] Y. P. Raizer, Gas Discharge Physics, Sprin-
treatment, as a replacement for UV lamps. steppers and scanners for illumination of ger-Verlag, Berlin (1991).
Other applications in the medical area are the resists. [2] M. von Dadelszen and D. E. Rothe, IEEE
still in the experimental phase. The latest generations of microprocessors Trans. On Plasma Science 19, p.329ff
Three years ago the telecommunications and memory chips are fabricated using (1991).
industry started to implement compact excimer lasers at 248 nm and 193 nm. Due [3] R. Sorkina, F. A. van Goor, W. J. Witteman,
excimer lasers for the writing of fibre Bragg to further miniaturisation of the elements, Applied Physics B 55, p.478–484 (1992).
gratings (FBG). Micro-structuring and the these lasers will be become more and more [4] TuiLaser AG, Data sheet of Excistar-S
marking of glass and special plastics is important in the future. Industrial Laser (2005).
another large field of industrial application. The TFT annealing process is used in the [5] A. Görtler, C. Strowitzki, Proceedings of
In the semiconductor industry, compact production of high-end colour displays in the Second International WLT-Confer-
excimer lasers have already been installed as mobile phones and LCD monitors for com- ence on Lasers in Manufacturing, Mu-
light sources in metrology tools. puters or television. Without excimer lasers nich, Germany, p.419ff (2003).
Compact excimer lasers are also used in we would probably have to do without [6] H. Mizoguchi et al, International Sympo-
science for a wide variety of applications. many of these modern tools and “toys” in sium on Immersion and 157 nm Lithog-
One example is photoionisation which takes the private field or workplace as there are no raphy, Vancouver, Canada (2004).
place in mass spectrometers for chemical alternative production technologies. [7] A. Görtler, C. Strowitzki, XV International
analytics and process controlling. The pum- Symposium on Gas Flow and Chemical
ping of dye lasers is another application. Lasers & High Power Laser Conference,
Summary and Outlook
The main application of excimer lasers with Prague, Czech Republic (2004); to be
higher output energy (typically more than Main topics of future development in the published in SPIE Proceedings Vol. 5777
100 mJ, up to 1 J single pulsed energy) are in field of excimer lasers are the enlargement (2004).
lithography for producing highly-integrated of the laser tube lifetime and especially of the
semiconductor elements and the TFT anne- resonators optics lifetime. The aim of further
aling process in the production of flat panel development is to extend the optics lifetime
50 LTJ June 2005 No. 2 © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim