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Chemical Resistance
Chemical Resistance
Improved Solvent
Resistance
Ancamine 2432, or
8:2 2280:1608/1638
Ancamine 2280
Note: All curing agents in this bulletin offer very good resistance to water, sodium hydroxide, 70% sulfuric acid, and bleach (10% sodium hypochlorite).
Table 1
Handling of Curing Agents with Bisphenol-A Based (EEW=190) Epoxy Resin
Curing Agent
Curing Agent Mixed Gel Time2, min. Thin Film Set Time,3 60°
Viscosity1 (cP) Viscosity1 (cP) (150 g mass) tack free (hr) Film Gloss4
Figure 2
Chemically Resistant Curing Agent Selection: Additional Performance Characteristics
Ancamine 2280
Rapid Development
of Hardness
Ancamine 2423, 2432,
or 2368
IMPROVED CURE SPEED
Reduced Viscosity
Ancamine 2286, 2368,
or 1693
Ancamine 2143
Lower Viscosity Improved Color Better Chemical Resistance Accelerate with Aliphatics
(2432, 2089M, 1856, etc.)
Ancamine 2368 Ancamine 2423 or 2368 Ancamine 2432
0
0 7 14 21 28
Immersion Time, days
Samples cured for 7 days at 77 oF (25 oC) before testing.
Gladys (16338).pm
Chemical Resistance for Ambient Cured Formulations with Bisphenol-A Based (EEW=190) Epoxy Resin
6
3 days 28 days 3 days 28 days 3 days 28 days 3 days 28 days 3 days 28 days 3 days 28 days 3 days 28 days 3 days 28 days
Deionized Water 0.52 1.55 0.33 1.11 0.41 1.39 0.49 1.50 0.31 1.12 0.53 1.59 0.36 1.24 0.52 1.51
Methanol 9.38 7.16 6.38 9.55 10.20 8.07 7.93 -2.41 D@3 D@3 8.46 8.21 10.47 9.74 11.74 5.07
Ethanol 2.41 6.92 1.55 4.68 2.95 7.96 3.98 10.28 6.57 D@14 1.97 5.57 2.39 7.47 3.76 10.35
Toluene 0.05 2.26 0.17 0.99 0.53 2.79 0.40 2.86 1.32 19.20 1.37 0.79 4.85 0.44 2.12
Xylene 0.02 0.20 0.25 0.69 0.01 0.17 0.04 0.19 0.08 1.52 0.11 1.67 0.01 0.90 0.04 0.18
Butyl Cellosolve 0.56 2.41 0.31 1.18 0.79 3.15 1.65 5.31 4.12 13.78 0.98 3.61 1.46 7.82 2.02 5.86
Methyl Ethyl Ketone (MEK) 17.17 D@28 9.35 11.19 21.48 D@5 D@3 D@3 D@1 D@1 15.62 11.88 24.06 17.41 D@3 D@3
10% Lactic Acid 0.76 2.99 1.10 3.24 3.08 9.52 1.81 5.42 0.50 1.70 0.65 2.38 1.10 3.81 2.20 6.55
10% Acetic Acid 1.70 5.64 1.23 3.85 5.29 14.85 2.92 8.23 0.90 2.85 1.68 5.62 3.10 9.31 3.32 9.27
70% Sulfuric Acid 0.01 0.36 0.10 0.13 0.20 0.37 0.08 0.14 0.04 0.11 0.06 -0.05 0.26 0.53 0.11 0.05
98% Sulfuric Acid D@1 D@1 NT NT D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1
6
50% Sodium Hydroxide -0.05 -0.09 0.04 0.09 0.04 0.00 -0.01 -0.04 -0.04 -0.02 0.01 -0.04 -0.10 -0.10 0.64 0.54
10% Sodium Hypochlorite 0.49 1.16 0.27 0.93 0.42 1.08 0.51 1.36 0.11 0.78 0.54 1.26 -0.10 0.71 0.47 1.22
1,1,1 Trichloroethane -0.02 0.64 0.18 0.43 0.02 0.20 0.02 -0.02 0.59 5.74 3.02 15.91 NT NT 0.02 0.23
Note: Samples cured for 7 days at 77 °F (25 °C) before testing. Tested in accordance with ASTM D543-84. NT= not tested. D@X – Destroyed at X days.
5/15/01, 12:22 PM
Table 3
Chemical Resistance for Ambient Cured Formulations with Bisphenol-F Based (EEW=172) Epoxy Resin
Deionized Water 0.68 1.73 0.43 1.30 0.35 1.39 0.58 1.74 0.35 1.30 0.55 1.62 0.48 1.63
Methanol 8.85 1.91 6.79 4.15 9.00 6.44 13.01 D@5 14.26 D@7 7.29 7.28 12.26 D@5
Ethanol 1.97 6.02 1.26 3.47 2.16 6.91 3.61 9.58 18.48 D@7 1.42 4.25 3.37 9.22
Toluene 0.00 0.72 0.12 0.37 0.05 1.82 0.05 0.78 0.02 3.17 0.13 1.98 0.07 0.37
Xylene 0.02 0.02 NT NT -0.01 0.32 0.11 0.09 NT NT -0.03 0.10 0.04 0.09
Butyl Cellosolve 0.30 1.08 NT NT 0.33 1.46 1.03 3.62 NT NT 0.28 0.98 1.05 3.30
Methyl Ethyl Ketone (MEK) D@3 D@3 7.29 7.87 15.34 9.70 16.63 D@5 D@1 D@1 14.30 5.33 19.28 D@5
10% Lactic Acid 0.92 3.35 NT NT 2.92 7.03 1.51 4.80 0.99 3.20 0.84 2.94 2.84 8.05
10% Acetic Acid 2.29 6.77 1.36 3.71 5.05 14.13 2.29 6.95 1.68 5.31 1.92 6.58 3.85 10.77
70% Sulfuric Acid 0.10 0.18 NT NT 0.17 0.11 0.45 NT NT 0.03 -4.32 0.17 0.44
98% Sulfuric Acid 1.17 -1.42 0.62 -0.01 1.57 0.77 -9.32 4.63 -15.57 1.86 -3.20 1.53 -9.75
50% Sodium Hydroxide 0.01 -0.02 NT NT -0.09 -0.15 -0.01 -0.01 NT NT -0.04 -0.12 0.03 0.02
10% Sodium Hypochlorite 0.57 1.24 NT NT 0.29 0.94 0.54 1.48 NT NT 0.46 1.14 0.50 1.27
1,1,1 Trichloroethane 0.04 0.36 NT NT 0.02 0.36 0.02 0.29 NT NT 0.01 0.20 -0.01 0.12
Note: Samples cured for 7 days at 77 °F (25 °C) before testing. Tested in accordance with ASTM D543-84. NT= not tested. D@X – Destroyed at X days.
Table 4
Chemical Resistance for Ambient Cured Formulations with Bisphenol-F/Novolac Resin Blend*
Deionized Water 0.55 1.61 0.48 1.43 0.48 1.36 0.59 1.68 0.36 1.33 0.62 1.71 0.53 1.69
Methanol 8.94 8.76 6.82 7.07 9.05 10.50 11.88 1.26 D@3 D@3 8.25 9.69 11.97 2.50
Ethanol 1.92 5.19 1.24 3.45 2.09 6.10 2.98 8.58 17.02 D@7 1.62 4.59 3.03 8.70
Toluene 0.05 0.56 0.15 0.36 5.07 5.63 4.99 0.68 0.13 4.35 0.06 1.32 0.07 0.61
Xylene 0.00 0.09 NT NT 0.01 0.24 -0.03 0.05 NT NT 0.02 0.05 -0.01 0.09
Butyl Cellosolve 0.25 0.97 NT NT 0.32 1.24 0.75 2.80 NT NT 0.35 1.11 0.84 2.92
Methyl Ethyl Ketone (MEK) 15.70 D@5 6.40 6.74 12.75 9.00 18.25 13.20 D@1 D@1 14.63 4.54 20.00 11.75
10% Lactic Acid 1.06 3.35 NT NT 3.31 9.56 1.75 5.09 0.87 2.78 1.12 3.46 3.24 8.70
10% Acetic Acid 2.25 6.64 1.57 4.19 5.88 16.57 2.83 7.68 1.46 4.55 2.50 7.51 4.50 12.69
70% Sulfuric Acid 0.03 0.08 NT NT 0.08 0.30 0.22 0.35 NT NT 0.04 0.11 0.18 0.65
98% Sulfuric Acid 0.46 -1.63 0.72 0.45 0.67 -3.32 0.36 -6.10 7.51 -24.29 0.65 0.27 0.58 -4.46
50% Sodium Hydroxide -0.01 -0.04 NT NT -0.01 -0.01 -0.04 -0.05 NT NT -0.11 -0.25 -0.02 -0.04
10% Sodium Hypochlorite 0.55 1.24 NT NT 0.44 1.17 0.51 1.31 NT NT 0.43 0.94 0.56 1.48
1,1,1 Trichloroethane 0.07 0.35 NT NT 0.04 0.22 0.05 0.34 NT NT 0.05 1.07 0.04 0.24
*60% by weight bisphenol-F based epoxy resin, EEW=172, and 40% by weight epoxy novolac resin, EEW=176.
Note: Samples cured for 7 days at 77 °F (25 °C) before testing. Tested in accordance with ASTM D543-84. NT = not tested. D@X – Destroyed at X days.
Deionized Water 0.57 1.55 0.43 1.32 0.53 1.53 .47 1.39 0.45 1.51
Methanol 11.22 1.11 10.85 2.50 12.90 2.52 9.09 6.25 14.29 5.90
Ethanol 3.11 7.38 3.14 8.94 4.26 10.01 2.25 5.81 4.62 12.08
Toluene 0.23 3.24 0.44 3.81 0.46 5.64 2.62 22.15 0.29 2.75
Xylene 0.02 0.12 0.04 0.27 0.04 0.58 0.40 2.87 0.03 0.19
Butyl Cellosolve 0.99 3.17 1.07 4.30 1.97 7.74 1.37 4.48 2.36 8.92
Methyl Ethyl Ketone (MEK) 16.17 D@5 21.38 14.97 D@1 D@1 16.12 11.45 D@1 D@1
10% Lactic Acid 0.97 3.03 2.43 7.40 0.92 3.04 0.72 2.39 1.87 6.01
10% Acetic Acid 2.14 6.30 4.31 12.46 1.95 5.95 1.69 5.25 2.90 8.68
70% Sulfuric Acid 0.06 0.13 0.05 0.09 0.02 0.10 -0.05 -0.17 0.16 0.16
98% Sulfuric Acid D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1
50% Sodium Hydroxide -0.02 -0.09 0.04 -0.05 -0.03 -0.09 -0.21 -0.33 0.00 -0.03
10% Sodium Hypochlorite 0.59 1.24 0.40 1.19 0.51 1.33 0.48 1.23 0.39 1.25
1,1,1 Trichloroethane 0.03 0.24 0.03 0.27 0.05 0.32 0.01 0.40 0.03 0.47
Note: Samples cured for 7 days at 77 °F (25 °C) before testing. Tested in accordance with ASTM D543-84. NT= not tested. D@X – Destroyed at X days.
Table 6
Chemical Resistance for Aliphatic Amine Modified Formulations
with Bisphenol-A Epoxy Resin, EEW=190
Reagent 8:2 2280:1608 8:2 2280:1638 8:2 2280:TETA 9:1 2280:TETA 8:2 2143:TETA 9:1 2143:TETA
3 days 28 days 3 days 28 days 3 days 28 days 3 days 28 days 3 days 28 days 3 days 28 days
Deionized Water 0.44 1.29 0.40 1.25 0.36 1.20 0.47 1.26 0.32 1.16 0.32 1.08
Methanol 8.55 10.83 7.91 10.11 7.44 12.07 8.36 14.15 7.21 14.06 7.95 16.54
MEK D@1 D@1 25.69 D@7 D@3 D@3 D@1 D@1 25.91 17.54 D@1 D@1
10% Acetic Acid 2.21 5.90 2.67 6.76 4.16 10.52 1.54 5.13 10.73 25.84 2.95 9.51
98% Sulfuric Acid D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1 D@1
Note: Samples cured for 7 days at 77 °F (25 °C) before testing. Tested in accordance with ASTM D543-84. NT= not tested. D@X – Destroyed at X days.
Table 7
Handling of Curing Agents with Bisphenol-F Based Epoxy Resin,
EEW=172
Curing Agent Thin
Curing Agent Mixed 150 g mass Film Set Time,3 60°
Viscosity (cP)1 Viscosity (cP)1 Gel Time (min)2 tack free (hr) Film Gloss4
Table 8
Handling of Curing Agents with Bisphenol-F/Multifunctional Epoxy Resin
Blend*
Curing Agent
Thin
Curing Agent Mixed Gel Time2, min. Film Set Time,3 60°
Viscosity1 (cP) Viscosity1 (cP) (150 g mass) tack free (hr) Film Gloss4
Table 9
Handling of Curing Agents with 10% CGE diluted Bisphenol-A Based
Epoxy Resin, EEW=188
Curing Agent
Thin
Curing Agent Mixed Gel Time2, min. Film Set Time,3 60°
Viscosity1 (cP) Viscosity1 (cP) (150 g mass) tack free (hr) Film Gloss4
Table 10
Handling of Aliphatic Amine Modified Cycloaliphatic Curing Agents
with Bisphenol-A Based Epoxy Resin, EEW=190
Curing Agent
Thin
Curing Agent Mixed Gel Time2, min. Film Set Time,3 60°
Viscosity1 (cP) Viscosity1 (cP) (150 g mass) tack free (hr) Film Gloss4
10
Figure 5
Cure Speeds of Accelerated Ancamine 2280 Systems
25
80% Ancamine 2280, 20% Ancamine 1856
80% Ancamine 2280, 20% Ancamine 2089M
80% Ancamine 2280, 20% Ancamine 2205
20 80% Ancamine 2280, 20% Ancamine 2432
THIN FILM SET TIME (HR)
15
10
0
77 60 45
CURE TEMPERATURE (OF)
Table 11
Performance of Formulations Accelerated with Ancamine 2432
100% 2280 20% 2432/ 100% 2143 20% 2432/ 100% 1618 20% 2432/
80% 2280 80% 2143 80% 1618
77 °F (25 °C) TFST (hr.)3 6.0 4.5 7.0 4.5 5.5 4.6
40 °F (4 °C) TFST (hr.)3 29 15.3 21 13.8 21 14.5
77 °F (25 °C) Gel Time (min.)2 55 37 45 40 50 35
60° Gloss (7 days at 77 °F)4 105 110 103 110 118 109
Note: Curing agent blends formulated with standard bisphenol-A (DGEBA, EEW=190) resin.
11
150
The data show that Ancamine 2280 and 1693
125
cured formulations develop hardness more
100 slowly than the other curing agent formula-
tions. The data also show that Ancamine
75 2423, 2143, 1618, 2368, and 2286 curing
agents impart similar hardness development
50 at ambient temperatures. At low tempera-
tures, however, hardness development is
25
faster with Ancamine 2423 and 2368 curing
0 agents.
2280 2432 2143 1618 2423 1693 2368 2286
Data in Figure 7 demonstrate the effect of
Note: Curing agents formulated with standard bisphenol-A (EEW=190) liquid epoxy resin formulating with alternative resins on the de-
velopment of coating hardness. Formulating
with bisphenol-F resin or 10% CGE diluted
bisphenol-A epoxy resin reduces the rate of
hardness development relative to Bis-A based
Figure 7 resin.
14 Day Development of Pendulum Hardness for Ancamine 2280-Cured
Epoxy Resins
200
175
1 day
3 days
7 days
KONIG PENDULUM HARDNESS
150 14 days
125
100
75
50
25 Footnotes
1
0
ASTM D-445-83, Brookfield
Bis-A Based Bis-F Based 10% CGE/Bis-A 2
Techne GT-4 Gelation Timer
EPOXY RESIN 3
BK Drying Recorder
4
ASTM D 523-85
12
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