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2007-SPRINGER-Chan-Effects of Bonding Frequency On Au Wedge Wire Bondability
2007-SPRINGER-Chan-Effects of Bonding Frequency On Au Wedge Wire Bondability
DOI 10.1007/s10854-007-9312-7
Received: 16 March 2007 / Accepted: 4 May 2007 / Published online: 31 May 2007
Ó Springer Science+Business Media, LLC 2007
Abstract This paper studies the effect of bonding continuously supplied because of the power drop. This
frequency on bondability of Au wire on a PCB bond pad. causes an excessive energy to be transmitted to the bonded
The wire bonding was performed at two different fre- wire, resulting in weakened wire due to excessive defor-
quencies, 62 kHz and 138 kHz, and at varying bond pad mation.
temperatures between 60 and 110 °C. It is shown that the
bond strengths of the wires bonded at a high frequency
were generally higher than those bonded at a low frequency
for all temperatures studied. Two distinct wire failure
modes were observed for the wires bonded at the high 1 Introduction
frequency: the wires with high pull strengths failed at the
bond neck, while those with low pull strengths failed Vast majority of electronic packages are still intercon-
mainly within the bonded wire body. This resulted in a nected based on the thermosonic wire bonding technology.
large pull strength data scatter, which was explained by the With advantages of high reliability, good electrical
high Q factor of the high frequency transducer. The bon- performance and corrosion resistance, Au wire bonding has
dability obtained for the high bond power end was much been widely used in high end applications [1, 2]. Typical
higher for the high frequency, giving rise to a wider process issues on wire bond quality are bond peel-off and no-bond.
window in terms of bond power for the high frequency These failures can be reduced by increasing major bonding
bonding. The wire bonding performance was compared parameters, such as bond power, force, time and bond pad
between the ‘‘open’’ and ‘‘closed’’ loop bonding systems. temperature, but all these measures have undesirable
The minimum bond powers required for successful bonds drawbacks [3]. Increasing the bond power provides suffi-
in the closed loop system were significantly lower than cient ultrasonic energy, but it also causes large wire
those required in the open loop system (e.g. 20–40 mW vs. deformation. Increasing bond force may cause bond pad
110–135 mW at 90 °C). The closed loop system was able cratering and tend to produce highly deformed wires. A
to correct the resonance frequency shift, thus maintaining long bond time may damage the wire, while reducing the
an almost constant bond power during bonding. In the open product yield. Increasing the bond pad temperature can be
loop system, in contrast, a high bond power needs to be beneficial, but the maximum bonding temperature is
severely limited by the glass transition temperature, Tg, of
the organic printed circuit boards (PCBs). The bonding
Y. H. Chan J.-K. Kim (&)
temperature must be carefully adjusted to ensure the supply
Department of Mechanical Engineering, Hong Kong University
of Science & Technology, Clear Water Bay, Kowloon, of sufficient thermal energy, while avoiding softening of
Hong Kong the substrate material [1].
e-mail: mejkkim@ust.hk A potential solution to the above drawbacks is to
increase the wire bonding frequency. A conventional wire
D. Liu P. C. K. Liu Y. M. Cheung M. W. Ng
ASM Assembly Automation, Ltd. 4/F, Watson Centre, 16 Kung bonding process operates at a low frequency of 60 kHz.
Yip Street, Kwai Chung, Hong Kong Doubling the transducer frequency to 120 kHz will provide
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282 J Mater Sci: Mater Electron (2008) 19:281–288
an additional energy needed to overcome the activation Table 2 Plasma cleaning process
energy of bonding [4, 5]. At even a higher bonding Gas Flow rate Time (s) Power Pressure
frequency of 138 kHz, the bonding temperature can be (SCCM) (W) (mTorr)
further reduced [6]. The high frequency ultrasonic vibra-
tion increases wire-to-pad friction energy by increasing the Argon 5 Initial 60 & Next 100 120
60
number of scrubbing per bond [3], which in turn acceler-
Oxygen 5 Initial 60 100 120
ates solid state welding in a shorter period of time and at a
lower vibration amplitude [7, 8]. The shorter bond time,
lower bond pad temperature and lower wire deformation nickel sulfate (NiSO4) solution. A Au layer was plated
are all beneficial in terms of higher product yield, higher electrolytically on top of the Ni layer.
reliability and higher pull strength. The bond pads were cleaned using plasma to remove
The characteristics of high frequency wire bonding any contaminations on the surface before wire bonding.
make it suitable for ultra fine pitch applications. As the size The optimized plasma process conditions chosen after
of semiconductor devices continuously shrinks and the preliminary tests, including the cleaning power and time,
input/output (I/O) density increases, the demands for are summarized in Table 2. The gas pressure was
smaller and more closely spaced bond pads are ever 120 mTorr and the gas flow rate was 5 sccm. A mixture of
growing [9, 10]. Unlike the Au ball bonds, the wedge Ar and O2 gases was used initially for either 1 min or
bonds are long and narrow. Benefited from the much lower 5 min, followed by an Ar gas treatment for another 1 min.
wire loops than ball bonds, the wedge bonds are ideal for
low profile and ultra high pitch applications. Therefore, the 2.2 Wire pull test and construction of process windows
high frequency thermosonic Au wedge bonding is the
subject of the current study. As a continuation of our pre- Thermosonic wire bonding was performed using two
vious work [11, 12] on bondability of thermosonic Au wire identical automatic wedge bonders (ASM model
bond, the present study aims to evaluate the effect of AB559 A), equipped with different transducers of 62 kHz
bonding frequency on wire bondability. Attention is also and 138 kHz. The same software was used to control the
placed on the comparison of bonding performances using bonding parameters in the two bonders and all other setups
the ‘‘open’’ and ‘‘closed’’ loop systems. The process were identical: only the bonding frequencies were differ-
windows are established to identify the combinations of ent. The wedge tools of both bonders were made of tita-
important parameters, such as wire bond power and bond nium carbide. The mode of operation could be shifted from
pad temperature, which could produce successful wire the ‘‘open’’ to ‘‘closed’’ loop system.
bonds. The Au wire of 25.4 lm in diameter had an elongation
of 0.5–3% and a tensile strength of 12–17 gf. No die was
mounted on the PCB substrates and both the 1st and 2nd
2 Experiments bonds were made directly on the PCBs. The locations of
bonds were controlled by the automatic wedge bonder so
2.1 Materials and samples that the distance between the 1st and the 2nd bonds were
made consistent. The nominal distance between the bonds
The metallizations applied onto the bond pad of PCB were was 1.5 mm and the average loop height was 0.328 mm.
basically the same as those used in our previous studies The bond force and bond time were 20 gf and 20 ms,
[11, 12]. The PCB substrates used were made from 0.8 mm respectively, while the bond power was varied between 0
thick FR-4 type glass fabric reinforced epoxy laminates and 300 mW. The bond pads were pre-heated on the wire
with a Tg of about 120 °C (supplied by Universal Printed bonder heater work chuck to the desire temperature before
Circuit Co. Ltd, Hong Kong) with a copper clad. The bond wire bonding. The bond pad temperature was monitored
pad consisted of Cu, Ni and Au layers, whose plating using a non-contact infrared thermometer. Twenty wires
methods and thicknesses are given in Table 1. On top of were bonded for each set of conditions.
the 25.4 lm thick Cu layer, Ni was electroplated using a A modified wire pull test was used to evaluate the
bondability by measuring the wire pull strength. The test-
Table 1 Metallization scheme ing hook was placed close to the 2nd bond, 0.33 mm away
from the 2nd bond as schematically shown in Fig. 1.
Substrate Plating method Thickness (lm)
Because the distribution of force on each bond and the
Ni Au Ni Au resultant wire pull strength were significantly affected by
the position of the hook, the hook was located consistently
FR-4 Electrolytic Electrolytic 4–8 0.11–0.25
in the same position by automatically placing the hook at
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J Mater Sci: Mater Electron (2008) 19:281–288 283
Hook
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284 J Mater Sci: Mater Electron (2008) 19:281–288
(a) 14
Power 12 62kHz
138kHz
10
6
Open loop
4
0
Time 0 20 40 60 80 100 120 140 160 180 200 220 240 260
Bond power (mW)
Fig. 4 Variations of bond power with time in the open and closed
loop bonding systems
(b) 2.4
2.2
closed loop systems are schematically shown in Fig. 4. In 62kHz
Deformation ratio
the present study, two fixed resonance frequencies were 2.0 138kHz
used, namely 62 kHz and 138 kHz, as the principle oper- 1.8
ating frequencies of the transducers. The open loop system
1.6
was studied at a typical temperature (90 °C) here to iden-
tify any changes in bondability arising from the resonance 1.4
frequency drift. 1.2
1.0
0 20 40 60 80 100 120 140 160 180 200 220 240 260
3 Results and discussion
Bond power (mW)
3.1 Open loop high frequency wire bonding Fig. 5 Wire pull strength and deformation ratio as a function of bond
power obtained in the open loop system (at 90 °C)
The wire bonding performance, in terms of wire pull
strength and wire deformation, is compared between the It was also noted that there were larger bond strength
low and high frequencies for a given bonding tempera- data scatters for the high frequency bonding, in particular
ture of 90 °C while all other conditions were kept in the closed-loop system (see Fig. 6). The high Q factor of
unchanged, as shown in Fig. 5. The wire pull strengths the transducer used and the sensitive wedge tip motion at
decreased while the deformation ratio increased system- the high frequency bonding were mainly responsible for
atically with increasing bond power when a low the large data scatters. Q factor is defined as the ratio of the
frequency of 62 kHz was used. When the bonding fre- energy supplied to the energy dissipated per cycle, and
quency was increased to 138 kHz, the wire pull strengths measures the mechanical loss of supplied energy. The Q
improved by as much as 3–4 gf depending on the bond factors of high and low frequency transducers were 700–
power used, and the corresponding deformation ratio was 800 and 400–600, respectively. The bonding system con-
reduced to only about 1.2 at the threshold or the lowest sisting of a transducer with a high Q factor is very sensitive
bond power. The higher pull strengths and smaller wire to bond pad characteristics, such as surface hardness,
deformation ratios obtained at a higher frequency are a roughness and cleanliness, and slight changes in these
direct reflection of smaller plastic deformation of the conditions cause a sharp drop of energy transmission effi-
wires, which is probably associated with the reduced ciency [14].
wedge tool vibration amplitude at the high frequency Figure 5 also suggests that a high frequency bonding
bonding [7, 8]. The higher the frequency, the greater the requires a higher bond power to make successful bonds. At
number of scrubbing per bond, which can increase the a low frequency, successful bonds were made at the lowest
frictional heat generated at the contact interface [13]. bond power of 110 mW, which is 30 mW lower than the
The higher energy supplied and less wire damage due to corresponding bond power for the high frequency bond.
wedge-wire interfacial motion [9] allowed more complete This does not necessarily imply the bondability of the low
bonding and stronger wire necks, resulting in higher frequency bonding was better than the high frequency
bond strengths than in the low frequency bonding. bonding. It appears that the bonding conditions used in this
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J Mater Sci: Mater Electron (2008) 19:281–288 285
0
3.2 Closed loop high frequency wire bonding
0 20 40 60 80 100 120 140 160 180 200 220 240 260
Bond power (mW) To correct the discrepancy associated with the shift in
resonance frequency, wire bonding was carried out using
(b) 14
62kHz the closed loop system. Wire bonding was performed at
12
138kHz two different frequencies and three different bonding
10 temperatures. The wire pull strengths measured at different
Pull strength (gf)
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286 J Mater Sci: Mater Electron (2008) 19:281–288
1.2
1.0
0 20 40 60 80 100 120 140 160 180 200 220 240 260
Bond power (mW)
(a)
(c) 2.4
62kHz
2.2 138kHz
2.0
Defo rm ation ratio
Wire bonded with low bond power After wire pull test
1.8
1.6
1.4
1.2 (b)
1.0
0 20 40 60 80 100 120 140 160 180 200 220 240 260
Bond power (mW)
Wire bonded with high bond power After wire pull test
Fig. 7 Wire deformation ratio as a function of bond power at
different temperatures obtained in the closed loop system: (a) 60 °C, Fig. 9 Schematic diagrams of wire bonded and after pull test with
(b) 90 °C and (c) 110 °C (a) high bond power and (b) low bond power
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J Mater Sci: Mater Electron (2008) 19:281–288 287
deformation ratios of the samples bonded at these wire pull strengths corresponding to the low frequency
temperatures, which were significantly higher than those were generally low (lower than the criterion of 5 gf). This
obtained at 60 °C, especially at high bond powers. Nev- resulted in a generally wider process window for the high
ertheless, the average bond strengths for the bond power at frequency bonding. The above observations are in general
or below 120 mW were still higher for the wires bonded at valid if the hook position is changed in the wire pull test, as
a high frequency than at a low frequency. supported by the wire deformation ratios and the failure
At a given temperature (90 °C), the minimum bond mechanisms.
powers required for successful bonds in the closed loop
system were significantly lower than those required in the
open loop system at both frequencies (20–40 mW in 4 Concluding remarks
Fig. 6(b) vs. 110–135 mW in Fig. 5(a)). In the closed loop
system, a power as low as 13 mW was sufficient to produce The wire bondability at low and high frequencies was
a successful bond at 110 °C. This observation is a reflec- studied in this paper. The relative bonding performance of
tion of the ability of the closed loop system to correct the the open and closed loop systems was also studied. The
resonance frequency shift. Because the bond power can be following results can be highlighted from the study.
maintained almost constant during bonding, a much lower
1. In both the open and closed loop systems, the use of
initial bond power is required to initiate bonds. In the
high frequency resulted in higher bond strength and
open loop system, however, the bond power needs to be
lower wire deformation at a given bond power. The
continuously supplied even after a bond is formed. This
low wire deformation facilitates the high frequency
causes an excessive energy to be transmitted to the bonded
wire bonding suitable for ultra fine pitch applications.
wire, resulting in further deformation of the wire.
2. The pull strength data showed a large scatter when the
high frequency transducer was used. This was caused
3.3 Process window
by the high Q factor and large wedge nodal shift at a
high frequency, which in turn affected the wedge
Process windows for the closed system are constructed as a
amplitude during bonding. A high frequency trans-
function of bond temperature and bond power, as shown in
ducer with a low Q factor may favorably produce
Fig. 10. A low bond pad temperature in general required a
consistently strong bonds.
high bond power to make a successful bond because a high
3. The high frequency bonding resulted in a generally
power was needed to compensate for the reduced thermal
wider process window in terms of bond power than the
energy. At a low frequency, wire could be bonded at a
low frequency bonding due to the ability to produce
marginally lower bond power than at a high frequency,
strong bonds at high bond powers.
especially at low temperatures. In contrast, the bondability
4. The bond power required for successful bonding was
measured for the high bond power end was much higher for
much lower in the closed loop system than in the open
the high frequency than for the low frequency because the
loop system.
References
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288 J Mater Sci: Mater Electron (2008) 19:281–288
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