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Azmat-LS2102205, Microwaves Home Task #11
Azmat-LS2102205, Microwaves Home Task #11
Student ID : LS2102205
Subject : Microwave Engineering
Dated:18th, Dec. 2021 Day: Saturday
1. INTRODUCTION:
The trend of any maturing electronic technology is toward smaller size, lighter weight, lower
power requirements, lower cost, and increased complexity. Microwave technology has been moving
in this direction for the last 10–30 years with the development of microwave integrated circuits
(MICs). This technology strives to replace bulky and expensive waveguide and coaxial components
with small and inexpensive planar components, and is analogous to the digital integrated circuitry
that has led to the rapid increase in sophistication of computer systems. Microwave integrated
circuitry can incorporate transmission lines, discrete resistors, capacitors, and inductors, as well as
active devices such as diodes and transistors. MIC technology has advanced to the point where
complete microwave subsystems, such as receiver front ends and radar transmit/receive modules, can
be integrated on a chip that is only a few square millimetres in size. There are two distinct types of
microwave integrated circuits. Hybrid MICs have one layer of metallization for conductors and
transmission lines, with discrete components (resistors, capacitors, integrated circuit chips,
transistors, diodes, etc.) bonded to the substrate.
In a thin-film hybrid MIC, some of the simpler components are deposited on the substrate.
Hybrid MICs were first developed in the 1960s, and still provide a very flexible and cost-effective
means for circuit implementation. Monolithic microwave integrated circuits (MMICs) are a more
recent development, where the active and passive circuit elements are grown on the substrate. The
substrate is a semiconductor material, and several layers of metal, dielectric, and resistive films are
used. Below we will briefly describe these two types of MICs in terms of the materials and
fabrication processes that are required and the relative merits of each type of circuitry.
Figure 1.
Figure 1: Photograph of one of the 25,344 hybrid integrated T/R modules used in Raytheon’s Ground
Based Radar system. This X-band module contains phase shifters, amplifiers, switches,
couplers, a ferrite circulator, and associated control and bias circuitry.
Courtesy of Raytheon Company, Waltham, Mass
The fuelling factors behind the advancement of monolithic microwave IC market is mostly
due to low price, batch processing, small size, reproducibility, and compact size, similar to those of
silicon ICs. Semi-insulated crystal of gallium arsenide, epitaxial film development systems, gallium
arsenide substrates, and MESFET PC based circuit configuration, and the advancement of the
gallium arsenide metal-semiconductor field-impact transistor have given additional acceleration to
this development of the of monolithic microwave IC market over the past few years.
Because of its property of higher thickness, a huge number of devices can easily be developed
in a single MMIC during fabrication that makes lower manufacturing costs. Henceforth in general
MMIC cost is less. The delay of signal is minimum because of shorter distance between the parts on
a MMIC because of which, the insignificant mismatch between the segments happens. MMICs
(Monolithic Microwave Integrated Circuit) don’t have any wire security unwavering quality issues.
Execution of MMIC is undermined as ideal materials and can’t be utilized in making for every
component separately. Power handling ability with limit is lower since proper heat exchange are not
utilized in making of MMIC (Monolithic Microwave Integrated Circuit).
The development of the monolithic microwave IC market in Asia Pacific can be ascribed to
the high popularity of cell phones; significant move toward fast mobile technologies (for example,
shifting from 3G to 4G network connectivity); Surged utilization of mobile services, including social
media, video, money related services, and internet business, and surge in the Defense purpose in
nations, for example, India, China, South Korea, and Japan. China is a worldwide manufacturing hub
with a prospering electronics sector and one of the quickest developing economies globally. Factors,
for example, increasing spending on Defense sector, rising focus on automobile sector by the
governments, and advancement in technology propel the growth of the monolithic microwave IC
market.
The report offers a comprehensive evaluation of the market. It does so via in-depth qualitative
insights, historical data, and verifiable projections about market size. The projections featured in the
report have been derived using proven research methodologies and assumptions. By doing so, the
research report serves as a repository of analysis and information for every facet of the market,
including but not limited to: Regional markets, technology, types, and applications.
Figure 3: Some common transmission lines used in microwave circuits: (a) coaxial line, (b)
Figure 5 shows an example of monolithic integration. Figure 5 (a) is a photograph of the top
side of a wafer and Figure 5(b) shows a single monolithic microwave integrated circuit; the identical
circuits are repeatedly produced on the wafer in Figure 5(a). The monolithic microwave integrated
circuit in Figure 5(b) is found to contain active and passive devices, and planar transmission lines.
The monolithic integration provides a compact sized circuit and eliminates a significant amount of
assembly when building a component or a system. Especially because size is of critical importance in
most recent RF systems, monolithic integration is frequently employed to provide a compact
component. An advantage of monolithic integration is that it is well suited for large-scale production,
which results in lower costs. A disadvantage is that monolithic integration takes a long time to
develop and fabricate, and small-scale production results in highly prohibitive costs.
Figure 5: Monolithic integration circuit (a) wafer and(b) a monolithic microwave integrated
circuit on the wafer (28 GHz GaAs pHEMT Gilbert cell up-converting mixer)
Hybrid integration is a fabrication method in which the transmission lines are implemented by
conductor patterns on a selected substrate with either printing or etching, and active and passive
devices are assembled on the patterned substrate by either soldering or wire bonding. When
implementing transmission lines by conductor patterns on a substrate, careful consideration must be
given to the substrate material and the conductor material for the transmission lines because these
materials can have significant effects on the characteristics of transmission lines. Hybrid integration
is thus classified into three types based on the method by which the lines are formed on the substrate:
a printed circuit board (PCB), a thick-film substrate, and a thin-film substrate.
Figure 6 shows an example of how connection lines are formed on a PCB substrate. Both
sides of the dielectric material are attached with copper cladding that is then etched to obtain the
desired conductor patterns. For PCB substrate materials, epoxy fiberglass (FR4), Teflon, and Duroid
are widely used. FR4 substrate (a kind of epoxy fiberglass) can be used from lower frequencies to
approximately 4 GHz, while Teflon or Duroid can be used up to the millimeter wave frequencies,
depending on their formation. Generally, all these materials lend themselves to soldering while wire
bonding for an integrated circuit assembly is typically not widely used. Furthermore, compared with
other methods that will be explained later, a PCB can result in lower costs; its fabrication is easy and
requires less time to produce. In addition, production on a small scale is possible without the use of
expensive assembly machines; it is easy to fix and could also be used in large-scale production, and
The thin-film technique is very widely used in the fabrication of microwave circuits for
military and microwave communication systems. In the case of the thin-film process, a similar
ceramic substrate material used in thick film is employed, but compared to the thick-film substrate, a
fine surface-finish substrate is used. The most widely used substrate is 99% alumina (Al 2O3). Other
substrates such as fused silica, quartz, and so on are possible for conductor-pattern generation based
on thin-film technologies. The pattern formation on the substrate is created with a photolithographic
process that can produce fine tracks of conductor patterns similar to those in a semiconductor
process. Since the thin-film substrate is also alumina as in the case of a thick-film substrate, the
assembly of semiconductor chips using wire bonding is possible. Thin film compared with PCB and
thick film is more expensive, and due to the requirement of fine tracks, a mask fabrication is
necessary and the process generally takes longer. Passive components such as resistors and air-bridge
capacitors can be implemented using this process. In addition, integrated circuits produced by the
thin-film process require special wire bonders and micro welding equipment for assembly. Compared
to the monolithic integration process, the thin-film process tends to be cheaper in terms of cost, but
compared to MMIC, the assembled circuit using the thin-film patterned substrate is difficult to
characterize precisely because of unknown or poorly described parasitic circuit elements associated
with the assembly methods such as wire bonding and die attach. Before the emergence of MMICs
(monolithic microwave integrated circuits), thin-film technology was the conventional method for
building microwave-integrated circuits (MICs). Figure 8 is a photograph of thin-film circuits
fabricated with the thin-film technique.
Figure 8: A photograph of substrates produced by the thin-film process. From top left to bottom
right, they are filter, phase shifter, power amplifier (presented in Chapter 9), path-switching
circuit by assembly, power divider, and 50 Ω lines.
The choice of integration method depends on the application and situation, taking into
account several factors mentioned previously, such as the operating frequency of the integrated
circuit, the types of semiconductor components (chip or packaged), the forms of the passive
components, large-scale fabrication costs, and method of assembly. These factors should all be
considered when selecting the optimum method of integration. For a description of microwave-
patterned substrate fabrication, assembly with wire bonding and soldering, and packaging, see
reference 1 at the end of this chapter. The book provides general information about microwave-
circuit fabrications. Table 1.1 provides a comparison of the hybrid integrations described previously.
Now we will consider the application of the planar transmission lines such as microstrip, slot,
and CPW to the monolithic and hybrid integration technologies. Microstrip lines are the most widely
used transmission lines for both monolithic and hybrid integration technologies. In microstrip lines,
the top conductor pattern is usually connected to the ground by a through hole or a via hole. Thus, the
back-side process for the through-hole or via-hole fabrication is essential to building a circuit based
on microstrip lines. This backside process is inconvenient especially in the monolithic integration. In
hybrid integration, the holes can be fabricated through simple mechanical drilling for a PCB case and
through laser or ultrasonic drilling for thick- and thin-film cases. Then, plating the fabricated holes
completes the fabrication of a through or via hole. However, to fabricate via holes in monolithic
integration, a wafer that typically has a normal thickness of about 600 mm should be polished down
to about 100 mm thickness. Current technology does not support via-hole fabrication beyond 100
mm. In Figure 4, we can see that the CPW and slot lines do not need the back-side metallic ground
and they eliminate the need for any additional backside metallization process. The CPW is very
helpful in monolithic integration and is widely used to build MMICs without vias. However, the
discontinuities of CPWs are not well understood compared to those of microstrip lines and the
integration based on a CPW is not as popular as that based on a microstrip.
The driverless car must be able to see and interpret what's in front when going forward and
backward when reversing. It needs a 360-degree view and uses a “vision” called a LIDAR system
(Light and Radar). For close-in control, such as when parking, lane-changing, or in bumper-to-
bumper traffic, radars are built into the front and rear bumpers and sides of the vehicle. Operating
frequency for this radar is usually 77GHz, which has good RF propagation characteristics, and
provides enough resolution.
6.3 Several RF and Microwave technologies will drive the industry forward in
2019
The RF and Microwave industry will continue to move towards technologies that have higher
levels of integration and flexibility to enable multiple use sub-systems. Re-usability will drive down
cost but more importantly, accelerates time to market. Manufacturers’ re-use of the same hardware
and software, as well as accumulated engineering knowledge across all platforms, mitigate risks and
allows for rapid reconfiguration.
6.4 Research and development will be ‘top priority’ with 5G on the horizon
As 5G continues to grow in relevance, everyone from component manufacturers to service
providers will be increasingly forced to manage their costs and respective business models. 5G
promises orders of magnitude improvement in data capacity, however, it comes at the expense of
added equipment complexity and higher costs.
6.5 Reinvention of RF And Antennas
Technology companies that design and manufacturer RF components or antennas will play a
critical part in adopting the new 5G standards and ensuring these devices fit in with new networks.
New 5G modelling software will allow companies to test designs and simulations to reduce costs
further.
Summary
Q2. List the nonlinear effect in RF and microwave circuits and try to describe it?
We have seen that thermal noise is generated by any lossy component. Since all realistic
components have at least a small loss, the ideal linear component does not exist in practice because
all realistic devices are nonlinear at very low signal levels due to noise effects. In addition, practical
components may also become nonlinear at high signal levels. In the case of active devices, such as
diodes and transistors, this may be due to effects such as gain compression or the generation of
spurious frequency components due to device non-linearities, but all devices ultimately fail at very
high-power levels. In either case, these effects set a minimum and maximum realistic power range, or
dynamic range, over which a given component or network will operate as desired. In this section we
will study the response of nonlinear devices in general, and two definitions of dynamic range.
Devices such as diodes and transistors have nonlinear characteristics, and it is this nonlinearity that is
of great utility for desirable functions such as amplification, detection, and frequency conversion.
Nonlinear device characteristics, however, can also lead to undesirable effects such as gain
compression and the generation of spurious frequency components. These effects may lead to
increased losses, signal distortion, and possible interference with other radio channels or services.
Some of the many possible effects of nonlinearity in RF and microwave circuits are listed
below:
1. Saturation (gain reduction in an amplifier)
2. Harmonic distortion (multiples of a fundamental signal)
3. Intermodulation distortion (products of a two-tone input signal)
4. Cross-modulation (modulation transfer from one signal to another)
5. AM-PM conversion (amplitude variation causes phase shift)
6. Spectral regrowth (intermodulation with many closely spaced signals)
Figure 9 shows a general nonlinear network, having an input voltage vi and an output voltage vo. In
the most general sense, the output response of a nonlinear circuit can.
d2 vo
a2 = (squared output) (2c)
d v 2i Vi=0
and higher order terms. Different functions can be obtained from the nonlinear network depending on
the dominance of particular terms in the expansion. The constant term, with coefficient a0, in (1)
leads to rectification, converting an AC input signal to DC. The linear term, with coefficient a1,
models a linear attenuator (a1 < 1) or amplifier (a1 > 1). The second-order term, with coefficient a 2,
can be used for mixing and other frequency conversion functions. Practical nonlinear devices usually
have a series expansion containing many nonzero terms, and a combination of several of the above
effects will occur.
Figure 10: An example of a linear and nonlinear PISPO network response, with its time-domain
representation denoted by y(t) and frequency-domain representation denoted by Y (f), to a
single frequency stimulus, x(t) and X(f).
1. Gain Compression
First consider the case where a single-frequency sinusoid is applied to the input of a general
nonlinear network, such as an amplifier:
vi = V0 cos ω0t. (3)
Equation (1) gives the output voltage as
vo = a0 + a1V0 cos ω0t + a2V2 0 cos2 ω0t + a3V3 0 cos3 ω0t +···
1 3 1 1
= (a0 + a2V2 0 ) + (a1V0 + a3V3 0 ) cos ω0t + a2V2 0 cos 2ω0t + a3V3 0 cos 3ω0t +··· . (4)
2 4 2 4
This result leads to the voltage gain of the signal component at frequency ω0
(5)
Where we have retained only terms through the third order. The result of (5) shows that the
voltage gain is equal to a1, the coefficient of the linear term, as expected, but with an additional term
proportional to the square of the input voltage amplitude. In most practical amplifiers a 3 typically has
the opposite sign of a1, so that the output of the amplifier tends to be reduced from the expected linear
dependence for large values of V0. This effect is called gain compression, or saturation. Physically,
this is usually due to the fact that the instantaneous output voltage of an amplifier is limited by the
power supply voltage used to bias the active device.
(7)
where standard trigonometric identities have been used to expand the initial expression. We see that
the output spectrum consists of harmonics of the form
mω1 + nω2, (8)
with m, n = 0, ±1, ±2, ±3, .... These combinations of the two input frequencies are called
intermodulation products, and the order of a given product is defined as |m|+|n|. For example, the
squared term of (7) gives rise to the following four intermodulation products of second order:
2ω1 (second harmonic of ω1) m=2n=0 order = 2,
2ω2 (second harmonic of ω2) m=0n=2 order = 2,
ω1 − ω 2 (difference frequency) m = 1 n = −1 order = 2,
ω1 + ω 2 (sum frequency) m=1n=1 order = 2.
All of these second-order products are undesired in an amplifier, but in a mixer the sum or
difference frequencies form the desired outputs. In either case, if ω1 and ω2 are close, all of the
second-order products will be far from ω1 or ω2 and can easily be filtered (either passed or rejected)
from the output of the component. Note from (7) that the ratio of the amplitude of the second-order
intermodulation product ω1 − ω2 (or ω1 + ω2) to the amplitude of a second harmonic 2ω 1 (or 2ω2) is
2.0, so the second-order harmonic power will be 6 dB less than the power in the second-order sum or
difference terms. The cubed term of (7) leads to six third-order intermodulation products: 3ω1, 3ω2,
2ω1 + ω2, 2ω2 + ω1, 2ω1 − ω2, and 2ω2 − ω1. The first four of these will again be located far from ω 1 or
ω2, and will typically be outside the passband of the component. However, the two difference terms
produce products located near the original input signals at ω1 and ω2, and so cannot be easily filtered
from the passband of an amplifier. Figure 10.16 shows a typical spectrum of the second- and third-
order two-tone intermodulation products. For an arbitrary input signal consisting of many frequencies
of varying amplitude and phase, the resulting in-band intermodulation products will cause distortion
of the output signal. This effect is called third-order intermodulation distortion. The third-order
intermodulation product 2ω1 − ω2 (or 2ω2 − ω1) to the amplitude of the third harmonic 3ω1 (or 3ω2) is
3.0, so the third-order harmonic power will be 9.54 dB less than the power in the third-order
intermodulation terms.
Figure 12: Output spectrum of second- and third-order two-tone intermodulation products,
assuming ω1 < ω2.
Similarly, define P2ω1−ω2 as the output power of the intermodulation product of frequency 2ω 1- ω 2
(10)
)
By definition, these two powers are equal at the third-order intercept point. If we define the input
signal voltage at the intercept point as VIP, then equating (9) and (10) gives
(11)
Since OIP3 is equal to the linear response of Pω1 at the intercept point, we have from (9) and (11)
that
(12)
4. CROSS-MODULATION
Cross-modulation is an effect in which amplitude modulation (AM) from a strong undesired
signal is transferred to a weaker desired signal. Testing is usually done (in HF receivers) with a 20-
kHz spacing between the desired and undesired signals, a 3-kHz IF bandwidth on the receiver, and
the desired signal set to 1,000 μV EMF (-53 dBm). The undesired signal (20 kHz away) is amplitude
modulated to the 30 percent level. This undesired AM signal is increased in strength until an
unwanted AM output 20 dB below the desired signal is produced.
A cross-modulation specification ≥ 100 dB would be considered decent performance. This
figure is often not given for modern HF receivers, but if the receiver has a good third-order intercept
point, it is likely to also have good cross-modulation performance.
Cross-modulation is also said to occur naturally, especially in transpolar and North Atlantic
radio paths where the effects of the aurora are strong. According to one (possibly apocryphal) legend,
there was something called the “Radio Luxembourg Effect” discovered in the 1930s. Modulation
from a very strong broadcaster (BBC) appeared on the Radio Luxembourg signal received in North
America. This effect was said to be an ionospheric cross-modulation phenomenon and apparently
occurs when the strong station is within 175 miles of the great circle path between the desired station
and the receiver site.
Figure 14: Cross Modulation
The Cross modulation is the intermodulation distortion caused by multiple carriers within
the same bandwidth. This can happen when strong nearby unwanted AM signal gets added with the
wanted AM signal. The effect will be observed on the weaker input signal. This results into receiver
gets overloaded.
Examples
Cross modulation is observed in cable TV and OFDM based systems. In cable TV, same
amplifier is used for multiple channels for amplification. OFDM uses multiple carriers within the
bandwidth of the single amplifier. OFDM (Orthogonal frequency division multiplexing) modulation
technique is used in WiMAX or WLAN based technologies.
Measurement:
Turn on all tones or carriers except the one and measure the power at the frequency that was
not turned on.
As shown the jammer signal is present just outside the edge of channel filters. Hence large
part of cross modulation signal falls within passband of filter. If LNA IP3 point is not higher, the
cross-modulation power within filter pass band exceeds total thermal noise power.
4.2 Intermodulation
Intermodulation distortion is relevant to devices which handle multiple frequencies. There are
second order and higher order intermodulation distortions. Refer second order vs third order intercept
point which describes intermodulation products, TOI point and IP2 point.
Figure 16: Effect of AM-PM distortion on a modulated signal, input signal has AM component only.
Output signal has interrelated AM and FM components due to the AM-PM distortion of the circuit
Where Jn is the nth order Bessel function of the first kind. Thus, like amplitude distortion, AM-
PM distortion creates sidebands at the harmonics of the modulating signal. Unlike, amplitude
distortion, the sidebands are not limited to the first sideband. The AM-PM distortion effects often
dominate the out-of-band interference beyond fc ± fm as seen in figure 17.
The FM modulation index kϕ may be used as a figure of a merit to access the impact of AM-
PM on signal with small amplitude deviation. The relative level of the sidebands may be calculated
from equation 16. It must be noted that two sidebands nearest to the carrier may be masked from the
AM component of the signal, but the out-of- band component are readily identical.
Figure 17: Output components of an amplitude modulated signals distorted by AM-PM effects
f (ρ, φ) = ∑ A k (¿ ρ)e
jk ∅
¿ (17)
k
Thus, for a given input magnitude, the Fourier coefficients are obtained directly from the
output spectrum calculated by the MFT. For example, if the input circle is large enough to alternately
saturate the modulators, the –3 harmonic of the complex baseband tone dominates the distortion. Let
the carrier frequency be ωc. The output spectrum has lines at ωc+ω0 and ωc – 3ω0. The MFT computes
the real and imaginary parts of the Fourier coefficients. The simulation is repeated for a range of
input magnitudes to capture the magnitude dependence of the Fourier coefficients. At each input
magnitude, the fundamental and its relevant harmonics are recorded for interpolation. The model
implementation reads the recorded data then processes any amount of input baseband data. Figure 19
shows a simulated ACPR measurement.