Lecture #4: Outline - Band Gap Energy - Density of States - Doping

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Lecture #4

OUTLINE

• Band gap energy


• Density of states
• Doping

Read: Chapter 2 (Section 2.3)


Band Gap and Material Classification
Ec

EG= ~9 eV
Ec
EG = 1.12 eV
Ev Ev Ec

Si SiO2 Metal

• Filled bands and empty bands do not allow current flow


• Insulators have large EG
• Semiconductors have small EG
• Metals have no band gap
– conduction band is partially filled

Prof. Changhwan Shin


Measuring Band Gap Energy
· EG can be determined from the minimum energy (hn) of photons
that are absorbed by the semiconductor.

electron
Ec
photon

photon energy: h v ³ E G
Ev

hole

Band gap energies of selected semiconductors


Semiconductor Ge Si GaAs
Band gap (eV) 0.67 1.12 1.42

Prof. Changhwan Shin


Density of States
E
gc(E)
DE
Ec Ec

Ev Ev

gv(E)
g(E)dE = number of states per cm3 in the energy range between E and E+dE
so, g(E) = number of states per (cm3 and each energy state level)

Near the band edges:


mn* 2mn* (E - Ec )
gc ( E ) = E ³ Ec
p 2h 3
m*p 2m*p (Ev - E )
gv ( E ) = E £ Ev
p 2h 3

Prof. Changhwan Shin


Doping
By substituting a Si atom with a special impurity atom (Column V
or Column III element), a conduction electron or hole is created.

Donors: P, As, Sb Acceptors: B, Al, Ga, In

Prof. Changhwan Shin


Doping Silicon with Donors
Example: Add arsenic (As) atom to the Si crystal

The loosely bound 5th valence electron of the As atom “breaks free”
and becomes a mobile electron for current conduction.

Prof. Changhwan Shin


Doping Silicon with Acceptors
Example: Add boron (B) atom to the Si crystal

The B atom accepts an electron from a neighboring Si atom, resulting


in a missing bonding electron, or “hole”. The hole is free to roam
around the Si lattice, carrying current as a positive charge.

Prof. Changhwan Shin


Donor / Acceptor Levels (Band Model)
Ec
Donor Level Ed
Donor ionization energy

Acceptor ionization energy


Acceptor Level
Ea
Ev

Ionization energy of selected donors and acceptors in silicon


Donors Acceptors
Dopant Sb P As B Al In
Ionization energy, E c -E d or E a -E v (meV) 39 45 54 45 67 160

Prof. Changhwan Shin


Charge-Carrier Concentrations
ND: ionized donor concentration (cm-3)
NA: ionized acceptor concentration (cm-3)

Charge neutrality condition: ND + p = NA + n

At thermal equilibrium, np = ni2 (“Law of Mass Action”)

Note: Carrier concentrations depend


on net dopant concentration (ND - NA) !

Prof. Changhwan Shin


N-type Material
ND >> NA

(ND – NA >> ni):

Prof. Changhwan Shin


P-type Material
NA >> ND

(NA – ND >> ni):

Prof. Changhwan Shin


Terminology
donor: impurity atom that increases n
acceptor: impurity atom that increases p

n-type material: contains more electrons than holes


p-type material: contains more holes than electrons

majority carrier: the most abundant carrier


minority carrier: the least abundant carrier

intrinsic semiconductor: n = p = ni
extrinsic semiconductor: doped semiconductor

Prof. Changhwan Shin


Summary
• The band gap energy is the energy required to free an
electron from a covalent bond.
– EG for Si at 300K = 1.12eV
– Insulators have large EG; semiconductors have small EG
• Dopants in Si:
– Reside on lattice sites (substituting for Si)
– Group-V elements contribute conduction electrons, and
are called donors
– Group-III elements contribute holes, and are called
acceptors
– Very low ionization energies (<50 meV)
à ionized at room temperature
Dopant concentrations typically range from 1014 cm-3 to 1020 cm-3
Prof. Changhwan Shin

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